-
公开(公告)号：US5811754A
公开(公告)日：1998-09-22
申请号：US444871
申请日：1995-05-19
申请人： Hajime Nakatani , Atsushi Sugitatsu , Masao Izumo , Tadao Minagawa , Yasushi Minamitani , Yoshifumi Matsushita , Toshinori Yagi , Nobuyuki Zumoto
发明人： Hajime Nakatani , Atsushi Sugitatsu , Masao Izumo , Tadao Minagawa , Yasushi Minamitani , Yoshifumi Matsushita , Toshinori Yagi , Nobuyuki Zumoto
CPC分类号： B23K26/046 , B23K26/04 , B23K26/043 , B23K26/048 , B23K26/066 , H05K3/0026 , H05K2203/056
摘要： An optical processing apparatus for processing optically a workpiece (7) by using a light beam (B). The apparatus is capable of automatically adjusting a imaging magnification to a predetermined value and at the same time maintaining constant a imaging magnification regardless of exchange of masks (3; 100) and workpieces (7) and for ensuring an extended use life of a mask with satisfactory mask function. The apparatus includes a light source system (1) for generating a light beam (B) for illuminating a mask (3; 100) having a predetermined pattern, a imaging lens (5) for copying a pattern image of the mask (3; 100) onto a workpiece (7), a mask moving mechanism (4) for moving the mask in a direction perpendicular to an optical axis (L) of the imaging lens (5), a workpiece moving mechanism for moving the workpiece in a direction perpendicular to the optical axis (L) of the imaging lens (5), a imaging magnification changing mechanism for changing inter-mask/lens/workpiece distance between the mask, the imaging lens and the workpiece, and a central control unit (9) which is comprised of an actual imaging magnification arithmetic module (91) for determining an actual imaging magnification value (M') in terms of a ratio between the copied pattern image and a predetermined pattern, a magnification decision module (92) for making decision whether or not a difference between the actual imaging magnification value and a desired imaging magnification value is smaller than a permissible value, an optical-axis displacement control module (93) responsive to indication that the difference exceeds a permissible value (.delta.) to thereby arithmetically determine on the basis of the actual and desired imaging magnification values the inter-mask/lens/workpiece distance at which the actual imaging magnification value (M') becomes equal to the desired imaging magnification value (M) for controlling thereby the imaging magnification changing mechanism so that the inter-mask/lens/workpiece distance coincides with the arithmetically determined distance, and a displacement control module for controlling the mask moving mechanism and the workpiece moving mechanism.
-
2.发明授权
公开(公告)号：US5661744A
公开(公告)日：1997-08-26
申请号：US512710
申请日：1995-08-08
申请人： Kazuyuki Murakami , Hajime Nakatani , Atsushi Sugitatsu , Tadao Minagawa , Toshinori Yagi , Keiko Ito
发明人： Kazuyuki Murakami , Hajime Nakatani , Atsushi Sugitatsu , Tadao Minagawa , Toshinori Yagi , Keiko Ito
CPC分类号： B23K26/083 , B23K26/066
摘要： An excimer laser beam irradiation apparatus capable of processing a workpiece optimally with an excimer irradiation beam even when intensity distribution of the excimer laser beam undergone multiple reflections is non-uniform. A patterning mask has light-transmissive portions for allowing the excimer laser beam to pass through and a reflecting layer for reflecting it. A high reflectivity mirror disposed in opposition to the reflecting layer reflects the excimer laser beam reflected from the reflecting layer toward the patterning mask. An imaging lens images a pattern of the excimer laser beam transmitted through the patterning mask onto a workpiece for irradiation thereof. A workpiece moving mechanism and a mask moving mechanism move the workpiece and the mask moving mechanism, respectively. A control unit controls the workpiece moving mechanism and the mask moving mechanism such that the patterning mask and the workpiece are displaced along a same axis synchronously with each other in a scan moving direction which coincides with a direction in which the excimer laser beam shifts positionally while being reflected between the patterning mask and the reflecting means, for thereby allowing the workpiece to be scanned with the excimer laser beam. The workpiece can be processed uniformly and stably in accordance with a pattern of the patterning mask with high accuracy and reliability.
摘要翻译： 即使准分子激光束的强度分布发生多次反射也能够用准分子照射光束最佳地处理工件的准分子激光束照射装置是不均匀的。 图形掩模具有用于允许准分子激光束通过的透光部分和用于反射它的反射层。 与反射层相对设置的高反射率反射镜将从反射层反射的准分子激光束朝向图案掩模反射。 成像透镜将通过图案化掩模透射的准分子激光束的图案成像到工件上以进行照射。 工件移动机构和掩模移动机构分别移动工件和掩模移动机构。 控制单元控制工件移动机构和掩模移动机构，使得图案掩模和工件沿着与准分子激光束在位置上移动的方向一致的扫描移动方向沿同一轴线同步地移位，同时 在图案掩模和反射装置之间被反射，从而允许用准分子激光束扫描工件。 可以以高精度和可靠性根据图案化掩模的图案均匀且稳定地加工工件。
-
公开(公告)号：US5305339A
公开(公告)日：1994-04-19
申请号：US793430
申请日：1991-12-17
IPC分类号： H01S3/0971 , H01S3/00
CPC分类号： H01S3/0971
摘要： By dissipating a reverse voltage energy occurring on the pulse generation capacitor (4) of a pulse laser apparatus through the diode (11) connected in parallel with this pulse generation capacitor (4), arc or streamer becomes not occurring, and hence the lifetime of the main discharge electrodes become long and a high-repetition rate oscillation becomes possible.
