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公开(公告)号：US5187716A
公开(公告)日：1993-02-16
申请号：US725098
申请日：1991-07-03
申请人： Kenyu Haruta , Haruhiko Nagai , Hajime Nakatani , Yoshihiko Yamamoto , Taketoshi Takemura , Takashi Eura , Shungo Tsuboi , Yoshifumi Matsushita , Tadao Minagawa
发明人： Kenyu Haruta , Haruhiko Nagai , Hajime Nakatani , Yoshihiko Yamamoto , Taketoshi Takemura , Takashi Eura , Shungo Tsuboi , Yoshifumi Matsushita , Tadao Minagawa
IPC分类号： H01S3/038 , H01S3/0971 , H01S3/225
CPC分类号： H01S3/225 , H01S3/0388 , H01S3/0971
摘要： At least the opposing surface portions of the main electrodes of an excimer laser device are covered with materials which are resistive to chemical etching than nickel. The etching resistive material may be a platinum based alloy containing rhodium, ruthenium, iridium, or osmium; a nickel based alloy containing gold, platinum, rhodium, ruthenium, iridium, or osmium; or rhodium, ruthenium, iridium, or osmium. Thus, an excimer laser device is realized by which the lives of the electrodes and the laser gas are prolonged.
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公开(公告)号：US4914662A
公开(公告)日：1990-04-03
申请号：US248900
申请日：1988-09-26
IPC分类号： H01S3/131
CPC分类号： H01S3/131
摘要： A laser wavelength is stabilized by deriving a portion of laser beam emitted from a wavelength variable laser oscillator, spectroscopically processing the laser beam portion by means of a wavelength monitor mechanism, measuring a spatial intensity distribution of the spectroscopically processed beam portion, spectroscopically processing light having a specific wavelength and measuring a spatial intensity distribution thereof, analyzing the measured spatial intensity distribution of the spectroscopically processed beam portion on the basis of the measured spatial intensity distribution of the spectroscopically processed light having the specific wavelength, and controlling wavelength of the laser oscillator according to a result of the analysis.
摘要翻译： 通过导出从波长可变激光振荡器发射的激光束的一部分来稳定激光波长，通过波长监测机构对激光束部分进行光谱处理，测量光谱处理的光束部分的空间强度分布，光谱处理具有 特定波长并测量其空间强度分布，基于所测量的具有特定波长的光谱处理光的空间强度分布，并根据测量的激光振荡器的波长控制光谱处理光束部分的测量空间强度分布， 分析结果。
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3.发明授权Method of stabilizing laser wavelength and laser device with stabilized wavelength 失效稳定激光波长的方法和具有稳定波长的激光器件
公开(公告)号：US5107511A
公开(公告)日：1992-04-21
申请号：US381723
申请日：1989-08-25
申请人： Hajime Nakatani , Yoshibumi Minowa , Hiromi Kaneko , Hitoshi Wakata , Kenyu Haruta , Haruhiko Nagai , Kenichi Yasuda , Hiroyuki Mukumoto
发明人： Hajime Nakatani , Yoshibumi Minowa , Hiromi Kaneko , Hitoshi Wakata , Kenyu Haruta , Haruhiko Nagai , Kenichi Yasuda , Hiroyuki Mukumoto
摘要： A method and apparatus for stabilizing the wavelength in a laser. The apparatus includes a first and second etalon for fine and rough tuning, respectively, of a laser oscillator. The output power and wavelength of the laser beam, for example, can be used to adjust these etalons to provide a constant output power and to counteract the change in etalon characteristics due to heat.
