公开(公告)号：US08481969B2

公开(公告)日：2013-07-09

申请号：US13150822

申请日：2011-06-01

申请人： Kan Ota ,  William Davis Lee

发明人： Kan Ota ,  William Davis Lee

IPC分类号： H01J37/18 ,  G21K5/00

CPC分类号： H01J37/3171 ,  H01J37/18 ,  H01J37/20 ,  H01J2237/002 ,  H01J2237/166 ,  H01J2237/2001 ,  H01J2237/2005 ,  H01J2237/20278 ,  H01J2237/31701

摘要： A method for warming a rotational interface in an ion implantation environment provides a scan arm configured to rotate about a first axis and an end effector coupled to the scan arm via a motor to selectively secure a workpiece. The end effector is configured to rotate about a second axis having a bearing and a seal associated with the second axis and motor. The motor is activated, and the rotation of motor is reversed after a predetermined time or when the motor faults due to a rotation the end effector about the second axis. A determination is made as to whether the rotation of the end effector about the second axis is acceptable, and the scan arm is reciprocated about the first axis when the rotation of the end effector is unacceptable, wherein inertia of the end effector causes a rotation of the end effector about the second axis.

摘要翻译： 用于在离子注入环境中加热旋转界面的方法提供了扫描臂，该扫描臂被配置为通过电动机围绕第一轴线和与扫描臂耦合的端部执行器旋转以选择性地固定工件。 末端执行器构造成围绕具有与第二轴和马达相关联的轴承和密封件的第二轴线旋转。 电动机被激活，并且电动机的旋转在预定时间之后或当电动机由于端部执行器围绕第二轴线的旋转而故障时被反转。 确定末端执行器围绕第二轴线的旋转是否可接受，并且当端部执行器的旋转是不可接受的时，扫描臂围绕第一轴线往复运动，其中末端执行器的惯性导致旋转 末端执行器围绕第二轴。

公开(公告)号：US20110297845A1

公开(公告)日：2011-12-08

申请号：US13150822

申请日：2011-06-01

申请人： Kan Ota ,  William Davis Lee

发明人： Kan Ota ,  William Davis Lee

IPC分类号： G21K5/00

CPC分类号： H01J37/3171 ,  H01J37/18 ,  H01J37/20 ,  H01J2237/002 ,  H01J2237/166 ,  H01J2237/2001 ,  H01J2237/2005 ,  H01J2237/20278 ,  H01J2237/31701

摘要： A method for warming a rotational interface in an ion implantation environment provides a scan arm configured to rotate about a first axis and an end effector coupled to the scan arm via a motor to selectively secure a workpiece. The end effector is configured to rotate about a second axis having a bearing and a seal associated with the second axis and motor. The motor is activated, and the rotation of motor is reversed after a predetermined time or when the motor faults due to a rotation the end effector about the second axis. A determination is made as to whether the rotation of the end effector about the second axis is acceptable, and the scan arm is reciprocated about the first axis when the rotation of the end effector is unacceptable, wherein inertia of the end effector causes a rotation of the end effector about the second axis.

摘要翻译： 用于在离子注入环境中加热旋转界面的方法提供了扫描臂，该扫描臂被配置为通过电动机围绕第一轴线和与扫描臂耦合的端部执行器旋转以选择性地固定工件。 末端执行器构造成围绕具有与第二轴和马达相关联的轴承和密封件的第二轴线旋转。 电动机被激活，并且电动机的旋转在预定时间之后或当电动机由于端部执行器围绕第二轴线的旋转而故障时被反转。 确定端部执行器围绕第二轴线的旋转是否可接受，并且当端部执行器的旋转不可接受时，扫描臂围绕第一轴线往复运动，其中末端执行器的惯性导致旋转 末端执行器围绕第二轴。

