High current density particle beam system
    2.
    发明申请
    High current density particle beam system 有权
    高电流密度粒子束系统

    公开(公告)号:US20060151711A1

    公开(公告)日:2006-07-13

    申请号:US11274608

    申请日:2005-11-15

    IPC分类号: H01J1/50

    摘要: The present invention relates to a charged particle unit for deflecting and energy-selecting charged particles of a charged particle beam. Thereby, a double-focusing sector unit for deflecting and focusing the charged particle beam and an energy-filter forming a potential is provided, whereby charged particles of the charged particles beam are redirected at the potential-saddle depending on the energy of the charged articles.

    摘要翻译: 本发明涉及带电粒子单元,用于对带电粒子束的带电粒子进行偏转和能量选择。 由此,提供用于使带电粒子束偏转和聚焦并形成电位的能量滤波器的双重聚焦扇区单元,由此带电粒子束的带电粒子根据带电物品的能量在电位鞍上被重定向 。

    Analyzing system and charged particle beam device
    3.
    发明申请
    Analyzing system and charged particle beam device 有权
    分析系统和带电粒子束装置

    公开(公告)号:US20060226361A1

    公开(公告)日:2006-10-12

    申请号:US11384044

    申请日:2006-03-17

    IPC分类号: G21K7/00

    摘要: The present invention relates to an analyzing system with improved detection scheme and a charged particle beam device comprising the same. The analyzing system for analyzing a beam of charged particles has a divider to divide the beam of charged particles according to their energies into a low energy beam and a high energy beam; a front detector for detecting the high energy beam; and at least one reverse detector for detecting the low energy beam. The divider is positioned between the front detector and the at least one reverse detector and the front detector and/or the at least one reverse detector are segmented.

    摘要翻译: 本发明涉及具有改进的检测方案的分析系统和包括该分析系统的带电粒子束装置。 用于分析带电粒子束的分析系统具有分隔器,用于将带电粒子束根据其能量分成低能量束和高能量束; 用于检测高能束的前检测器; 以及用于检测低能量束的至少一个反向检测器。 分隔器位于前检测器和至少一个反向检测器之间,并且前分辨器和/或至少一个反向检测器被分段。

    Analyzing system and charged particle beam device
    4.
    发明授权
    Analyzing system and charged particle beam device 有权
    分析系统和带电粒子束装置

    公开(公告)号:US07439500B2

    公开(公告)日:2008-10-21

    申请号:US11384044

    申请日:2006-03-17

    摘要: The present invention relates to an analyzing system with improved detection scheme and a charged particle beam device comprising the same. The analyzing system for analyzing a beam of charged particles has a divider to divide the beam of charged particles according to their energies into a low energy beam and a high energy beam; a front detector for detecting the high energy beam; and at least one reverse detector for detecting the low energy beam. The divider is positioned between the front detector and the at least one reverse detector and the front detector and/or the at least one reverse detector are segmented.

    摘要翻译: 本发明涉及具有改进的检测方案的分析系统和包括该分析系统的带电粒子束装置。 用于分析带电粒子束的分析系统具有分隔器,用于将带电粒子束根据其能量分成低能量束和高能量束; 用于检测高能束的前检测器; 以及用于检测低能量束的至少一个反向检测器。 分隔器位于前检测器和至少一个反向检测器之间,并且前分辨器和/或至少一个反向检测器被分段。

    Ultra high precision measurement tool with control loop
    5.
    发明授权
    Ultra high precision measurement tool with control loop 有权
    超高精度测量工具,带控制回路

    公开(公告)号:US07851768B2

    公开(公告)日:2010-12-14

    申请号:US12133147

    申请日:2008-06-04

    申请人: Juergen Frosien

    发明人: Juergen Frosien

    IPC分类号: H01J49/10 H01J27/26 H01J27/02

    摘要: A focused ion beam device is described comprising a gas field ion source with an emitter emitting an ion beam including ions of gas, an ion beam column and a beam current control loop comprising a beam current measurement device. Furthermore, the focused ion beam device may have a sample charge control comprising measuring the sample charge. A method of operating a focused ion beam device is provided comprising applying a voltage between an emitter an electrode, applying gas to the emitter, emitting ions of a gas from the emitter and controlling a beam current by measuring the beam current with a beam current measurement device.

