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    Off-axis levelling in lithographic projection apparatus
    3.
    发明申请
    Off-axis levelling in lithographic projection apparatus 有权
    平版印刷设备中的离轴调平

    公开(公告)号：US20060176459A1

    公开(公告)日：2006-08-10

    申请号：US11324754

    申请日：2006-01-04

    申请人： Theodorus Modderman ,  Gerrit Nijmeijer ,  Johannes Jasper

    发明人： Theodorus Modderman ,  Gerrit Nijmeijer ,  Johannes Jasper

    IPC分类号： G03B27/52

    CPC分类号： G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

    摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

    摘要翻译： 在离轴调平程序中，在测量站产生衬底的高度图。 高度图参考衬底台的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站，测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定衬底台的最佳高度和/或倾斜，以在曝光期间以最佳聚焦将曝光区域定位在衬底上。 相同的原理可以应用于（反射）掩模。

    Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby
    4.
    发明申请
    Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby 审中-公开
    平版印刷设备，曝光基板的方法，测量方法，器件制造方法以及由此制造的器件

    公开(公告)号：US20050134816A1

    公开(公告)日：2005-06-23

    申请号：US10740824

    申请日：2003-12-22

    申请人： Theodorus Modderman ,  Nicolaas Antonius Allegondus Van Asten ,  Gerrit Nijmeijer

    发明人： Theodorus Modderman ,  Nicolaas Antonius Allegondus Van Asten ,  Gerrit Nijmeijer

    IPC分类号： G03F9/00 ,  G03B27/42

    CPC分类号： G03F9/7053 ,  G03F9/7026 ,  G03F9/7034 ,  G03F9/7049

    摘要： A method of exposing a substrate (e.g. in a lithographic apparatus comprising a substrate table to support a substrate) according to one embodiment of the invention includes performing first and a second height measurement of a part of at least one substrate with a first and second sensor, generating and storing an offset error map based on a difference between the measurements; generating and storing a height map of portions of the substrate (or another substrate that has had a similar processing as the part) by performing height measurements with the first sensor and correcting this height map by means of the offset error map; and exposing the substrate (or the other substrate).

    摘要翻译： 根据本发明的一个实施例的曝光衬底（例如，在包括衬底台的光刻设备中以支撑衬底）的方法包括使用第一和第二传感器执行至少一个衬底的一部分的第一和第二高度测量 基于所述测量之间的差产生和存储偏移误差图; 通过利用第一传感器执行高度测量并通过偏移误差图校正该高度图来生成和存储基板（或具有与该部分相似的处理的另一基板）的部分的高度图; 并使基板（或另一个基板）曝光。

    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    8.
    发明申请
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US20050030507A1

    公开(公告)日：2005-02-10

    申请号：US10892395

    申请日：2004-07-16

    申请人： Paulus Antonius Teunissen ,  Gerrit Nijmeijer ,  Rene Marinus Queens ,  Frank Staals ,  Robert Van Wijk ,  Roeland Nicolaas Vanneer

    发明人： Paulus Antonius Teunissen ,  Gerrit Nijmeijer ,  Rene Marinus Queens ,  Frank Staals ,  Robert Van Wijk ,  Roeland Nicolaas Vanneer

    IPC分类号： G03F9/00 ,  G03B27/52

    CPC分类号： G03F9/7019 ,  G03F9/7034

    摘要： According to one embodiment, a method of calibrating level sensors of at least two lithographic projection apparatus to correct machine to machine level sensor process dependency includes using a first lithographic projection apparatus to measure a first set of leveling data for a reference substrate and a second set of leveling data for a substrate processed according to a selected process, and using a second lithographic projection apparatus to measure a third set of leveling data for the reference substrate and a fourth set of leveling data for the processed substrate. The method also includes calculating, based on the first, second, third and fourth sets of leveling data, a set of level sensor parameters corresponding to machine to machine level sensor differences for the selected process, wherein the machine to machine level sensor differences are measured and stored as intrafield values.

    摘要翻译： 根据一个实施例，一种校准至少两个光刻投影设备的水平传感器以校正机器与机器水平传感器处理依赖性的方法包括使用第一光刻投影设备来测量参考基板和第二组的第一组调平数据 根据所选择的工艺处理的衬底的调平数据，以及使用第二光刻投影装置测量用于所述参考衬底的第三组校平数据和用于所述经处理衬底的第四组校平数据。 该方法还包括基于第一，第二，第三和第四组平整数据计算一组对于所选择的过程的机器与机器水平传感器差异的水平传感器参数，其中测量机器与机器水平传感器差异 并作为场内值存储。