公开(公告)号：US20050194549A1

公开(公告)日：2005-09-08

申请号：US10794009

申请日：2004-03-05

申请人： Kan Ota ,  Mehran Asdigha

发明人： Kan Ota ,  Mehran Asdigha

IPC分类号： H01L21/677 ,  H01J37/317 ,  H01J37/18 ,  H01J37/20

CPC分类号： H01L21/67742 ,  H01L21/67745

摘要： A work piece transfer apparatus for use with an ion beam implanter for treating a work piece at sub-atmospheric pressure. The work piece transfer apparatus includes an evacuable load lock system in fluid communication with an interior region the implantation chamber interior region. The load lock system includes a support surface for supporting the work piece with an opening aligned with the work piece. The work piece transfer apparatus further includes a work piece support within the implantation chamber having a pedestal supported by a linkage with two degrees of freedom. The linkage moves the pedestal transversely through the load lock support surface opening to pick up the work piece from the support surface prior to treatment. The pedestal holds the work piece in position in the implantation chamber for treatment. The linkage then moves the pedestal transversely through the load lock support surface opening to deposit the work piece on the support surface subsequent to treatment.

摘要翻译： 一种与离子束注入机一起使用的工件传送装置，用于在大气压下处理工件。 工件传送装置包括与植入室内部区域的内部区域流体连通的可抽空的装载锁定系统。 负载锁定系统包括用于支撑具有与工件对准的开口的工件的支撑表面。 工件传送装置还包括在植入室内的工件支撑件，其具有由具有两个自由度的连杆支撑的基座。 连杆将基座横向移动通过负载锁定支撑表面开口，以在处理之前从支撑表面拾起工件。 基座将工件保持在植入室中的适当位置进行处理。 然后，联动装置将基座横向移动通过负载锁定支撑表面开口，以在处理之后将工件沉积在支撑表面上。

公开(公告)号：US20090321631A1

公开(公告)日：2009-12-31

申请号：US12487229

申请日：2009-06-18

申请人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

发明人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

IPC分类号： H01J49/26

CPC分类号： H01J37/3171 ,  F16M11/123 ,  F16M11/18 ,  H01J37/20 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20278

摘要： An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The robotic architecture has a plurality of motors operatively coupled to the end station, each having a rotational shaft. At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly respectively associated therewith, wherein each linkage assembly respectively has a crank arm and a strut. The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint, and pivotally coupled to the end effector at a second joint.

摘要翻译： 提供了一种配置成产生离子束的离子注入系统，其中端站具有至少四个自由度的机器人结构。 可操作地耦合到机器人架构的末端执行器选择性地夹持和平移工件通过离子束。 机器人结构具有可操作地联接到终端站的多个电动机，每个电动机具有旋转轴。 每个旋转轴的至少一部分通常位于终端站内，并且多个电动机中的每一个具有分别与其相关联的联动组件，其中每个连杆组件分别具有曲柄臂和支柱。 每个连杆组件的曲柄臂固定地联接到相应的旋转轴，并且每个连杆组件的支柱在第一关节处枢转地联接到相应的曲柄臂，并且在第二关节处可枢转地联接到末端执行器。

公开(公告)号：US20050247891A1

公开(公告)日：2005-11-10

申请号：US10840186

申请日：2004-05-06

申请人： Mehran Asdigha ,  Kurt Cleveland ,  Jay Krishnasamy ,  Kan Ota

发明人： Mehran Asdigha ,  Kurt Cleveland ,  Jay Krishnasamy ,  Kan Ota

IPC分类号： H01L21/00 ,  H01L21/687 ,  H01J37/20

CPC分类号： H01L21/68764 ,  H01J37/3171 ,  H01J2237/20228 ,  H01L21/67069

摘要： The present invention is directed to a scanning apparatus and method for processing a substrate, wherein the scanning apparatus comprises a first link and a second link rigidly coupled to one another at a first joint, wherein the first link and second link are rotatably coupled to a base portion by the first joint, therein defining a first axis. An end effector, whereon the substrate resides, is coupled to the first link. The second link is coupled to a first actuator via at least second joint. The first actuator is operable to translate the second joint with respect to the base portion, therein rotating the first and second links about the first axis and translating the substrate along a first scan path in an oscillatory manner. A controller is further operable to maintain a generally constant translational velocity of the end effector within a predetermined scanning range.

