CHARGED PARTICLE RADIATION DEVICE
    1.
    发明申请
    CHARGED PARTICLE RADIATION DEVICE 有权
    充电颗粒辐射装置

    公开(公告)号:US20120085925A1

    公开(公告)日:2012-04-12

    申请号:US13376473

    申请日:2010-06-15

    IPC分类号: G21K5/08

    摘要: An electron gun that serves to reduce the quantity of electron stimulated desorption and accomplishes vacuum evacuation efficiently with a sufficient degree of vacuum. An electron source 1 and an extraction electrode 6 are provided for emitting an electron beam 7 from the electron source 1. A first vacuum chamber 16 containing the electron source 1 is connected to a second vacuum chamber 9 via an aperture 8 provided in the extraction electrode 6. Each vacuum chamber is differentially evacuated with an independent vacuum evacuation means, and the generation of electron stimulated desorption gas 11 is reduced by securing a wide route of vacuum evacuation around the electron source 1 and intercepting the procession of back scattered electrons 12 emitted from the area with the electron beam 7 on the extraction electrode 6 by using a shielding electrode 22 given a prescribed potential.

    摘要翻译: 一种电子枪,其用于减少电子刺激的解吸量,并以足够的真空度有效地实现真空排气。 提供电子源1和提取电极6,用于从电子源1发射电子束7.包含电子源1的第一真空室16通过设置在引出电极中的孔8连接到第二真空室9 每个真空室用独立的真空排气装置进行差异抽真空,并且通过确保在电子源1周围的宽的真空排气路径并且截断从后面散射的电子12的排出而减少电子刺激的解吸气体11的产生 通过使用给定电位的屏蔽电极22,在引出电极6上具有电子束7的区域。

    Charged particle radiation device
    2.
    发明授权
    Charged particle radiation device 有权
    带电粒子辐射装置

    公开(公告)号:US08426835B2

    公开(公告)日:2013-04-23

    申请号:US13376473

    申请日:2010-06-15

    IPC分类号: G21K5/08

    摘要: An electron gun that serves to reduce the quantity of electron stimulated desorption and accomplishes vacuum evacuation efficiently with a sufficient degree of vacuum. An electron source 1 and an extraction electrode 6 are provided for emitting an electron beam 7 from the electron source 1. A first vacuum chamber 16 containing the electron source 1 is connected to a second vacuum chamber 9 via an aperture 8 provided in the extraction electrode 6. Each vacuum chamber is differentially evacuated with an independent vacuum evacuation means, and the generation of electron stimulated desorption gas 11 is reduced by securing a wide route of vacuum evacuation around the electron source 1 and intercepting the procession of back scattered electrons 12 emitted from the area with the electron beam 7 on the extraction electrode 6 by using a shielding electrode 22 given a prescribed potential.

    摘要翻译: 一种电子枪,其用于减少电子刺激的解吸量,并以足够的真空度有效地实现真空排气。 提供电子源1和提取电极6,用于从电子源1发射电子束7.包含电子源1的第一真空室16通过设置在引出电极中的孔8连接到第二真空室9 每个真空室用独立的真空排气装置进行差异抽真空,并且通过确保在电子源1周围的宽的真空排气路径并且截断从后面散射的电子12的排出而减少电子刺激的解吸气体11的产生 通过使用给定电位的屏蔽电极22,在引出电极6上具有电子束7的区域。

    Charged particle beam apparatus, and method of controlling the same
    3.
    发明授权
    Charged particle beam apparatus, and method of controlling the same 有权
    带电粒子束装置及其控制方法

    公开(公告)号:US08319193B2

    公开(公告)日:2012-11-27

    申请号:US12999075

    申请日:2009-06-10

    IPC分类号: H01J27/26

    摘要: Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1 10−8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1×10−2sr or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.

