公开(公告)号：US5614273A

公开(公告)日：1997-03-25

申请号：US639620

申请日：1996-04-29

申请人： Klaus Goedicke ,  Bert Scheffel ,  Jonathan Reschke ,  Siegfried Schiller ,  Volker Kirchhoff ,  Torsten Werner

发明人： Klaus Goedicke ,  Bert Scheffel ,  Jonathan Reschke ,  Siegfried Schiller ,  Volker Kirchhoff ,  Torsten Werner

IPC分类号： C23C14/24 ,  C23C14/30 ,  C23C14/56 ,  H01J37/305 ,  H05H1/24

CPC分类号： C23C14/562 ,  C23C14/24 ,  C23C14/30 ,  H01J37/3053

摘要： A process and apparatus for plasma-activated electron beam vaporization isrovided. The vaporizing material from at least two vaporizer crucibles is vaporized with electron beams. An electric voltage is applied to the vaporizer crucibles in such a way that the vapor-emitting areas serve as electrodes of an electric discharge. The vaporizing material acts as a cathode or anode. The process and apparatus are preferably intended for the reactive coating of large surfaces and for the reactive coating of components, tools and strip steel.

摘要翻译： 提供了一种用于等离子体激活的电子束蒸发的方法和装置。 来自至少两个蒸发器坩埚的气化材料用电子束蒸发。 以蒸发器坩埚的方式施加电压使得蒸汽发射区域用作放电电极。 蒸发材料充当阴极或阳极。 该方法和装置优选用于大表面的反应性涂层和组件，工具和带钢的反应性涂层。

公开(公告)号：US6083356A

公开(公告)日：2000-07-04

申请号：US91099

申请日：1998-09-14

申请人： Klaus Goedicke ,  Fred Fietzke ,  Jonathan Reschke ,  Wolfgang Hempel ,  Bert Scheffel ,  Christoph Metzner ,  Siegfried Schiller

发明人： Klaus Goedicke ,  Fred Fietzke ,  Jonathan Reschke ,  Wolfgang Hempel ,  Bert Scheffel ,  Christoph Metzner ,  Siegfried Schiller

IPC分类号： C23C14/02 ,  H01J37/32 ,  B01J19/08

CPC分类号： H01J37/32018 ,  C23C14/022 ,  H01J37/34 ,  H01J2237/3322

摘要： Process and apparatus for pre-treatment of a substrate surface in a vacuum by a glow discharge for a subsequent coating process in a vacuum. The process includes maintaining a low pressure glow discharge between the substrate to be pre-treated and a counter-electrode, where the counter-electrode composed of at least a component of the coating to be deposited in the vacuum coating process. The process also includes periodically alternating a polarity of the substrate to act as a cathode or as an anode of the low pressure glow discharge, and individually controlling at least one of pulse length and discharge voltage in both polarities. A frequency of alternation of the polarity is set within a range of between 1 Hz and 1000 kHz. The apparatus includes an evacuatable vacuum chamber, a substrate holder positioned to hold a substrate to be pre-treated, at least one counter-electrode, and an alternating voltage generator coupled to the substrate to be pre-treated and the at least one counter-electrode. The substrate and the counter-electrode are mounted in a potential-free manner.

摘要翻译： PCT No.PCT / EP96 / 05032 Sec。 371日期：1998年9月14日 102（e）1998年9月14日PCT PCT 1996年11月15日PCT公布。 公开号WO97 / 22988 PCT 日期1997年6月26日用于在真空中通过辉光放电在真空中预处理衬底表面以用于在真空中进行随后的涂覆过程的工艺和设备。 该方法包括保持待预处理的基板和反电极之间的低压辉光放电，其中反电极由真空涂覆工艺中要沉积的涂层的至少一部分组成。 该方法还包括周期性地交替使衬底的极性作为阴极或作为低压辉光放电的阳极，以及分别控制两极性的脉冲长度和放电电压中的至少一个。 极性的交替频率设定在1Hz〜1000kHz的范围内。 该装置包括可抽空的真空室，定位成保持待预处理的基板的基板保持器，至少一个对电极和耦合到待预处理的基板的交流电压发生器， 电极。 基板和对电极以无电势的方式安装。