摘要翻译： 本发明涉及一种用于处理基板的扫描装置和方法，其中扫描装置包括第一连杆和在第一关节处彼此刚性地联接的第二连杆，其中第一连杆和第二连杆可旋转地连接到 其中所述第一接头限定第一轴线。 衬底所在的末端执行器被耦合到第一连杆。 第二连杆通过至少第二接头联接到第一致动器。 第一致动器可操作以相对于基部部分平移第二接头，其中使第一和第二连杆围绕第一轴线旋转，并以振荡方式沿着第一扫描路径平移基板。 控制器还可操作以将末端执行器的大致恒定的平移速度保持在预定扫描范围内。

公开(公告)号：US08227768B2

公开(公告)日：2012-07-24

申请号：US12487229

申请日：2009-06-18

申请人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

发明人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

IPC分类号： G21K5/04

CPC分类号： H01J37/3171 ,  F16M11/123 ,  F16M11/18 ,  H01J37/20 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20278

摘要： An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The robotic architecture has a plurality of motors operatively coupled to the end station, each having a rotational shaft. At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly respectively associated therewith, wherein each linkage assembly respectively has a crank arm and a strut. The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint, and pivotally coupled to the end effector at a second joint.

摘要翻译： 提供了一种配置成产生离子束的离子注入系统，其中端站具有至少四个自由度的机器人结构。 可操作地耦合到机器人架构的末端执行器选择性地夹持和平移工件通过离子束。 机器人结构具有可操作地联接到终端站的多个电动机，每个电动机具有旋转轴。 每个旋转轴的至少一部分通常位于终端站内，并且多个电动机中的每一个具有分别与其相关联的联动组件，其中每个连杆组件分别具有曲柄臂和支柱。 每个连杆组件的曲柄臂固定地联接到相应的旋转轴，并且每个连杆组件的支柱在第一关节处枢转地联接到相应的曲柄臂，并且在第二关节处可枢转地联接到末端执行器。

公开(公告)号：US20100159153A1

公开(公告)日：2010-06-24

申请号：US12340936

申请日：2008-12-22

申请人： Kan Ota ,  Stanley W. Stone ,  Steve T. Drummond

发明人： Kan Ota ,  Stanley W. Stone ,  Steve T. Drummond

IPC分类号： C23C14/50

CPC分类号： C23C14/48 ,  C23C14/564 ,  H01J37/3171 ,  H01J2237/022

摘要： An end station for an ion implantation system is provided, wherein the end station comprises a process chamber configured to receive an ion beam. A load lock chamber is coupled to the process chamber and configured to selectively introduce a workpiece into the process chamber. An electrostatic chuck within the process chamber is configured to selectively translate through the ion beam, and a shield within the process chamber is configured to selectively cover at least a portion of a clamping surface of the electrostatic chuck to protect the clamping surface from one or more contaminants associated with the ion beam. A docking station within the process chamber selectively retains the shield, and a transfer mechanism is configured to transfer a workpiece between the load lock chamber and the electrostatic chuck, and to transfer the shield between the docking station and the clamping surface of the electrostatic chuck.

摘要翻译： 提供了一种用于离子注入系统的终端站，其中终端站包括被配置为接收离子束的处理室。 负载锁定室联接到处理室并且被配置为选择性地将工件引入到处理室中。 处理室内的静电卡盘被配置成选择性地平移穿过离子束，并且处理室内的屏蔽被配置为选择性地覆盖静电卡盘的夹紧表面的至少一部分，以保护夹紧表面免受一个或多个 与离子束相关的污染物。 处理室内的对接站选择性地保持屏蔽，并且传送机构被配置为在加载锁定室和静电卡盘之间传送工件，并且在对接站和静电卡盘的夹紧表面之间传送屏蔽。

