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1.发明授权
公开(公告)号：US4083834A
公开(公告)日：1978-04-11
申请号：US605699
申请日：1975-08-18
摘要： A process for producing a polymer having functional groups at its chain terminals, which comprises reacting a polymer having alkali metal atoms at its chain terminals with an alkylene oxide or sulfide in a hydrocarbon medium having a solubility parameter of 7.2 or less at 25.degree. C. This process makes it possible to produce the said polymer in a short period of time without necessitating a large power for agitation. According to this process, there can be produced a polymer having a functionality near the theoretical functionality in a short period of time.
摘要翻译： 一种制备在其末端具有官能团的聚合物的方法，其包括使其末端具有碱金属原子的聚合物与环氧烷或硫化物在溶解度参数为7.2以下的烃介质中在25℃下反应。 该方法使得可以在短时间内生产所述聚合物，而不需要大的搅拌功率。 根据该方法，可以在短时间内产生具有接近理论官能度的官能团的聚合物。
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2.发明授权Exposure apparatus, structure, method for setting up apparatus, and device manufacturing method having filling member formed by hardening liquid to support setting leg 有权用于设置装置的曝光装置，结构，方法以及具有通过硬化液体形成的填充构件以支撑设置腿的装置制造方法公开(公告)号：US08780329B2
公开(公告)日：2014-07-15
申请号：US12341412
申请日：2008-12-22
申请人： Hiromichi Hara , Yasuyo Kawabata
发明人： Hiromichi Hara , Yasuyo Kawabata
CPC分类号： G03F7/70833 , G03F7/709 , G03F7/7095
摘要： An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system 110. The exposure apparatus includes a setting leg 105, platens 103, 107, and 109 on which at least one of a reticle stage apparatus 108 configured to hold the original, the projection optical system 110, a wafer stage apparatus 102 configured to hold the wafer, and an interferometer configured to measure a position of the original stage or the wafer stage is mounted, a vibration isolation support mechanism 105 which is provided between the platens 103, 107, and 109 and the setting leg 105 and configured to reduce a vibration, and a filling member 122 formed by hardening a hardening type liquid 113 which is filled between the setting leg 105 and a setting floor 101.
摘要翻译： 本发明的曝光装置被配置为经由投影透镜系统110将原稿上的图案曝光到晶片上。曝光装置包括设置支脚105，压板103,107和109，其上至少一个光罩 被配置为保持原稿的投影光学系统110，被配置为保持晶片的晶片台装置102和配置成测量原始台或晶片台的位置的干涉仪被安装，隔振支撑机构 105，其设置在压板103,107,109与设置支柱105之间，并且被构造成减少振动;以及填充构件122，其通过硬化硬化型液体113而形成，硬化型液体113填充在设置腿105和设定板 101。
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公开(公告)号：US20090195767A1
公开(公告)日：2009-08-06
申请号：US12361296
申请日：2009-01-28
申请人： Masatomi Yoshida , Hiromichi Hara
发明人： Masatomi Yoshida , Hiromichi Hara
IPC分类号： G03B27/58
CPC分类号： G03B27/58 , G03F7/70833 , G03F7/709
摘要： An exposure apparatus comprises a component configured to project a pattern of an original onto a substrate, a structure configured to support the component, a support configured to support the structure, a gas spring which is located between the structure and the support and configured to support the structure, and a stopper accommodated in an internal space of the gas spring so as to prevent the structure from moving relative to the support in excess of an allowable level.
摘要翻译： 曝光装置包括被配置为将原稿的图案投影到基板上的部件，被配置为支撑部件的结构，被配置为支撑结构的支撑件，位于结构和支撑件之间并被配置为支撑 所述结构和容纳在所述气弹簧的内部空间中的止动件，以防止所述结构相对于所述支撑件移动超过允许水平。
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公开(公告)号：US20070160356A1
公开(公告)日：2007-07-12
申请号：US11688370
申请日：2007-03-20
申请人： Hiromichi Hara
发明人： Hiromichi Hara
IPC分类号： G03B17/00
CPC分类号： G03B27/42 , G03F7/70841 , G03F7/709
摘要： An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.
