公开(公告)号：US08368868B2

公开(公告)日：2013-02-05

申请号：US12627087

申请日：2009-11-30

申请人： Johannes Petrus Martinus Bernardus Vermeulen ,  Marcel Koenraad Marie Baggen ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Jan Van Eijk ,  Andre Bernardus Jeunink ,  Nicolaas Rudolf Kemper ,  Robert-Han Munnig Schmidt ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Theodorus Petrus Maria Cadee ,  Fransiscus Mathijs Jacobs ,  Christiaan Louis Valentin

发明人： Johannes Petrus Martinus Bernardus Vermeulen ,  Marcel Koenraad Marie Baggen ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Jan Van Eijk ,  Andre Bernardus Jeunink ,  Nicolaas Rudolf Kemper ,  Robert-Han Munnig Schmidt ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Theodorus Petrus Maria Cadee ,  Fransiscus Mathijs Jacobs ,  Christiaan Louis Valentin

IPC分类号： G03B27/42

CPC分类号： G03B27/42 ,  G03F7/707 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866

摘要： A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

摘要翻译： 光刻设备包括位置控制器，其被配置为通过选择性地按压图案形成装置的侧面中的至少一个来控​​制图案形成装置在其平面方向上的位置。 位置控制器包括气体压力供给器和朝向图案形成装置的至少一个侧面的一个或多个流出开口，以在该侧面上施加加压气体，以便控制图案形成装置在其平面方向上的位置 一个非接触的方式。

公开(公告)号：US20100159399A1

公开(公告)日：2010-06-24

申请号：US12627087

申请日：2009-11-30

申请人： Johannes Petrus Martinus Bernardus VERMEULEN ,  Marcel Koenraad Marie Baggen ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Jan Van Eijk ,  Andre Bernardus Jeunink ,  Nicolaas Rudolf Kemper ,  Robert-Han Munnig Schmidt ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Theodorus Petrus Maria Cadee ,  Fransiscus Mathijs Jacobs ,  Christiaan Louis Valentin

发明人： Johannes Petrus Martinus Bernardus VERMEULEN ,  Marcel Koenraad Marie Baggen ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Jan Van Eijk ,  Andre Bernardus Jeunink ,  Nicolaas Rudolf Kemper ,  Robert-Han Munnig Schmidt ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Theodorus Petrus Maria Cadee ,  Fransiscus Mathijs Jacobs ,  Christiaan Louis Valentin

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03B27/42 ,  G03F7/707 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866

摘要： A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

摘要翻译： 光刻设备包括位置控制器，其被配置为通过选择性地按压图案形成装置的侧面中的至少一个来控​​制图案形成装置在其平面方向上的位置。 位置控制器包括气体压力供给器和朝向图案形成装置的至少一个侧面的一个或多个流出开口，以在该侧面上施加加压气体，以便控制图案形成装置在其平面方向上的位置 一个非接触的方式。

公开(公告)号：US09329501B2

公开(公告)日：2016-05-03

申请号：US13494638

申请日：2012-06-12

申请人： Yang-Shan Huang ,  Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Theodorus Petrus Maria Cadee ,  Robbert Edgar Van Leeuwen

发明人： Yang-Shan Huang ,  Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Theodorus Petrus Maria Cadee ,  Robbert Edgar Van Leeuwen

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/7085 ,  G03F7/70783

摘要： A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.

摘要翻译： 光刻设备包括投影系统，衬底台，多个传感器，致动器和控制器。 投影系统被配置为将图案化的辐射束投射到衬底上。 衬底台被配置为支撑衬底并相对于投影系统移动。 多个传感器被配置成测量衬底台的变形。 致动器构造成使基板台变形。 控制器被配置成基于由传感器进行的测量来控制致动器使基板台变形。 多个传感器位于与衬底台面对投影系统的第二侧相对的衬底台的第一侧上。 多个传感器相对于投影系统基本上是静止的。

公开(公告)号：US20120327386A1

公开(公告)日：2012-12-27

申请号：US13494638

申请日：2012-06-12

申请人： Yang-Shan Huang ,  Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Theodorus Petrus Maria Cadee ,  Robbert Edgar Van Leeuwen

发明人： Yang-Shan Huang ,  Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Theodorus Petrus Maria Cadee ,  Robbert Edgar Van Leeuwen

IPC分类号： G03B27/58

CPC分类号： G03F7/7085 ,  G03F7/70783

摘要： A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.

摘要翻译： 光刻设备包括投影系统，衬底台，多个传感器，致动器和控制器。 投影系统被配置为将图案化的辐射束投射到衬底上。 衬底台被配置为支撑衬底并相对于投影系统移动。 多个传感器被配置成测量衬底台的变形。 致动器构造成使基板台变形。 控制器被配置成基于由传感器进行的测量来控制致动器使基板台变形。 多个传感器位于与衬底台面对投影系统的第二侧相对的衬底台的第一侧上。 多个传感器相对于投影系统基本上是静止的。

公开(公告)号：US20110008483A1

公开(公告)日：2011-01-13

申请号：US12821806

申请日：2010-06-23

申请人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

发明人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

IPC分类号： B29C59/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

摘要： An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.

