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公开(公告)号：US20190086804A1
公开(公告)日：2019-03-21
申请号：US15923814
申请日：2018-03-16
发明人： Hiroko Nakamura , Koji Asakawa , Naoko Kihara , Reiko Yoshimura , Ko Yamada
IPC分类号： G03F7/039 , G03F7/004 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/32 , H01L21/027 , H01L21/04 , H01L29/16 , H01L29/66
摘要： A photosensitive composition of an embodiment includes: a resin containing at least one selected from polyacrylic acid, polymethacrylic acid, a cycloolefin-maleic anhydride copolymer, polycycloolefin, and a vinyl ether-maleic anhydride copolymer and having an ester bond which is caused to generate carboxylic acid by an acid or an ether bond which is caused to generate alcohol by an acid; and a photo acid generator which generates an acid by being irradiated with light, of which a wavelength is not less than 300 nm nor more than 500 nm, or KrF excimer laser light, the photo acid generator containing a substance that has a naphthalene ring or a benzene ring and in which at least one carbon atom of the naphthalene ring or the benzene ring is bonded to a bulky group.
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公开(公告)号：US08865010B2
公开(公告)日：2014-10-21
申请号：US13750086
申请日：2013-01-25
发明人： Naoko Kihara , Hiroyuki Hieda , Akiko Yuzawa , Norikatsu Sasao , Ryosuke Yamamoto , Yoshiyuki Kamata
CPC分类号： B44C1/227 , B05D1/185 , B05D3/108 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F7/0002 , G03F7/0017 , G03F7/168 , G03F7/405 , G11B5/746 , G11B5/855
摘要： In one embodiment, a pattern forming method includes: forming a functional layer having a functional group to cross-link a first polymer on a substrate; forming a diblock copolymer layer having the first polymer and a second polymer on the functional layer; self-assembling the diblock copolymer layer to form a self-assembled layer, the self-assembled layer having a first domain corresponding to the first polymer, and a plurality of second domains corresponding to the second polymer and surrounded by or interposed in the first domain; cross-linking the first polymer in the self-assembled layer with the functional group in the functional layer to form a bonding layer disposed in the self-assembled layer and bonded to the functional layer; and washing or etching the self-assembled layer to remain the bonding layer.
摘要翻译： 在一个实施方案中，图案形成方法包括：形成具有官能团的功能层以在基底上交联第一聚合物; 在功能层上形成具有第一聚合物和第二聚合物的二嵌段共聚物层; 自组装二嵌段共聚物层以形成自组装层，所述自组装层具有对应于第一聚合物的第一域，以及对应于第二聚合物的多个第二域，并被第一域包围或插入 ; 将所述自组装层中的所述第一聚合物与所述功能层中的官能团交联，以形成设置在所述自组装层中并结合到所述功能层的接合层; 并且洗涤或蚀刻自组装层以保持结合层。
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公开(公告)号：US09835947B2
公开(公告)日：2017-12-05
申请号：US15256990
申请日：2016-09-06
发明人： Yuriko Seino , Naoko Kihara
IPC分类号： G03F7/004 , G03F7/11 , G03F7/16 , C09D153/00 , C09D183/10 , C09D133/12 , G03F7/00 , G03F7/40 , H01L21/311 , H01L21/306 , H01L21/02 , H01L21/027 , B81C1/00 , B82Y40/00 , B82Y30/00 , C08G77/44
CPC分类号： G03F7/165 , B81C1/00031 , B81C2201/0149 , B82Y30/00 , B82Y40/00 , C08G77/44 , C09D133/12 , C09D153/00 , C09D183/10 , G03F7/0002 , G03F7/002 , G03F7/0035 , G03F7/11 , G03F7/40 , H01L21/02118 , H01L21/0275 , H01L21/30604 , H01L21/31138 , H01L21/31144
摘要： A self-organization material according to an embodiment includes a block copolymer and a top coat material. The block copolymer contains a first block and a second block. The second block has a surface free energy higher than that of the first block. The top coat material contains a first portion having a surface free energy higher than that of the first block and lower than that of the second block, and a second portion having a surface free energy lower than that of the first block. The first portion is one of a homopolymer miscible with both the first block and the second block, and a random copolymer having a repeating unit of the first block and a repeating unit of the second block. The second portion is one of an organic siloxane-containing polymer and a fluorine-containing polymer.
