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    POSITIVE RESIST COMPOSITION
    1.
    发明申请
    POSITIVE RESIST COMPOSITION 有权
    积极抵抗组成

    公开(公告)号：US20080096130A1

    公开(公告)日：2008-04-24

    申请号：US11926479

    申请日：2007-10-29

    申请人： Koji Shirakawa ,  Toru Fujimori ,  Shoichiro Yasunami

    发明人： Koji Shirakawa ,  Toru Fujimori ,  Shoichiro Yasunami

    IPC分类号： G03C1/73

    CPC分类号： G03F7/0392 ,  G03F7/0397 ,  Y10S430/122

    摘要： A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.

    摘要翻译： 一种正型抗蚀剂组合物，其包含（a）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，含有具有本说明书中定义的由式（X）表示的基团的结构单元，其重均分子量 分子量不大于5000，并且基于酸分解基团的数量和未被酸保护的碱可溶性基团的总数，含有不大于40％的酸分解基团 可分解基团，和（b）在光化射线或辐射照射时产生酸的化合物。

    Positive resist composition
    2.
    发明授权
    Positive resist composition 有权
    正抗蚀剂组成

    公开(公告)号：US08080362B2

    公开(公告)日：2011-12-20

    申请号：US11926479

    申请日：2007-10-29

    申请人： Koji Shirakawa ,  Toru Fujimori ,  Shoichiro Yasunami

    发明人： Koji Shirakawa ,  Toru Fujimori ,  Shoichiro Yasunami

    IPC分类号： G03C1/00 ,  G03F7/00 ,  H01L21/00

    CPC分类号： G03F7/0392 ,  G03F7/0397 ,  Y10S430/122

    摘要： A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.

    摘要翻译： 一种正型抗蚀剂组合物，其包含（a）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，含有具有本说明书中定义的由式（X）表示的基团的结构单元，其重均分子量 分子量不大于5000，并且基于酸分解基团的数量和未被酸保护的碱可溶性基团的总数，含有不大于40％的酸分解基团 可分解基团，和（b）在光化射线或辐射照射时产生酸的化合物。

    Positive resist composition
    3.
    发明授权
    Positive resist composition 有权
    正抗蚀剂组成

    公开(公告)号：US07361446B2

    公开(公告)日：2008-04-22

    申请号：US10812074

    申请日：2004-03-30

    申请人： Koji Shirakawa ,  Toru Fujimori ,  Shoichiro Yasunami

    发明人： Koji Shirakawa ,  Toru Fujimori ,  Shoichiro Yasunami

    IPC分类号： G03C1/73 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0392 ,  G03F7/0397 ,  Y10S430/122

    摘要： A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.

    摘要翻译： 一种正型抗蚀剂组合物，其包含（a）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，含有具有本说明书中定义的由式（X）表示的基团的结构单元，其重均分子量 分子量不大于5000，并且基于酸分解基团的数量和未被酸保护的碱可溶性基团的总数，含有不大于40％的酸分解基团 可分解基团，和（b）在光化射线或辐射照射时产生酸的化合物。

    Positive resist composition
    5.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号：US06489080B2

    公开(公告)日：2002-12-03

    申请号：US09449899

    申请日：1999-12-02

    申请人： Kazuya Uenishi ,  Toru Fujimori ,  Kunihiko Kodama ,  Koji Shirakawa ,  Shiro Tan

    发明人： Kazuya Uenishi ,  Toru Fujimori ,  Kunihiko Kodama ,  Koji Shirakawa ,  Shiro Tan

    IPC分类号： G03F7027

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/115

    摘要： The present invention provides a positive electron beam or X-ray resist composition containing (a) a compound which generates an acid by the irradiation with radiation and (b) a compound having a cationic polymerizable function. The positive electron beam or X-ray resist composition is high sensitivity, has high resolution, can provide an excellent rectangular pattern profile, and is excellent in PCD stability and PED stability.

    摘要翻译： 本发明提供一种正电子束或X射线抗蚀剂组合物，其含有（a）通过辐射照射产生酸的化合物和（b）具有阳离子可聚合官能团的化合物。 正电子束或X射线抗蚀剂组成灵敏度高，分辨率高，可提供优异的矩形图案，PCD稳定性和PED稳定性优异。

    Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
    7.
    发明授权
    Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same 有权
    光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法

    公开(公告)号：US08877423B2

    公开(公告)日：2014-11-04

    申请号：US13378387

    申请日：2010-06-30

    申请人： Kana Fujii ,  Toru Fujimori

    发明人： Kana Fujii ,  Toru Fujimori

    IPC分类号： G03F7/004 ,  G03F7/028

    CPC分类号： G03F7/0048 ,  C08F8/02 ,  C08F12/22 ,  C08F12/24 ,  C08F12/32 ,  C08F212/14 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0397 ,  C08F220/10 ,  C08F2220/1841

    摘要： An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided.

    摘要翻译： 一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（A）含有本说明书中定义的式（I）表示的重复单元的树脂，由说明书中定义的式（II）表示的重复单元和 由本说明书中定义的式（III-a）或（III-b）表示的重复单元; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）溶剂，其中溶剂（C）含有乳酸乙酯，并且提供使用该组合物的膜和图案形成方法。

    Dye-containing negative curable composition, color filter and method of producing color filter
    9.
    发明授权
    Dye-containing negative curable composition, color filter and method of producing color filter 有权
    含染料的阴性固化性组合物，滤色器及彩色滤光片的制造方法

    公开(公告)号：US08298731B2

    公开(公告)日：2012-10-30

    申请号：US12318740

    申请日：2009-01-07

    申请人： Toru Fujimori

    发明人： Toru Fujimori

    IPC分类号： G02B5/20 ,  G03F7/00

    CPC分类号： G03F7/0007 ,  G03F7/0048 ,  G03F7/027

    摘要： The present invention provides a dye-containing negative curable composition including a dye that is soluble in an organic solvent, a photopolymerization initiator, a photopolymerizable compound, and cyclopentanone; a color filter formed from the dye-containing negative curable composition; and a method of producing the color filter.

    摘要翻译： 本发明提供含有可溶于有机溶剂的染料，光聚合引发剂，光聚合性化合物和环戊酮的含染料阴性固化性组合物。 由含有染料的可固化组合物形成的滤色器; 以及制造滤色器的方法。

    Process for producing dye-containing negative curable composition, color filter, and color filter production process
    10.
    发明授权
    Process for producing dye-containing negative curable composition, color filter, and color filter production process 有权
    含有染料的阴性固化性组合物的制造方法，滤色器，滤色器的制造方法

    公开(公告)号：US07981577B2

    公开(公告)日：2011-07-19

    申请号：US11848639

    申请日：2007-08-31

    申请人： Toru Fujimori

    发明人： Toru Fujimori

    IPC分类号： G02B5/20

    CPC分类号： G03F7/0007 ,  G02B5/223 ,  G03F7/26

    摘要： According to an aspect of the invention, there is provided a process for producing a dye-containing negative curable composition, the process including passing a mixture containing a dye, a photopolymerization initiator, and a radical polymerizable monomer through a filter having a pore diameter of from not less than 0.02 μm to less than 0.2 μm.

    摘要翻译： 根据本发明的一个方面，提供了一种制备含染料的负极固化性组合物的方法，该方法包括使含有染料，光聚合引发剂和可自由基聚合的单体的混合物通过孔径为 从不小于0.02μm到小于0.2μm。