Mirrors for reducing the effects of spontaneous emissions in photodiodes
    1.
    发明申请
    Mirrors for reducing the effects of spontaneous emissions in photodiodes 有权
    用于减少光电二极管中自发辐射影响的镜子

    公开(公告)号:US20050286594A1

    公开(公告)日:2005-12-29

    申请号:US11026385

    申请日:2004-12-30

    IPC分类号: H01S5/00 H01S5/026 H01S5/183

    摘要: An optical structure that reduces the effects of spontaneous emissions from the active region of a laser. An optical structure includes optimizations to reduce the effects of spontaneous emissions. The optical structure includes a VCSEL with top and bottom DBR mirrors and an active region connected to the mirrors. The optical structure further includes a photodiode connected to the VCSEL. One or more optimizations may be included in the optical structure including optically absorbing materials, varying the geometry of the structure to change reflective angles, using optical apertures, changing the reflectivity of one or more mirrors, changing the photodiode to be more impervious to spontaneous emissions, and using ion implants to reduce photoluminescence efficiency.

    摘要翻译: 一种降低激光器有源区自发发射效应的光学结构。 光学结构包括优化以减少自发辐射的影响。 光学结构包括具有顶部和底部DBR反射镜的VCSEL和连接到反射镜的有源区域。 光学结构还包括连接到VCSEL的光电二极管。 可以在光学结构中包括一个或多个优化,包括光学吸收材料,改变结构的几何形状以改变反射角度,使用光学孔径,改变一个或多个反射镜的反射率,将光电二极管改变为对自发辐射更为不透明 ,并使用离子注入来降低光致发光效率。

    Distributed bragg reflector for optoelectronic device
    2.
    发明申请
    Distributed bragg reflector for optoelectronic device 有权
    光电器件分布式布拉格反射器

    公开(公告)号:US20050190812A1

    公开(公告)日:2005-09-01

    申请号:US11119292

    申请日:2005-04-29

    IPC分类号: H01S5/183 H01S5/42 H01S3/08

    摘要: This disclosure concerns devices such as DBRs, one example of which includes at least one first mirror layers having an oxidized region extending from an edge of the DBR to an oxide termination edge that is situated greater than a first distance from the edge of the DBR. The DBR also includes at least one second mirror layer having an oxidized region extending from the edge of the DBR to an oxide termination edge that is situated less than a second distance from the edge of the DBR, such that the first distance is greater than the second distance. Additionally, a first mirror layer includes an oxidizable material at a concentration that is higher than the concentration of the oxidizable material in any of the second mirror layers. Finally, a first mirror layer is doped with an impurity at a higher level than one of the second mirror layers.

    摘要翻译: 本公开涉及诸如DBR的设备,其一个示例包括至少一个第一镜像层,其具有从DBR的边缘延伸到距离DBR的边缘大于第一距离的氧化物终止边缘的氧化区域。 DBR还包括至少一个第二镜层,其具有从DBR的边缘延伸到氧化物终止边缘的氧化区域,该氧化物终止边缘距离DBR的边缘小于第二距离,使得第一距离大于 第二距离。 此外,第一镜层包括浓度高于任何第二镜层中的可氧化材料的浓度的可氧化材料。 最后,第一镜层掺杂有比第二镜层中的一个更高的杂质。

    Optimizing mirror reflectivity for reducing spontaneous emissions in photodiodes
    3.
    发明申请
    Optimizing mirror reflectivity for reducing spontaneous emissions in photodiodes 有权
    优化镜面反射率,以减少光电二极管中的自发辐射

    公开(公告)号:US20050286595A1

    公开(公告)日:2005-12-29

    申请号:US11027717

    申请日:2004-12-30

    IPC分类号: H01S5/00 H01S5/026 H01S5/183

    摘要: An optical structure that reduces the effects of spontaneous emissions from the active region of a laser. An optical structure includes optimizations to reduce the effects of spontaneous emissions. The optical structure includes a VCSEL with top and bottom DBR mirrors and an active region connected to the mirrors. The optical structure further includes a photodiode connected to the VCSEL. One or more optimizations may be included in the optical structure including optically absorbing materials, varying the geometry of the structure to change reflective angles, using optical apertures, changing the reflectivity of one or more mirrors, changing the photodiode to be more impervious to spontaneous emissions, and using ion implants to reduce photoluminescence efficiency.

