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12 条记录 (耗时 0.036 秒)

    Off-axis levelling in lithographic projection apparatus
    3.
    发明申请
    Off-axis levelling in lithographic projection apparatus 有权
    平版印刷设备中的离轴调平

    公开(公告)号：US20060176459A1

    公开(公告)日：2006-08-10

    申请号：US11324754

    申请日：2006-01-04

    申请人： Theodorus Modderman ,  Gerrit Nijmeijer ,  Johannes Jasper

    发明人： Theodorus Modderman ,  Gerrit Nijmeijer ,  Johannes Jasper

    IPC分类号： G03B27/52

    CPC分类号： G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

    摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

    摘要翻译： 在离轴调平程序中，在测量站产生衬底的高度图。 高度图参考衬底台的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站，测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定衬底台的最佳高度和/或倾斜，以在曝光期间以最佳聚焦将曝光区域定位在衬底上。 相同的原理可以应用于（反射）掩模。

    Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby
    4.
    发明申请
    Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby 审中-公开
    平版印刷设备，曝光基板的方法，测量方法，器件制造方法以及由此制造的器件

    公开(公告)号：US20050134816A1

    公开(公告)日：2005-06-23

    申请号：US10740824

    申请日：2003-12-22

    申请人： Theodorus Modderman ,  Nicolaas Antonius Allegondus Van Asten ,  Gerrit Nijmeijer

    发明人： Theodorus Modderman ,  Nicolaas Antonius Allegondus Van Asten ,  Gerrit Nijmeijer

    IPC分类号： G03F9/00 ,  G03B27/42

    CPC分类号： G03F9/7053 ,  G03F9/7026 ,  G03F9/7034 ,  G03F9/7049

    摘要： A method of exposing a substrate (e.g. in a lithographic apparatus comprising a substrate table to support a substrate) according to one embodiment of the invention includes performing first and a second height measurement of a part of at least one substrate with a first and second sensor, generating and storing an offset error map based on a difference between the measurements; generating and storing a height map of portions of the substrate (or another substrate that has had a similar processing as the part) by performing height measurements with the first sensor and correcting this height map by means of the offset error map; and exposing the substrate (or the other substrate).

    摘要翻译： 根据本发明的一个实施例的曝光衬底（例如，在包括衬底台的光刻设备中以支撑衬底）的方法包括使用第一和第二传感器执行至少一个衬底的一部分的第一和第二高度测量 基于所述测量之间的差产生和存储偏移误差图; 通过利用第一传感器执行高度测量并通过偏移误差图校正该高度图来生成和存储基板（或具有与该部分相似的处理的另一基板）的部分的高度图; 并使基板（或另一个基板）曝光。

    Lithographic apparatus and device manufacturing method
    9.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20050225734A1

    公开(公告)日：2005-10-13

    申请号：US10820227

    申请日：2004-04-08

    申请人： Joannes De Smit ,  Vadim Banine ,  Theodorus Hubertus Bisschops ,  Theodorus Modderman ,  Marcel Mathijs Theodore Dierichs

    发明人： Joannes De Smit ,  Vadim Banine ,  Theodorus Hubertus Bisschops ,  Theodorus Modderman ,  Marcel Mathijs Theodore Dierichs

    IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

    CPC分类号： G03F7/70341

    摘要： A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection can be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal can be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and phase shifting ultrasonic standing-wave node patterns.

    摘要翻译： 光刻设备和设备制造方法利用限制在储存器13中的高折射率液体，至少部分地填充投影透镜的最终元件与基板之间的成像场。 检测并去除从溶解的大气中的液体中形成的液体或暴露于液体的装置元件的气体排出的气泡，使得它们不会干扰曝光并导致基板上的印刷缺陷。 检测可以通过测量液体中超声波衰减的频率依赖性进行，气泡去除可以通过对液体进行脱气和加压来实现，使用低表面张力的液体从大气中分离出液体，从而提供连续的液体流通 成像领域和相移超声波驻波节点模式。