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1.发明授权Developing roller, and method and apparatus for developing latent images using the roller 失效显影辊，以及使用辊显影潜像的方法和装置
公开(公告)号：US5565968A
公开(公告)日：1996-10-15
申请号：US523041
申请日：1995-09-01
Applicant: Eiji Sawa , Ryuta Tanaka , Yuichiro Mori , Tokuo Okada , Yoshio Takizawa , Koji Takagi , Takahiro Kawagoe
Inventor： Eiji Sawa , Ryuta Tanaka , Yuichiro Mori , Tokuo Okada , Yoshio Takizawa , Koji Takagi , Takahiro Kawagoe
IPC: G03G15/08
CPC classification number: G03G15/0818 , G03G2215/0861
Abstract: A developing roller comprising a conductive layer formed around a shaft carries a non-magnetic one-component developer on its outer surface to form a thin film of the developer and contacts a photoconductor drum having an electrostatic latent image borne on its surface whereby the latent image is developed to form a toner image. In one embodiment, the surface of the conductive layer has a DIN 4776 core roughness depth Rk of 0.5-3.5 .mu.m in a circumferential direction of the roller, and the ratio of circumferential Rk to axial Rk is greater than 1.0. In another embodiment, the surface of the conductive layer is provided with microscopic ridges and recesses which are alternately disposed in a rotational direction to define wavy streaks having a longitudinal direction substantially aligned with an axial direction of the roller.
Abstract translation: 包括形成在轴周围的导电层的显影辊在其外表面上承载非磁性单组分显影剂以形成显影剂的薄膜并与其表面上具有静电潜像的感光鼓相接触，由此潜像 被开发以形成调色剂图像。 在一个实施例中，导电层的表面在辊的圆周方向上具有0.5-3.5μm的DIN 4776芯粗糙度深度R k，并且周向R k与轴向R k的比率大于1.0。 在另一个实施例中，导电层的表面设置有微小的脊和凹槽，其沿旋转方向交替地设置，以限定具有与辊的轴向方向基本对齐的纵向方向的波浪状条纹。
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公开(公告)号：US5878313A
公开(公告)日：1999-03-02
申请号：US883601
申请日：1997-06-26
Applicant: Koji Takagi , Yoshio Takizawa , Eiji Sawa
Inventor： Koji Takagi , Yoshio Takizawa , Eiji Sawa
CPC classification number: B82Y15/00 , B29C45/0013 , B29C45/401 , G03G15/0921 , H01F41/0266 , H01F41/028 , H01F7/0268 , B29C33/442 , B29K2105/16 , B29K2995/0008 , B29L2031/324
Abstract: A developing roller (1) includes a highly conductive shaft (2) and a conductive elastic layer (3). When the developing roller carring a one-component developer thereon comes in contact with or in proximity to an image forming body, the developer is supplied from the roller to a surface of the image forming body, thereby forming a visible image on the image forming body surface. The elastic layer (3) has applied to its surface a resin component having an elongation at rupture of less than 10% as measured according to JIS K7113. The developing roller ensures that images of high quality are reproduced without a drop of image density over a long period of time.
Abstract translation: 显影辊（1）包括高导电轴（2）和导电弹性层（3）。 当在其上接触单组分显影剂的显影辊与图像形成体接触或接近时，显影剂从辊被提供到图像形成体的表面，从而在图像形成体上形成可见图像 表面。 根据JIS K7113测定，弹性层（3）在其表面上施加了断裂伸长率小于10％的树脂成分。 显影辊确保高质量的图像在长时间不会降低图像密度的情况下再现。
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3.发明申请DEVELOPING ROLLER, DEVELOPING APPARATUS COMPRISING THE DEVELOPING ROLLER, AND METHOD FOR PROVIDING THE DEVELOPING ROLLER 有权开发滚子，包含开发滚子的开发设备和提供开发滚子的方法公开(公告)号：US20090257789A1
公开(公告)日：2009-10-15
申请号：US12422888
申请日：2009-04-13
Applicant: John JANSEN , Tsuyoshi Tokiwa , Eiji Sawa
Inventor： John JANSEN , Tsuyoshi Tokiwa , Eiji Sawa
CPC classification number: G03G15/0818 , B65H27/00 , B65H2401/11 , C08L33/06 , C09D5/24 , C09D175/06 , G03G15/0233 , G03G15/1685 , G03G2215/0861 , C08L2666/04
Abstract: Developing roller comprising a conductive mandrel with at least an elastic conductive base layer and a charge providing layer. The base layer is located closer to the mandrel than the charge providing layer. The base layer is roughened before the charge providing layer is applied to the base layer.