    摘要翻译: 一种降低激光器有源区自发发射效应的光学结构。 光学结构包括优化以减少自发辐射的影响。 光学结构包括具有顶部和底部DBR反射镜的VCSEL和连接到反射镜的有源区域。 光学结构还包括连接到VCSEL的光电二极管。 可以在光学结构中包括一个或多个优化,包括光学吸收材料,改变结构的几何形状以改变反射角度,使用光学孔径,改变一个或多个反射镜的反射率,将光电二极管改变为对自发辐射更为不透明 ,并使用离子注入来降低光致发光效率。

    Obsorbing layers for reduced spontaneous emission effects in an integrated photodiode
    4.
    发明申请
    Obsorbing layers for reduced spontaneous emission effects in an integrated photodiode 有权
    吸收层用于降低集成光电二极管中的自发发射效应

    公开(公告)号:US20050286583A1

    公开(公告)日:2005-12-29

    申请号:US11026095

    申请日:2004-12-30

    IPC分类号: H01S5/00 H01S5/026 H01S5/183

    摘要: An optical structure that reduces the effects of spontaneous emissions from the active region of a laser. An optical structure includes optimizations to reduce the effects of spontaneous emissions. The optical structure includes a VCSEL with top and bottom DBR mirrors and an active region connected to the mirrors. The optical structure further includes a photodiode connected to the VCSEL. One or more optimizations may be included in the optical structure including optically absorbing materials, varying the geometry of the structure to change reflective angles, using optical apertures, changing the reflectivity of one or more mirrors, changing the photodiode to be more impervious to spontaneous emissions, and using ion implants to reduce photoluminescence efficiency.

    摘要翻译: 一种降低激光器有源区自发发射效应的光学结构。 光学结构包括优化以减少自发辐射的影响。 光学结构包括具有顶部和底部DBR反射镜的VCSEL和连接到反射镜的有源区域。 光学结构还包括连接到VCSEL的光电二极管。 可以在光学结构中包括一个或多个优化,包括光学吸收材料,改变结构的几何形状以改变反射角度,使用光学孔径,改变一个或多个反射镜的反射率,将光电二极管改变为对自发辐射更为不透明 ,并使用离子注入来降低光致发光效率。

    INTEGRATED LIGHT EMITTING DEVICE AND PHOTODIODE WITH OHMIC CONTACT
    5.
    发明申请
    INTEGRATED LIGHT EMITTING DEVICE AND PHOTODIODE WITH OHMIC CONTACT 有权
    集成式发光装置和光电接头

    公开(公告)号:US20070264805A1

    公开(公告)日:2007-11-15

    申请号:US11778603

    申请日:2007-07-16

    IPC分类号: H01L21/20

    摘要: Optoelectronic device including integrated light emitting device and photodiode. The optoelectronic device includes a light emitting device such as a vertical cavity surface emitting laser (VCSEL) or resonant cavity light emitting diode (RCLED). A photodiode is also included in the optoelectronic device. Between the light emitting device and the photodiode is a transition region. At least part of the transition region is shorted. A metal contact provides a contact to both the light emitting device and the photodiode.

    摘要翻译: 光电器件包括集成发光器件和光电二极管。 光电子器件包括诸如垂直腔表面发射激光器(VCSEL)或谐振腔发光二极管(RCLED)的发光器件。 光电二极管也包括在光电器件中。 在发光器件和光电二极管之间是过渡区域。 至少部分过渡区域短路。 金属触点提供与发光器件和光电二极管的接触。

    Photodiode bandgaps for reducing spontaneous emissions in photodiodes
    6.
    发明申请
    Photodiode bandgaps for reducing spontaneous emissions in photodiodes 有权
    用于减少光电二极管自发辐射的光电二极管带隙