摘要翻译： PCT No.PCT / JP91 / 00152 Sec。 371 1991年12月17日第 102（e）1991年12月17日PCT 1991年2月8日PCT。通过与该脉冲并联连接的二极管（11）消散在脉冲激光装置的脉冲发生电容器（4）上产生的反向电压能量 发电电容器（4）不会发生电弧或流光，因此主放电电极的寿命变长，高重复率振荡成为可能。
-
公开(公告)号：US5243614A
公开(公告)日：1993-09-07
申请号：US795793
申请日：1991-11-21
CPC分类号： G01J3/02 , G01J3/0237 , G01J3/26 , H01S3/137 , G01J2001/4493 , G01J2003/265 , H01S3/225
摘要： A wavelength monitor/stabilizer for narrowly controlling the bandwidth of laser; the monitor/stabilizer uses parameters Q, F or G derived by measuring diameters of interference fringes given by the beam of the wavelength-controlled narrow bandwidth laser e.g. excimer laser and those given by the reference light e.g. of a mercury lamp. The controlling is made by controlling the parameter to be in a predetermined range. An image sensing unit for detecting the interference fringes are splitted into plural image sensors with adjustable distance for enabling more rapid measurement by skipping the in-between part.
摘要翻译： 用于狭窄控制激光带宽的波长监视器/稳定器; 监视器/稳定器使用通过测量由波长控制的窄带宽激光束的波束给出的干涉条纹的直径导出的参数Q，F或G，例如 准分子激光和由参考光给出的那些。 的水银灯。 通过将参数控制在预定范围内来进行控制。 用于检测干涉条纹的图像感测单元被分割成具有可调节距离的多个图像传感器，以通过跳过中间部分来实现更快速的测量。
-
公开(公告)号：US5187716A
公开(公告)日：1993-02-16
申请号：US725098
申请日：1991-07-03
申请人： Kenyu Haruta , Haruhiko Nagai , Hajime Nakatani , Yoshihiko Yamamoto , Taketoshi Takemura , Takashi Eura , Shungo Tsuboi , Yoshifumi Matsushita , Tadao Minagawa
发明人： Kenyu Haruta , Haruhiko Nagai , Hajime Nakatani , Yoshihiko Yamamoto , Taketoshi Takemura , Takashi Eura , Shungo Tsuboi , Yoshifumi Matsushita , Tadao Minagawa
IPC分类号： H01S3/038 , H01S3/0971 , H01S3/225
CPC分类号： H01S3/225 , H01S3/0388 , H01S3/0971
摘要： At least the opposing surface portions of the main electrodes of an excimer laser device are covered with materials which are resistive to chemical etching than nickel. The etching resistive material may be a platinum based alloy containing rhodium, ruthenium, iridium, or osmium; a nickel based alloy containing gold, platinum, rhodium, ruthenium, iridium, or osmium; or rhodium, ruthenium, iridium, or osmium. Thus, an excimer laser device is realized by which the lives of the electrodes and the laser gas are prolonged.
-
公开(公告)号：US5708676A
公开(公告)日：1998-01-13
申请号：US543987
申请日：1995-10-17
CPC分类号： H01S3/09713 , H01S3/0384 , H01S3/225
摘要： A discharge excitation type pulse laser apparatus includes main discharge electrodes and and an auxiliary discharge electrode. In order to make a voltage pulse applied to the auxiliary discharge electrode rise up steeply without incurring any appreciable time lag, a reactor connected in series to a first charging capacitor is constituted by a first saturable reactor 19 with a second saturable reactor being additionally inserted in series to a second charging capacitor. After stray inductance and resistance components of a switch become minimum, inductance of the saturable reactor is first decreased, which is then followed by decreasing of inductance of the first saturable reactor. Degree of steepness of the voltage rise-up for corona and main discharges can set at high values, respectively, whereby preionization is accelerated to allow the main discharge to occur uniformly. The energy injected into the main discharge is increased. Laser output power and oscillation efficiency are enhanced.
