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    Mask design and OPC for device manufacture
    2.
    发明授权
    Mask design and OPC for device manufacture 失效
    面罩设计和OPC设备制造

    公开(公告)号：US08778605B2

    公开(公告)日：2014-07-15

    申请号：US13762083

    申请日：2013-02-07

    申请人： Shem Ogadhoh ,  Raguraman Venkatesan ,  Kevin J. Hooker ,  Sungwon Kim ,  Bin Hu ,  Vivek Singh ,  Bikram Baidya ,  Prasad Narendra Atkar ,  Seongtae Jeong

    发明人： Shem Ogadhoh ,  Raguraman Venkatesan ,  Kevin J. Hooker ,  Sungwon Kim ,  Bin Hu ,  Vivek Singh ,  Bikram Baidya ,  Prasad Narendra Atkar ,  Seongtae Jeong

    IPC分类号： G03F1/68 ,  G03F1/36

    CPC分类号： G03F1/36 ,  G03F1/68 ,  G06F17/50

    摘要： Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.

    摘要翻译： 这里描述的是要连续成像以在诸如半导体晶片的衬底上打印复合图案的一组掩模的掩模设计和建模。 本文进一步描述的是使用该组掩模对衬底进行双重图案化的方法。 这里还描述了一种基于掩模级别中的另一个的预测图案轮廓来校正掩模级中的一个的绘制图案的方法。 本文还描述了一种对光致抗蚀剂施加到非均匀衬底上的掩模级的抗蚀剂轮廓轮廓建模方法，以及预测两个掩模的布尔运算的抗蚀剂轮廓的方法。

    Visualization techniques for oilfield operations
    3.
    发明授权
    Visualization techniques for oilfield operations 有权
    油田作业可视化技术

    公开(公告)号：US08199166B2

    公开(公告)日：2012-06-12

    申请号：US12371039

    申请日：2009-02-13

    申请人： Dmitriy Repin ,  Vivek Singh ,  Christos Nikolakis-Mouchas ,  Farid Harhad ,  Syed Hammad Zafar

    发明人： Dmitriy Repin ,  Vivek Singh ,  Christos Nikolakis-Mouchas ,  Farid Harhad ,  Syed Hammad Zafar

    IPC分类号： G09G5/00

    CPC分类号： E21B47/00 ,  G06T13/00 ,  G06T15/20 ,  G06T19/00 ,  G06T2219/004

    摘要： A method for visualizing oilfield data of an oilfield operation involves obtaining real-time data generated from a borehole, generating and updating a current position object, and displaying and annotating a representation of a first geology, geophysics, drilling, and production object in a display based on the oilfield data using a two dimensional (2D) callout having an attachment handle for adjusting the 2D callout according the updated location in an animation sequence in real-time responsive to updating the current position.

    摘要翻译： 油田作业的油田数据的可视化方法包括获得从井眼产生的实时数据，生成和更新当前位置物体，以及在显示器中显示和注释第一地质学，地球物理学，钻井和生产物体的表示 基于使用具有附接句柄的二维（2D）标注的油田数据，其具有附加句柄，用于根据更新当前位置实时地根据动画序列中的更新位置来调整2D标注。

    Real-time, bi-directional data management
    4.
    发明授权
    Real-time, bi-directional data management 有权
    实时的双向数据管理

    公开(公告)号：US08135862B2

    公开(公告)日：2012-03-13

    申请号：US12349684

    申请日：2009-01-07

    申请人： Vivek Singh ,  Bruce Fogelsong ,  Sam Marcuccio ,  Clinton Chapman ,  Paul Thow ,  Jim Brannigan

    发明人： Vivek Singh ,  Bruce Fogelsong ,  Sam Marcuccio ,  Clinton Chapman ,  Paul Thow ,  Jim Brannigan

    IPC分类号： G06F15/16

    CPC分类号： E21B47/12

    摘要： An example method for real-time bi-directional data management includes receiving a requested data list from a field application, receiving an available data list from a data source, and subscribing to available data by mapping the available data list to the requested data list, the available data having a first data format and a first protocol and including a first context identifier for identifying a portion of data. The method further includes modifying the available data have a second data format and a second protocol, the modified data including the first context identifier, and performing a field operation based on the modified data to generate processed data, the processed data including the first context identifier. The method further includes modifying the processed data to generate second modified data having the first data format and the first protocol, the second modified data being stored in the data source.