    公开(公告)号:US20050286585A1

    公开(公告)日:2005-12-29

    申请号:US11026495

    申请日:2004-12-30

    IPC分类号: H01S5/00 H01S5/026 H01S5/183

    摘要: An optical structure that reduces the effects of spontaneous emissions from the active region of a laser. An optical structure includes optimizations to reduce the effects of spontaneous emissions. The optical structure includes a VCSEL with top and bottom DBR mirrors and an active region connected to the mirrors. The optical structure further includes a photodiode connected to the VCSEL. One or more optimizations may be included in the optical structure including optically absorbing materials, varying the geometry of the structure to change reflective angles, using optical apertures, changing the reflectivity of one or more mirrors, changing the photodiode to be more impervious to spontaneous emissions, and using ion implants to reduce photoluminescence efficiency.

    摘要翻译: 一种降低激光器有源区自发发射效应的光学结构。 光学结构包括优化以减少自发辐射的影响。 光学结构包括具有顶部和底部DBR反射镜的VCSEL和连接到反射镜的有源区域。 光学结构还包括连接到VCSEL的光电二极管。 可以在光学结构中包括一个或多个优化,包括光学吸收材料,改变结构的几何形状以改变反射角度,使用光学孔径,改变一个或多个反射镜的反射率,将光电二极管改变为对自发辐射更为不透明 ,并使用离子注入来降低光致发光效率。

    Optical apertures for reducing spontaneous emissions in photodiodes
    7.
    发明申请
    Optical apertures for reducing spontaneous emissions in photodiodes 有权
    用于减少光电二极管自发辐射的光学孔

    公开(公告)号:US20050286584A1

    公开(公告)日:2005-12-29

    申请号:US11026355

    申请日:2004-12-30

    IPC分类号: H01S5/00 H01S5/026 H01S5/183

    摘要: An optical structure that reduces the effects of spontaneous emissions from the active region of a laser. An optical structure includes optimizations to reduce the effects of spontaneous emissions. The optical structure includes a VCSEL with top and bottom DBR mirrors and an active region connected to the mirrors. The optical structure further includes a photodiode connected to the VCSEL. One or more optimizations may be included in the optical structure including optically absorbing materials, varying the geometry of the structure to change reflective angles, using optical apertures, changing the reflectivity of one or more mirrors, changing the photodiode to be more impervious to spontaneous emissions, and using ion implants to reduce photoluminescence efficiency.

    摘要翻译: 一种降低激光器有源区自发发射效应的光学结构。 光学结构包括优化以减少自发辐射的影响。 光学结构包括具有顶部和底部DBR反射镜的VCSEL和连接到反射镜的有源区域。 光学结构还包括连接到VCSEL的光电二极管。 可以在光学结构中包括一个或多个优化,包括光学吸收材料,改变结构的几何形状以改变反射角度,使用光学孔径,改变一个或多个反射镜的反射率,将光电二极管改变为对自发辐射更为不透明 ,并使用离子植入物来降低光致发光效率。

    Systems for wafer level burn-in of electronic devices
    8.
    发明申请
    Systems for wafer level burn-in of electronic devices 有权
    电子设备晶圆级老化系统

    公开(公告)号:US20050024076A1

    公开(公告)日:2005-02-03

    申请号:US10486672

    申请日:2002-08-12

    摘要: Systems for wafer level burn-in (WLBI) of semiconductor devices (210, 215) are presented. Systems having at least two electrodes for the application of electrical bias and/or thermal power on each side of a wafer (100) having back (105) and front (110) electrical contacts for semiconductor devices borne by the wafer (100) is described. Methods of wafer level burnin using the system are also described. Furthermore, a pliable conductive layer (220) is described for supplying pins or contacts (110) on device side of a wafer with electrical contact. The pliable conductive layer (220) can allow for an effective series R in each of the devices borne by the wafer (100), thus helping keep voltage bias level consistent. The pliable conductive layer can also prevent damage to a wafer when pressure is applied to it by chamber contacts (210, 215) and pressure onto surfaces of the wafer (100) during burn-in operations. A cooling system (660) is also described for enabling the application of a uniform temperature to the wafer (100) undergoing burn-in.

