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    LOW-INERTIA MULTI-AXIS MULTI-DIRECTIONAL MECHANICALLY SCANNED ION IMPLANTATION SYSTEM
    1.
    发明申请
    LOW-INERTIA MULTI-AXIS MULTI-DIRECTIONAL MECHANICALLY SCANNED ION IMPLANTATION SYSTEM 有权
    低精度多轴多方向机械扫描离子植入系统

    公开(公告)号：US20090321631A1

    公开(公告)日：2009-12-31

    申请号：US12487229

    申请日：2009-06-18

    申请人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

    发明人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

    IPC分类号： H01J49/26

    CPC分类号： H01J37/3171 ,  F16M11/123 ,  F16M11/18 ,  H01J37/20 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20278

    摘要： An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The robotic architecture has a plurality of motors operatively coupled to the end station, each having a rotational shaft. At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly respectively associated therewith, wherein each linkage assembly respectively has a crank arm and a strut. The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint, and pivotally coupled to the end effector at a second joint.

    摘要翻译： 提供了一种配置成产生离子束的离子注入系统，其中端站具有至少四个自由度的机器人结构。 可操作地耦合到机器人架构的末端执行器选择性地夹持和平移工件通过离子束。 机器人结构具有可操作地联接到终端站的多个电动机，每个电动机具有旋转轴。 每个旋转轴的至少一部分通常位于终端站内，并且多个电动机中的每一个具有分别与其相关联的联动组件，其中每个连杆组件分别具有曲柄臂和支柱。 每个连杆组件的曲柄臂固定地联接到相应的旋转轴，并且每个连杆组件的支柱在第一关节处枢转地联接到相应的曲柄臂，并且在第二关节处可枢转地联接到末端执行器。

    Low-inertia multi-axis multi-directional mechanically scanned ion implantation system
    2.
    发明授权
    Low-inertia multi-axis multi-directional mechanically scanned ion implantation system 有权
    低惯性多轴多向机械扫描离子注入系统

    公开(公告)号：US08227768B2

    公开(公告)日：2012-07-24

    申请号：US12487229

    申请日：2009-06-18

    申请人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

    发明人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

    IPC分类号： G21K5/04

    CPC分类号： H01J37/3171 ,  F16M11/123 ,  F16M11/18 ,  H01J37/20 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20278

    摘要： An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The robotic architecture has a plurality of motors operatively coupled to the end station, each having a rotational shaft. At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly respectively associated therewith, wherein each linkage assembly respectively has a crank arm and a strut. The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint, and pivotally coupled to the end effector at a second joint.

    摘要翻译： 提供了一种配置成产生离子束的离子注入系统，其中端站具有至少四个自由度的机器人结构。 可操作地耦合到机器人架构的末端执行器选择性地夹持和平移工件通过离子束。 机器人结构具有可操作地联接到终端站的多个电动机，每个电动机具有旋转轴。 每个旋转轴的至少一部分通常位于终端站内，并且多个电动机中的每一个具有分别与其相关联的联动组件，其中每个连杆组件分别具有曲柄臂和支柱。 每个连杆组件的曲柄臂固定地联接到相应的旋转轴，并且每个连杆组件的支柱在第一关节处枢转地联接到相应的曲柄臂，并且在第二关节处可枢转地联接到末端执行器。

    Post-decel magnetic energy filter for ion implantation systems
    6.
    发明授权
    Post-decel magnetic energy filter for ion implantation systems 有权
    用于离子注入系统的减速磁能过滤器

    公开(公告)号：US08124946B2

    公开(公告)日：2012-02-28

    申请号：US12477631

    申请日：2009-06-03

    申请人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

    发明人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

    IPC分类号： H01J37/317 ,  H01J49/30 ,  H01J49/42

    CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1523 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/24528 ,  H01J2237/31705

    摘要： A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.