    摘要翻译: 提供一种带电粒子束装置,其能够发射具有高亮度和窄能量宽度的稳定电子束。 带电粒子束装置包括场发射电子源,用于向场发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在10×10 8 Pa以下的真空排气单元。 该装置构成为使用发射的电子束中心辐射角为1×10-2sr以下的电子束,并使用其电流,其二阶微分为负 或相对于时间为零,并以每小时10%或更少的速率减少。 带电粒子束装置还包括用于场发射电子源的加热单元和用于电子束电流的检测单元。 重复加热场致发射电子源以使电子束的电流保持在规定值以上。

    Charged particle beam apparatus, and method of controlling the same
    4.
    发明授权
    Charged particle beam apparatus, and method of controlling the same 有权
    带电粒子束装置及其控制方法

    公开(公告)号:US08772735B2

    公开(公告)日:2014-07-08

    申请号:US13666119

    申请日:2012-11-01

    IPC分类号: H01J1/304

    摘要: A charged particle beam apparatus includes a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1×10−8 Pa or less. The apparatus uses electron beams emitted to have an electron-beam-center radiation angle of 1×10−2 sr or less, and uses the electric current thereof, the second order differentiation of which is negative or zero with respect to time, and which reduces at a rate of 10% or less per hour. A heating unit is provided for the field emission electron source, and a detection unit is provided for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.

    摘要翻译: 带电粒子束装置包括场致发射电子源,用于向场发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在1×10 -8 Pa以下的真空排气单元。 该装置使用发射的电子束具有1×10 -2 sr以下的电子束中心辐射角,并使用其电流,其二阶微分相对于时间为负或为零,其中 以每小时10%或更少的速度减少。 为场发射电子源提供加热单元,为电子束的电流提供检测单元。 重复加热场致发射电子源以使电子束的电流保持在规定值以上。

    CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME
    5.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME 有权
    充电颗粒光束装置及其控制方法

    公开(公告)号:US20110089336A1

    公开(公告)日:2011-04-21

    申请号:US12999075

    申请日:2009-06-10

    IPC分类号: H01J27/26 H01J27/00

    摘要: Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vaccume exhaust unit for keeping the pressure around the field emission electron source at 1 10−8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1 10−2 str or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.

    摘要翻译: 提供一种带电粒子束装置,其能够发射具有高亮度和窄能量宽度的稳定电子束。 带电粒子束装置包括场致发射电子源,用于向场致发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在10×10 8 Pa以下的疫苗排气单元。 该装置构成为使用发射的电子束中心辐射角为1×10 -2 str以下的电子束,并使用其电流,其二阶微分为负 或相对于时间为零,并以每小时10%或更少的速率减少。 带电粒子束装置还包括用于场发射电子源的加热单元和用于电子束电流的检测单元。 重复加热场致发射电子源以使电子束的电流保持在规定值以上。

    CHARGED PARTICLE BEAM SYSTEM AND METHOD FOR EVACUATION OF THE SYSTEM
    6.
    发明申请
    CHARGED PARTICLE BEAM SYSTEM AND METHOD FOR EVACUATION OF THE SYSTEM 有权
    充电颗粒光束系统及其系统的消除方法

    公开(公告)号:US20080315122A1

    公开(公告)日:2008-12-25

    申请号:US12127030

    申请日:2008-05-27

    IPC分类号: H01J37/02

    摘要: The present invention provides a charged particle beam system which can perform evacuation on an electron gun chamber or an ion-gun chamber having a non-evaporable getter pump in a short time and can maintain the ultra-high vacuum for a long time, and a technology of evacuation therefor. Provided is a charged particle beam system equipped with a charged particle optics which makes the charged particle beam emitted from a charged particle source incident on a sample and means of evacuation for evacuating the charged particle optics, characterized in that the evaporation means has: a vacuum vessel with a charged particle source disposed in the vessel; a non-evaporable getter pump which connects with the vacuum vessel through a vacuum pipe and evacuates the interior of the vacuum vessel as a subsidiary vacuum pump; a valve interposed in the vacuum pipe connecting between the vacuum vessel and the non-evaporable getter pump; a rough pumping port which is provided closer to the non-evaporable getter pump than the valve and performs rough pumping; an open and shut valve for opening and shutting the rough pumping port; and a main vacuum pump which is provided closer to the vacuum vessel than the valve and evacuates the interior of the vacuum vessel.

