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公开(公告)号：US09281207B2
公开(公告)日：2016-03-08
申请号：US13407541
申请日：2012-02-28
IPC分类号： H01L29/06 , H01L21/308 , H01L21/316 , C23C18/06 , C23C18/12 , H01L21/02 , H01L21/311 , G03F7/09 , H01L21/033 , G03F7/16
CPC分类号： H01L21/3081 , C23C18/06 , C23C18/1216 , G03F7/091 , G03F7/094 , G03F7/16 , H01L21/02178 , H01L21/02181 , H01L21/02189 , H01L21/02194 , H01L21/02282 , H01L21/0332 , H01L21/0338 , H01L21/3088 , H01L21/31122
摘要： Solution processible hardmasks are described that can be formed from aqueous precursor solutions comprising polyoxometal clusters and anions, such as polyatomic anions. The solution processible metal oxide layers are generally placed under relatively thin etch resist layers to provide desired etch contrast with underlying substrates and/or antireflective properties. In some embodiments, the metal oxide hardmasks can be used along with an additional hardmask and/or antireflective layers. The metal oxide hardmasks can be etched with wet or dry etching. Desirable processing improvements can be obtained with the solution processible hardmasks.
摘要翻译： 描述了可以由包含多金属氧化物簇和阴离子（例如多原子阴离子）的含水前体溶液形成的溶液可加工硬掩模。 溶液可加工的金属氧化物层通常放置在相对较薄的蚀刻抗蚀剂层下，以提供与下面的衬底和/或抗反射性质的期望的蚀刻对比度。 在一些实施例中，金属氧化物硬掩模可以与额外的硬掩模和/或抗反射层一起使用。 金属氧化物硬掩模可以用湿蚀刻或干蚀刻蚀刻。 可以使用可处理的硬掩模获得理想的加工改进。
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公开(公告)号：US20120223418A1
公开(公告)日：2012-09-06
申请号：US13407541
申请日：2012-02-28
IPC分类号： H01L23/00 , H01L21/311
CPC分类号： H01L21/3081 , C23C18/06 , C23C18/1216 , G03F7/091 , G03F7/094 , G03F7/16 , H01L21/02178 , H01L21/02181 , H01L21/02189 , H01L21/02194 , H01L21/02282 , H01L21/0332 , H01L21/0338 , H01L21/3088 , H01L21/31122
摘要： Solution processible hardmasks are described that can be formed from aqueous precursor solutions comprising polyoxometal clusters and anions, such as polyatomic anions. The solution processible metal oxide layers are generally placed under relatively thin etch resist layers to provide desired etch contrast with underlying substrates and/or antireflective properties. In some embodiments, the metal oxide hardmasks can be used along with an additional hardmask and/or antireflective layers. The metal oxide hardmasks can be etched with wet or dry etching. Desirable processing improvements can be obtained with the solution processible hardmasks.
摘要翻译： 描述了可以由包含多金属氧化物簇和阴离子（例如多原子阴离子）的含水前体溶液形成的溶液可加工硬掩模。 溶液可加工的金属氧化物层通常放置在相对较薄的蚀刻抗蚀剂层下，以提供与下面的衬底和/或抗反射性质的期望的蚀刻对比度。 在一些实施例中，金属氧化物硬掩模可以与额外的硬掩模和/或抗反射层一起使用。 金属氧化物硬掩模可以用湿蚀刻或干蚀刻蚀刻。 可以使用可处理的硬掩模获得理想的加工改进。
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公开(公告)号：US20120119202A1
公开(公告)日：2012-05-17
申请号：US12286606
申请日：2008-09-30
CPC分类号： G03F7/0002 , B01J21/02 , B01J21/066 , B01J23/002 , B32B9/005 , B32B2457/14 , B82Y10/00 , B82Y40/00 , G03F7/0042 , G03F7/11 , H01L27/1225 , H01L29/7869
摘要： Devices having a thin film or laminate structure comprising hafnium and/or zirconium oxy hydroxy compounds, and methods for making such devices, are disclosed. The hafnium and zirconium compounds can be doped, typically with other metals, such as lanthanum. Examples of electronic devices or components that can be made include, without limitation, insulators, transistors and capacitors. A method for patterning a device using the materials as positive or negative resists or as functional device components also is described. For example, a master plate for imprint lithography can be made. An embodiment of a method for making a device having a corrosion barrier also is described. Embodiments of an optical device comprising an optical substrate and coating also are described. Embodiments of a physical ruler also are disclosed, such as for accurately measuring dimensions using an electron microscope.
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4.发明申请SOLUTION PROCESSED THIN FILMS AND LAMINATES, DEVICES COMPRISING SUCH THIN FILMS AND LAMINATES, AND METHOD FOR THEIR USE AND MANUFACTURE 有权溶液处理的薄膜和层压体，包含这种薄膜和层压体的装置及其使用和制造方法公开(公告)号：US20110045406A1
公开(公告)日：2011-02-24
申请号：US12836492
申请日：2010-07-14
CPC分类号： H01L29/4908 , C01G1/10 , C01G25/006 , C01G25/06 , C01G27/006 , C01G27/06 , C01P2002/02 , C01P2002/72 , C01P2002/88 , C01P2004/03 , C01P2004/04 , C01P2006/40 , C23C18/06 , C23C18/1216 , C23C18/1225 , C23C18/1295 , G02B1/10 , H01L21/02181 , H01L21/02189 , H01L21/02192 , H01L21/02194 , H01L21/02282 , H01L21/0337 , H01L21/28194 , H01L29/7869 , Y10S430/114 , Y10S430/143
摘要： Devices having a thin film or laminate structure comprising hafnium and/or zirconium oxy hydroxy compounds, and methods for making such devices, are disclosed. The hafnium and zirconium compounds can be doped, typically with other metals, such as lanthanum. Examples of electronic devices or components that can be made include, without limitation, insulators, transistors and capacitors. A method for patterning a device using the materials as positive or negative resists or as functional device components also is described. For example, a master plate for imprint lithography can be made. An embodiment of a method for making a device having a corrosion barrier also is described. Embodiments of an optical device comprising an optical substrate and coating also are described. Embodiments of a physical ruler also are disclosed, such as for accurately measuring dimensions using an electron microscope.
摘要翻译： 公开了具有包含铪和/或锆羟基羟基化合物的薄膜或层压结构的装置以及制造这种装置的方法。 铪和锆化合物可以掺杂，通常与其它金属如镧掺杂。 可以制造的电子器件或组件的实例包括但不限于绝缘体，晶体管和电容器。 还描述了使用这些材料作为正或负抗蚀剂或作为功能元件部件来构图设备的方法。 例如，可以制造用于压印光刻的主板。 还描述了制造具有腐蚀屏障的装置的方法的实施例。 还描述了包括光学基底和涂层的光学装置的实施例。 还公开了物理尺的实施例，例如使用电子显微镜精确地测量尺寸。
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