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    IMPRINT LITHOGRAPHY APPARATUS
    3.
    发明申请
    IMPRINT LITHOGRAPHY APPARATUS 有权

    公开(公告)号：US20110003023A1

    公开(公告)日：2011-01-06

    申请号：US12821749

    申请日：2010-06-23

    申请人： Johannes Petrus Martinus Bernardus VERMEULEN ,  Andre Bernardus Jeunink ,  Yvonne Wendela Kruijt-Stegeman

    发明人： Johannes Petrus Martinus Bernardus VERMEULEN ,  Andre Bernardus Jeunink ,  Yvonne Wendela Kruijt-Stegeman

    IPC分类号： B29C59/00

    CPC分类号： B29C67/0051 ,  B29C64/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S425/81

    摘要： An imprint lithography apparatus is disclosed. The apparatus includes an electromagnetic Lorentz actuator arrangement configured to move an imprint template arrangement, the electromagnetic Lorentz actuator arrangement comprising: an array of magnets; and an array of conductors, each conductor configured to carry an electric current, one of the array of magnets or the array of conductors being moveable and connected to the imprint template arrangement, and the other of the array of magnets or the array of conductors extending at least partially around or forming a part of a substrate holder; the array of magnets and the array of conductors together being in a configuration which facilitates moving of the moveable one of the array of magnets or the array of conductors in six degrees of freedom, such that the imprint template arrangement is also movable in six degrees of freedom.

    摘要翻译： 公开了压印光刻设备。 该设备包括配置成移动压印模板布置的电磁洛伦兹致动器装置，所述电磁洛伦兹致动器装置包括：磁体阵列; 以及导体阵列，每个导体被配置为承载电流，所述磁体阵列中的一个或所述导体阵列可移动并连接到所述压印模板装置，并且所述磁体阵列或所述导体阵列中的另一个延伸 至少部分地围绕或形成衬底保持器的一部分; 磁体阵列和导体阵列一起处于有利于以六个自由度移动磁体阵列或导体阵列中的可移动的一个的构造，使得印模模板布置也可以在六度 自由。

    MULTI-STAGE SYSTEM, A CONTROL METHOD THEREFOR, AND A LITHOGRAPHIC APPARATUS
    5.
    发明申请
    MULTI-STAGE SYSTEM, A CONTROL METHOD THEREFOR, AND A LITHOGRAPHIC APPARATUS 有权
    多级系统，其控制方法，以及一种平面设备

    公开(公告)号：US20120300186A1

    公开(公告)日：2012-11-29

    申请号：US13477669

    申请日：2012-05-22

    申请人： Hans BUTLER ,  Johannes Petrus Martinus Bernardus VERMEULEN

    发明人： Hans BUTLER ,  Johannes Petrus Martinus Bernardus VERMEULEN

    IPC分类号： G05B11/32 ,  G03B27/58

    CPC分类号： G03F7/70725 ,  G03F7/70716 ,  G05B19/418 ,  H02P25/06 ,  Y02P90/04

    摘要： A method for controlling a multi-stage system includes a stator extending parallel to a first direction; a first and second stage that are moveable relative to the stator; the stages being provided with a magnet system to generate a magnetic field, and the stator being provided with coils to interact with the magnetic fields to position the stages relative to the stator, the method including: determining the position of the stages; selecting a first and a second subset of coils that are capable of having a non-negligible interaction with the magnetic field of respectively the first and the second stage; activating the coils of both subsets, wherein activating the coils includes determining the coils that are part of both subsets; and excluding a coil that is part of both subsets from activating.

    摘要翻译： 一种用于控制多级系统的方法包括：平行于第一方向延伸的定子; 相对于定子可移动的第一和第二阶段; 所述阶段设置有磁体系统以产生磁场，并且所述定子设置有线圈以与所述磁场相互作用以相对于所述定子定位所述级，所述方法包括：确定所述级的位置; 选择能够分别与第一和第二阶段的磁场具有不可忽略的相互作用的线圈的第一和第二子集; 激活两个子集的线圈，其中激活线圈包括确定作为两个子集的一部分的线圈; 并排除作为两个子集的一部分激活的线圈。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    7.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20100157273A1

    公开(公告)日：2010-06-24

    申请号：US12627108

    申请日：2009-11-30

    申请人： Johannes Petrus Martinus Bernardus VERMEULEN

    发明人： Johannes Petrus Martinus Bernardus VERMEULEN

    IPC分类号： G03B27/58

    CPC分类号： G03B27/58 ,  G03F7/707

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table including a substrate holder constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate table is constructed and arranged to reduce or eliminate slip and hysteresis in position and orientation between the substrate table and the substrate holder.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 衬底台，其包括构造成保持衬底的衬底保持器; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述基板台被构造和布置成减小或消除所述基板台和所述基板支架之间的位置和方向上的滑动和滞后。