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公开(公告)号：US08298965B2
公开(公告)日：2012-10-30
申请号：US12553843
申请日：2009-09-03
IPC分类号： H01L21/31
CPC分类号： H01L21/31633 , B05D1/62 , B05D3/0254 , C23C16/401 , C23C16/56 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02274 , H01L21/31695
摘要： Disclosed herein are precursors and methods for their use in the manufacture of semiconductor, photovoltaic, TFT-LCD, or flat panel type devices.
摘要翻译： 本文公开了其用于制造半导体，光伏，TFT-LCD或平板型器件的前体和方法。
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2.发明授权Methods for checking and calibrating concentration sensors in a semiconductor processing chamber 有权在半导体处理室中检查和校准浓度传感器的方法公开(公告)号：US08191397B2
公开(公告)日：2012-06-05
申请号：US12332796
申请日：2008-12-11
IPC分类号： G01N21/00
CPC分类号： G01N27/06
摘要： The present invention provides methods for checking and calibrating one or more concentration sensors in an open or closed system. More specifically, in one embodiment of the present invention, the disclosed method allows for the checking and calibration of one or more concentration sensors in which removal of the liquid from the system is required. In two additional embodiments, the disclosed methods allow for the checking and calibration of one or more concentration sensors without having to remove the liquid from the closed system thereby minimizing contamination of the system while at the same time greatly reducing or eliminating contact of the user with the liquid.
摘要翻译： 本发明提供了用于在开放或封闭系统中检查和校准一个或多个浓度传感器的方法。 更具体地说，在本发明的一个实施例中，所公开的方法允许检查和校准需要从系统中去除液体的一个或多个浓度传感器。 在两个附加实施例中，所公开的方法允许检查和校准一个或多个浓度传感器，而不必从封闭系统中移除液体，从而最小化系统的污染，同时大大减少或消除用户与 液体。
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3.发明申请Methods For Checking And Calibrating Concentration Sensors In A Semiconductor Processing Chamber 有权在半导体处理室中检查和校准浓度传感器的方法公开(公告)号：US20090151419A1
公开(公告)日：2009-06-18
申请号：US12332796
申请日：2008-12-11
IPC分类号： G01D18/00
CPC分类号： G01N27/06
摘要： The present invention provides methods for checking and calibrating one or more concentration sensors in an open or closed system. More specifically, in one embodiment of the present invention, the disclosed method allows for the checking and calibration of one or more concentration sensors in which removal of the liquid from the system is required. In two additional embodiments, the disclosed methods allow for the checking and calibration of one or more concentration sensors without having to remove the liquid from the closed system thereby minimizing contamination of the system while at the same time greatly reducing or eliminating contact of the user with the liquid.
摘要翻译： 本发明提供了用于在开放或封闭系统中检查和校准一个或多个浓度传感器的方法。 更具体地说，在本发明的一个实施例中，所公开的方法允许检查和校准需要从系统中去除液体的一个或多个浓度传感器。 在两个附加实施例中，所公开的方法允许检查和校准一个或多个浓度传感器，而不必从封闭系统中移除液体，从而最小化系统的污染，同时大大减少或消除用户与 液体。
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公开(公告)号：US20080142375A1
公开(公告)日：2008-06-19
申请号：US11864254
申请日：2007-09-28
申请人： Francois Doniat , Matthew L. Fisher , Alan D. Zdunek , Alexandro A. Barajas , Ian Suni , Xiangfeng Chu , Abhinav Tripathi , Yuzhuo Li
发明人： Francois Doniat , Matthew L. Fisher , Alan D. Zdunek , Alexandro A. Barajas , Ian Suni , Xiangfeng Chu , Abhinav Tripathi , Yuzhuo Li
IPC分类号： B23H3/00
CPC分类号： C09G1/02 , C25F3/30 , H01L21/32125
摘要： Compositions and methods suitable for the electrochemical mechanical planarization of a conductive material layer on a semiconductor workpiece. Compositions contain a phosphonic acid based electrolyte, a corrosion inhibitor, a chelating agent, a pH adjusting agent, and a solvent as the remainder.
摘要翻译： 适用于半导体工件上导电材料层的电化学机械平面化的组合物和方法。 组合物含有基于膦酸的电解质，腐蚀抑制剂，螯合剂，pH调节剂和作为其余的溶剂。
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