摘要:
Disclosed is an electrolyte for a lithium secondary battery including a non-aqueous organic solvent and alkylphosphonic acid cyclic anhydride of the following Formula (I) where R, R′, and R″ are alkyl groups having 1 to 4 carbon atoms.
摘要:
Disclosed is an electrolyte for a lithium secondary battery. The electrolyte includes a non-aqueous solvent and a sulfone based organic compound represented by the following Formulae (I), (II), or (III), or a mixture thereof: where R and R′ are independently selected from the group consisting of primary alkyl groups, secondary alkyl groups, tertiary alkyl groups, alkenyl groups, aryl groups; halogen substituted primary alkyl groups, halogen substituted secondary alkyl groups, halogen substituted tertiary alkyl groups, halogen substituted alkenyl groups, and halogen substituted aryl groups, and n is from 0 to 3.
摘要:
A non-aqueous electrolyte for a lithium secondary battery is provided. The electrolyte comprises a lithium salt, a non-aqueous solvent, and an organic compound selected from the group consisting of compounds represented by Formulae (1) to (6): wherein R1 to R12 are each independently selected from the group consisting of primary, secondary, and tertiary alkyl groups, alkenyl groups, and aryl groups; X is hydrogen or halogen; and n and m are numerical values ranging from 0 to 3.
摘要:
A non-aqueous electrolyte for a lithium secondary battery is provided. The electrolyte comprises a lithium salt, a non-aqueous solvent, and an organic compound selected from the group consisting of compounds represented by Formulae (1) to (6): wherein R1 to R12 are each independently selected from the group consisting of primary, secondary, and tertiary alkyl groups, alkenyl groups, and aryl groups; X is hydrogen or halogen; and n and m are numerical values ranging from 0 to 3.
摘要:
A non-aqueous electrolyte for a lithium secondary battery is provided. The electrolyte comprises a lithium salt, a non-aqueous solvent, and an organic compound selected from the group consisting of compounds represented by Formulae (1) to (6): wherein R1 to R12 are each independently selected from the group consisting of primary, secondary, and tertiary alkyl groups, alkenyl groups, and aryl groups; X is hydrogen or halogen; and n and m are numerical values ranging from 0 to 3.
摘要:
A resist underlayer composition includes a solvent and an organosilane condensation polymerization product, the organosilane condensation polymerization product including about 40 to about 80 mol % of a structural unit represented by the following Chemical Formula 1,
摘要:
An aromatic ring-containing polymer, a polymer mixture, an antireflective hardmask composition, and a method for patterning a material on a substrate, the aromatic ring-containing polymer including at least one aromatic ring-containing polymer represented by Formulae 1, 2, or 3.
摘要:
A resist underlayer composition includes a solvent, and an organosilane condensation polymerization product of: a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3, [R1O]3Si—X [Chemical Formula 1] [R2O]3Si—R3 [Chemical Formula 2] [R4O]3Si—Si[OR5]3. [Chemical Formula 3]
摘要:
A photoresist underlayer composition includes a solvent, and a polysiloxane resin represented by Chemical Formula 1: {(SiO1.5—Y—SiO1.5)x(SiO2)y(XSiO1.5)z}(OH)e(OR1)f. [Chemical Formula 1]
摘要:
A resin composition for a transparent encapsulation material, the resin composition including a polysiloxane obtained by copolymerization of a first silicon compound represented by the following Chemical Formula 1 and a second silicon compound including a compound represented by the following Chemical Formula 2,