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    Process for the production of copper-clad laminate
    3.
    发明授权
    Process for the production of copper-clad laminate 失效
    生产覆铜层压板的工艺

    公开(公告)号：US5435877A

    公开(公告)日：1995-07-25

    申请号：US56536

    申请日：1993-05-05

    申请人： Kenji Ishii ,  Yoshinori Kondo ,  Hiroyuki Matsumoto ,  Takamasa Nakai

    发明人： Kenji Ishii ,  Yoshinori Kondo ,  Hiroyuki Matsumoto ,  Takamasa Nakai

    IPC分类号： B29C70/08 ,  B32B15/08 ,  B32B37/18 ,  H05K1/03 ,  H05K1/09 ,  B32B31/12 ,  B32B31/18 ,  B32B31/20 ,  B32B31/22

    CPC分类号： B32B37/182 ,  B29C70/088 ,  B32B15/08 ,  B32B37/04 ,  B32B37/06 ,  H05K1/0366 ,  H05K1/09 ,  B32B2305/08 ,  B32B2311/12 ,  H05K2201/029 ,  H05K2201/0355 ,  Y10T156/1075

    摘要： A process for the production of a copper-clad laminate which is improved in dimensional accuracy and freedom from bow and twist and shows nearly the same values of dimensional accuracy, thermal expansion coefficient and elastic modulus in the length and width directions, the process using:a prepreg (I) comprising a glass cloth (I-1) having a thickness of 190.+-.20 .mu.m, a weight of 210.+-.20 g/m.sup.2, warp and weft counts of 35 to 38 yarns/25 mm and a warp and weft difference of 2 yarns or less in count, anda copper foil (II) having a ductility, measured in atmosphere at 180.degree. C. in length and width directions, of at least 10% when it is a 1/2 oz/Ft.sup.2 foil, at least 15% when it is a 1 oz/Ft.sup.2 foil and at least 20% when it is a 2 oz/Ft.sup.2 foil, andthe set of the prepreg or prepregs and copper foil or copper foils is laminate-molded by curing it under predetermined heat in a laminate-molding step using a press machine, removing the application of pressure and then cooling the resultant laminate in the press machine.

    摘要翻译： 一种生产覆铜层压板的方法，其尺寸精度提高并且不受弯曲和弯曲，并且在长度和宽度方向上显示出几乎相同的尺寸精度，热膨胀系数和弹性模量的值，该方法使用： 包括厚度为190 +/-20μm，重量为210 +/- 20g / m 2的玻璃布（I-1），经纬度为35至38根/ 25mm的预浸料（I） 以及计数为2根以下的纬纱和纬纱的差异，以及在长度和宽度方向的180℃下在大气中测定的具有延展性的铜箔（II）为1 / 2盎司/ Ft2箔，当为1盎司/ Ft2箔时为至少15％，当为2盎司/ Ft2箔时为至少20％，并且预浸料坯或预浸料和铜箔或铜箔的组合为层压体 通过使用压制机在层压成型步骤中在预定热下固化来模塑，除去施加压力，然后冷却所得到的层 在压机中。

    SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND A METHOD FOR MANUFACTURING A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
    9.
    发明申请
    SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND A METHOD FOR MANUFACTURING A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE 审中-公开
    半导体集成电路装置及制造半导体集成电路装置的方法

    公开(公告)号：US20120061769A1

    公开(公告)日：2012-03-15

    申请号：US13225548

    申请日：2011-09-05

    申请人： MASAO SUGIYAMA ,  Yoshiyuki Kaneko ,  Yoshinori Kondo ,  Masayoshi Hirasawa

    发明人： MASAO SUGIYAMA ,  Yoshiyuki Kaneko ,  Yoshinori Kondo ,  Masayoshi Hirasawa

    IPC分类号： H01L27/092

    CPC分类号： H01L21/28518 ,  H01L21/02164 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/31053 ,  H01L21/31055 ,  H01L21/31612 ,  H01L21/76801 ,  H01L21/76819 ,  H01L23/485 ,  H01L23/53257 ,  H01L2924/0002 ,  H01L2924/00

    摘要： For constituting a pre-metal interlayer insulating film, such a method is considered as forming a CVD silicon oxide-based insulating film having good filling properties by ozone TEOS, reflowing the film to planarize it, stacking a silicon oxide film having good CMP scratch resistance by plasma TEOS, and further planarizing by CMP. However, in forming a contact hole, crack in the pre-metal interlayer insulating film is exposed in the contact hole, into which barrier metal intrudes to cause short-circuit defects. In the present invention, in the pre-metal process, after forming the ozone TEOS film over an etch stop film, the ozone TEOS film is once etched back so as to expose the etch stop film over a gate structure, a plasma TEOS film is formed over the remaining ozone TEOS film, and the plasma TEOS film is planarized by CMP.

    摘要翻译： 为了构成前金属层间绝缘膜，将这种方法考虑为通过臭氧TEOS形成具有良好填充性能的CVD氧化硅系绝缘膜，回流膜使其平坦化，层叠具有良好CMP耐刮擦性的氧化硅膜 通过等离子体TEOS，并通过CMP进一步平坦化。 然而，在形成接触孔时，金属间绝缘膜中的裂纹暴露在阻挡金属侵入的接触孔中，导致短路缺陷。 在本发明中，在预金属工艺中，在蚀刻停止膜上形成臭氧TEOS膜之后，臭氧TEOS膜被一次回蚀刻，以便在栅极结构上暴露蚀刻停止膜，等离子体TEOS膜为 形成在剩余的臭氧TEOS膜上，并且等离子体TEOS膜通过CMP平坦化。

    TOOTH-BLEACHING MATERIAL AND METHOD OF BLEACHING TOOTH
    10.
    发明申请
    TOOTH-BLEACHING MATERIAL AND METHOD OF BLEACHING TOOTH 审中-公开
    牙齿漂白材料和漂白牙齿的方法

    公开(公告)号：US20100092407A1

    公开(公告)日：2010-04-15

    申请号：US12530975

    申请日：2008-02-21

    申请人： Hiroshi Kurata ,  Yuki Kumagai ,  Kenichi Kimiduka ,  Yoshinori Kondo ,  Yasunari Kawabata

    发明人： Hiroshi Kurata ,  Yuki Kumagai ,  Kenichi Kimiduka ,  Yoshinori Kondo ,  Yasunari Kawabata

    IPC分类号： A61K8/22 ,  A61Q11/00

    CPC分类号： A61Q11/00 ,  A61K8/362 ,  A61K8/4973 ,  A61K8/498

    摘要： A tooth bleaching material that is safe and has good operability and high bleaching effect and a tooth bleaching method using the tooth bleaching material are provided by bleaching and removing colored sediments (colored or discolored deposits) on a tooth with a tooth bleaching material containing hydrogen peroxide and/or a compound generating hydrogen peroxide in an aqueous solution, and a dicarboxylic anhydride, and also containing a basic compound and a thickening agent, and a tooth bleaching method containing attaching the tooth bleaching material to a surface of a discolored tooth after dilution or without dilution irradiating with light.

    摘要翻译： 通过使用含有过氧化氢的牙齿漂白材料在牙齿上漂白除去有色沉淀物（着色或变色沉积物），提供安全且具有良好可操作性和高漂白效果的牙齿漂白剂和使用牙齿漂白材料的牙齿漂白方法 和/或在水溶液中产生过氧化氢的化合物和二羧酸酐，并且还含有碱性化合物和增稠剂，以及牙齿漂白方法，其将稀释后的牙齿漂白材料附着到变色牙齿的表面，或 无稀释照射光。