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公开(公告)号：US4686682A
公开(公告)日：1987-08-11
申请号：US782568
申请日：1985-10-01
申请人： Kenyu Haruta , Hitoshi Wakata , Yukio Sato , Haruhiko Nagai , Hajime Nakatani , Hideki Kita
发明人： Kenyu Haruta , Hitoshi Wakata , Yukio Sato , Haruhiko Nagai , Hajime Nakatani , Hideki Kita
CPC分类号： H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0971 , H01S3/0384 , H01S3/225
摘要： A discharge excitation type short pulse laser device which is constructed with first and second main electrodes disposed in confrontation with the direction of the laser beam axis as their longitudinal direction, an auxiliary electrode provided on the rear surface part of the second main electrode and opposed to the second main electrode through the dielectric member, a pulse circuit for applying a pulse voltage across the first and second main electrodes, and a circuit for applying a voltage across the auxiliary electrode and the second main electrode, the circuit forming a part of the pulse circuit, or being independent of the pulse circuit, wherein the second main electrode is made of an electrically conductive material having a plurality of apertures therein, the second main electrode and the dielectric member are disposed in tight adhesion each other, and the second main electrode is thinly formed to enable creeping discharge to be produced on the surface of the dielectric member, thereby distributing electrons to be the seed for the main discharge to be generated across the main electrode.
摘要翻译： 一种放电激励型短脉冲激光器件，其由与激光束轴线的方向对置设置的第一和第二主电极作为其纵向方向构成，辅助电极设置在第二主电极的后表面部分上并与 通过电介质构件的第二主电极，用于在第一和第二主电极上施加脉冲电压的脉冲电路，以及用于在辅助电极和第二主电极之间施加电压的电路，形成脉冲的一部分的电路 电路或独立于脉冲电路，其中第二主电极由其中具有多个孔的导电材料制成，第二主电极和电介质构件彼此紧密地配置，第二主电极 被薄形成以能够在电介质构件的表面上产生爬电放电， 从而将电子分配成跨越主电极而产生的用于主放电的种子。
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公开(公告)号：US5811754A
公开(公告)日：1998-09-22
申请号：US444871
申请日：1995-05-19
申请人： Hajime Nakatani , Atsushi Sugitatsu , Masao Izumo , Tadao Minagawa , Yasushi Minamitani , Yoshifumi Matsushita , Toshinori Yagi , Nobuyuki Zumoto
发明人： Hajime Nakatani , Atsushi Sugitatsu , Masao Izumo , Tadao Minagawa , Yasushi Minamitani , Yoshifumi Matsushita , Toshinori Yagi , Nobuyuki Zumoto
CPC分类号： B23K26/046 , B23K26/04 , B23K26/043 , B23K26/048 , B23K26/066 , H05K3/0026 , H05K2203/056
摘要： An optical processing apparatus for processing optically a workpiece (7) by using a light beam (B). The apparatus is capable of automatically adjusting a imaging magnification to a predetermined value and at the same time maintaining constant a imaging magnification regardless of exchange of masks (3; 100) and workpieces (7) and for ensuring an extended use life of a mask with satisfactory mask function. The apparatus includes a light source system (1) for generating a light beam (B) for illuminating a mask (3; 100) having a predetermined pattern, a imaging lens (5) for copying a pattern image of the mask (3; 100) onto a workpiece (7), a mask moving mechanism (4) for moving the mask in a direction perpendicular to an optical axis (L) of the imaging lens (5), a workpiece moving mechanism for moving the workpiece in a direction perpendicular to the optical axis (L) of the imaging lens (5), a imaging magnification changing mechanism for changing inter-mask/lens/workpiece distance between the mask, the imaging lens and the workpiece, and a central control unit (9) which is comprised of an actual imaging magnification arithmetic module (91) for determining an actual imaging magnification value (M') in terms of a ratio between the copied pattern image and a predetermined pattern, a magnification decision module (92) for making decision whether or not a difference between the actual imaging magnification value and a desired imaging magnification value is smaller than a permissible value, an optical-axis displacement control module (93) responsive to indication that the difference exceeds a permissible value (.delta.) to thereby arithmetically determine on the basis of the actual and desired imaging magnification values the inter-mask/lens/workpiece distance at which the actual imaging magnification value (M') becomes equal to the desired imaging magnification value (M) for controlling thereby the imaging magnification changing mechanism so that the inter-mask/lens/workpiece distance coincides with the arithmetically determined distance, and a displacement control module for controlling the mask moving mechanism and the workpiece moving mechanism.