公开(公告)号：US5693417A

公开(公告)日：1997-12-02

申请号：US445523

申请日：1995-05-22

申请人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

发明人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

IPC分类号： C23C14/00 ,  C23C14/08 ,  C23C8/00

CPC分类号： C23C14/081 ,  C23C14/0036 ,  Y10T428/24975 ,  Y10T428/265

摘要： Vacuum coated compound body and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of a metal or of an alloy, a layer that is thermally, mechanically and chemically unstable, with their surface showing cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process wherein at least one layer of a material having an outer layer is of Al.sub.2 O.sub.3, is applied to the metal or alloy carrier at a maximum of 700.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 Gpa and a hardness of at least 20 Gpa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse powered, the pulse frequency lies between 20 and 100 Khz, and the deposition rate is at least 1 nm/s, with the compound bodies being utilized for cutting treatments, particularly as drills, milling cutters, reamers, broaches or saw blades.

摘要翻译： 真空涂层复合体及其生产工艺。 当以已知的方式涂覆时，这种复合体具有金属或合金的载体，即热，机械和化学不稳定的层，其表面显示出裂纹并且是部分多孔的。 通过改进的环保真空沉积工艺克服了这些缺点，其中至少一层具有外层的材料为Al 2 O 3，最多在700℃下施加到金属或合金载体上，该层为 完全结晶并且由αAl 2 O 3相和可能具有（440）织构的γAl 2 O 3相组成，具有至少1Gpa的压缩应力和至少20Gpa的硬度，其中Al 2 O 3层通过反应磁控管沉积 溅射，其中磁控管是脉冲供电的，脉冲频率在20和100KHz之间，并且沉积速率为至少1nm / s，复合体用于切割处理，特别是作为钻头，铣刀，铰刀， 拉刀或锯片。

公开(公告)号：US5846608A

公开(公告)日：1998-12-08

申请号：US722024

申请日：1996-10-11

申请人： Manfred Neumann ,  Klaus Goedicke ,  Siegfried Schiller ,  Jonathan Reschke ,  Henry Morgner ,  Falk Milde ,  Fred Fietzke

发明人： Manfred Neumann ,  Klaus Goedicke ,  Siegfried Schiller ,  Jonathan Reschke ,  Henry Morgner ,  Falk Milde ,  Fred Fietzke

IPC分类号： H05H1/32 ,  C23C14/32 ,  C23C14/56 ,  H01J37/32 ,  H05H1/46 ,  C23C14/08

CPC分类号： H01J37/32422 ,  C23C14/32 ,  C23C14/562 ,  H01J37/32706

摘要： A process an device for ion-supported vacuum coating. The process and the affiliated device is intended to permit the high-rate ating of large-surfaced, electrically conductive and electrically insulating substrates with electrically insulating and electrically conductive coatings with relatively low expenditure. The substrates are predominantly band-shaped, in particular plastic sheets with widths of over a meter. According to the invention, in an intrinsically known device for vacuum coating, alternating negative and positive voltage pulses are applied to the electrically conductive substrate or in electrically insulating substrates, to an electrode disposed directly behind them, e.g. the cooling roller, relative to the plasma or to an electrode that is disposed almost at plasma potential. The form, the voltage, and the duration of the pulses are adapted to the coating task and the material. The process is used particularly for depositing abrasion protection, corrosion protection, and barrier coatings. The user is the packaging industry, among others.

摘要翻译： PCT No.PCT / DE95 / 00476 Sec。 371日期：1996年10月11日 102（e）日期1996年10月11日PCT提交1995年4月7日PCT公布。 公开号WO95 / 28508 日期：1995年10月26日一种用于离子支持真空涂层的装置。 该方法和附属装置旨在允许具有相对较低支出的具有电绝缘和导电涂层的大表面，导电和电绝缘基板的高速涂布。 基底主要是带状，特别是宽度超过一米的塑料片。 根据本发明，在本来已知的用于真空涂覆的装置中，将交替的负电压和正电压脉冲施加到导电衬底或电绝缘衬底，直接设置在其后面的电极，例如， 冷却辊相对于等离子体或几乎处于等离子体电位的电极。 脉冲的形式，电压和持续时间适用于涂层任务和材料。 该方法特别用于沉积磨损保护，防腐蚀和阻隔涂层。 用户是包装行业等。

