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公开(公告)号：US08318407B2
公开(公告)日：2012-11-27
申请号：US12286606
申请日：2008-09-30
IPC分类号： G03F7/20
CPC分类号： G03F7/0002 , B01J21/02 , B01J21/066 , B01J23/002 , B32B9/005 , B32B2457/14 , B82Y10/00 , B82Y40/00 , G03F7/0042 , G03F7/11 , H01L27/1225 , H01L29/7869
摘要： Devices having a thin film or laminate structure comprising hafnium and/or zirconium oxy hydroxy compounds, and methods for making such devices, are disclosed. The hafnium and zirconium compounds can be doped, typically with other metals, such as lanthanum. Examples of electronic devices or components that can be made include, without limitation, insulators, transistors and capacitors. A method for patterning a device using the materials as positive or negative resists or as functional device components also is described. For example, a master plate for imprint lithography can be made. An embodiment of a method for making a device having a corrosion barrier also is described. Embodiments of an optical device comprising an optical substrate and coating also are described. Embodiments of a physical ruler also are disclosed, such as for accurately measuring dimensions using an electron microscope.
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2.发明授权Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture 有权溶液处理的薄膜和层压板，包括这种薄膜和层压材料的装置及其使用和制造方法公开(公告)号：US08206892B2
公开(公告)日：2012-06-26
申请号：US12836492
申请日：2010-07-14
CPC分类号： H01L29/4908 , C01G1/10 , C01G25/006 , C01G25/06 , C01G27/006 , C01G27/06 , C01P2002/02 , C01P2002/72 , C01P2002/88 , C01P2004/03 , C01P2004/04 , C01P2006/40 , C23C18/06 , C23C18/1216 , C23C18/1225 , C23C18/1295 , G02B1/10 , H01L21/02181 , H01L21/02189 , H01L21/02192 , H01L21/02194 , H01L21/02282 , H01L21/0337 , H01L21/28194 , H01L29/7869 , Y10S430/114 , Y10S430/143
摘要： Devices having a thin film or laminate structure comprising hafnium and/or zirconium oxy hydroxy compounds, and methods for making such devices, are disclosed. The hafnium and zirconium compounds can be doped, typically with other metals, such as lanthanum. Examples of electronic devices or components that can be made include, without limitation, insulators, transistors and capacitors. A method for patterning a device using the materials as positive or negative resists or as functional device components also is described. For example, a master plate for imprint lithography can be made. An embodiment of a method for making a device having a corrosion barrier also is described. Embodiments of an optical device comprising an optical substrate and coating also are described. Embodiments of a physical ruler also are disclosed, such as for accurately measuring dimensions using an electron microscope.
摘要翻译： 公开了具有包含铪和/或锆羟基羟基化合物的薄膜或层压结构的装置以及制造这种装置的方法。 铪和锆化合物可以掺杂，通常与其它金属如镧掺杂。 可以制造的电子器件或组件的实例包括但不限于绝缘体，晶体管和电容器。 还描述了使用这些材料作为正或负抗蚀剂或作为功能元件部件来构图设备的方法。 例如，可以制造用于压印光刻的主板。 还描述了制造具有腐蚀屏障的装置的方法的实施例。 还描述了包括光学基底和涂层的光学装置的实施例。 还公开了物理尺的实施例，例如使用电子显微镜精确地测量尺寸。
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3.发明授权公开(公告)号：US08415000B2
公开(公告)日：2013-04-09
申请号：US13284531
申请日：2011-10-28
IPC分类号： G03C1/00 , G03F7/00 , H01L21/02 , H01L21/302 , H01L21/461
CPC分类号： G03F7/0043 , G03F7/0042 , G03F7/20 , G03F7/327 , Y10T428/24355
摘要： Stabilized precursor solutions can be used to form radiation inorganic coating materials. The precursor solutions generally comprise metal suboxide cations, peroxide-based ligands and polyatomic anions. Design of the precursor solutions can be performed to achieve a high level of stability of the precursor solutions. The resulting coating materials can be designed for patterning with a selected radiation, such as ultraviolet light, x-ray radiation or electron beam radiation. The radiation patterned coating material can have a high contrast with respect to material properties, such that development of a latent image can be successful to form lines with very low line-width roughness and adjacent structures with a very small pitch.