摘要翻译： 一种包括用于将基板暴露于能量图案的曝光系统的设备，具有包括能够彼此分离的第一和第二单元的外壁的真空室和由所述第一单元支撑的第一防振安装座， 并用于支持曝光系统的第一组成元件。 第一防振支架设置在真空室的外部。 该装置还包括由第二单元支撑的用于支撑曝光系统的第二构成元件的第二防振安装座。
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公开(公告)号：US6048659A
公开(公告)日：2000-04-11
申请号：US165096
申请日：1998-10-02
申请人： Masaaki Inoue , Katsumi Inomata , Hiromichi Hara , Yoshiji Yumoto
发明人： Masaaki Inoue , Katsumi Inomata , Hiromichi Hara , Yoshiji Yumoto
CPC分类号： G03F7/0048 , G03F7/022
摘要： A radiation-sensitive resin composition including (1) an alkali-soluble resin, (2) a quinonediazide compound and (3) a mixed solvent including a monoketone having 7 to 14 carbon atoms and an alkoxypropionic acid alkyl ester is provided. The composition can be coated in a uniform thickness in a small coating weight. The composition has a high sensitivity and a high resolution, and also enables formation of resist patterns having a superior pattern shape with less pattern defects. Thus, it is suitable as a positive resist.
摘要翻译： 提供了包含（1）碱溶性树脂，（2）醌二叠氮化合物和（3）含有7-14个碳原子的单酮和烷氧基丙酸烷基酯的混合溶剂的辐射敏感性树脂组合物。 组合物可以以小的涂层重量以均匀的厚度涂覆。 该组合物具有高灵敏度和高分辨率，并且还能够形成具有较少图案缺陷的优异图案形状的抗蚀剂图案。 因此，它适合作为正性抗蚀剂。
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公开(公告)号：US07060414B2
公开(公告)日：2006-06-13
申请号：US11080400
申请日：2005-03-16
申请人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
发明人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
IPC分类号： G03F7/04
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106 , Y10S430/114 , Y10S430/115 , Y10S430/118 , Y10S430/122
摘要： A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.
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公开(公告)号：US20050158657A1
公开(公告)日：2005-07-21
申请号：US11080400
申请日：2005-03-16
申请人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
发明人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106 , Y10S430/114 , Y10S430/115 , Y10S430/118 , Y10S430/122
摘要： A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.
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公开(公告)号：US06862077B2
公开(公告)日：2005-03-01
申请号：US10263311
申请日：2002-10-03
申请人： Hiromichi Hara
发明人： Hiromichi Hara
CPC分类号： G03F7/70725 , G03F7/70833 , G03F7/709
摘要： An anti-vibration system includes air dampers of high natural frequency, in a compact space. A pair of air dampers are disposed with their driving directions opposed to each other, and inside pressures of these dampers are variably controlled so as to set the natural vibration frequency.
摘要翻译： 防振系统包括在较小的空间中具有高固有频率的空气阻尼器。 一对空气阻尼器的驱动方向彼此相反地设置，并且这些阻尼器的内部压力被可变地控制，以便设定固有的振动频率。
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公开(公告)号：US06512571B2
公开(公告)日：2003-01-28
申请号：US09300521
申请日：1999-04-28
申请人： Hiromichi Hara
发明人： Hiromichi Hara
IPC分类号： G03B2742
CPC分类号： G03F7/70725 , G03F7/70833 , G03F7/709
摘要： An anti-vibration system with air dampers of high natural frequency, in a compact space. A pair of air dampers are disposed with their driving directions opposed to each other, and inside pressures of these dampers are variably controlled so as set the natural vibration frequency.
摘要翻译： 在紧凑的空间内，具有高固有频率的空气阻尼器的防振系统。 一对空气阻尼器的驱动方向彼此相反地设置，并且这些阻尼器的内部压力被可变地控制以设定固有的振动频率。
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公开(公告)号：US07944546B2
公开(公告)日：2011-05-17
申请号：US12361296
申请日：2009-01-28
申请人： Masatomi Yoshida , Hiromichi Hara
发明人： Masatomi Yoshida , Hiromichi Hara
CPC分类号： G03B27/58 , G03F7/70833 , G03F7/709
摘要： An exposure apparatus comprises a component configured to project a pattern of an original onto a substrate, a structure configured to support the component, a support configured to support the structure, a gas spring which is located between the structure and the support and configured to support the structure, and a stopper accommodated in an internal space of the gas spring so as to prevent the structure from moving relative to the support in excess of an allowable level.
摘要翻译： 曝光装置包括被配置为将原稿的图案投影到基板上的部件，被配置为支撑部件的结构，被配置为支撑结构的支撑件，位于结构和支撑件之间并被配置为支撑 所述结构和容纳在所述气弹簧的内部空间中的止动件，以防止所述结构相对于所述支撑件移动超过允许水平。
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