    摘要翻译: 本发明提供了一种带电粒子束系统,其能够在短时间内在具有不可蒸发的吸气泵的电子枪室或离子枪室上进行排气并且能够长时间保持超高真空, 撤离技术。 提供了一种装有带电粒子光学器件的带电粒子束系统,其使从入射到样品上的带电粒子源发射的带电粒子束和抽空装置用于抽空带电粒子光学器件,其特征在于,蒸发装置具有:真空 具有设置在容器中的带电粒子源的容器; 一个不可蒸发的吸气泵,通过一个真空管与真空容器相连,抽真空真空容器的内部作为辅助真空泵; 插入在真空容器和不可蒸发的吸气剂泵之间的真空管中的阀; 一个粗略的抽气口,比阀门更靠近不可蒸发的吸气泵,进行粗抽; 用于打开和关闭粗抽泵口的打开和关闭阀; 以及主真空泵,其设置成比阀更靠近真空容器并排空真空容器的内部。

    Charged particle beam system and method for evacuation of the system
    7.
    发明授权
    Charged particle beam system and method for evacuation of the system 有权
    带电粒子束系统和排气系统的方法

    公开(公告)号:US07781743B2

    公开(公告)日:2010-08-24

    申请号:US12127030

    申请日:2008-05-27

    摘要: The present invention provides a charged particle beam system which can perform evacuation on an electron gun chamber or an ion-gun chamber having a non-evaporable getter pump in a short time and can maintain the ultra-high vacuum for a long time, and a technology of evacuation therefor. Provided is a charged particle beam system equipped with a charged particle optics which makes the charged particle beam emitted from a charged particle source incident on a sample and means of evacuation for evacuating the charged particle optics, characterized in that the evaporation means has: a vacuum vessel with a charged particle source disposed in the vessel; a non-evaporable getter pump which connects with the vacuum vessel through a vacuum pipe and evacuates the interior of the vacuum vessel as a subsidiary vacuum pump; a valve interposed in the vacuum pipe connecting between the vacuum vessel and the non-evaporable getter pump; a rough pumping port which is provided closer to the non-evaporable getter pump than the valve and performs rough pumping; an open and shut valve for opening and shutting the rough pumping port; and a main vacuum pump which is provided closer to the vacuum vessel than the valve and evacuates the interior of the vacuum vessel.

    摘要翻译: 本发明提供了一种带电粒子束系统,其能够在短时间内在具有不可蒸发的吸气泵的电子枪室或离子枪室上进行排气并且能够长时间保持超高真空, 撤离技术。 提供了一种装有带电粒子光学器件的带电粒子束系统,其使从入射到样品上的带电粒子源发射的带电粒子束和抽空装置用于抽空带电粒子光学器件,其特征在于,蒸发装置具有:真空 具有设置在容器中的带电粒子源的容器; 一个不可蒸发的吸气泵,通过一个真空管与真空容器相连,抽真空真空容器的内部作为辅助真空泵; 插入在真空容器和不可蒸发的吸气剂泵之间的真空管中的阀; 一个粗略的抽气口,比阀门更靠近不可蒸发的吸气泵,进行粗抽; 用于打开和关闭粗抽泵口的打开和关闭阀; 以及主真空泵,其设置成比阀更靠近真空容器并排空真空容器的内部。

    Charged particle beam apparatus
    8.
    发明授权
    Charged particle beam apparatus 失效
    带电粒子束装置

    公开(公告)号:US07582885B2

    公开(公告)日:2009-09-01

    申请号:US11401878

    申请日:2006-04-12

    IPC分类号: H01J1/50

    摘要: A small-sized charged particle beam apparatus capable of maintaining high vacuum even during emission of an electron beam is provided. A nonevaporative getter pump is placed upstream of differential pumping of an electron optical system of the charged particle beam apparatus, and a minimum number of ion pumps are placed downstream, so that both the pumps are used in combination. Further, by mounting a detachable coil on an electron gun part, the inside of a column can be maintained under high vacuum with a degree of vacuum in the order of 10−8 Pa.

