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29 条记录 (耗时 0.027 秒)

    Laser apparatus
    1.
    发明授权
    Laser apparatus 有权
    激光设备

    公开(公告)号：US08611393B2

    公开(公告)日：2013-12-17

    申请号：US13421116

    申请日：2012-03-15

    申请人： Junichi Fujimoto ,  Takahito Kumazaki ,  Toru Suzuki ,  Satoshi Tanaka ,  Osamu Wakabayashi

    发明人： Junichi Fujimoto ,  Takahito Kumazaki ,  Toru Suzuki ,  Satoshi Tanaka ,  Osamu Wakabayashi

    IPC分类号： H01S3/08

    CPC分类号： H01S3/106 ,  H01S3/005 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0971 ,  H01S3/2316 ,  H01S3/2333

    摘要： This disclosure is directed to widen an adjustable range of the spectral linewidth of laser light output from a laser apparatus. This laser apparatus may include: (1) an excitation source configured to excite a laser medium in a laser gain space, (2) an optical resonator including an output coupler arranged on one side of an optical path through the laser gain space and a wavelength dispersion element arranged on the other side of the optical path through the laser gain space, and (3) a switching mechanism configured to switch a beam-width magnification or reduction factor by placing or removing at least one beam-width change optical system for expanding or reducing a beam width in or from an optical path between the laser gain space and the wavelength dispersion element or by inverting orientation of the at least one beam-width change optical system in the optical path.

    摘要翻译： 本公开旨在扩大从激光设备输出的激光的谱线宽度的可调范围。 该激光装置可以包括：（1）激励源，被配置为在激光增益空间中激发激光介质，（2）光学谐振器，包括布置在通过激光增益空间的光路的一侧上的输出耦合器，以及波长 通过激光增益空间布置在光路的另一侧的色散元件，以及（3）配置为通过放置或去除至少一个用于扩展的光束宽度改变光学系​​统来切换光束宽度放大率或缩小因子的切换机构 或者减小激光增益空间和波长色散元件之间的光路中的光束宽度，或者通过使光路中的至少一个光束宽度改变光学系​​统的取向反转。

    EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM
    3.
    发明申请
    EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM 审中-公开
    极致超紫外光源系统

    公开(公告)号：US20120119118A1

    公开(公告)日：2012-05-17

    申请号：US13359315

    申请日：2012-01-26

    申请人： Yukio WATANABE ,  Osamu Wakabayashi ,  Junichi Fujimoto ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Hideo Hoshino

    发明人： Yukio WATANABE ,  Osamu Wakabayashi ,  Junichi Fujimoto ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Hideo Hoshino

    IPC分类号： G21K5/00

    CPC分类号： G03F7/70975 ,  G03F7/70033

    摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.

    摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。 该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光 具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。

    APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT
    4.
    发明申请
    APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT 审中-公开
    用于产生极度超紫外线灯的装置和方法

    公开(公告)号：US20130105712A1

    公开(公告)日：2013-05-02

    申请号：US13805278

    申请日：2012-02-21

    申请人： Tatsuya Yanagida ,  Junichi Fujimoto ,  Osamu Wakabayashi

    发明人： Tatsuya Yanagida ,  Junichi Fujimoto ,  Osamu Wakabayashi

    IPC分类号： H05G2/00

    CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/008

    摘要： A method for generating extreme ultraviolet (EUV) light that includes the steps of supplying a droplet of a target material into a chamber, diffusing the droplet by irradiating the droplet by a pre-pulse laser beam to form a diffused target, and generating a plasma by irradiating the diffused target by a main pulse laser beam wherein the plasma emits extreme ultraviolet light. The main pulse laser beam has a cross-sectional shape that is substantially coincident with a shape of the diffused target at the irradiation point.