摘要翻译： 公开了一种压印光刻设备，其包括远离衬底保持器并延伸穿过衬底保持器的结构，并且使得压印模板布置在使用中位于结构和衬底保持器之间，其中结构具有一个或 更多的线阵列或一个或多个编码器，并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器，其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个，并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置，和/或压印模板布置和结构之间的相对配置，和/ 或压印模板布置和基板或基板保持器之间的相对配置。

公开(公告)号：US09116423B2

公开(公告)日：2015-08-25

申请号：US12821806

申请日：2010-06-23

申请人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

发明人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

IPC分类号： B29C59/02 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

摘要： An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.

摘要翻译： 公开了一种压印光刻设备，其包括远离衬底保持器并延伸穿过衬底保持器的结构，并且使得压印模板布置在使用中位于结构和衬底保持器之间，其中结构具有一个或 更多的线阵列或一个或多个编码器，并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器，其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个，并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置，和/或压印模板布置与结构之间的相对配置，和/ 或压印模板布置和基板或基板保持器之间的相对配置。

公开(公告)号：US08334983B2

公开(公告)日：2012-12-18

申请号：US12768883

申请日：2010-04-28

申请人： Ruud Antonius Catharina Maria Beerens ,  Sjoerd Nicolaas Lambertus Donders ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Fransiscus Mathijs Jacobs

发明人： Ruud Antonius Catharina Maria Beerens ,  Sjoerd Nicolaas Lambertus Donders ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Fransiscus Mathijs Jacobs

IPC分类号： G01B11/02

CPC分类号： G03F7/70775

摘要： A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale.

摘要翻译： 光刻设备具有光学编码器测量系统，其具有将照射束引导到第一刻度的照射系统。 该系统具有光学器件，用于将从第一刻度衍射的主衍射光束照射到第二刻度的照射光束和检测器以检测干涉后的次级衍射光束，并且在第二刻度上进行第二衍射照射束的第二衍射 测量相对于第二刻度的第一刻度的位置。

公开(公告)号：US20100297561A1

公开(公告)日：2010-11-25

申请号：US12768883

申请日：2010-04-28

申请人： Ruud Antonius Catharina Maria BEERENS ,  Sjoerd Nicolaas Lambertus Donders ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Fransiscus Mathijs Jacobs

发明人： Ruud Antonius Catharina Maria BEERENS ,  Sjoerd Nicolaas Lambertus Donders ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Fransiscus Mathijs Jacobs

IPC分类号： G03F7/20 ,  G01B11/14

CPC分类号： G03F7/70775

摘要： A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale.

摘要翻译： 光刻设备具有光学编码器测量系统，其具有将照射束引导到第一刻度的照射系统。 该系统具有光学器件，用于将从第一刻度衍射的主衍射光束照射到第二刻度的照射光束和检测器以检测干涉后的次级衍射光束，并且在第二刻度上进行第二衍射照射束的第二衍射 测量相对于第二刻度的第一刻度的位置。

公开(公告)号：US20140022526A1

公开(公告)日：2014-01-23

申请号：US14038533

申请日：2013-09-26

申请人： Jan VAN EIJK ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen

发明人： Jan VAN EIJK ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC分类号： G03F7/20

CPC分类号： G03F1/44 ,  G03B27/42 ,  G03F7/704 ,  G03F7/70516 ,  G03F7/70775 ,  G03F7/7085

摘要： The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device.

摘要翻译： 本发明涉及一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，所述图案形成装置能够在辐射束的横截面中赋予辐射束以形成图案， 图案化的辐射束，被构造成保持衬底的衬底支撑件; 配置成将图案化的辐射束投影到基板的目标部分上的投影系统，以及配置成至少在将图案化的辐射束投射到基板的目标部分上的编码器型测量系统中，连续地确定 使用设置在图案形成装置上的格栅或格栅支撑在图案形成装置支撑体上的图案形成装置。

公开(公告)号：US20130194586A1

公开(公告)日：2013-08-01

申请号：US13564665

申请日：2012-08-01

申请人： Jan Van Eijk ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen

发明人： Jan Van Eijk ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC分类号： G01B11/14

CPC分类号： G01B11/14 ,  G01D5/38 ,  G03F7/70775

摘要： A system for detecting motion of a body, the system comprising: a body; a first grating mounted substantially stationary relative to a frame of reference; a second grating mounted on the body; a detector arranged to receive one or more radiation beams diffracted at the first and second gratings thereby to detect motion of the body relative to the frame of reference; wherein the detector is coupled to the body and moveable relative to the body.

摘要翻译： 一种用于检测身体运动的系统，所述系统包括：主体; 相对于参考框架基本上固定的第一光栅; 安装在本体上的第二光栅; 检测器，布置成接收在第一和第二光栅处衍射的一个或多个辐射束，从而检测身体相对于参考系的运动; 其中所述检测器联接到所述主体并且相对于所述主体可移动。