    摘要翻译: 提供即使在电子束的发射期间也能保持高真空的小尺寸带电粒子束装置。 将非蒸发性吸气泵放置在带电粒子束装置的电子光学系统的差分泵浦的上游,并且将最少数量的离子泵放置在下游,使得两个泵组合使用。 此外,通过将可拆卸线圈安装在电子枪部件上,可以将真空度保持在10-8Pa以下的真空度的高真空下。

    Electron Lens and Charged Particle Beam Apparatus
    9.
    发明申请
    Electron Lens and Charged Particle Beam Apparatus 失效
    电子透镜和带电粒子束装置

    公开(公告)号:US20080067396A1

    公开(公告)日:2008-03-20

    申请号:US11749181

    申请日:2007-05-16

    IPC分类号: H01J1/50

    摘要: The present invention provides a compact electron lens causing little aberration, and a charged particle beam apparatus such as a scanning electron microscope that is super compact and offers a high resolution. An upper magnetic pole and a sample-side magnetic pole are magnetically coupled to the respective poles of a permanent magnet that is made of a highly strong magnetic material such as a rare-earth cobalt system or a neodymium-iron-boron system, that is axially symmetrical, and that has a hole in the center thereof. An inner gap is created on the side of a center axis. Thus, a magnetic lens is formed axially. Moreover, a semi-stationary magnetic path that shields an outside magnetic field and has the magnetic reluctance thereof regulated is disposed outside. The sample-side magnetic pole and magnetic path defines a region where magnetic reluctance is the highest outside the permanent magnet. A space defined by the permanent magnet, upper magnetic pole, sample-die magnetic pole, and semi-stationary magnetic path is filled with a filling made of a non-magnetic material. Thus, an objective lens is constructed.

    摘要翻译: 本发明提供一种产生很小像差的小型电子透镜,以及诸如扫描电子显微镜的带电粒子束装置,其具有超级紧凑并且提供高分辨率。 上磁极和样本侧磁极磁耦合到由诸如稀土钴体系或钕铁硼体系的高强度磁性材料制成的永磁体的各极上,即, 轴向对称,并且在其中心具有孔。 在中心轴的一侧产生内部间隙。 因此,磁性透镜轴向形成。 此外,将外部磁场屏蔽并具有调节磁阻的半静态磁路设置在外部。 样品侧磁极和磁路限定永磁体外磁阻最高的区域。 由永磁体,上磁极,样品芯磁极和半静态磁路限定的空间填充有由非磁性材料制成的填充物。 因此,构成物镜。

    Charged particle beam apparatus
    10.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号:US20090294697A1

    公开(公告)日:2009-12-03

    申请号:US12453986

    申请日:2009-05-28

    IPC分类号: A61N5/00 G21F5/02

    摘要: The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10−8 to 10−9 Pa even in the state where electron beams are emitted using a non-evaporable getter pump and is not affected by dropout foreign particles.The present invention includes a vacuum vessel in which a charged particle source (electron source, ion source, etc.) is disposed and a non-evaporable getter pump disposed at a position that does not directly face electron beams and includes a structure that makes the non-evaporable getter pump upward with respect to a horizontal direction to drop out foreign particles into a bottom in a groove, so that the foreign particles dropped out from the non-evaporable getter pump do not face an electron optical system. Or, the present invention includes a structure that is covered by a shield means, or a means that is disposed immediately on a surface of the non-evaporable getter pump but at a position where the electron beams are not seen and has a concave structure capable of trapping the dropout foreign particles on a lower portion of the non-evaporable getter pump.

    摘要翻译: 本发明提供了一种带电粒子束装置,其将电子源附近的真空度保持为10-8至10-9Pa的超高真空度,即使在使用非电子束发射电子束的状态下, 可蒸发吸气泵,不受脱落异物的影响。 本发明包括设置有带电粒子源(电子源,离子源等)的真空容器和设置在不直接面向电子束的位置的非蒸发性吸气泵,并且包括使 不可蒸发的吸气剂相对于水平方向向上泵送以将异物排出到槽中的底部,使得从非蒸发性吸气泵排出的异物不面向电子光学系统。 或者,本发明包括被屏蔽装置覆盖的结构,或者立即设置在不可蒸发的吸气泵的表面上,但是在不能看到电子束的位置处并具有凹形结构的装置 在非蒸发性吸气泵的下部捕获脱落的异物。