公开(公告)号：US5614248A

公开(公告)日：1997-03-25

申请号：US424418

申请日：1995-05-30

申请人： Siegfried Schiller ,  Manfred Neumann ,  Volker Kirchhoff ,  Gerhard Zeissig ,  Nicolas Schiller ,  Klaus Goedicke

发明人： Siegfried Schiller ,  Manfred Neumann ,  Volker Kirchhoff ,  Gerhard Zeissig ,  Nicolas Schiller ,  Klaus Goedicke

IPC分类号： C23C14/30 ,  C23C14/00 ,  C23C14/32 ,  C23C14/54 ,  C23C14/56 ,  B05D3/06 ,  H05H1/02

CPC分类号： C23C14/54 ,  C23C14/0021

摘要： Certain non-optical characteristics and, in particular, mechanical characteristics are not measurable in situ in the industrial production of layers using plasma-assisted reactive electron beam vaporization, particularly if high demands are made on the hardness, wear resistance and barrier action, so as to be able to reproducibly apply the layers. The values of the optical layer characteristics are to be used as a control signal. In this method, immediately after the substrate has passed through the vaporizing zone, the reflection and/or transmission and absorption capacity are measured in the wavelength range .DELTA..sub.k =150 to 800 nm and from this are determined the refractive index and optical absorption coefficient. These determined values are compared with an experimentally determined desired value. A control signal obtained therefrom, in the case of a constant reactive gas partial pressure, controls the plasma and maintains constant the optical characteristics of the layer. The method is used in the vapor-deposition of wear-resistance, hard layers or barrier layers, e.g. of metal oxide on glass, plastic and other materials, e.g. in the building industry for facade glass and in the packaging industry.

摘要翻译： PCT No.PCT / DE93 / 00748 Sec。 371日期：1995年5月30日 102（e）日期1995年5月30日PCT提交1993年8月18日PCT公布。 公开号WO94 / 10356 日期1994年5月11日具有非光学特性，特别是在使用等离子体辅助的反应电子束蒸发的工业生产中不能测量机械特性，特别是如果对硬度，耐磨性和阻挡层有高要求 动作，以便能够可重复地应用层。 光层特性的值被用作控制信号。 在该方法中，在基板通过蒸发区之后，在DELTA k = 150〜800nm的波长范围内测定反射和/或透射吸收能力，由此确定折射率和光吸收系数。 将这些确定的值与实验确定的期望值进行比较。 在恒定的反应气体分压的情况下，从其获得的控制信号控制等离子体并保持该层的光学特性恒定。 该方法用于耐磨性，硬质层或阻挡层的气相沉积，例如， 玻璃，塑料和其他材料上的金属氧化物，例如。 在建筑行业的立面玻璃和包装行业。

公开(公告)号：US5698314A

公开(公告)日：1997-12-16

申请号：US445521

申请日：1995-05-22

申请人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

发明人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

IPC分类号： C04B35/622 ,  C04B41/50 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C23C14/00 ,  C23C14/08

CPC分类号： C04B41/87 ,  C04B35/62222 ,  C04B41/5031 ,  C04B41/52 ,  C04B41/89 ,  C23C14/0036 ,  C23C14/081 ,  Y10T428/2916

摘要： Compound body of a vacuum coated sintered material and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of sintered material coated with a layer that is thermally, mechanically and chemically unstable, with their surface showings cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process, wherein at least one layer of a material, having an outer layer of Al.sub.2 O.sub.3, is applied to the carrier of sintered material at a maximum of 800.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub..sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 GPa and a hardness of at least 20 GPa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse driven, the pulse frequency lies between 20 and 100 Khz and the deposition rate is at least 1 nm/s, with the resulting compound bodies being utilized for cutting treatments, particularly as cemented carbide inserts.

摘要翻译： 真空涂覆烧结材料的复合体及其制造方法。 这种复合体以已知的方式涂覆时，具有涂覆有热，机械和化学不稳定的层的烧结材料的载体，其表面显示出裂纹并且是部分多孔的。 通过改进的环保真空沉积工艺克服了这些缺点，其中至少一层具有Al 2 O 3外层的材料最多在800℃下施加到烧结材料的载体上，该层 是完全结晶的，并且由αAl 2 O 3相和可能具有（440）织构的γAl 2 O 3相组成，具有至少1GPa的压缩应力和至少20GPa的硬度，Al 2 O 3层通过反应性沉积 磁控管溅射，其中磁控管是脉冲驱动的，脉冲频率在20和100KHz之间，并且沉积速率为至少1nm / s，所得到的复合体用于切割处理，特别是作为硬质合金刀片。

