公开(公告)号：US09347824B2

公开(公告)日：2016-05-24

申请号：US14527034

申请日：2014-10-29

Applicant: KLA-Tencor Corporation

Inventor： Mark A. McCord ,  Joseph A. DiRegolo ,  Michael R. Gluszczak

IPC: G01J1/04 ,  G01J3/28 ,  G01J3/02 ,  G01J3/50 ,  G01J1/02 ,  G01J1/42

CPC classification number: G01J1/0407 ,  G01J1/0214 ,  G01J3/0251 ,  G01J3/0262 ,  G01J3/28 ,  G01J3/505 ,  G01J2001/0481 ,  G01J2001/4252

Abstract: Systems and methods for accurately measuring the luminous flux and color (spectra) from light-emitting devices are disclosed. An integrating sphere may be utilized to directly receive a first portion of light emitted by a light-emitting device through an opening defined on the integrating sphere. A light collector may be utilized to collect a second portion of light emitted by the light-emitting device and direct the second portion of light into the integrating sphere through the opening defined on the integrating sphere. A spectrometer may be utilized to measure at least one property of the first portion and the second portion of light received by the integrating sphere.

Abstract translation: 公开了用于准确测量发光器件的光通量和颜色（光谱）的系统和方法。 可以使用积分球直接接收由发光装置通过限定在积分球上的开口发射的光的第一部分。 可以利用光收集器来收集由发光装置发射的光的第二部分，并将第二部分的光通过限定在积分球上的开口引导到积分球。 可以使用光谱仪来测量由积分球接收的第一部分和第二部分光的至少一个性质。

公开(公告)号：US20160011110A1

公开(公告)日：2016-01-14

申请号：US14686308

申请日：2015-04-14

Applicant: KLA-Tencor Corporation

Inventor： Shinichi Kojima ,  Hamada Wahba ,  Michael R. Gluszczak ,  Joseph A. DiRegolo

IPC: G01N21/64 ,  H01J37/22 ,  H01J37/244

CPC classification number: G01N21/64 ,  H01J37/226 ,  H01J37/244 ,  H01J2237/043 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/24578

Abstract: An electron beam detection apparatus includes a first aperture element including a first set of apertures. The apparatus includes a second aperture element including a second set of apertures. The second set of apertures is arranged in a pattern corresponding with the pattern of the first plurality of apertures. The detection apparatus includes an electron-photon conversion element configured to receive electrons of the electron beam transmitted through the first and second aperture elements. The electron-photon conversion element is configured to generate photons in response to the received electrons. The detection apparatus includes an optical assembly including one or more optical elements. The detection apparatus includes a detector assembly. The optical elements of the optical assembly are configured to direct the generated photons from the electron-photon conversion system to the detector assembly.

Abstract translation: 电子束检测装置包括包括第一组孔的第一孔元件。 该装置包括第二孔元件，其包括第二组孔。 第二组孔被布置成与第一多个孔的图案对应的图案。 检测装置包括电子 - 光子转换元件，其被配置为接收通过第一和第二孔元件传输的电子束的电子。 电子 - 光子转换元件被配置为响应于所接收的电子产生光子。 检测装置包括包括一个或多个光学元件的光学组件。 检测装置包括检测器组件。 光学组件的光学元件被配置为将所产生的光子从电子 - 光子转换系统引导到检测器组件。

公开(公告)号：US20150124253A1

公开(公告)日：2015-05-07

申请号：US14527034

申请日：2014-10-29

Applicant: KLA-Tencor Corporation

Inventor： Mark A. McCord ,  Joseph A. DiRegolo ,  Michael R. Gluszczak

IPC: G01J1/04 ,  G01J3/28

CPC classification number: G01J1/0407 ,  G01J1/0214 ,  G01J3/0251 ,  G01J3/0262 ,  G01J3/28 ,  G01J3/505 ,  G01J2001/0481 ,  G01J2001/4252

Abstract: Systems and methods for accurately measuring the luminous flux and color (spectra) from light-emitting devices are disclosed. An integrating sphere may be utilized to directly receive a first portion of light emitted by a light-emitting device through an opening defined on the integrating sphere. A light collector may be utilized to collect a second portion of light emitted by the light-emitting device and direct the second portion of light into the integrating sphere through the opening defined on the integrating sphere. A spectrometer may be utilized to measure at least one property of the first portion and the second portion of light received by the integrating sphere.

Abstract translation: 公开了用于准确测量发光器件的光通量和颜色（光谱）的系统和方法。 可以使用积分球直接接收由发光装置通过限定在积分球上的开口发射的光的第一部分。 可以利用光收集器来收集由发光装置发射的光的第二部分，并将第二部分的光通过限定在积分球上的开口引导到积分球。 可以使用光谱仪来测量由积分球接收的第一部分和第二部分光的至少一个性质。

公开(公告)号：US08724115B2

公开(公告)日：2014-05-13

申请号：US13914351

申请日：2013-06-10

Applicant: KLA-Tencor Corporation

Inventor： Upendra Ummethala ,  Layton Hale ,  Josh Clyne ,  Samir Nayfeh ,  Mark Williams ,  Joseph A. DiRegolo ,  Andrew Wilson

IPC: G01B11/02

CPC classification number: G01B11/02 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/14 ,  G01B21/16 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70816 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3174 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/30433 ,  H01J2237/30438

Abstract: A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.