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4.发明申请PATTERNED INORGANIC LAYERS, RADIATION BASED PATTERNING COMPOSITIONS AND CORRESPONDING METHODS 有权图形无机层，基于辐射的图案组合物和相关方法公开(公告)号：US20110293888A1
公开(公告)日：2011-12-01
申请号：US12850867
申请日：2010-08-05
CPC分类号： G03F7/0043 , G03F7/0042 , G03F7/20 , G03F7/327 , Y10T428/24355
摘要： Stabilized precursor solutions can be used to form radiation inorganic coating materials. The precursor solutions generally comprise metal suboxide cations, peroxide-based ligands and polyatomic anions. Design of the precursor solutions can be performed to achieve a high level of stability of the precursor solutions. The resulting coating materials can be designed for patterning with a selected radiation, such as ultraviolet light, x-ray radiation or electron beam radiation. The radiation patterned coating material can have a high contrast with respect to material properties, such that development of a latent image can be successful to form lines with very low line-width roughness and adjacent structures with a very small pitch.
摘要翻译： 稳定的前体溶液可用于形成辐射无机涂层材料。 前体溶液通常包含金属低氧化物阳离子，基于过氧化物的配体和多原子阴离子。 可以进行前体溶液的设计以实现前体溶液的高水平的稳定性。 可以将所得涂层材料设计成用所选择的辐射（例如紫外光，x射线辐射或电子束辐射）进行图案化。 辐射图案化涂层材料可以在材料性质方面具有高对比度，使得潜像的显影可以成功地形成具有非常低的线宽粗糙度的线和具有非常小间距的相邻结构。
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5.发明申请SOLUTION PROCESSED THIN FILMS AND LAMINATES, DEVICES COMPRISING SUCH THIN FILMS AND LAMINATES, AND METHOD FOR THEIR USE AND MANUFACTURE 有权溶液处理的薄膜和层压体，包含这种薄膜和层压体的装置及其使用和制造方法公开(公告)号：US20110045406A1
公开(公告)日：2011-02-24
申请号：US12836492
申请日：2010-07-14
CPC分类号： H01L29/4908 , C01G1/10 , C01G25/006 , C01G25/06 , C01G27/006 , C01G27/06 , C01P2002/02 , C01P2002/72 , C01P2002/88 , C01P2004/03 , C01P2004/04 , C01P2006/40 , C23C18/06 , C23C18/1216 , C23C18/1225 , C23C18/1295 , G02B1/10 , H01L21/02181 , H01L21/02189 , H01L21/02192 , H01L21/02194 , H01L21/02282 , H01L21/0337 , H01L21/28194 , H01L29/7869 , Y10S430/114 , Y10S430/143
摘要： Devices having a thin film or laminate structure comprising hafnium and/or zirconium oxy hydroxy compounds, and methods for making such devices, are disclosed. The hafnium and zirconium compounds can be doped, typically with other metals, such as lanthanum. Examples of electronic devices or components that can be made include, without limitation, insulators, transistors and capacitors. A method for patterning a device using the materials as positive or negative resists or as functional device components also is described. For example, a master plate for imprint lithography can be made. An embodiment of a method for making a device having a corrosion barrier also is described. Embodiments of an optical device comprising an optical substrate and coating also are described. Embodiments of a physical ruler also are disclosed, such as for accurately measuring dimensions using an electron microscope.