公开(公告)号：US5470388A

公开(公告)日：1995-11-28

申请号：US307663

申请日：1994-11-23

申请人： Klaus Goedicke ,  Christoph Metzner ,  Joerg Schmidt ,  Ullrich Heisig ,  Siegfried Schiller ,  Jonathan Reschke

发明人： Klaus Goedicke ,  Christoph Metzner ,  Joerg Schmidt ,  Ullrich Heisig ,  Siegfried Schiller ,  Jonathan Reschke

IPC分类号： C23C14/50 ,  C23C14/22 ,  C23C16/50 ,  C23C14/00

CPC分类号： C23C14/223 ,  C23C14/22

摘要： Device for the vacuum coating of mass produced products. By means of the ice small parts, such as screws and bolts, as mass produced products are highly productively coated by vacuum deposition or sputtering, also under plasma action. In a container is located a drum rotatable at high speed about its horizontal axis and in which the parts to be coated are fixed to the inner wall by centrifugal force. The surface of the inner wall is geometrically constructed such that the parts to be coated are reliably held and moved with it. The coating devices are located in the drum. A stripping device, whose spacing with respect to the inner wall is adjustable at programmable time intervals, is located in the drum and has an abutment surface directed opposite to the rotation direction.

摘要翻译： PCT No.PCT / DE93 / 00201 Sec。 371日期1994年11月23日 102（e）日期1994年11月23日PCT 1993年3月3日PCT公布。 出版物WO93 / 19217 日期1993年9月30日。批量生产产品的真空镀膜设备。 通过设备的小部件，例如螺钉和螺栓，通过真空沉积或溅射也可以在等离子体作用下大量生产大量生产的产品。 在容器中设置有以其高度绕其水平轴线可高速旋转的滚筒，其中待涂覆的部件通过离心力固定在内壁上。 内壁的表面是几何构造的，使得待涂覆的部件被可靠地保持和移动。 涂层装置位于滚筒中。 相对于内壁的间隔可以以可编程的时间间隔调节的剥离装置位于滚筒中并且具有与旋转方向相反的抵接表面。

公开(公告)号：US06444086B1

公开(公告)日：2002-09-03

申请号：US09555905

申请日：2000-08-31

申请人： Gerd Andler ,  Wolfgang Wixwat-Ernst ,  Christoph Metzner ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Siegfried Schiller

发明人： Gerd Andler ,  Wolfgang Wixwat-Ernst ,  Christoph Metzner ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Siegfried Schiller

IPC分类号： C23F100

CPC分类号： C23C14/50 ,  C23C14/022 ,  C23C14/568 ,  F16C33/14

摘要： Existing devices for vacuum coating substrates having different shapes, either in continuous or hatch facilities, are equipped in such a way that several coatings are applied after a coating process. The slide bearings are to be coated with several coats and the coating materials used and the conditions related thereto require the use of several coating techniques. This relates inter alia to conveyance parameters. Existing facilities fail to meet these requirements. According to the invention, such a device comprises several aligned processing chambers. Slide bearings which are held together by positive and non-positive fit in tempered carrier bodies are displaced through said chambers comprising pretreatment, atomization and evaporation chambers using a conveyance system adapted to this process. A tempering device for the carrier bodies is connected upstream from the coating track. Corresponding inlet and outlet channels enable air-to-air conveyance.

摘要翻译： 在连续或舱口设施中具有不同形状的真空涂覆基材的现有装置以这样的方式装备，使得在涂覆工艺之后施加若干涂层。 滑动轴承应涂覆几层，所用的涂层材料和相关条件需要使用几种涂层技术。 这尤其涉及输送参数。 现有设施不符合这些要求。 根据本发明，这种装置包括几个对准的处理室。 通过正和非正配合保持在回火承载体中的滑动轴承通过适于该过程的输送系统而被移动通过包括预处理，雾化和蒸发室的所述室。 用于承载体的回火装置连接在涂层轨迹的上游。 相应的入口和出口通道可进行空气 - 空气输送。