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6.发明授权
公开(公告)号：US5661744A
公开(公告)日：1997-08-26
申请号：US512710
申请日：1995-08-08
申请人： Kazuyuki Murakami , Hajime Nakatani , Atsushi Sugitatsu , Tadao Minagawa , Toshinori Yagi , Keiko Ito
发明人： Kazuyuki Murakami , Hajime Nakatani , Atsushi Sugitatsu , Tadao Minagawa , Toshinori Yagi , Keiko Ito
CPC分类号： B23K26/083 , B23K26/066
摘要： An excimer laser beam irradiation apparatus capable of processing a workpiece optimally with an excimer irradiation beam even when intensity distribution of the excimer laser beam undergone multiple reflections is non-uniform. A patterning mask has light-transmissive portions for allowing the excimer laser beam to pass through and a reflecting layer for reflecting it. A high reflectivity mirror disposed in opposition to the reflecting layer reflects the excimer laser beam reflected from the reflecting layer toward the patterning mask. An imaging lens images a pattern of the excimer laser beam transmitted through the patterning mask onto a workpiece for irradiation thereof. A workpiece moving mechanism and a mask moving mechanism move the workpiece and the mask moving mechanism, respectively. A control unit controls the workpiece moving mechanism and the mask moving mechanism such that the patterning mask and the workpiece are displaced along a same axis synchronously with each other in a scan moving direction which coincides with a direction in which the excimer laser beam shifts positionally while being reflected between the patterning mask and the reflecting means, for thereby allowing the workpiece to be scanned with the excimer laser beam. The workpiece can be processed uniformly and stably in accordance with a pattern of the patterning mask with high accuracy and reliability.
摘要翻译： 即使准分子激光束的强度分布发生多次反射也能够用准分子照射光束最佳地处理工件的准分子激光束照射装置是不均匀的。 图形掩模具有用于允许准分子激光束通过的透光部分和用于反射它的反射层。 与反射层相对设置的高反射率反射镜将从反射层反射的准分子激光束朝向图案掩模反射。 成像透镜将通过图案化掩模透射的准分子激光束的图案成像到工件上以进行照射。 工件移动机构和掩模移动机构分别移动工件和掩模移动机构。 控制单元控制工件移动机构和掩模移动机构，使得图案掩模和工件沿着与准分子激光束在位置上移动的方向一致的扫描移动方向沿同一轴线同步地移位，同时 在图案掩模和反射装置之间被反射，从而允许用准分子激光束扫描工件。 可以以高精度和可靠性根据图案化掩模的图案均匀且稳定地加工工件。
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公开(公告)号：US20080213140A1
公开(公告)日：2008-09-04
申请号：US12100435
申请日：2008-04-10
IPC分类号： B01J19/12
CPC分类号： C01B13/11 , C01B2201/60 , C01B2201/66
摘要： An ozone generator for generating ozone by applying a specified process to oxygen by discharge includes a first raw material gas supply unit for supplying the oxygen as a first raw material gas, and a second raw material gas supply unit for supplying an oxide compound gas as a second raw material gas, in which, by excited light, excited and generated by a discharge in the oxygen and the oxide compound gas, the oxide compound gas is dissociated, or the oxide compound gas is excited accelerating dissociation of the oxygen, and ozone is generated. In this way, ozone generation efficiency is raised.
摘要翻译： 一种用于通过排出对氧气进行特定工艺来产生臭氧的臭氧发生器包括：第一原料气体供应单元，用于供应作为第一原料气体的氧;以及第二原料气体供应单元，用于将氧化物化合物气体作为 第二原料气体，其中通过激发光激发并通过在氧气和氧化物化合物气体中的放电产生氧化物化合物气体，氧化物化合物气体被分解，或氧化物化合物气体被激发以促进氧的解离，臭氧是 生成。 这样就可以提高臭氧发生效率。
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公开(公告)号：US20080206115A1
公开(公告)日：2008-08-28
申请号：US12100444
申请日：2008-04-10
IPC分类号： B01J19/08
CPC分类号： C01B13/11 , C01B2201/60 , C01B2201/66
摘要： An ozone generator for generating ozone by applying a specified process to oxygen by discharge includes a first raw material gas supply unit for supplying the oxygen as a first raw material gas, and a second raw material gas supply unit for supplying an oxide compound gas as a second raw material gas, in which, by excited light, excited and generated by a discharge in the oxygen and the oxide compound gas, the oxide compound gas is dissociated, or the oxide compound gas is excited accelerating dissociation of the oxygen, and ozone is generated. In this way, ozone generation efficiency is raised.
