公开(公告)号：US07795085B2

公开(公告)日：2010-09-14

申请号：US11451264

申请日：2006-06-12

申请人： Jong Shik Yoon ,  Amitava Chatterjee ,  Kayvan Sadra ,  Shaoping Tang

发明人： Jong Shik Yoon ,  Amitava Chatterjee ,  Kayvan Sadra ,  Shaoping Tang

IPC分类号： H01L21/8238

CPC分类号： H01L27/1104 ,  H01L27/11

摘要： Methods are disclosed for forming an SRAM cell having symmetrically implanted active regions and reduced cross-diffusion therein. One method comprises patterning a resist layer overlying a semiconductor substrate to form resist structures about symmetrically located on opposite sides of active regions of the cell, implanting one or more dopant species using a first implant using the resist structures as an implant mask, rotating the semiconductor substrate relative to the first implant by about 180 degrees, and implanting one or more dopant species into the semiconductor substrate with a second implant using the resist structures as an implant mask. A method of performing a symmetric angle implant is also disclosed to provide reduced cross-diffusion within the cell, comprising patterning equally spaced resist structures on opposite sides of the active regions of the cell to equally shadow laterally opposed first and second angled implants.

摘要翻译： 公开了用于形成具有对称注入的有源区并在其中减少的交叉扩散的SRAM单元的方法。 一种方法包括图案化覆盖在半导体衬底上的抗蚀剂层，以形成对称地位于电池的有源区的相对侧上的抗蚀剂结构，使用第一注入使用抗蚀剂结构作为注入掩模注入一种或多种掺杂物种， 衬底，相对于第一注入约180度，以及使用抗蚀剂结构作为植入掩模，用第二注入将一种或多种掺杂剂物质注入到半导体衬底中。 还公开了执行对称角度注入的方法，以在电池内提供减小的交叉扩散，包括在电池的有源区域的相对侧上图案化等间隔的抗蚀剂结构，以同样地遮蔽横向相对的第一和第二倾斜植入物。

公开(公告)号：US20060024910A1

公开(公告)日：2006-02-02

申请号：US10899664

申请日：2004-07-27

申请人： Amitava Chatterjee ,  Alwin Tsao ,  Manuel Quevedo-Lopez ,  Jong Yoon ,  Shaoping Tang

发明人： Amitava Chatterjee ,  Alwin Tsao ,  Manuel Quevedo-Lopez ,  Jong Yoon ,  Shaoping Tang

IPC分类号： H01L21/76

CPC分类号： H01L21/76237 ,  H01L21/823878

摘要： A method (200) of forming an isolation structure is disclosed, and includes forming an isolation trench in a semiconductor body (214) associated with an isolation region, and filling a bottom portion of the isolation trench with an implant masking material (216). An angled ion implant is performed into the isolation trench (218) after having the bottom portion thereof filled with the implant masking material, thereby forming a threshold voltage compensation region in the semiconductor body. Subsequently, the isolation trench is filled with a dielectric material (220).

摘要翻译： 公开了一种形成隔离结构的方法（200），并且包括在与隔离区域相关联的半导体本体（214）中形成隔离沟槽，并用植入物掩模材料（216）填充隔离沟槽的底部。 在其底部填充有注入掩模材料之后，在隔离沟槽（218）中进行成角度的离子注入，从而在半导体本体中形成阈值电压补偿区域。 随后，隔离沟槽填充有电介质材料（220）。

公开(公告)号：US06794730B2

公开(公告)日：2004-09-21

申请号：US10028002

申请日：2001-12-20

申请人： Youngmin Kim ,  Shaoping Tang ,  Seetharaman Sridhar ,  Amitava Chatterjee

发明人： Youngmin Kim ,  Shaoping Tang ,  Seetharaman Sridhar ,  Amitava Chatterjee

IPC分类号： H01L27082

CPC分类号： H01L29/66272 ,  H01L21/8249 ,  H01L29/0804

摘要： A pnp bipolar junction transistor is formed with improved emitter efficiency by reducing the depth of the p well implant to increase carrier concentration in the emitter and making the emitter junction deeper to increase minority lifetime in the emitter. The high gain BJT is formed without added mask steps to the process flow. A blanket high energy boron implant is used to suppress the isolation leakage in SRAM in the preferred embodiment.