    摘要翻译： 提供了一种用于在离子注入工件期间对离子束进行磁过滤的系统和方法，其中离子从离子源发射并且将离子加速离开离子源以形成离子束。 离子束通过质量分析器进行质量分析，其中选择离子。 一旦离子束被质量分析，离子束然后通过减速器减速，并且离子束进一步对减速度下游的离子束进行磁过滤。 磁滤波由四极磁能滤波器提供，其中形成磁场以截取离开减速器的离子束中的离子，以选择性地过滤不需要的离子和快速中性粒子。

    Ion beam diagnostics
    8.
    发明申请
    Ion beam diagnostics 失效
    离子束诊断

    公开(公告)号：US20080142727A1

    公开(公告)日：2008-06-19

    申请号：US11589156

    申请日：2006-10-30

    申请人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

    发明人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

    IPC分类号： G01K1/08

    CPC分类号： H01J37/3171 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578

    摘要： This invention relates to a method of measuring a property of an ion beam, for example an ion beam current profile or the emittance of an ion beam. A Faraday array comprising an array of ion beam current sensors is employed. The array can provide an ion beam current profile at the plane of the array. The Faraday array is also used in conjunction with an occluding element that may be moved through the ion beam upstream of the Faraday array, there obscuring varying portions of the ion beam from the Faraday array. Suitable manipulation of the signals from the Faraday allows the ion beam current profile to be determined for the plane of the occluding element, and also for the emittance of the ion beam at the plane of the occluding element to be determined.

    摘要翻译： 本发明涉及一种测量离子束的性质的方法，例如离子束电流分布或离子束的发射率。 采用包括离子束电流传感器阵列的法拉第阵列。 该阵列可以在阵列的平面处提供离子束电流分布。 法拉第阵列还与可以通过法拉第阵列上游的离子束移动的阻塞元件结合使用，这掩盖了来自法拉第阵列的离子束的变化部分。 适当地操纵来自法拉第的信号允许针对封闭元件的平面确定离子束电流轮廓，并且还确定待确定的阻塞元件平面处的离子束的发射率。

    POST-DECEL MAGNETIC ENERGY FILTER FOR ION IMPLANTATION SYSTEMS
    9.
    发明申请
    POST-DECEL MAGNETIC ENERGY FILTER FOR ION IMPLANTATION SYSTEMS 有权
    用于离子植入系统的后胶磁能过滤器

    公开(公告)号：US20090321630A1

    公开(公告)日：2009-12-31

    申请号：US12477631

    申请日：2009-06-03

    申请人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

    发明人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

    IPC分类号： B01D59/44 ,  A61N5/00 ,  H01J37/08

    CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1523 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/24528 ,  H01J2237/31705

    摘要： A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.

    摘要翻译： 提供了一种用于在离子注入工件期间对离子束进行磁过滤的系统和方法，其中离子从离子源发射并且将离子加速离开离子源以形成离子束。 离子束通过质量分析器进行质量分析，其中选择离子。 一旦离子束被质量分析，离子束然后通过减速器减速，并且离子束进一步对减速度下游的离子束进行磁过滤。 磁滤波由四极磁能滤波器提供，其中形成磁场以截取离开减速器的离子束中的离子，以选择性地过滤不需要的离子和快速中性粒子。

    Ion beam diagnostics
    10.
    发明授权
    Ion beam diagnostics 失效
    离子束诊断

    公开(公告)号：US07479644B2

    公开(公告)日：2009-01-20

    申请号：US11589156

    申请日：2006-10-30

    申请人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

    发明人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

    IPC分类号： H01J37/317 ,  H01L21/265

    CPC分类号： H01J37/3171 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578

    摘要： This invention relates to a method of measuring a property of an ion beam, for example an ion beam current profile or the emittance of an ion beam. A Faraday array comprising an array of ion beam current sensors is employed. The array can provide an ion beam current profile at the plane of the array. The Faraday array is also used in conjunction with an occluding element that may be moved through the ion beam upstream of the Faraday array, there obscuring varying portions of the ion beam from the Faraday array. Suitable manipulation of the signals from the Faraday allows the ion beam current profile to be determined for the plane of the occluding element, and also for the emittance of the ion beam at the plane of the occluding element to be determined.

    摘要翻译： 本发明涉及一种测量离子束的性质的方法，例如离子束电流分布或离子束的发射率。 采用包括离子束电流传感器阵列的法拉第阵列。 阵列可以在阵列的平面处提供离子束电流分布。 法拉第阵列还与可以通过法拉第阵列上游的离子束移动的阻塞元件结合使用，这掩盖了来自法拉第阵列的离子束的变化部分。 适当地操纵来自法拉第的信号允许针对封闭元件的平面确定离子束电流轮廓，并且还确定待确定的阻塞元件平面处的离子束的发射率。