RESISTANCE WELDING A POROUS METAL LAYER TO A METAL SUBSTRATE
    3.
    发明申请
    RESISTANCE WELDING A POROUS METAL LAYER TO A METAL SUBSTRATE 有权
    电阻焊接多孔金属层到金属基底

    公开(公告)号:US20120125896A1

    公开(公告)日:2012-05-24

    申请号:US13300151

    申请日:2011-11-18

    IPC分类号: B23K11/00 B23K11/24

    摘要: An apparatus and method are provided for manufacturing an orthopedic prosthesis by resistance welding a porous metal layer of the orthopedic prosthesis onto an underlying metal substrate of the orthopedic prosthesis. The resistance welding process involves directing an electrical current through the porous layer and the substrate, which dissipates as heat to cause softening and/or melting of the materials, especially along the interface between the porous layer and the substrate. The softened and/or melted materials undergo metallurgical bonding at points of contact between the porous layer and the substrate to fixedly secure the porous layer onto the substrate.

    摘要翻译: 提供了一种用于通过将矫形假体的多孔金属层电阻焊到矫形假体的下面的金属基底上来制造整形外科假体的装置和方法。 电阻焊接工艺涉及引导电流通过多孔层和衬底,其消散为热量以引起材料的软化和/或熔化,特别是沿着多孔层和衬底之间的界面。 软化和/或熔化的材料在多孔层和基底之间的接触点处进行冶金结合,以将多孔层牢固地固定到基底上。

    Method for forming textured surfaces on an orthopaedic implant
    10.
    发明授权
    Method for forming textured surfaces on an orthopaedic implant 失效
    在整形外科植入物上形成纹理表面的方法

    公开(公告)号:US5307594A

    公开(公告)日:1994-05-03

    申请号:US990320

    申请日:1992-12-14

    摘要: The method of this invention eliminates the problems discussed above. First a resilient mask 12 is placed on the implant 10. The mask 12 includes openings 14 which form the design of the textured surface. Next the implant 10 with mask 12 attached is subjected to high pressure blasting with a erosive blasting media. Typically, this may be referred to as media blasting. Particles contacting the resilient mask 12 are bounced off or embedded in the masking material while protecting the implant. Particles passing through the openings 14 of the mask 12 contact the surface of the implant 10. Blasting is continued until a proper surface is achieved. After blasting, the mask 12 is removed. Portions of the implant 10 which were exposed are blasted away or textured, portions protected by the mask 12 are unaffected.

    摘要翻译: 本发明的方法消除了上述问题。 首先,将弹性掩模12放置在植入物10上。掩模12包括形成纹理化表面的设计的开口14。 接下来,将附着有掩模12的植入物10用腐蚀性爆破介质进行高压喷砂。 通常,这可以被称为介质爆破。 接触弹性掩模12的颗粒在保护植入物的同时被反弹或嵌入掩模材料中。 通过掩模12的开口14的颗粒接触植入物10的表面。持续喷砂直到达到适当的表面。 在喷砂之后,去除面罩12。 被暴露的植入物10的部分被破坏或纹理化,由掩模12保护的部分不受影响。