    摘要翻译： 用于实时双向数据管理的示例性方法包括从现场应用接收所请求的数据列表，从数据源接收可用数据列表，并通过将可用数据列表映射到所请求的数据列表来订阅可用数据， 所述可用数据具有第一数据格式和第一协议，并且包括用于识别数据的一部分的第一上下文标识符。 该方法还包括修改可用数据具有第二数据格式和第二协议，所述修改数据包括第一上下文标识符，以及基于修改数据执行字段操作以生成经处理数据，所处理的数据包括第一上下文标识符 。 该方法还包括修改经处理的数据以产生具有第一数据格式和第一协议的第二修改数据，第二修改数据被存储在数据源中。

    Sub-wavelength diffractive elements to reduce corner rounding
    5.
    发明授权
    Sub-wavelength diffractive elements to reduce corner rounding 有权
    亚波长衍射元件以减少圆角

    公开(公告)号：US07892706B2

    公开(公告)日：2011-02-22

    申请号：US12317196

    申请日：2008-12-19

    申请人： Bikram Baidya ,  Vivek Singh ,  Yan Borodovsky

    发明人： Bikram Baidya ,  Vivek Singh ,  Yan Borodovsky

    IPC分类号： G03F1/00

    CPC分类号： G03F1/36

    摘要： The present invention discloses a mask including: a first region near a corner of a feature, the first region including a first element, the first element being transparent to a light, the first element having a side that is smaller than a wavelength of said light; a second region near the corner of the feature, the second region including a second element, the second element being transparent to the light, the second element having a side that is smaller than the wavelength of the light; and a third region near the corner of the feature, the third region including a third element, the third element being opaque to the light, the third element having a side that is smaller than the wavelength of the light.

    摘要翻译： 本发明公开了一种掩模，其包括：靠近特征角的第一区域，所述第一区域包括第一元件，所述第一元件对于光是透明的，所述第一元件具有小于所述光的波长的一侧 ; 靠近所述特征角的第二区域，所述第二区域包括第二元件，所述第二元件对于所述光是透明的，所述第二元件具有小于所述光的波长的一侧; 以及靠近所述特征角的第三区域，所述第三区域包括第三元件，所述第三元件对于所述光不透明，所述第三元件具有小于所述光的波长的一侧。

    Sub-wavelength diffractive elements to reduce corner rounding
    6.
    发明授权
    Sub-wavelength diffractive elements to reduce corner rounding 有权
    亚波长衍射元件，减少圆角

    公开(公告)号：US07611806B2

    公开(公告)日：2009-11-03

    申请号：US11242166

    申请日：2005-09-30

    申请人： Bikram Baidya ,  Vivek Singh ,  Yan Borodovsky

    发明人： Bikram Baidya ,  Vivek Singh ,  Yan Borodovsky

    IPC分类号： G03F1/00

    CPC分类号： G03F1/36

    摘要： The present invention discloses a mask including: a first region near a corner of a feature, the first region including a first element, the first element being transparent to a light, the first element having a side that is smaller than a wavelength of said light; a second region near the corner of the feature, the second region including a second element, the second element being transparent to the light, the second element having a side that is smaller than the wavelength of the light; and a third region near the corner of the feature, the third region including a third element, the third element being opaque to the light, the third element having a side that is smaller than the wavelength of the light.