    摘要翻译： 一种用于产生极紫外（EUV）光的方法，包括以下步骤：将目标材料的液滴供应到室中，通过用预脉冲激光束照射液滴来扩散液滴，以形成扩散的靶，并产生等离子体 通过用等离子体发射极紫外光的主脉冲激光束照射漫射靶。 主脉冲激光束具有与照射点处的扩散靶的形状大致一致的截面形状。

    Excimer laser apparatus
    6.
    发明授权
    Excimer laser apparatus 失效
    准分子激光装置

    公开(公告)号：US5373523A

    公开(公告)日：1994-12-13

    申请号：US136448

    申请日：1993-10-14

    申请人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Yoshiho Amada ,  Osamu Wakabayashi

    发明人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Yoshiho Amada ,  Osamu Wakabayashi

    IPC分类号： H01S3/034 ,  H01S3/036 ,  H01S3/225 ,  H01S3/22

    CPC分类号： H01S3/0346 ,  H01S3/036 ,  H01S3/225

    摘要： An excimer laser apparatus is provided with a compact high efficiency dust particle removal means which is capable of maintaining the windows clean with only a small volume of purging gas, and which prevents deterioration of aperture masks without having to increase the cavity length or risking the possibility of leakage from piping connections. The excimer laser apparatus uses, as dust particle removal means, filters (13a and 13b) made of metal or ceramic which is non-reactive with fluorine. A ground potential dust collector can be provided at a downstream side of a static dust particle remover, having an anode and a cathode, for collecting any dust particles which have passed through the static dust particle remover. In addition, clean laser medium gas can be introduced into subchambers (14a and 14b) through gas introducing passages (11a and 11b) provided in the walls of the housing (1) and then into the laser chamber (12) through labyrinths (8a and 8b) without disturbing the clean gas which stays near the internal surfaces of the windows (6a and 6b).

    摘要翻译： 准分子激光装置设置有紧凑的高效除尘装置，其能够仅利用少量清洗气体来保持窗户清洁，并且防止孔径掩模的劣化，而不必增加空腔长度或冒着可能性 从管道连接泄漏。 准分子激光装置使用与氟反应的金属或陶瓷制成的过滤器（13a，13b）作为除尘装置。 可以在具有阳极和阴极的静电除尘器的下游侧设置地电位集尘器，用于收集通过静电除尘器的任何灰尘颗粒。 此外，可以通过设置在壳体（1）的壁中的气体引入通道（11a和11b）将干净的激光介质气体引入到子室（14a和14b）中，然后通过迷宫（8a和8a）进入激光室 8b），而不干扰保持在窗口（6a和6b）的内表面附近的清洁气体。

    Chamber apparatus
    7.
    发明授权
    Chamber apparatus 有权
    室内设备

    公开(公告)号：US08748853B2

    公开(公告)日：2014-06-10

    申请号：US13494442

    申请日：2012-06-12

    申请人： Shinji Nagai ,  Osamu Wakabayashi ,  Yutaka Shiraishi ,  Junichi Fujimoto

    发明人： Shinji Nagai ,  Osamu Wakabayashi ,  Yutaka Shiraishi ,  Junichi Fujimoto

    IPC分类号： H05G2/00

    CPC分类号： H05G2/008 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003

    摘要： A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a collection unit and a collection container. The chamber includes an inlet through which a laser beam from the laser apparatus enters the chamber. The target supply unit is configured to supply a target material to a predetermined region inside the chamber. The collection unit includes a debris entering surface so that debris generated when the target material is irradiated with the laser beam enters the debris entering surface. The debris entering surface is inclined with respect to a direction in which the debris enters the debris entering surface. The collection container collects the debris flowing out of the collection unit.

    摘要翻译： 用于利用激光装置操作的腔室装置包括腔室，目标供应单元，收集单元和收集容器。 该腔室包括入口，来自激光装置的激光束通过入口进入腔室。 目标供给单元被配置为将目标材料供应到室内的预定区域。 收集单元包括碎屑进入表面，使得当靶材料被激光束照射时产生的碎屑进入碎片进入表面。 碎屑进入表面相对于碎片进入碎片进入表面的方向倾斜。 收集容器收集从收集单元流出的碎屑。

    Discharge electrode and discharge electrode manufacturing method
    9.
    发明授权
    Discharge electrode and discharge electrode manufacturing method 有权
    放电电极和放电电极的制造方法

