公开(公告)号：US20210318612A1

公开(公告)日：2021-10-14

申请号：US17356536

申请日：2021-06-24

Applicant: Intel Corporation

Inventor： Hongxia FENG ,  Changhua LIU ,  Bohan SHAN ,  Dingying XU ,  Leonel ARANA ,  Manuel GADOGBE ,  Matthew TINGEY ,  Julianne TROIANO

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/32

Abstract: The present disclosure is directed to a patterning process that includes providing a composite dry film resist on a surface, in which the composite dry film resist includes a base film, a barrier layer and a resist layer, in which the base film is disposed over the barrier layer and the barrier layer is disposed over the resist layer. In another aspect, the patterning process includes removing the base film from the barrier layer and exposing the barrier layer to form an exposure precursor, which has a first area and a second area, further exposing the first area of the exposure precursor to electromagnetic irradiation, which passes through the barrier layer and the resist layer in the exposed first area becomes water-insoluble, and removing the barrier layer and the unexposed second area to form a pattern template.

公开(公告)号：US20240282591A1

公开(公告)日：2024-08-22

申请号：US18171683

申请日：2023-02-21

Applicant: Intel Corporation

Inventor： Oladeji FADAYOMI ,  Shaojiang CHEN ,  Jeremy ECTON ,  Matthew TINGEY ,  Srinivas PIETAMBARAM ,  Leonel ARANA

IPC: H01L21/48 ,  C23F1/02

CPC classification number: H01L21/486 ,  C23F1/02

Abstract: The present disclosure is directed to a planarization tool having at least one module with a target holder for supporting a target with a metal layer, at least one of a plurality of etch inhibitor dispensers for discharging an etch inhibitor toward the target, and a plurality of nozzles for discharging a chemical etchant at an angle towards the target to perform selective removal of the metal layer for planarization of the target. In an aspect, the plurality of etch inhibitor dispensers and the plurality of nozzles may be combined as a single unit to discharge the chemical etchant and the etch inhibitor together. In another aspect, the plurality of etch inhibitor dispensers and the plurality of nozzles may be configured in a single module or separate modules.

公开(公告)号：US20200312771A1

公开(公告)日：2020-10-01

申请号：US16366661

申请日：2019-03-27

Applicant: Intel Corporation

Inventor： Bai NIE ,  Gang DUAN ,  Srinivas PIETAMBARAM ,  Jesse JONES ,  Yosuke KANAOKA ,  Hongxia FENG ,  Dingying XU ,  Rahul MANEPALLI ,  Sameer PAITAL ,  Kristof DARMAWIKARTA ,  Yonggang LI ,  Meizi JIAO ,  Chong ZHANG ,  Matthew TINGEY ,  Jung Kyu HAN ,  Haobo CHEN

IPC: H01L23/538 ,  H01L23/31 ,  H01L23/00 ,  H01L21/48 ,  H01L21/56 ,  H01L21/78

Abstract: A die assembly is disclosed. The die assembly includes a die, one or more die pads on a first surface of the die and a die attach film on the die where the die attach film includes one or more openings that expose the one or more die pads and that extend to one or more edges of the die.

公开(公告)号：US20240088052A1

公开(公告)日：2024-03-14

申请号：US18513015

申请日：2023-11-17

Applicant: Intel Corporation

Inventor： Bai NIE ,  Gang DUAN ,  Srinivas PIETAMBARAM ,  Jesse JONES ,  Yosuke KANAOKA ,  Hongxia FENG ,  Dingying XU ,  Rahul MANEPALLI ,  Sameer PAITAL ,  Kristof DARMAWIKARTA ,  Yonggang LI ,  Meizi JIAO ,  Chong ZHANG ,  Matthew TINGEY ,  Jung Kyu HAN ,  Haobo CHEN

IPC: H01L23/538 ,  H01L21/48 ,  H01L21/56 ,  H01L21/78 ,  H01L23/00 ,  H01L23/31

CPC classification number: H01L23/5389 ,  H01L21/4853 ,  H01L21/4857 ,  H01L21/565 ,  H01L21/78 ,  H01L23/3121 ,  H01L23/5381 ,  H01L23/5383 ,  H01L23/5386 ,  H01L23/562 ,  H01L24/19 ,  H01L24/20 ,  H01L2224/214 ,  H01L2924/3511 ,  H01L2924/381

Abstract: A die assembly is disclosed. The die assembly includes a die, one or more die pads on a first surface of the die and a die attach film on the die where the die attach film includes one or more openings that expose the one or more die pads and that extend to one or more edges of the die.