Abstract translation: 适用于REBL的舞台计量包括配置成测量短行晶片扫描台的位置和旋转的干涉仪台计量系统，其中干涉仪计量系统包括用于每个测量轴的两个或更多个干涉仪，其中第一干涉仪镜是 设置在短冲程晶片扫描台的第一表面上，第二干涉仪镜设置在短行晶片扫描台的第二表面上;以及控制系统，被配置为使用两个第二干涉仪来确定第一干涉仪镜的形状误差 或更多的来自与第一干涉仪镜相关联的两个或更多个干涉仪的干涉仪测量，以及使用来自与第二干涉仪镜相关联的两个或更多个干涉仪的两个或更多个干涉仪测量的第二干涉仪镜的形状误差。

公开(公告)号：US09030661B1

公开(公告)日：2015-05-12

申请号：US14161549

申请日：2014-01-22

Applicant: KLA-Tencor Corporation

Inventor： Walter D. Mieher ,  Michael R. Gluszczak ,  Joseph A. DiRegolo

IPC: G01B11/00 ,  G01B11/14 ,  G03F9/00

CPC classification number: G03F9/7069 ,  G01B11/272 ,  G03F9/7003 ,  G03F9/7046 ,  G03F9/7088

Abstract: One embodiment relates to an apparatus for alignment measurement. A laser source generates an incident laser beam which is directed to a two-dimensional target grating on a target substrate such that multiple diffracted beams are created. A beam splitter transmits a first plurality of the multiple diffracted beams onto a first optical path and directs a second plurality of the multiple diffracted beams onto a second optical path. Each of the two optical paths includes a reference grating and a detector. Another embodiment relates to a method of measuring alignment of a target substrate. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及用于对准测量的装置。 激光源产生入射激光束，其被引导到目标衬底上的二维目标光栅，使得产生多个衍射光束。 分束器将第一多个多个衍射光束发射到第一光路上，并将第二多个衍射光束引导到第二光路上。 两个光路中的每一个包括参考光栅和检测器。 另一实施例涉及一种测量目标衬底对准的方法。 还公开了其它实施例，方面和特征。

公开(公告)号：US09778186B2

公开(公告)日：2017-10-03

申请号：US14686308

申请日：2015-04-14

Applicant: KLA-Tencor Corporation

Inventor： Shinichi Kojima ,  Hamada Wahba ,  Michael R. Gluszczak ,  Joseph A. DiRegolo

IPC: H01J37/22 ,  G01N21/64 ,  H01J37/244

CPC classification number: G01N21/64 ,  H01J37/226 ,  H01J37/244 ,  H01J2237/043 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/24578

Abstract: An electron beam detection apparatus includes a first aperture element including a first set of apertures. The apparatus includes a second aperture element including a second set of apertures. The second set of apertures is arranged in a pattern corresponding with the pattern of the first plurality of apertures. The detection apparatus includes an electron-photon conversion element configured to receive electrons of the electron beam transmitted through the first and second aperture elements. The electron-photon conversion element is configured to generate photons in response to the received electrons. The detection apparatus includes an optical assembly including one or more optical elements. The detection apparatus includes a detector assembly. The optical elements of the optical assembly are configured to direct the generated photons from the electron-photon conversion system to the detector assembly.

公开(公告)号：US20130342827A1

公开(公告)日：2013-12-26

申请号：US13914351

申请日：2013-06-10

Applicant: KLA-Tencor Corporation

Inventor： Upendra Ummethala ,  Layton Hale ,  Josh Clyne ,  Samir Nayfeh ,  Mark Williams ,  Joseph A. DiRegolo ,  Andrew Wilson

IPC: G01B11/14 ,  G01B21/16

CPC classification number: G01B11/02 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/14 ,  G01B21/16 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70816 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3174 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/30433 ,  H01J2237/30438

Abstract: A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.

Abstract translation: 适用于REBL的舞台计量包括配置成测量短行晶片扫描台的位置和旋转的干涉仪台计量系统，其中干涉仪计量系统包括用于每个测量轴的两个或更多个干涉仪，其中第一干涉仪镜是 设置在短冲程晶片扫描台的第一表面上，第二干涉仪镜设置在短行晶片扫描台的第二表面上;以及控制系统，被配置为使用两个第二干涉仪来确定第一干涉仪镜的形状误差 或更多的来自与第一干涉仪镜相关联的两个或更多个干涉仪的干涉仪测量，以及使用来自与第二干涉仪镜相关联的两个或更多个干涉仪的两个或更多个干涉仪测量的第二干涉仪镜的形状误差。