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公开(公告)号：US20130105712A1
公开(公告)日：2013-05-02
申请号：US13805278
申请日：2012-02-21
IPC分类号： H05G2/00
摘要： A method for generating extreme ultraviolet (EUV) light that includes the steps of supplying a droplet of a target material into a chamber, diffusing the droplet by irradiating the droplet by a pre-pulse laser beam to form a diffused target, and generating a plasma by irradiating the diffused target by a main pulse laser beam wherein the plasma emits extreme ultraviolet light. The main pulse laser beam has a cross-sectional shape that is substantially coincident with a shape of the diffused target at the irradiation point.
摘要翻译： 一种用于产生极紫外（EUV）光的方法，包括以下步骤：将目标材料的液滴供应到室中，通过用预脉冲激光束照射液滴来扩散液滴，以形成扩散的靶，并产生等离子体 通过用等离子体发射极紫外光的主脉冲激光束照射漫射靶。 主脉冲激光束具有与照射点处的扩散靶的形状大致一致的截面形状。
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公开(公告)号：US09113540B2
公开(公告)日：2015-08-18
申请号：US13492067
申请日：2012-06-08
CPC分类号： H05G2/008 , H01S3/02 , H01S3/094026 , H01S3/10061 , H01S3/1106 , H01S3/131 , H01S3/1636 , H01S3/1643 , H01S3/2232 , H01S3/2316 , H01S3/2383 , H05G2/003 , H05G2/005
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号：US09265136B2
公开(公告)日：2016-02-16
申请号：US13572484
申请日：2012-08-10
CPC分类号： H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号：US20140077099A1
公开(公告)日：2014-03-20
申请号：US14114906
申请日：2012-06-07
IPC分类号： F21K2/00
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
摘要翻译： 一种系统，包括：室，激光束装置，被配置为产生要被引入到所述腔室中的激光束;激光控制器，用于激光束装置至少控制激光束的光束强度和输出定时;以及目标 供给单元，被配置为将目标材料供应到所述室中，所述目标材料被所述激光束照射以产生极紫外光。
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5.发明授权System and method for generating extreme ultraviolet light, and laser apparatus 有权用于产生极紫外光的系统和方法，以及激光装置公开(公告)号：US08669543B2
公开(公告)日：2014-03-11
申请号：US13126671
申请日：2011-03-25
IPC分类号： H05G2/00
CPC分类号： H01S3/10061 , H01S3/08054 , H01S3/08059 , H01S3/2308 , H01S3/2383 , H01S2301/20 , H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.
摘要翻译： 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。
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6.发明申请SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS 有权用于产生极光紫外线灯和激光装置的系统和方法公开(公告)号：US20120146507A1
公开(公告)日：2012-06-14
申请号：US13126671
申请日：2011-03-25
CPC分类号： H01S3/10061 , H01S3/08054 , H01S3/08059 , H01S3/2308 , H01S3/2383 , H01S2301/20 , H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.
摘要翻译： 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。
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7.发明授权Extreme ultraviolet light generation system utilizing a pre-pulse to create a diffused dome shaped target 有权极紫外光发生系统利用预脉冲来产生扩散的圆顶形靶公开(公告)号：US09072153B2
公开(公告)日：2015-06-30
申请号：US13572248
申请日：2012-08-10
IPC分类号： H05G2/00
摘要： An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
摘要翻译： 与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统 用于控制激光束的光束强度分布。
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8.发明授权公开(公告)号：US09072152B2
公开(公告)日：2015-06-30
申请号：US13523446
申请日：2012-06-14
IPC分类号： H05G2/00
摘要： An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
摘要翻译： 与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统 用于控制激光束的光束强度分布。
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公开(公告)号：US20140203194A1
公开(公告)日：2014-07-24
申请号：US14241023
申请日：2012-09-05
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , G03F7/70025 , G03F7/70033 , G03F7/70041 , G21K1/062 , H01L21/0275 , H01S3/005 , H01S3/10038 , H01S3/1075 , H01S3/115 , H01S3/1305 , H01S3/1643 , H01S3/2316 , H01S3/235 , H01S3/2375 , H01S5/4087 , H05G2/005
摘要： A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.
摘要翻译： 一种用于产生极紫外光的系统，其中室内的目标材料被照射成等离子体的激光束，包括被配置为输出第一激光束的第一激光装置，被配置为输出基座的第二激光装置 和第二激光束，以及连接到第一和第二激光装置并被配置为使第一激光束首先输出的控制器，控制器在第一激光束之后输出，并且第二激光束的能量高于 在基座之后输出的基座。
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公开(公告)号：US20140084183A1
公开(公告)日：2014-03-27
申请号：US14114902
申请日：2012-06-12
摘要： An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
摘要翻译： 与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统 用于控制激光束的光束强度分布。
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