摘要:
A dive mask having a configuration of reverse Galilean telescopes. The reverse Galilean telescopes are tilted relative to each other. This configuration achieves panoramic true-sized vision underwater, instead of vision that exhibits the magnification effects experienced with flat dive masks.
摘要:
A near-to-eye display system includes a source of modulated light, a proximal optic positionable adjacent an eye of the user to receive the modulated light. The proximal optic has a plurality of groups of optically redirecting regions. The optically redirecting regions are configured to direct a plurality of beams of the modulated light into a pupil of the eye to form a contiguous illuminated portion of the retina of the eye. A first group of the optically redirecting regions receives modulated light from the source and redirect beams of the modulated light into the pupil of the eye for illumination of a first portion of the retina. A second group of the optically redirecting regions receives modulated light from the source and redirect beams of the modulated light into the pupil of the eye for illumination of a second portion of the retina.
摘要:
One embodiment relates to an apparatus that includes an illumination source (102) for illuminating a target substrate (106), objective optics (108) for projecting the EUV light which is reflected from the target substrate, and a sensor (110) for detecting the projected EUV light. The objective optics includes a first mirror (202,302, or 402) which is arranged to receive and reflect the EUV light which is reflected from the target substrate, a second mirror (204, 304, or 404) which is arranged to receive and reflect the EUV light which is reflected by the first mirror, a third mirror (206, 306, or 406) which is arranged to receive and reflect the EUV light which is reflected by the second mirror, and a fourth mirror (208, 308, or 408) which is arranged to receive and reflect the EUV light which is reflected by the third mirror.
摘要:
One embodiment relates to an apparatus that includes an illumination source (102) for illuminating a target substrate (106), objective optics (108) for projecting the EUV light which is reflected from the target substrate, and a sensor (110) for detecting the projected EUV light. The objective optics includes a first mirror (202,302, or 402) which is arranged to receive and reflect the EUV light which is reflected from the target substrate, a second mirror (204, 304, or 404) which is arranged to receive and reflect the EUV light which is reflected by the first mirror, a third mirror (206, 306, or 406) which is arranged to receive and reflect the EUV light which is reflected by the second mirror, and a fourth mirror (208, 308, or 408) which is arranged to receive and reflect the EUV light which is reflected by the third mirror.
摘要:
Various embodiments involving structures and methods for illumination can be employed, for example, in projectors, head-mounted displays, helmet-mounted displays, heads-up displays, back projection TVs, flat panel displays as well as other optical systems. Certain embodiments may include prism elements for illuminating, for example, a spatial light modulator. Light may be coupled to the prism in some cases using fiber optics or lightpipes. The optical system may also include a diffuser having scatter features arranged to scatter light appropriately to produce a desired luminance profile. Ellipsoid- and parapoloid-shaped combiners may be employed in embodiments of displays such as for example head mounted displays, helmet mounted displays, and heads-up display. Other embodiments are possible as well.
摘要:
A system for automatic spreading resistance profiling of wafer specimens. The system comprises a positioning stage for positioning the specimens for contact by probe tips and alternately a probe conditioning fixture or a sample calibration fixture. The system further comprises a programmed computer for controlling the positioning stage to effect automatic specimen profiling, probe tip conditioning, and calibration.
摘要:
A pistol grip has twin abutments projecting in parallel relationship and spaced apart to straddle an orthodontic bracket attached to a tooth and to engage the tooth at opposite sides of the bracket. A swing handle pivoted to the pistol grip carries a pull wire extending between the abutments such pull wire has a loop for hooking a wing of the orthodontic bracket. The handle can be pulled toward the pistol grip to draw the pull wire toward the pistol grip for pressing the abutments against the tooth and simultaneously pulling the bracket off the tooth. During such pulling, constriction of the arch wire slot in the bracket is prevented by fitting in such slot a spacer hook of a tenaculum.
摘要:
Various embodiments involving structures and methods for illumination can be employed, for example, in projectors, head-mounted displays, helmet-mounted displays, back projection TVs, flat panel displays as well as other optical systems. Certain embodiments may include prism elements for illuminating, for example, a spatial light modulator. Light may be coupled to the prism in some cases using fiber optics or lightpipes. The optical system may also include a diffuser having scatter features arranged to scatter light appropriately to produce a desired luminance profile. Other embodiments are possible as well.
摘要:
Apparatus for optimizing performance of a stepper motor includes interaction between on-hardware system drivers and a host controlling computer through an intermediate target computer. The command instructions from the host computer are optimized by the interaction using an objective function to define the best performance of the stepper motor and real-time feedback from operation of the motor. A method for optimizing the stepper motor performance is also disclosed.
摘要:
An absorbent material is prepared by treating a substrate with an aqueous monomer dispersion of an acrylate salt and a cross-linking monomer and thereafter irradiating the treated substrate with high energy ionizing radiation to form a cage matrix of the polymer and monomer substrate. The absorbent material can be swelled with a solution containing a volatile additive to dispense said additive over a period of time.