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公开(公告)号：US07198765B2
公开(公告)日：2007-04-03
申请号：US10394048
申请日：2003-03-24
申请人： Youichiro Tabata , Akaru Usui , Yujiro Okihara , Tetsuya Saitsu , Norimitsu Esaki , Hajime Nakatani
发明人： Youichiro Tabata , Akaru Usui , Yujiro Okihara , Tetsuya Saitsu , Norimitsu Esaki , Hajime Nakatani
IPC分类号： B01J19/08
CPC分类号： C01B13/11 , C01B2201/12 , C01B2201/22 , C01B2201/70
摘要： An ozone generator in which a discharge region may be enlarged without damaging ozone generating performance. In the ozonizer, an alternating current is applied between a first electrode and a second electrode, and a discharge is produced in a gap into which oxygen is injected. In the first electrode, an ozone gas passage for retrieving ozone gas generated in the discharge region is located between an electrode surface facing the discharge region and a side. The ozone gas passages are dispersed in the first electrode. The ozone gas passages collect ozone generated at discharge region locations inside the first electrode.
摘要翻译： 一种臭氧发生器，其中放电区域可以扩大而不损害臭氧产生性能。 在臭氧发生器中，在第一电极和第二电极之间施加交流电，并且在注入氧气的间隙中产生放电。 在第一电极中，用于回收在放电区域中产生的臭氧气体的臭氧气体通道位于面向放电区域的电极表面与侧面之间。 臭氧气体通道分散在第一电极中。 臭氧气体通道收集在第一电极内部的放电区域处产生的臭氧。
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公开(公告)号：US20150021162A1
公开(公告)日：2015-01-22
申请号：US14376261
申请日：2013-02-12
CPC分类号： C01B13/11 , B01J19/088 , B01J2219/00051 , B01J2219/00164 , B01J2219/0809 , C01B2201/10 , C01B2201/14 , C01B2201/22 , C01B2201/32 , C01B2201/64 , C01B2201/76 , C01B2201/90 , Y02P20/129
摘要： A system including: an ozone generating device including discharge electrodes forming a discharge space; a gas supplying device; a power source device that supplies power to the discharge electrodes; a temperature adjustment device that adjusts temperature of the discharge electrodes; a control unit that controls the ozone generating device; and a detection unit that detects an ozone generation parameter in the ozone generating device. The control unit increases temperature of the discharge electrodes up to a vaporizing temperature of dinitrogen pentoxide by controlling the temperature adjustment device and the gas supplying device or the temperature adjustment device and the power source device, based on the output ozone generation parameter, to thereby switch operation from a normal operation mode to a cleaning operation mode in which surfaces of the discharge electrodes and the discharge space are cleaned up while continuing generation of ozone in the discharge space.
摘要翻译： 一种系统，包括：臭氧发生装置，其包括形成放电空间的放电电极; 气体供给装置; 向放电电极供电的电源装置; 调节放电电极的温度的温度调节装置; 控制单元，其控制所述臭氧发生装置; 以及检测单元，其检测臭氧发生装置中的臭氧产生参数。 控制单元通过基于输出的臭氧产生参数控制温度调节装置和气体供给装置，温度调节装置和电源装置，将放电电极的温度上升到五氧化二氮的蒸发温度，从而切换 从正常操作模式到清洁操作模式的操作，其中放电电极和放电空间的表面被清除，同时在放电空间中继续产生臭氧。
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