    摘要翻译： 本发明公开了一种掩模，其包括：靠近特征角的第一区域，所述第一区域包括第一元件，所述第一元件对于光是透明的，所述第一元件具有小于所述光的波长的一侧 ; 靠近所述特征角的第二区域，所述第二区域包括第二元件，所述第二元件对于所述光是透明的，所述第二元件具有小于所述光的波长的一侧; 以及靠近所述特征角的第三区域，所述第三区域包括第三元件，所述第三元件对于所述光不透明，所述第三元件具有小于所述光的波长的一侧。

    Mask design using library of corrections
    7.
    发明授权
    Mask design using library of corrections 失效
    面具设计使用修正库

    公开(公告)号：US07603648B2

    公开(公告)日：2009-10-13

    申请号：US11174336

    申请日：2005-06-29

    申请人： Peng Liu ,  Vivek Singh ,  Bin Hu

    发明人： Peng Liu ,  Vivek Singh ,  Bin Hu

    IPC分类号： G06F17/50

    CPC分类号： G06F17/5081 ,  G03F1/36 ,  G06F2217/12 ,  Y02P90/265

    摘要： Systems, techniques, and approaches to quickly generate mask patterns, synthesize near-fields, and design masks. In one aspect, a mask may be designed by modeling the transmitted field using a library of corrections and a fast field model.

    摘要翻译： 快速生成掩模图案，合成近场和设计蒙版的系统，技术和方法。 在一个方面，可以通过使用校正库和快速场模型对所发送的场进行建模来设计掩模。

    Phase-shifting masks with sub-wavelength diffractive opical elements
    8.
    发明申请
    Phase-shifting masks with sub-wavelength diffractive opical elements 有权
    具有亚波长衍射光学元件的相移掩模

    公开(公告)号：US20090170012A1

    公开(公告)日：2009-07-02

    申请号：US12316064

    申请日：2008-12-09

    申请人： Bin Hu ,  Vivek Singh ,  Yan Borodovsky

    发明人： Bin Hu ,  Vivek Singh ,  Yan Borodovsky

    IPC分类号： G03F1/00

    CPC分类号： G03F7/70283 ,  G03F1/32 ,  G03F1/36 ,  G03F7/70433 ,  G03F7/705

    摘要： The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light.

    摘要翻译： 本发明公开了一种设计一组两个平铺掩模的方法，以及掩模，包括：第一瓦片，第一瓦片对于光是透明的，第一瓦片具有15％的第一特征线性尺寸或 较少的波长的光; 第二瓦片，所述第二瓦片对于所述光是透明的，所述第二瓦片具有光的波长的15％或更小的第二特征线性尺寸; 以及第三瓦片，所述第三瓦片对于所述光不透明，所述第三瓦片具有光的波长的15％以下的第三特征线性尺寸。

    Phase-shifting masks with sub-wavelength diffractive optical elements
    9.
    发明申请
    Phase-shifting masks with sub-wavelength diffractive optical elements 有权
    具有亚波长衍射光学元件的相移掩模

    公开(公告)号：US20070094959A1

    公开(公告)日：2007-05-03

    申请号：US11242165

    申请日：2005-09-30

    申请人： Bin Hu ,  Vivek Singh ,  Yan Borodovsky

    发明人： Bin Hu ,  Vivek Singh ,  Yan Borodovsky

    IPC分类号： E04C2/52

    CPC分类号： G03F7/70283 ,  G03F1/32 ,  G03F1/36 ,  G03F7/70433 ,  G03F7/705

    摘要： The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light.

    摘要翻译： 本发明公开了一种设计一组两个平铺掩模的方法，以及掩模，包括：第一瓦片，第一瓦片对于光是透明的，第一瓦片具有15％的第一特征线性尺寸或 较少的波长的光; 第二瓦片，所述第二瓦片对于所述光是透明的，所述第二瓦片具有光的波长的15％或更小的第二特征线性尺寸; 以及第三瓦片，所述第三瓦片对于所述光不透明，所述第三瓦片具有光的波长的15％以下的第三特征线性尺寸。