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公开(公告)号：US08974682B2
公开(公告)日：2015-03-10
申请号：US13930262
申请日：2013-06-28
CPC分类号： G03F7/343 , G03F7/0002
摘要： A self-assembled pattern forming method in an embodiment includes: forming a guide pattern on a substrate; forming a layer of a first polymer; filling a first block copolymer; and phase-separating the first block copolymer. The guide pattern includes a first recessed part having a depth T and a diameter D smaller than the depth T, and a second recessed part having a width larger than double of the diameter D. The first block copolymer has the first polymer and a second polymer which are substantially the same in volume fraction. By phase-separating the first block copolymer, a cylinder structure and a lamellar structure are obtained.
摘要翻译： 实施方式中的自组装图案形成方法包括：在基板上形成引导图案; 形成第一聚合物层; 填充第一嵌段共聚物; 并分相第一嵌段共聚物。 引导图案包括具有深度T和直径D小于深度T的第一凹陷部分，以及具有大于直径D的两倍的宽度的第二凹陷部分。第一嵌段共聚物具有第一聚合物和第二聚合物 其体积分数基本相同。 通过相分离第一嵌段共聚物，获得圆筒结构和层状结构。
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公开(公告)号：US20170073542A1
公开(公告)日：2017-03-16
申请号：US15256990
申请日：2016-09-06
发明人： Yuriko SEINO , Naoko Kihara
IPC分类号： C09D153/00 , C08J7/12 , C09D133/12 , C09D183/10
CPC分类号： G03F7/165 , B81C1/00031 , B81C2201/0149 , B82Y30/00 , B82Y40/00 , C08G77/44 , C09D133/12 , C09D153/00 , C09D183/10 , G03F7/0002 , G03F7/002 , G03F7/0035 , G03F7/11 , G03F7/40 , H01L21/02118 , H01L21/0275 , H01L21/30604 , H01L21/31138 , H01L21/31144
摘要： A self-organization material according to an embodiment includes a block copolymer and a top coat material. The block copolymer contains a first block and a second block. The second block has a surface free energy higher than that of the first block. The top coat material contains a first portion having a surface free energy higher than that of the first block and lower than that of the second block, and a second portion having a surface free energy lower than that of the first block. The first portion is one of a homopolymer miscible with both the first block and the second block, and a random copolymer having a repeating unit of the first block and a repeating unit of the second block. The second portion is one of an organic siloxane-containing polymer and a fluorine-containing polymer.
摘要翻译： 根据实施方案的自组织材料包括嵌段共聚物和顶涂层材料。 嵌段共聚物含有第一嵌段和第二嵌段。 第二块具有比第一块高的表面自由能。 顶涂层材料包含第一部分，其表面自由能高于第一块的表面自由能，并且低于第二块的表面自由能，并且第二部分具有比第一块低的表面自由能。 第一部分是与第一嵌段和第二嵌段都可混合的均聚物之一，以及具有第一嵌段的重复单元和第二嵌段的重复单元的无规共聚物之一。 第二部分是含有机硅氧烷的聚合物和含氟聚合物之一。
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公开(公告)号：US09269387B2
公开(公告)日：2016-02-23
申请号：US14576001
申请日：2014-12-18
发明人： Akira Kikitsu , Naoko Kihara , Yoshiyuki Kamata , Hiroyuki Hieda
摘要： In one embodiment, there are provided: a substrate; a data area disposed on the substrate and having a plurality of first magnetic dots arrayed in lines in mutually different first, second, and third directions; and a boundary magnetic part having a plurality of first magnetic portions arrayed in a line in the third direction and each having a length longer than that of the first magnetic dot in the third direction, and a second magnetic dot disposed between the first magnetic portions and disposed on extensions in the first and second directions of the first magnetic dots, and disposed along with the data area on the substrate.