摘要翻译： 通过减小p阱注入的深度以增加发射极中的载流子浓度并使发射极结更深以增加发射极中的少数寿命，形成pnp双极结型晶体管，其具有改善的发射极效率。 形成高增益BJT，而不对工艺流程添加掩模步骤。 在优选实施例中，使用覆盖的高能量硼注入来抑制SRAM中的隔离泄漏。

公开(公告)号：US07045436B2

公开(公告)日：2006-05-16

申请号：US10899664

申请日：2004-07-27

申请人： Amitava Chatterjee ,  Alwin Tsao ,  Manuel Quevedo-Lopez ,  Jong Yoon ,  Shaoping Tang

发明人： Amitava Chatterjee ,  Alwin Tsao ,  Manuel Quevedo-Lopez ,  Jong Yoon ,  Shaoping Tang

IPC分类号： H01L21/762

CPC分类号： H01L21/76237 ,  H01L21/823878

摘要： A method (200) of forming an isolation structure is disclosed, and includes forming an isolation trench in a semiconductor body (214) associated with an isolation region, and filling a bottom portion of the isolation trench with an implant masking material (216). An angled ion implant is performed into the isolation trench (218) after having the bottom portion thereof filled with the implant masking material, thereby forming a threshold voltage compensation region in the semiconductor body. Subsequently, the isolation trench is filled with a dielectric material (220).

公开(公告)号：US07216310B2

公开(公告)日：2007-05-08

申请号：US10993815

申请日：2004-11-19

申请人： Amitava Chatterjee ,  David Barry Scott ,  Theodore W. Houston ,  Song Zhao ,  Shaoping Tang ,  Zhiqiang Wu

发明人： Amitava Chatterjee ,  David Barry Scott ,  Theodore W. Houston ,  Song Zhao ,  Shaoping Tang ,  Zhiqiang Wu

IPC分类号： G06F17/50 ,  G11C5/14 ,  H03K3/01 ,  G05F1/10

CPC分类号： G06F17/505

摘要： The present invention provides a method (100) of designing a circuit. The method comprises specifying (105) a design parameter for memory transistors and logic transistors and selecting (110) a test retention-mode bias voltage for the memory transistors. The method further comprises determining (115) a first relationship of a retention-mode leakage current and the design parameter at the test retention-mode bias voltage and obtaining (120) a second relationship of an active-mode drive current and the design parameter. The first and second relationships are used (125) to assess whether there is a range of values of the design parameter where the retention-mode leakage current and the active-mode drive current are within a predefined circuit specification. The method also includes adjusting (130) the test retention-mode bias voltage and repeating the determining and the using if the retention-mode total leakage current or the active-mode drive current is outside of the predefined circuit specification.

摘要翻译： 本发明提供一种设计电路的方法（100）。 该方法包括指定（105）存储晶体管和逻辑晶体管的设计参数，并选择（110）存储晶体管的测试保持模式偏置电压。 所述方法还包括在所述测试保持模式偏置电压下确定（115）保持模式漏电流和所述设计参数的第一关系，并获得（120）所述有源模式驱动电流与所述设计参数的第二关系。 使用第一和第二关系（125）来评估是否存在保持模式漏电流和有源模式驱动电流在预定电路规范内的设计参数值的范围。 该方法还包括调整（130）测试保持模式偏置电压，并重复确定和使用如果保持模式总泄漏电流或有源模式驱动电流超出预定电路规范。

公开(公告)号：US20050149887A1

公开(公告)日：2005-07-07

申请号：US10993815

申请日：2004-11-19

申请人： Amitava Chatterjee ,  David Scott ,  Theodore Houston ,  Song Zhao ,  Shaoping Tang ,  Zhiqiang Wu

发明人： Amitava Chatterjee ,  David Scott ,  Theodore Houston ,  Song Zhao ,  Shaoping Tang ,  Zhiqiang Wu

IPC分类号： G06F17/50

CPC分类号： G06F17/505

摘要： The present invention provides a method (100) of designing a circuit. The method comprises specifying (105) a design parameter for memory transistors and logic transistors and selecting (110) a test retention-mode bias voltage for the memory transistors. The method further comprises determining (115) a first relationship of a retention-mode leakage current and the design parameter at the test retention-mode bias voltage and obtaining (120) a second relationship of an active-mode drive current and the design parameter. The first and second relationships are used (125) to assess whether there is a range of values of the design parameter where the retention-mode leakage current and the active-mode drive current are within a predefined circuit specification. The method also includes adjusting (130) the test retention-mode bias voltage and repeating the determining and the using if the retention-mode total leakage current or the active-mode drive current is outside of the predefined circuit specification.