    摘要翻译: 描述了一种聚焦离子束装置,其包括具有发射包括气体离子的离子束的发射体的气体场离子源,离子束列和包括束电流测量装置的束流控制回路。 此外,聚焦离子束装置可以具有包括测量样品电荷的样品电荷控制。 提供了一种操作聚焦离子束装置的方法,包括在发射极与电极之间施加电压,向发射体施加气体,从发射极发射气体的离子,并通过用束电流测量来测量束电流来控制束电流 设备。

    Beam optical component for charged particle beams
    6.
    发明授权
    Beam optical component for charged particle beams 有权
    用于带电粒子束的光束组件

    公开(公告)号:US07675042B2

    公开(公告)日:2010-03-09

    申请号:US10578206

    申请日:2004-11-04

    申请人: Juergen Frosien

    发明人: Juergen Frosien

    IPC分类号: H01J29/02

    摘要: The present invention relates to a beam optical component (1, 201) for acting on a charged particle beam (63) including a first element (3; 203) having a first opening (9; 209) for acting on the charged particle beam (63), at least a second element (5; 205) for acting on the charged particle beam (63); at least one distance piece (20a, 20b, 20c) positioned between the first element (3; 203) and the second element (5; 205) to define a minimum distance between the first element (3; 203) and the second element (5; 205); and a first holding piece (30a; 30b; 30c) for abutting the first element (3) to the at least one distance piece (20a, 20b, 20c), whereby the first holding piece (30a; 30b; 30c) is attached to the at least one distance piece (20a, 20b, 20c). First and second elements (3; 203; 5; 205) are preferably electrodes or pole pieces to act on the charged particle beam by an electrostatic or magnetic force. With the first holding piece (30a; 30b; 30c) attached to the at least one distance piece, distorting mechanical forces on the first and second elements (3, 5) are reduced which improves the performance of the respective beam optical components (1; 201).

    摘要翻译: 本发明涉及一种用于作用在带电粒子束(63)上的束光学部件(1,201),其包括具有用于作用在带电粒子束上的第一开口(9; 209)的第一元件(3; 203) 至少一个用于作用在带电粒子束(63)上的第二元件(5; 205); 位于第一元件(3; 203)和第二元件(5; 205)之间的至少一个距离件(20a,20b,20c),以限定第一元件(3; 203)和第二元件 5; 205); 以及用于将所述第一元件(3)抵接到所述至少一个距离片(20a,20b,20c)的第一保持片(30a; 30b; 30c),由此所述第一保持片(30a; 30b; 30c) 所述至少一个距离件(20a,20b,20c)。 第一和第二元件(3; 203; 5; 205)优选地是通过静电或磁力作用在带电粒子束上的电极或极片。 在第一固定件(30a; 30b; 30c)附接到至少一个距离件上,使第一和第二元件(3,5)上的机械力变形减小,这改善了各个光束组件(1; 201)。

    Beam Optical Component Having a Charged Particle Lens
    7.
    发明申请
    Beam Optical Component Having a Charged Particle Lens 有权
    具有带电粒子透镜的光束组件

    公开(公告)号:US20080230694A1

    公开(公告)日:2008-09-25

    申请号:US10587105

    申请日:2004-12-13

    申请人: Juergen Frosien

    发明人: Juergen Frosien

    IPC分类号: G01N23/00 H01J3/14

    摘要: The present invention relates to a beam optical component including a charged particle lens for focusing a charged particle beam, the charged particle lens comprising a first element having a first opening for focusing the charged particle beam; a second element having a second opening for focusing the charged particle beam and first driving means connected with at least one of the first element and the second element for aligning the first opening with respect to the second opening. With the first driving means, the first opening and the second opening can be aligned with respect to each other during beam operation to provide a superior alignment of the beam optical component for a better beam focusing. The present invention also relates to a charged particle beam device that uses said beam optical component for focusing the charged particle beam, and a method to align first opening and second opening with respect to each other.

    摘要翻译: 本发明涉及一种包括用于聚焦带电粒子束的带电粒子透镜的束光学部件,该带电粒子透镜包括具有用于聚焦带电粒子束的第一开口的第一元件; 第二元件具有用于聚焦带电粒子束的第二开口和与第一元件和第二元件中的至少一个连接的第一驱动装置,用于相对于第二开口对准第一开口。 利用第一驱动装置,第一开口和第二开口可以在光束操作期间相对于彼此对准,以提供光束光学部件的优良对准以获得更好的光束聚焦。 本发明还涉及使用所述光束光学部件来聚焦带电粒子束的带电粒子束装置,以及使第一开口和第二开口相对于彼此对准的方法。

    Electrostatic deflection system with low aberrations and vertical beam incidence
    8.
    发明授权
    Electrostatic deflection system with low aberrations and vertical beam incidence 有权
    具有低像差和垂直光束入射的静电偏转系统

    公开(公告)号:US07315029B2

    公开(公告)日:2008-01-01

    申请号:US11241880

    申请日:2005-09-30

    摘要: Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.

    摘要翻译: 本发明的实施例可用于改善电子束偏转。 一个实施例提供一种静电偏转系统,其具有最小化像差并且同时实现垂直入射的电极。 通过对偏转方向使用至少两个偏转级,本发明允许偏转的电子束通过物镜的后焦平面,而偏转电容器不跨过后焦平面设置。 结果,偏转电极可以具有120°的角度以最小化像差并且同时实现电子束在靶上的垂直入射,以避免目标或焦点变化的高度变化引起的变形或放大变化。