摘要翻译： 公开了具有包含铪和/或锆羟基羟基化合物的薄膜或层压结构的装置以及制造这种装置的方法。 铪和锆化合物可以掺杂，通常与其它金属如镧掺杂。 可以制造的电子器件或组件的实例包括但不限于绝缘体，晶体管和电容器。 还描述了使用这些材料作为正或负抗蚀剂或作为功能元件部件来构图设备的方法。 例如，可以制造用于压印光刻的主板。 还描述了制造具有腐蚀屏障的装置的方法的实施例。 还描述了包括光学基底和涂层的光学装置的实施例。 还公开了物理尺的实施例，例如使用电子显微镜精确地测量尺寸。
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6.发明授权Patterned inorganic layers, radiation based patterning compositions and corresponding methods 有权图案化无机层，基于辐射的图案化组合物和相应的方法公开(公告)号：US09176377B2
公开(公告)日：2015-11-03
申请号：US12850867
申请日：2010-08-05
CPC分类号： G03F7/0043 , G03F7/0042 , G03F7/20 , G03F7/327 , Y10T428/24355
摘要： Stabilized precursor solutions can be used to form radiation inorganic coating materials. The precursor solutions generally comprise metal suboxide cations, peroxide-based ligands and polyatomic anions. Design of the precursor solutions can be performed to achieve a high level of stability of the precursor solutions. The resulting coating materials can be designed for patterning with a selected radiation, such as ultraviolet light, x-ray radiation or electron beam radiation. The radiation patterned coating material can have a high contrast with respect to material properties, such that development of a latent image can be successful to form lines with very low line-width roughness and adjacent structures with a very small pitch.
摘要翻译： 稳定的前体溶液可用于形成辐射无机涂层材料。 前体溶液通常包含金属低氧化物阳离子，基于过氧化物的配体和多原子阴离子。 可以进行前体溶液的设计以实现前体溶液的高水平的稳定性。 可以将所得涂层材料设计成用所选择的辐射（例如紫外光，x射线辐射或电子束辐射）进行图案化。 辐射图案化涂层材料可以在材料性质方面具有高对比度，使得潜像的显影可以成功地形成具有非常低的线宽粗糙度的线和具有非常小间距的相邻结构。
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公开(公告)号：US20120119202A1
公开(公告)日：2012-05-17
申请号：US12286606
申请日：2008-09-30
CPC分类号： G03F7/0002 , B01J21/02 , B01J21/066 , B01J23/002 , B32B9/005 , B32B2457/14 , B82Y10/00 , B82Y40/00 , G03F7/0042 , G03F7/11 , H01L27/1225 , H01L29/7869
摘要： Devices having a thin film or laminate structure comprising hafnium and/or zirconium oxy hydroxy compounds, and methods for making such devices, are disclosed. The hafnium and zirconium compounds can be doped, typically with other metals, such as lanthanum. Examples of electronic devices or components that can be made include, without limitation, insulators, transistors and capacitors. A method for patterning a device using the materials as positive or negative resists or as functional device components also is described. For example, a master plate for imprint lithography can be made. An embodiment of a method for making a device having a corrosion barrier also is described. Embodiments of an optical device comprising an optical substrate and coating also are described. Embodiments of a physical ruler also are disclosed, such as for accurately measuring dimensions using an electron microscope.
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8.发明申请公开(公告)号：US20120070613A1
公开(公告)日：2012-03-22
申请号：US13284531
申请日：2011-10-28
CPC分类号： G03F7/0043 , G03F7/0042 , G03F7/20 , G03F7/327 , Y10T428/24355
摘要： Stabilized precursor solutions can be used to form radiation inorganic coating materials. The precursor solutions generally comprise metal suboxide cations, peroxide-based ligands and polyatomic anions. Design of the precursor solutions can be performed to achieve a high level of stability of the precursor solutions. The resulting coating materials can be designed for patterning with a selected radiation, such as ultraviolet light, x-ray radiation or electron beam radiation. The radiation patterned coating material can have a high contrast with respect to material properties, such that development of a latent image can be successful to form lines with very low line-width roughness and adjacent structures with a very small pitch.
