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    Apparatus and method for aligning and controlling edge deposition on a substrate
    8.
    发明授权
    Apparatus and method for aligning and controlling edge deposition on a substrate 失效
    用于对准和控制衬底上的边缘沉积的装置和方法

    公开(公告)号：US06328808B1

    公开(公告)日：2001-12-11

    申请号：US09543393

    申请日：2000-04-05

    申请人： Kenneth Tsai ,  Joseph Yudovsky ,  Steve Ghanayem ,  Ken K. Lai ,  Patricia Liu ,  Toshiyuki Nakagawa ,  Maitreyee Mahajani

    发明人： Kenneth Tsai ,  Joseph Yudovsky ,  Steve Ghanayem ,  Ken K. Lai ,  Patricia Liu ,  Toshiyuki Nakagawa ,  Maitreyee Mahajani

    IPC分类号： C23C1600

    CPC分类号： C23C16/45521 ,  C23C16/4585

    摘要： An alignment mechanism for aligning a substrate on a support member in a process chamber includes a set of guide pins extending from the upper surface of the support member equally spaced about the periphery thereof and spaced to receive a substrate therebetween and align a shadow ring thereover. The inner surfaces of the guide pins are slanted outwardly to form an inverted funnel for receiving and aligning the substrate on the support member. An annular gas groove in the upper surface of the support member provides communication for a supply of purge gas and directs the gas about the peripheral edge of the substrate. The guide pins which extend partially over the gas groove include slots therein that provide fluid communication through the guide pins from the gas groove to the peripheral edge of the substrate. The guide pins also mate with alignment bores formed in the shadow ring so that, as the support member moves into the processing position, the inner surfaces of the guide pins abut abutment surfaces in the alignment bores and align the shadow ring on the support member and over the substrate. A hanger member supports and aligns the shadow ring between processing of each substrate.

    摘要翻译： 用于使处理室中的支撑构件上的基板对准的对准机构包括一组引导销，其从支撑构件的上表面延伸，围绕其周边等间隔开并间隔开，以在其间对准阴影环。 引导销的内表面向外倾斜以形成用于接收和对准支撑构件上的基板的倒置漏斗。 在支撑构件的上表面中的环形气体沟槽提供用于供应吹扫气体的连通并且引导围绕衬底的周边边缘的气体。 在气槽上部分延伸的引导销包括其中的槽，其通过引导销从气槽到衬底的周缘提供流体连通。 引导销还与形成在阴影环中的对准孔配合，使得当支撑构件移动到处理位置时，引导销的内表面邻接对准孔中的邻接表面并将阴影环对准支撑构件和 在基板上。 衣架构件在每个基底的处理之间支撑和对准阴影环。