    公开(公告)号：US06810061B2

    公开(公告)日：2004-10-26

    申请号：US10225286

    申请日：2002-08-22

    申请人： Tsukasa Hori ,  Akira Sumitani ,  Takayuki Yabu ,  Teiichirou Chiba ,  Hakaru Mizoguchi ,  Osamu Wakabayashi ,  Junichi Fujimoto

    发明人： Tsukasa Hori ,  Akira Sumitani ,  Takayuki Yabu ,  Teiichirou Chiba ,  Hakaru Mizoguchi ,  Osamu Wakabayashi ,  Junichi Fujimoto

    IPC分类号： H01S3097

    CPC分类号： H01S3/038 ,  H01S3/0388 ,  H01S3/225

    摘要： A film is formed on the discharge parts of the main discharge electrodes. In order to prevent erosion of the discharge parts by the halogen gas contained in the laser gas, a substance that tends not to react with the halogen gas, i.e., a halogen-resistant substance, is used for this film. Furthermore, in order to prevent deformation of the discharge parts by the bombardment and heat of the main discharge, a substance that has a higher hardness than the metal of the main discharge electrodes or a substance that has a higher melting point than the metal of the main discharge electrodes is used for this film. As a result, deterioration of the electrodes can be inhibited, so that a stable laser output can be obtained, and the replacement interval of the electrodes can be extended.

    摘要翻译： 在主放电电极的放电部分上形成膜。 为了防止由激光气体中所含的卤素气体引起的排出部件的侵蚀，使用与卤素气体即不耐卤素物质倾向不反应的物质。 此外，为了防止放电部件由于主放电的轰击和热而发生变形，所以具有比主放电电极的金属更高的硬度的物质或具有比金属的熔点高的物质 主放电电极用于该膜。 结果，可以抑制电极的劣化，从而可以获得稳定的激光输出，并且可以延长电极的替换间隔。

    Multi-mode narrow-band oscillation excimer laser
    10.
    发明授权
    Multi-mode narrow-band oscillation excimer laser 失效
    多模窄带振荡准分子激光器

    公开(公告)号：US4829536A

    公开(公告)日：1989-05-09

    申请号：US144000

    申请日：1987-11-30

    申请人： Koichi Kajiyama ,  Kaoru Saito ,  Yasuhiro Nozue ,  Noritoshi Ito ,  Osamu Wakabayashi ,  Junichi Fujimoto ,  Masahiko Kowaka ,  Yasao Itakura

    发明人： Koichi Kajiyama ,  Kaoru Saito ,  Yasuhiro Nozue ,  Noritoshi Ito ,  Osamu Wakabayashi ,  Junichi Fujimoto ,  Masahiko Kowaka ,  Yasao Itakura

    IPC分类号： G03F7/20 ,  H01S3/106 ,  H01S3/225

    CPC分类号： G03F7/70575 ,  G03F7/70583 ,  H01S3/1062 ,  H01S3/225

    摘要： Specification of an etalon included in a multimode, narrow-band oscillation excimer laster used as a light source for light exposure in photolithography are set to satisfy a relation S.lambda.W.lambda.R.lambda. (u,v)d.lambda..gtoreq..alpha., where .alpha. is an optical transfer function necessary for light exposure of resist according to a reticle pattern, R.lambda.(u,v) is an optical transfer function of monochromatic light for an illuminating system and a reduced-projection lens, W.lambda. is a weight which is applied to a waveform of a power spectrum in an oscillation laser beam at a wavelength .lambda.. Further, an inclination angle .lambda. of the etalon in its normal direction with respect to an optical axis when the etalon is provided between the chamber and rear mirror is set to satisfy a relation .theta.>tan.sup.-1 S/2A, where S is a dimension of a beam at a beam output mirror and A is a distance between the etalon and beam output mirror, and an oscillation linewidth K is set to satisfy relations K=1/.lambda..sub.o [1/{cos (.theta.+.theta.')}-1/cos .theta.} and also K.ltoreq.x, where .lambda..sub.o is a selected wavelength when the beam is directed onto the etalon at a normal angle, .theta.' is a beam divergence angle, and x is an allowable linewidth of a light exposure system using the excimer laser as a light source.