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公开(公告)号：US08958177B2
公开(公告)日：2015-02-17
申请号：US13912519
申请日：2013-06-07
发明人： Akira Kikitsu , Naoko Kihara , Yoshiyuki Kamata , Hiroyuki Hieda
摘要： In one embodiment, there are provided: a substrate; a data area disposed on the substrate and having a plurality of first magnetic dots arrayed in lines in mutually different first, second, and third directions; and a boundary magnetic part having a plurality of first magnetic portions arrayed in a line in the third direction and each having a length longer than that of the first magnetic dot in the third direction, and a second magnetic dot disposed between the first magnetic portions and disposed on extensions in the first and second directions of the first magnetic dots, and disposed along with the data area on the substrate.
摘要翻译： 在一个实施例中，提供：衬底; 数据区域，设置在所述基板上，并且具有在相互不同的第一，第二和第三方向上以行排列的多个第一磁性点; 以及边界磁性部分，具有多个第一磁性部分，沿着第三方向排成一行，并且每个第一磁性部分的长度都大于第三方向上的第一磁性点的长度;以及第二磁性点，设置在第一磁性部分和 设置在第一磁性点的第一和第二方向上的延伸部上，并与数据区域一起设置在基板上。
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公开(公告)号：US09050752B2
公开(公告)日：2015-06-09
申请号：US14083592
申请日：2013-11-19
CPC分类号： B29C59/026 , G03F7/0002 , G03F7/027 , G03F7/038
摘要： An imprint method according to this embodiment includes preparing a mold having a recessed portion, filling the recessed portion with a mold non-reactive material, pressing the mold against a resist which is applied on a base material, curing the resist in a state that the mold is pressed, and separating the mold from the base material. The mold non-reactive material is a material which does not chemically react with a material of the mold. By curing of the resist, the resist and the mold non-reactive material are coupled. When the mold is separated from the base material, the resist and the mold non-reactive material are left on the base material.
摘要翻译： 根据本实施例的压印方法包括制备具有凹陷部分的模具，用模具非反应性材料填充凹部，将模具压在施加在基材上的抗蚀剂上，使该抗蚀剂在 模具被压制，并将模具与基材分离。 模具非反应性材料是不与模具的材料发生化学反应的材料。 通过固化抗蚀剂，抗蚀剂和模具非反应性材料被连接。 当模具与基材分离时，抗蚀剂和模具非反应性材料留在基材上。
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9.发明授权公开(公告)号：US09281480B2
公开(公告)日：2016-03-08
申请号：US14637558
申请日：2015-03-04
发明人： Yuriko Seino , Naoko Kihara
IPC分类号： H01L51/00
CPC分类号： H01L51/0012 , H01L51/0017
摘要： In one embodiment, a method for forming pattern includes forming a guide layer on a substrate, forming a copolymer layer of a high-molecular block copolymer on the guide layer; and forming a phase-separation structure with a phase-separation cycle d by self-assembling the copolymer layer. The high-molecular block copolymer includes a first and a second polymer. The guide layer includes a first and a second region disposed on the substrate. Widths of the first and second region respectively are approximately (d/2)×n and (d/2)×m. Both of the first and second region are to be pinned with none of the first and second polymer. Surface energies of the first and second region are different from one another. Integers n and m are odd numbers. Value d is a phase-separation cycle of the high-molecular block copolymer.
摘要翻译： 在一个实施例中，形成图案的方法包括在基底上形成引导层，在引导层上形成高分子嵌段共聚物的共聚物层; 并通过自组装共聚物层形成具有相分离循环d的相分离结构。 高分子嵌段共聚物包括第一和第二聚合物。 引导层包括设置在基板上的第一和第二区域。 第一和第二区域的宽度分别为大约（d / 2）×n和（d / 2）×m。 第一和第二区域均不会被第一和第二聚合物所固定。 第一和第二区域的表面能量彼此不同。 整数n和m是奇数。 值d是高分子嵌段共聚物的相分离循环。
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