    摘要翻译: 提出了用于半导体器件(210,215)的晶片级老化(WLBI)的系统。 描述具有至少两个电极的系统,用于在具有由晶片(100)承载的半导体器件的背面(105)和前(110)电触点的晶片(100)的每一侧上施加电偏压和/或热功率。 。 还描述了使用该系统的晶片级烧伤的方法。 此外,描述了一种柔性导电层(220),用于在具有电接触的晶片的器件侧上提供引脚或触点(110)。 柔性导电层(220)可以允许由晶片(100)承载的每个器件中的有效串联R,从而有助于保持电压偏置电平一致。 柔性导电层还可以防止在老化操作期间通过室接触(210,215)向其施加压力和施加到晶片(100)的表面上的压力时损坏晶片。 还描述了一种冷却系统(660),用于使得能够对经历老化的晶片(100)施加均匀的温度。

    Providing photonic control over wafer borne semiconductor devices
    9.
    发明申请
    Providing photonic control over wafer borne semiconductor devices 有权
    提供晶圆传导半导体器件的光子控制

    公开(公告)号:US20070117242A1

    公开(公告)日:2007-05-24

    申请号:US10486666

    申请日:2002-08-12

    IPC分类号: H01L21/00 H01L33/00

    摘要: Disclosed are methods for providing wafer photonic flow control to a semiconductor wafer (1700) having a substrate (1720), at least one active layer (1765) and at least one surface layer (1710). Photonic flow control can be achieved through the formation of trenches (1725) and/or insulating implants (1730) formed in said wafer (1700), whereby active regions (1760) are defined by trenches (1725) that operate as nonconductive areas (1750). Methods of and systems for wafer level burn-in (WLBI) of semiconductor devices are also disclosed. Photonic flow control at the wafer level is important when using WLBI methods and systems.

    摘要翻译: 公开了用于向具有衬底(1720),至少一个有源层(1765)和至少一个表面层(1710)的半导体晶片(1700)提供晶片光子流控制的方法。 可以通过形成在所述晶片(1700)中形成的沟槽(1725)和/或绝缘植入物(1730)来实现光子流控制,由此有源区域(1760)由作为非导电区域(1750)的沟槽(1725)限定 )。 还公开了半导体器件的晶片级老化(WLBI)的方法和系统。 使用WLBI方法和系统时,晶圆级的光子流量控制很重要。

    LIGHT EMITTING SEMICONDUCTOR DEVICE HAVING AN ELECTRICAL CONFINEMENT BARRIER NEAR THE ACTIVE REGION
    10.
    发明申请
    LIGHT EMITTING SEMICONDUCTOR DEVICE HAVING AN ELECTRICAL CONFINEMENT BARRIER NEAR THE ACTIVE REGION 有权
    具有活动区域附近的电气限制障碍物的发光半导体器件

    公开(公告)号:US20060268954A1

    公开(公告)日:2006-11-30

    申请号:US11461353

    申请日:2006-07-31

    IPC分类号: H01S5/00

    摘要: Light emitting semiconductor devices such as VCSELs, SELs, and LEDs are manufactured to have a thin electrical confinement barrier in a confining layer near the active region of the device. The thin confinement barrier comprises a III-V semiconductor material having a high aluminum content (e.g. 80%-100% of the type III material). The aluminum content of the adjacent spacer layer is lower than that of the confinement barrier. In one embodiment the spacer layer has an aluminum content of less than 40% and a direct bandgap. The aluminum profile reduces series resistance and improves the efficiency of the semiconductor device.

    摘要翻译: 制造诸如VCSEL,SEL和LED的发光半导体器件在靠近器件的有源区域的约束层中具有薄的电限制屏障。 薄限制屏障包括具有高铝含量(例如III型材料的80%-100%)的III-V半导体材料。 相邻间隔层的铝含量低于限制屏障的铝含量。 在一个实施方案中,间隔层具有小于40%的铝含量和直接的带隙。 铝型材降低了串联电阻并提高了半导体器件的效率。