摘要翻译： 本发明提供一种设计电路的方法（100）。 该方法包括指定（105）存储晶体管和逻辑晶体管的设计参数，并选择（110）存储晶体管的测试保持模式偏置电压。 所述方法还包括在所述测试保持模式偏置电压下确定（115）保持模式漏电流和所述设计参数的第一关系，并获得（120）所述有源模式驱动电流与所述设计参数的第二关系。 使用第一和第二关系（125）来评估是否存在保持模式漏电流和有源模式驱动电流在预定电路规范内的设计参数值的范围。 该方法还包括调整（130）测试保持模式偏置电压，并重复确定和使用如果保持模式总泄漏电流或有源模式驱动电流超出预定电路规范。

公开(公告)号：US07736983B2

公开(公告)日：2010-06-15

申请号：US11972417

申请日：2008-01-10

申请人： Puneet Kohli ,  Manoj Mehrotra ,  Shaoping Tang

发明人： Puneet Kohli ,  Manoj Mehrotra ,  Shaoping Tang

IPC分类号： H01L21/336

CPC分类号： H01L21/823412 ,  H01L21/26506 ,  H01L21/26586 ,  H01L21/823418 ,  H01L29/0847 ,  H01L29/6659 ,  H01L29/7833

摘要： Pipe defects in n-type lightly doped drain (NLDD) regions and n-type source/drain (NDS) regions are associated with arsenic implants, while excess diffusion in NLDD and NSD regions is mainly due to phosphorus interstitial movement. Carbon implantation is commonly used to reduce phosphorus diffusion in the NLDD, but contributes to gated diode leakage (GDL). In high threshold NMOS transistors GDL is commonly a dominant off-state leakage mechanism. This invention provides a method of forming an NMOS transistor in which no carbon is implanted into the NLDD, and the NSD is formed by a pre-amorphizing implant (PAI), a phosphorus implant and a carbon species implant. Use of carbon in the NDS allows a higher concentration of phosphorus, resulting in reduced series resistance and reduced pipe defects. An NMOS transistor with less than 1·1014 cm−2 arsenic in the NSD and a high threshold NMOS transistor formed with the inventive method are also disclosed.

摘要翻译： n型轻掺杂漏极（NLDD）区域和n型源极/漏极（NDS）区域的管道缺陷与砷植入相关，而NLDD和NSD区域的过度扩散主要是由于磷间质运动。 碳注入通常用于减少NLDD中的磷扩散，但有助于栅极二极管泄漏（GDL）。 在高阈值NMOS晶体管中，GDL通常是主要的截止状态泄漏机制。 本发明提供了一种形成NMOS晶体管的方法，其中没有碳注入到NLDD中，并且NSD由前非晶化植入物（PAI），磷植入物和碳种植入物形成。 在NDS中使用碳可以提供更高浓度的磷，从而降低串联电阻并减少管道缺陷。 还公开了在NSD中具有小于1×1014cm-2砷的NMOS晶体管和由本发明方法形成的高阈值NMOS晶体管。

公开(公告)号：US20090004803A1

公开(公告)日：2009-01-01

申请号：US11769058

申请日：2007-06-27

申请人： Manoj Mehrotra ,  Stan Ashburn ,  Shaoping Tang

发明人： Manoj Mehrotra ,  Stan Ashburn ,  Shaoping Tang

IPC分类号： G11C11/34 ,  H01L21/8238

CPC分类号： G11C11/412 ,  H01L21/26513 ,  H01L21/823807 ,  H01L21/823814 ,  H01L27/11 ,  H01L27/1104 ,  H01L29/1083 ,  H01L29/7833

摘要： One aspect of the inventors' concept relates to a method of forming a semiconductor device. In this method, a gate structure is formed over a semiconductor body. A source/drain mask is patterned over the semiconductor body implanted source and drain regions are formed that are associated with the gate structure. After forming the implanted source and drain regions, a multi-stage implant is performed on the source and drain regions that comprises at least two implants where the dose and energy of the first implant varies from the dose and energy of the second implant. Other methods and devices are also disclosed.

