摘要:
A high-efficient sheet plasma sputtering method and an apparatus for carrying out the method which comprise means for deforming an arc plasma stream into a form of sheet by a magnetic field so that ions in the sheet plasma are accelerated to a target which is controlled to have a negative potential to the sheet plasma, whereby a coating layer is formed by sputtering on a substrate arranged opposite the target with respect to the sheet plasma.
摘要:
In a method of forming a transparent conductive film, an arc discharge type plasma produced by arc discharging is generated in an atmosphere wherein the pressure of an atmospheric gas is 3.0 .times. 10.sup.-4 Torr or higher; the plasma is converged onto a vapor deposition material for forming a transparent conductive film to thereby evaporate the vapor deposition material, whereby said transparent conductive film is formed on a substrate located above said vapor deposition material.
摘要:
A transparent laminated product comprising a transparent substrate and a 5-layered transparent coating composed of a first transparent oxide layer formed on the substrate, a second Ag layer formed on the first transparent oxide layer, a third first transparent oxide layer formed on the second layer, a fourth Ag layer formed on the third transparent oxide layer and a fifth transparent oxide layer formed on the fourth layer, and having a visible ray transmission of at least 60%, wherein the thickness of each Ag layer is from 60 to 250 A, and each transparent oxide layer comprises a material selected from the group consisting of SnO.sub.2, Sn.sub.1-x Zn.sub.x O.sub.y, and TiO.sub.2.
摘要:
A transparent laminated product comprising a transparent substrate and a coating composed of transparent oxide and silver layers alternately laminated in a total of (2n+1) (n.gtoreq.2) layers with the inner most and outer most layers being transparent oxide layers and having a surface resistance of at most 10 .OMEGA./sq. and a visible ray transmission of at least 60%.
摘要:
The present invention relates to a film comprising silicon dioxide as the main component, which contains Zr, etc., and a method for forming it by reactive DC sputtering. It makes it possible to form reflection preventive films, alkali barrier films and various multi-layered films such as multi-layered films for anti-iridescent glass, which contain said film comprising silicon dioxide as the main component, by a physical vapor deposition method without breaking a vacuum.
摘要:
The present invention relates to a film comprising silicon dioxide as the main component, which contains Zr, etc., and a method for forming it by reactive DC sputtering. It makes it possible to form reflection preventive films, alkali barrier films and various multi-layered films such as multi-layered films for anti-iridescent glass, which contain said film comprising silicon dioxide as the main component, by a physical vapor deposition method without breaking a vacuum.
摘要:
The present invention provides a communication system facilitating introduction into an existing network and improving a quality of service of communications. The communication system is configured by connecting a relay device performing wireless communications with a terminal, a management device managing the relay device and a server to each other via an IP network, the relay device has a packet generating unit generating an encapsulated packet containing, as a payload, and transferring unit transferring the encapsulated packet to the management device, and the management device has a receiving unit receiving the encapsulated packet transmitted from the relay device, and a transmitting unit transmitting a predetermined encapsulated packet in the encapsulated packets received by the receiving unit back to the relay device.
摘要:
A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented. A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOX which is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from −100 MPa to +100 MPa.
摘要翻译:通过使用导电性溅射材料的溅射法,通过在基板上高速沉积包含金属氧化物膜和氧化硅膜的多层膜而使薄膜的应力弛豫的多层膜被覆基板,以及制造方法 提出了具有如此低应力的多层膜涂覆的基板。 一种多层膜被覆基板,包括基板和至少一层金属氧化物膜和氧化硅膜,其上重复层叠至少一次,其中至少一层所述金属氧化物膜是通过溅射沉积的金属氧化物膜,其通过使用作为 目标材料,缺氧量低于化学计量组成的金属氧化物MO X X,以使氧缺陷分解,多层膜的应力为-100MPa〜+100MPa。
摘要:
A high reflectance mirror having a high reflectance in a visible-light region, being excellent in durability such as a moisture resistance, a saltwater resistance, etc. and having small dependence on incident angle (i.e., the fluctuation of the reflectance depending on an incident angle of light is little) is provided. The high reflectance mirror comprises a substrate and a silver film, a low refractive index film and a high refractive index film laminated on the substrate in this order wherein an adhesion improving film is formed on the silver film surface on the opposite side of the substrate, the extinction coefficient of the low refractive index film is at most 0.01, the extinction coefficient of the high refractive index film is at most 0.01, the adhesion improving film is an oxide film and the extinction coefficient of the adhesion improving film is at most 0.1.
摘要:
A protective plate for a plasma display comprises conductive substrate for protecting a plasma display and an electrode in electrical contact with the conductive substrate.