摘要翻译： 稳定的前体溶液可用于形成辐射无机涂层材料。 前体溶液通常包含金属低氧化物阳离子，基于过氧化物的配体和多原子阴离子。 可以进行前体溶液的设计以实现前体溶液的高水平的稳定性。 可以将所得涂层材料设计成用所选择的辐射（例如紫外光，x射线辐射或电子束辐射）进行图案化。 辐射图案化涂层材料可以在材料性质方面具有高对比度，使得潜像的显影可以成功地形成具有非常低的线宽粗糙度的线和具有非常小间距的相邻结构。
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公开(公告)号：US09281207B2
公开(公告)日：2016-03-08
申请号：US13407541
申请日：2012-02-28
IPC分类号： H01L29/06 , H01L21/308 , H01L21/316 , C23C18/06 , C23C18/12 , H01L21/02 , H01L21/311 , G03F7/09 , H01L21/033 , G03F7/16
CPC分类号： H01L21/3081 , C23C18/06 , C23C18/1216 , G03F7/091 , G03F7/094 , G03F7/16 , H01L21/02178 , H01L21/02181 , H01L21/02189 , H01L21/02194 , H01L21/02282 , H01L21/0332 , H01L21/0338 , H01L21/3088 , H01L21/31122
摘要： Solution processible hardmasks are described that can be formed from aqueous precursor solutions comprising polyoxometal clusters and anions, such as polyatomic anions. The solution processible metal oxide layers are generally placed under relatively thin etch resist layers to provide desired etch contrast with underlying substrates and/or antireflective properties. In some embodiments, the metal oxide hardmasks can be used along with an additional hardmask and/or antireflective layers. The metal oxide hardmasks can be etched with wet or dry etching. Desirable processing improvements can be obtained with the solution processible hardmasks.
摘要翻译： 描述了可以由包含多金属氧化物簇和阴离子（例如多原子阴离子）的含水前体溶液形成的溶液可加工硬掩模。 溶液可加工的金属氧化物层通常放置在相对较薄的蚀刻抗蚀剂层下，以提供与下面的衬底和/或抗反射性质的期望的蚀刻对比度。 在一些实施例中，金属氧化物硬掩模可以与额外的硬掩模和/或抗反射层一起使用。 金属氧化物硬掩模可以用湿蚀刻或干蚀刻蚀刻。 可以使用可处理的硬掩模获得理想的加工改进。
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公开(公告)号：US20120223418A1
公开(公告)日：2012-09-06
申请号：US13407541
申请日：2012-02-28
IPC分类号： H01L23/00 , H01L21/311
CPC分类号： H01L21/3081 , C23C18/06 , C23C18/1216 , G03F7/091 , G03F7/094 , G03F7/16 , H01L21/02178 , H01L21/02181 , H01L21/02189 , H01L21/02194 , H01L21/02282 , H01L21/0332 , H01L21/0338 , H01L21/3088 , H01L21/31122
摘要： Solution processible hardmasks are described that can be formed from aqueous precursor solutions comprising polyoxometal clusters and anions, such as polyatomic anions. The solution processible metal oxide layers are generally placed under relatively thin etch resist layers to provide desired etch contrast with underlying substrates and/or antireflective properties. In some embodiments, the metal oxide hardmasks can be used along with an additional hardmask and/or antireflective layers. The metal oxide hardmasks can be etched with wet or dry etching. Desirable processing improvements can be obtained with the solution processible hardmasks.
摘要翻译： 描述了可以由包含多金属氧化物簇和阴离子（例如多原子阴离子）的含水前体溶液形成的溶液可加工硬掩模。 溶液可加工的金属氧化物层通常放置在相对较薄的蚀刻抗蚀剂层下，以提供与下面的衬底和/或抗反射性质的期望的蚀刻对比度。 在一些实施例中，金属氧化物硬掩模可以与额外的硬掩模和/或抗反射层一起使用。 金属氧化物硬掩模可以用湿蚀刻或干蚀刻蚀刻。 可以使用可处理的硬掩模获得理想的加工改进。
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