摘要翻译： 本发明人的概念的一个方面涉及形成半导体器件的方法。 在该方法中，在半导体本体上形成栅极结构。 源极/漏极掩模在半导体本体注入源上形成图案，并且形成与栅极结构相关联的漏极区。 在形成植入的源区和漏区之后，在包括至少两个植入物的源极和漏极区域上执行多级注入，其中第一注入的剂量和能量与第二植入物的剂量和能量不同。 还公开了其它方法和装置。

公开(公告)号：US06933203B2

公开(公告)日：2005-08-23

申请号：US10299525

申请日：2002-11-19

申请人： Zhiqiang Wu ,  Shaoping Tang ,  Jau-Yuann Yang

发明人： Zhiqiang Wu ,  Shaoping Tang ,  Jau-Yuann Yang

IPC分类号： H01L21/761 ,  H01L21/762 ,  H01L21/8234 ,  H01L21/00

CPC分类号： H01L21/76237 ,  H01L21/761 ,  H01L21/823481

摘要： Methods are provided for forming wells in a semiconductor wafer, in which p-wells and n-wells are formed in a substrate, and first p-type dopants are implanted into n-well regions while an n-well mask remains over the wafer to selectively decrease a substrate resistivity in the n-well regions beneath the n-wells. A subsequent blanket implantation provides second p-type dopants into isolation regions of the substrate beneath isolation structures, where the first and second p-type dopants improve well to well isolation without addition of extra masks to the fabrication process.

摘要翻译： 提供了用于在半导体晶片中形成阱的方法，其中在衬底中形成p阱和n阱，并且将第一p型掺杂剂注入到n阱区域中，同时n阱掩模保留在晶片上， 选择性地降低n阱下面的n阱区中的衬底电阻率。 随后的覆盖植入在隔离结构下方的衬底的隔离区域中提供第二p型掺杂剂，其中第一和第二p型掺杂剂改善了良好的良好隔离，而没有向制造工艺添加额外的掩模。

公开(公告)号：US06930007B2

公开(公告)日：2005-08-16

申请号：US10662850

申请日：2003-09-15

申请人： Haowen Bu ,  Shashank Ekbote ,  Rajesh Khamankar ,  Shaoping Tang ,  Freidoon Mehrad

发明人： Haowen Bu ,  Shashank Ekbote ,  Rajesh Khamankar ,  Shaoping Tang ,  Freidoon Mehrad

IPC分类号： H01L21/00 ,  H01L21/3205 ,  H01L21/336 ,  H01L21/44 ,  H01L21/4763 ,  H01L21/8238 ,  H01L21/84 ,  H01L29/08 ,  H01L29/76 ,  H01L29/78

CPC分类号： H01L29/0847 ,  H01L29/665 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/7833 ,  H01L29/7845 ,  Y10S438/902

摘要： The present invention facilitates semiconductor device operation and fabrication by providing a cap-annealing process that improves channel electron mobility without substantially degrading PMOS transistor devices. The process uses an oxide/nitride composite-cap to alter the active dopant profile across the channel regions. During an annealing process, dopants migrate out of the Si/SiO2 in a channel region thereby altering the dopant profile of the channel region. This altered profile generally improves channel mobility thereby improving transistor performance and permitting smaller density designs.

摘要翻译： 本发明通过提供一种提高沟道电子迁移率而不会使PMOS晶体管器件基本上衰减的帽退火工艺来促进半导体器件的操作和制造。 该方法使用氧化物/氮化物复合帽来改变通道区域上的活性掺杂剂分布。 在退火过程中，掺杂剂在沟道区中迁移出Si / SiO 2，从而改变沟道区的掺杂物分布。 这种改变的形状通常改善了沟道迁移率，从而提高了晶体管的性能并允许更小的密度设计。