公开(公告)号：US09611540B2

公开(公告)日：2017-04-04

申请号：US12340936

申请日：2008-12-22

申请人： Kan Ota ,  Stanley W. Stone ,  Steve T. Drummond

发明人： Kan Ota ,  Stanley W. Stone ,  Steve T. Drummond

IPC分类号： C23C14/50 ,  C23C14/48 ,  C23C14/56 ,  H01J37/317

CPC分类号： C23C14/48 ,  C23C14/564 ,  H01J37/3171 ,  H01J2237/022

摘要： An end station for an ion implantation system is provided, wherein the end station comprises a process chamber configured to receive an ion beam. A load lock chamber is coupled to the process chamber and configured to selectively introduce a workpiece into the process chamber. An electrostatic chuck within the process chamber is configured to selectively translate through the ion beam, and a shield within the process chamber is configured to selectively cover at least a portion of a clamping surface of the electrostatic chuck to protect the clamping surface from one or more contaminants associated with the ion beam. A docking station within the process chamber selectively retains the shield, and a transfer mechanism is configured to transfer a workpiece between the load lock chamber and the electrostatic chuck, and to transfer the shield between the docking station and the clamping surface of the electrostatic chuck.

公开(公告)号：US07924159B2

公开(公告)日：2011-04-12

申请号：US12022300

申请日：2008-01-30

申请人： Kan Ota ,  Michael Chen ,  David K. Bernhardt

发明人： Kan Ota ,  Michael Chen ,  David K. Bernhardt

IPC分类号： G08B13/14

CPC分类号： G08B13/2402

摘要： The present invention involves a system and method of remotely detecting the presence of a wafer comprising, a passive RFID circuit, wherein the RFID circuit is attached to an end of a transfer arm located inside a vacuum chamber of an ion implantation system, a reader located outside the vacuum chamber, and wherein the RFID tag provides an indication relating to whether or not a wafer is secured by the transfer arm.

摘要翻译： 本发明涉及远程检测晶片的存在的系统和方法，其包括无源RFID电路，其中RFID电路附接到位于离子注入系统的真空室内的传递臂的端部，位于 在真空室外部，并且其中RFID标签提供与转印臂是否固定晶片有关的指示。

公开(公告)号：US06987272B2

公开(公告)日：2006-01-17

申请号：US10794009

申请日：2004-03-05

申请人： Kan Ota ,  Mehran Asdigha

发明人： Kan Ota ,  Mehran Asdigha

IPC分类号： H01J37/317

CPC分类号： H01L21/67742 ,  H01L21/67745

摘要： A work piece transfer apparatus for use with an ion beam implanter for treating a work piece at sub-atmospheric pressure. The work piece transfer apparatus includes an evacuable load lock system in fluid communication with an interior region the implantation chamber interior region. The load lock system includes a support surface for supporting the work piece with an opening aligned with the work piece. The work piece transfer apparatus further includes a work piece support within the implantation chamber having a pedestal supported by a linkage with two degrees of freedom. The linkage moves the pedestal transversely through the load lock support surface opening to pick up the work piece from the support surface prior to treatment. The pedestal holds the work piece in position in the implantation chamber for treatment. The linkage then moves the pedestal transversely through the load lock support surface opening to deposit the work piece on the support surface subsequent to treatment.

摘要翻译： 一种与离子束注入机一起使用的工件传送装置，用于在大气压下处理工件。 工件传送装置包括与植入室内部区域的内部区域流体连通的可抽空的装载锁定系统。 负载锁定系统包括用于支撑具有与工件对准的开口的工件的支撑表面。 工件传送装置还包括在植入室内的工件支撑件，其具有由具有两个自由度的连杆支撑的基座。 连杆将基座横向移动通过负载锁定支撑表面开口，以在处理之前从支撑表面拾起工件。 基座将工件保持在植入室中的适当位置进行处理。 然后，联动装置将基座横向移动通过负载锁定支撑表面开口，以在处理之后将工件沉积在支撑表面上。