摘要翻译： 放电激励型脉冲激光装置包括主放电电极和辅助放电电极。 为了使施加到辅助放电电极的电压脉冲上升而不引起任何明显的时间滞后，与第一充电电容器串联连接的电抗器由第一可饱和电抗器19构成，第一可饱和电抗器19另外插入第二可饱和电抗器 串联到第二个充电电容器。 在开关的杂散电感和电阻分量变得最小之后，可饱和电抗器的电感首先降低，随后降低第一饱和电抗器的电感。 电晕和主放电电压上升的陡度分别可以设定为高值，从而加速前置电位以允许主放电均匀地发生。 注入主放电的能量增加。 激光输出功率和振荡效率得到提高。
-
公开(公告)号：US5347531A
公开(公告)日：1994-09-13
申请号：US752573
申请日：1991-10-02
申请人： Hajime Nakatani , Atsushi Sugitatsu
发明人： Hajime Nakatani , Atsushi Sugitatsu
IPC分类号： H01S3/038 , H01S3/0971 , H01S3/097
CPC分类号： H01S3/09716 , H01S3/0385 , H01S3/0384
摘要： This invention relates to a transverse discharge pumping type pulse laser oscillating device including an electron capturing gas, especially to the configuration of preliminary ionization electrodes (4a, 4b, 8a, 8b). A transverse discharge exciting type pulse laser oscillating device according to this invention has preliminary ionization parts such that the dominant parts of corona discharge are directed to the part between main electrodes (1,2) and the developing lengths (1) of the corona discharge are long. The long developing lengths (1) increase the quantity of emitted ultraviolet rays and the electrodes (4a, 4b, 8a, 8b) are so arranged that the air between the main electrodes (1,2) is irradiated with ultraviolet rays emitted from near the initiating regions of the corona discharge, the initiating regions emitting light whose intensity is greater than those of other regions in the corona discharges. Thereby, a homogeneous main discharge is obtained and the efficiency of the laser oscillation is improved.
摘要翻译： PCT No.PCT / JP91 / 00159 Sec。 371日期1991年10月2日 102（e）1991年10月2日PCT PCT 1991年2月8日PCT公布。 出版物WO92 / 14285 本发明涉及包括电子捕获气体的横向放电泵浦型脉冲激光振荡装置，特别涉及初步电离电极（4a，4b，8a，8b）的构型。 根据本发明的横向放电励磁型脉冲激光振荡装置具有初步电离部分，使得电晕放电的主要部分被引导到主电极（1,2）和电晕放电的显影长度（1）之间的部分 长。 长显影长度（1）增加发射紫外线的量，并且电极（4a，4b，8a，8b）被布置成使得主电极（1,2）之间的空气被照射在从 启动电晕放电的区域，起始区域发射强度大于电晕放电中其他区域的光强度的光。 由此，得到均匀的主放电，提高了激光振荡的效率。
-
公开(公告)号：US5090021A
公开(公告)日：1992-02-18
申请号：US523688
申请日：1990-05-15
申请人： Hajime Nakatani , Atsushi Sugitatsu
发明人： Hajime Nakatani , Atsushi Sugitatsu
IPC分类号： H01S3/097 , H01S3/038 , H01S3/0971 , H01S3/225
CPC分类号： H01S3/09713 , H01S3/038 , H01S3/0384 , H01S3/225
摘要： A discharge exciting pulse laser device such as an exima laser device. The laser device is capable of accelerating the timing of rise of the voltage between an auxiliary electrode and one of main electrodes without decreasing a discharge start voltage between the main electrodes, so that the laser output power is increased and the laser oscillation efficiency is improved.
-
公开(公告)号：US20080213140A1
公开(公告)日：2008-09-04
申请号：US12100435
申请日：2008-04-10
IPC分类号： B01J19/12
CPC分类号： C01B13/11 , C01B2201/60 , C01B2201/66
摘要： An ozone generator for generating ozone by applying a specified process to oxygen by discharge includes a first raw material gas supply unit for supplying the oxygen as a first raw material gas, and a second raw material gas supply unit for supplying an oxide compound gas as a second raw material gas, in which, by excited light, excited and generated by a discharge in the oxygen and the oxide compound gas, the oxide compound gas is dissociated, or the oxide compound gas is excited accelerating dissociation of the oxygen, and ozone is generated. In this way, ozone generation efficiency is raised.
摘要翻译： 一种用于通过排出对氧气进行特定工艺来产生臭氧的臭氧发生器包括：第一原料气体供应单元，用于供应作为第一原料气体的氧;以及第二原料气体供应单元，用于将氧化物化合物气体作为 第二原料气体，其中通过激发光激发并通过在氧气和氧化物化合物气体中的放电产生氧化物化合物气体，氧化物化合物气体被分解，或氧化物化合物气体被激发以促进氧的解离，臭氧是 生成。 这样就可以提高臭氧发生效率。
-
公开(公告)号：US20080206115A1
公开(公告)日：2008-08-28
申请号：US12100444
申请日：2008-04-10
IPC分类号： B01J19/08
CPC分类号： C01B13/11 , C01B2201/60 , C01B2201/66
摘要： An ozone generator for generating ozone by applying a specified process to oxygen by discharge includes a first raw material gas supply unit for supplying the oxygen as a first raw material gas, and a second raw material gas supply unit for supplying an oxide compound gas as a second raw material gas, in which, by excited light, excited and generated by a discharge in the oxygen and the oxide compound gas, the oxide compound gas is dissociated, or the oxide compound gas is excited accelerating dissociation of the oxygen, and ozone is generated. In this way, ozone generation efficiency is raised.
-
-
-
-
-
-
-
-
-
搜索结果
42 条记录 (耗时 0.032 秒)