公开(公告)号：US06673430B2

公开(公告)日：2004-01-06

申请号：US10151821

申请日：2002-05-22

申请人： Siegfried Schiller ,  Klaus Goedicke ,  Fred Fietzke ,  Olaf Zywitzki ,  Mats Sjöstrand ,  Björn Ljungberg ,  Tomas Hilding ,  Viveka Alfredsson

发明人： Siegfried Schiller ,  Klaus Goedicke ,  Fred Fietzke ,  Olaf Zywitzki ,  Mats Sjöstrand ,  Björn Ljungberg ,  Tomas Hilding ,  Viveka Alfredsson

IPC分类号： B32B900

CPC分类号： C23C14/081 ,  C23C14/352 ,  Y10T407/27 ,  Y10T428/24975 ,  Y10T428/25 ,  Y10T428/252 ,  Y10T428/265

摘要： The present invention describes a coated cutting tool for metal machining. The coating is formed by one or more layers of refractory compounds of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al2O3, with a grainsize less than 0.1 &mgr;m. The Al2O3 layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450° C. to 700° C. preferably 550° C. to 650° C., depending on the particular material of the tool body to be coated. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (400) and (440) planes occurring at the 2&thgr;0- angles 45.8 and 66.8 degrees when using CuK&agr; radiation identify the &ggr;-phase Al2O3. The alumina layer is also very strongly textured in the [440]-direction. The Al2O3 layer is virtually free of cracks and halogen impurities. Furthermore, the Al2O3 layer gives the cutting edge of the tool an extremely smooth surface finish.

摘要翻译： 本发明描述了一种用于金属加工的涂层切割工具。 涂层由一层或多层难熔化合物形成，其中至少一层细晶粒结晶γ相氧化铝Al 2 O 3具有小于0.1μm的颗粒。 根据工具的具体材料，在450℃至700℃，优选550℃至650℃的衬底温度下，用双极脉冲DMS技术（双重磁控管溅射）沉积Al 2 O 3层。 身体涂层。 通过X射线衍射鉴定γ相氧化铝。 当使用CuKalpha辐射时，在2θ角45.8°和66.8°处发生的（400）和（440）平面的反射识别γ相Al2O3。 氧化铝层在[440] - 方向上也非常强烈地纹理化。 Al2O3层实际上没有裂纹和卤素杂质。 此外，Al2O3层使刀具的切削刃具有非常光滑的表面光洁度。

公开(公告)号：US06451180B1

公开(公告)日：2002-09-17

申请号：US09563419

申请日：2000-05-02

申请人： Siegfried Schiller ,  Klaus Goedicke ,  Fred Fietzke ,  Olaf Zywitzki ,  Mats Sjöstrand ,  Björn Ljungberg

发明人： Siegfried Schiller ,  Klaus Goedicke ,  Fred Fietzke ,  Olaf Zywitzki ,  Mats Sjöstrand ,  Björn Ljungberg

IPC分类号： C23C1434

CPC分类号： C23C14/345 ,  C23C14/0042 ,  C23C14/081 ,  C23C14/35 ,  C23C28/044 ,  C23C30/005

摘要： The present invention relates to a process for producing a coated cutting tool consisting of a coating and a substrate, wherein at least one refractory layer consisting of fine-grained, crystalline &ggr;-Al2O3 is deposited by reactive magnetron sputtering onto the moving substrate in a vacuum by pulsed magnetron sputtering in a mixture of a rare gas and a reactive gas at a pulse frequency set for 10 to 100 kHz. The deposition occurs with a rate of at least 1 nm/s with reference to a stationarily arranged substrate at a magnetron target power density in time average set for at least 10 W/cm2. The substrate temperature is in the range 400 to 700° C. and the flux of impinging particles onto each individual substrate is cyclically interrupted.

摘要翻译： 本发明涉及一种用于生产由涂层和基材组成的涂层切割工具的方法，其中至少一个由细晶粒结晶γ-Al 2 O 3构成的难熔层通过反应性磁控溅射在真空中沉积到移动的基板上 通过脉冲磁控溅射在设定为10至100kHz的脉冲频率的稀有气体和反应性气体的混合物中。 相对于以至少10W / cm 2的时间平均值的磁控管目标功率密度的固定布置的基板，沉积以至少1nm / s的速率发生。 衬底温度在400至700℃的范围内，并且每个单独衬底上的入射颗粒的通量被循环地中断。