摘要:
A semiconductor optical device comprises a first conductive type semiconductor region, an active layer provided on the second semiconductor portion of the first conductive type semiconductor region, a second conductive type semiconductor region on the side and top of the active layer, the side of the second semiconductor portion, and the second region of the first semiconductor portion of the first conductive type semiconductor region, a potential adjusting semiconductor layer provided between the second semiconductor portion of the first conductive type semiconductor region and the active layer, and first and second distributed Bragg reflector portions between which the first conductive type semiconductor region, the active layer and the second conductive type semiconductor region is provided. Bandgap energies of the first conductive type semiconductor region and second conductive type semiconductor region are greater than that of the active layer. The second region of the first semiconductor portion of the first conductive type semiconductor region and the second conductive type semiconductor region constitute a pn junction. A bandgap energy of the potential adjusting semiconductor layer is different from bandgap energies of the first conductive type semiconductor region and the second conductive type semiconductor region.
摘要:
A light-emitting device that reduces the leak current flowing along the sides of the mesa stripe is disclosed. The device provides the mesa stripe, the current blocking layer, and two intermediate layers put between the mesa stripe and the current blocking layer. One of intermediate layers has the p-type conduction and comes in directly contact with the mesa stripe, while, the other intermediate layer has the n-type conduction and put between the former intermediate layer and the current blocking layer. The double intermediate layers prevent impurities in the current blocking layer and in the mesa stripe from inter-diffusing each other.
摘要:
In a semiconductor optical device, the semiconductor substrate has a primary surface intersecting with a predetermined axis. The lower cladding region of the first conductive type is provided on the primary surface thereof. The lower cladding region includes ridge regions and a base region. The base region has first portions and second portions. The first portions and the second portions are alternately arranged along a predetermined plane perpendicular to the predetermined axis. Each first portion extends in an optical propagating direction. Each second portion extends in the optical propagating direction. Each ridge region is located on each second portion. Each ridge region has a side and a top, and each first portion has a top. The upper cladding layer of the second conductive type is provided on the primary surface of the semiconductor substrate. The bulk active layer is provided between the upper cladding layer and the lower cladding region. The bulk active layer includes first portions, second portions and third portions. Each first portion of the bulk active layer is located on each first portion of the base region of the lower cladding region. Each second portion of the bulk active layer is located on the top of each ridge region and each third portion of the bulk active layer is located on the side of the ridge region.
摘要:
A semiconductor optical device includes a GaAs substrate of a first conductivity type; a III-V compound semiconductor layer provided on the GaAs substrate; an active layer provided on the III-V compound semiconductor layer; and a cladding layer of a second conductivity type provided on the active layer, wherein the band gap energy of the III-V compound semiconductor layer is larger than the band gap energy of the GaAs substrate, wherein the band gap energy of the active layer is smaller than the band gap energy of the GaAs substrate, and wherein the thickness of the III-V compound semiconductor layer is not more than 0.2 μm.
摘要:
In a semiconductor optical device, a first conductive type semiconductor region includes first and second semiconductor portions. The first and second semiconductor portions are made of nitride mixed semiconductor crystal. This first semiconductor portion has a first region and a second region. The second semiconductor portion is provided on the first region of the first semiconductor portion. A second conductive type semiconductor region is made of nitride mixed semiconductor crystal. The second conductive type semiconductor region includes a first region and a second region. This second region of the first semiconductor portion of the first conductive type semiconductor region and the second region of the second conductive type semiconductor region constitute a pn junction. The sides of the second semiconductor portion of the first conductive type semiconductor region and the second region of the second conductive type semiconductor region constitute a pn junction. An active layer is made of nitride mixed semiconductor crystal. The active layer is provided between the second semiconductor portion of the first conductive type semiconductor region and the first region of the second conductive type semiconductor region. The bandgap energies of the first conductive type semiconductor region and the second conductive type semiconductor region are greater than that of the active layer.
摘要:
The present invention provides an optical device integrating an active device with a passive device without any butt joint structure between two devices. The optical integrated device of the invention includes a GaAs substrate, first and second cladding layers, and an active layer sandwiched by the first and second cladding layers, these layers are disposed on the GaAs substrate. The GaAs substrate provides first to third regions. The active layer includes first to third active layers disposed on respective regions of the substrate. The first active layer has a quantum well structure whose band-gap energy smaller than 1.3 eV, while the third active layer has a quantum well structure whose band-gap energy is greater than that of the first active layer.
摘要:
This surface emitting semiconductor device 1 comprises a first conductivity type semiconductor region, an active layer, a second conductivity type semiconductor layer and current block semiconductor region. The first conductivity type semiconductor region is provided on a surface made of GaAs semiconductor. The active layer is provided on the first conductivity type semiconductor region. The active layer has a side surface. The second conductivity type semiconductor layer is provided on the active layer. The second conductivity type semiconductor layer has a side surface. The current block semiconductor region is provided on the side surface of the active layer and on the side surface of the second conductivity type semiconductor layer. The active layer is made of III-V compound semiconductor including at least nitrogen element as a V group element.
摘要:
In the present method, at the time when a semiconductor laser is being made, nitrogen or phosphorus element is introduced into an active layer comprising a GaAs based compound from an end face thereof, thereby changing the region of the active layer in the vicinity of the end face into a GaN or GaP based compound. Accordingly, the energy band gap of this region is made wider than the energy band gap within the active layer, and thus substituted region is changed into a layer transparent to the laser light generated within the active layer. Thus, the end face can be prevented from deteriorating upon the temperature rise caused by laser light absorption at the end face.
摘要:
A Mach-Zehnder interferometer type optical modulator includes first and third optical waveguides; input and output optical couplers; and a phase shifting section disposed between the input and output optical couplers. The phase shifting section includes first and second optical waveguide structures each including an n-type semiconductor section, a core layer and a cladding layer. The cladding layer of the first optical waveguide structure includes a first section disposed on the core layer, and second and third sections disposed on the first section. The second and third sections are juxtaposed to each other in a direction that intersects a waveguiding direction. The first and second sections are composed of a p-type semiconductor, and the third section is composed of an undoped semiconductor.
摘要:
A surface-emitting type semiconductor optical device includes: a first DBR portion of a first conductivity type provided on a GaAs substrate of the first conductivity type; an active layer provided on the first DBR portion; a second DBR portion provided on the active layer; a mesa-shaped conductive layer, which is provided between the first DBR portion and the second DBR portion, and which has, embedded therein, a current confinement portion for supplying current to the active layer; and a burying layer comprising single undoped GaInP and provided between the first DBR portion and the second DBR portion, on the side faces of the conductive layer. The resistivity of the undoped GaInP in the surface-emitting type semiconductor optical device is not lower than 105 Ωcm. Improved productivity, as well as favorable device characteristics and high reliability can be achieved as a result.