摘要:
An adjustable threshold voltage MOS device having an asymmetric pocket region is disclosed herein. The pocket region abuts one of a source or drain proximate the device's channel region. The pocket region has the same conductivity type as the device's bulk (albeit at a higher dopant concentration) and, of course, the opposite conductivity type as the device's source and drain. An MOS device having such pocket region may have its threshold voltage adjusted by applying a potential directly to its pocket region. This capability is realized by providing a contact or conductive tie electrically coupled to the pocket region. This "pocket tie" is also electrically coupled to a metallization line (external to the device) which can be held at a specified potential corresponding to a potential required to back-bias the device by a specified amount.
摘要:
Systems and methods for raised source/drain with super steep retrograde channel are described. In accordance with a first embodiment, a semiconductor device comprises a substrate comprising a surface and a gate oxide disposed above the surface comprising a gate oxide thickness. The semiconductor device further comprises a super steep retrograde channel region formed at a depth below the surface. The depth is about ten to thirty times the gate oxide thickness. Embodiments may provide a more desirable body biasing voltage to threshold voltage characteristic than is available under the conventional art.
摘要:
Systems and methods of balanced adaptive body bias control. In accordance with a first embodiment of the present invention, a method of balanced adaptive body bias control comprises determining a desirable dynamic condition for circuitry of an integrated circuit. A first dynamic indicator corresponding to the desirable dynamic condition is accessed. Second and third dynamic indicators of the integrated circuit are accessed. A first body biasing voltage is adjusted by an increment so as to change the first dynamic indicator in the direction of the desirable dynamic condition. A second body biasing voltage is adjusted based on a relationship between the second dynamic indicator and the third dynamic indicator.
摘要:
Systems and methods for integrated circuits comprising multiple body biasing domains. In accordance with a first embodiment, a semiconductor structure comprises a substrate of first type material. A first closed structure comprising walls of second type material extends from a surface of the substrate to a first depth. A planar deep well of said second type material underlying and coupled to the closed structure extends from the first depth to a second depth. The closed structure and the planar deep well of said second type material form an electrically isolated region of the first type material. A second-type semiconductor device is disposed to receive a first body biasing voltage from the electrically isolated region of the first type material. A well of the second-type material within the electrically isolated region of the first type material is formed and a first-type semiconductor device is disposed to receive a second body biasing voltage from the well of second-type material.
摘要:
Systems and methods for integrated circuits comprising multiple body biasing domains. In accordance with a first embodiment of the present invention, a semiconductor structure comprises a substrate of first type material. A first closed structure comprising walls of second type material extends from a surface of the substrate to a first depth. A planar deep well of said second type material underlying and coupled to the closed structure extends from the first depth to a second depth. The closed structure and the planar deep well of said second type material form an electrically isolated region of the first type material. A second-type semiconductor device is disposed to receive a first body biasing voltage from the electrically isolated region of the first type material. A well of the second-type material within the electrically isolated region of the first type material is formed and a first-type semiconductor device is disposed to receive a second body biasing voltage from the well of second-type material.
摘要:
Systems and methods of suppressing latchup. In accordance with a first embodiment of the present invention a latchup suppression system comprises a voltage comparator for comparing a voltage applied to a body terminal of a semiconductor device to a reference voltage. The voltage comparator is also for controlling a selective coupling mechanism. The selective coupling mechanism is for selectively coupling the body terminal to a respective power supply. The latchup suppressing system is preferably independent of a voltage supply for applying a voltage to the body terminal.
摘要:
Methods and systems for operating a semiconductor device (e.g., a processor) are described. The device is operating at a first operating condition and device temperature. The first operating condition for the device can be dynamically changed to a second operating condition. The second operating condition is selected considering the design operating life of the device.
摘要:
Systems and methods for closed loop feedback control of integrated circuits. In one embodiment, a plurality of controllable inputs to an integrated circuit is adjusted to achieve a predetermined value of a dynamic operating indicator of the integrated circuit. An operating condition of an integrated circuit is controlled via closed loop feedback based on dynamic operating indicators of the integrated circuit's behavior.
摘要:
Layout patterns for the deep well region to facilitate routing the body-bias voltage in a semiconductor device are provided and described. The layout patterns include a diagonal sub-surface mesh structure, an axial sub-surface mesh structure, a diagonal sub-surface strip structure, and an axial sub-surface strip structure. A particular layout pattern is selected for an area of the semiconductor device according to several factors.