Abstract translation: 显影辊包括具有至少弹性导电基底层和电荷提供层的导电芯棒。 基底层比电荷提供层更靠近心轴。 在将电荷提供层施加到基底层之前，将基底层粗糙化。
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公开(公告)号：US07466854B2
公开(公告)日：2008-12-16
申请号：US11197501
申请日：2005-08-05
Applicant: Eiji Sawa , Hiromu Inoue
Inventor： Eiji Sawa , Hiromu Inoue
CPC classification number: G06T7/0006 , G01B11/028 , G01B11/2433 , G06K9/4638 , G06T2207/30148
Abstract: A pair of edges that are located at ends as viewed in the widthwise direction of a design pattern are recognized. On the basis of the edge direction in which the paired edges are recognized, edge points on the design pattern are detected as sub-pixels. The widthwise dimension of the design pattern is calculated on the basis of the edge points. In addition, the widthwise dimension of a circuit pattern is calculated at the same position as the widthwise dimension of the design pattern. On the basis of the calculated widthwise dimensions, the semiconductor wafer circuit pattern is checked.
Abstract translation: 识别位于设计图案的宽度方向上观察的端部处的一对边缘。 基于识别成对边缘的边缘方向，设计图案上的边缘点被检测为子像素。 基于边缘点计算设计图案的宽度尺寸。 此外，在与设计图案的宽度尺寸相同的位置处计算电路图案的宽度尺寸。 基于计算出的宽度方向尺寸，检查半导体晶片电路图案。
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5.发明申请公开(公告)号：US20110058729A1
公开(公告)日：2011-03-10
申请号：US12857906
申请日：2010-08-17
Applicant: Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
Inventor： Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
IPC: G06K9/00
CPC classification number: G01N21/956 , G03F1/84 , G03F7/70525 , G03F7/70625 , G03F7/7065
Abstract: According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.
Abstract translation: 根据一个实施例，用于光掩模的图案特性检测装置包括检测数据创建部分，参考数据创建部分，提取部分，第一区域设置部分，检测部分和收集部分。 检测数据创建部分被配置为基于形成在光掩模上的图案的光学图像来创建检测数据。 参考数据创建部分被配置为创建该图案的参考数据。 提取部分被提取用于图案特征检测的图案和提取的图案的位置信息。 第一区域设定部被配置为设定要检测图案特性的区域，并且被配置为提取目标图案。 检测部被配置为检测该区域内的目标图案的图案特性。 此外，收集部分被配置为收集检测到的图案特征。
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Patent Agency Ranking
公开(公告)号：US06965687B2
公开(公告)日：2005-11-15
申请号：US09883945
申请日：2001-06-20
Applicant: Eiji Sawa , Hiromu Inoue
Inventor： Eiji Sawa , Hiromu Inoue
CPC classification number: G01B11/028 , G01B11/2433 , G06T7/0006 , G06T7/12 , G06T7/168 , G06T7/62 , G06T2207/30148
Abstract: A pair of edges that are located at ends as viewed in the widthwise direction of a design pattern are recognized. On the basis of the edge direction in which the paired edges are recognized, edge points on the design pattern are detected as sub-pixels. The widthwise dimension of the design pattern is calculated on the basis of the edge points. In addition, the widthwise dimension of a circuit pattern is calculated at the same position as the widthwise dimension of the design pattern. On the basis of the calculated widthwise dimensions, the semiconductor wafer circuit pattern is checked.
Abstract translation: 识别位于设计图案的宽度方向上观察的端部处的一对边缘。 基于识别成对边缘的边缘方向，设计图案上的边缘点被检测为子像素。 基于边缘点计算设计图案的宽度尺寸。 此外，在与设计图案的宽度尺寸相同的位置处计算电路图案的宽度尺寸。 基于计算出的宽度方向尺寸，检查半导体晶片电路图案。
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公开(公告)号：US06875884B1
公开(公告)日：2005-04-05
申请号：US10019652
申请日：2000-07-28
Applicant: Janak Padia , Michael Hocker , Tsuyoshi Nishitoba , Hirohi Ohashi , Eiji Sawa
Inventor： Janak Padia , Michael Hocker , Tsuyoshi Nishitoba , Hirohi Ohashi , Eiji Sawa
IPC: C07C275/28 , C07C275/30 , C07C275/38 , C07C275/42 , C07C323/25 , C07C335/16 , C07D207/09 , C07D209/16 , C07D213/38 , C07D213/75 , C07D215/12 , C07D233/54 , C07D233/61 , C07D257/04 , C07D277/66 , C07D307/52 , C07D307/68 , C07D317/58 , C07D333/20 , C07C205/00 , C07C229/00 , C07C327/00 , C07D215/38
CPC classification number: C07C323/25 , C07C275/28 , C07C275/30 , C07C275/38 , C07C275/42 , C07C335/16 , C07C2601/02 , C07C2601/04 , C07C2601/14 , C07C2602/08 , C07C2602/10 , C07D207/09 , C07D209/16 , C07D213/38 , C07D213/75 , C07D215/12 , C07D233/54 , C07D257/04 , C07D277/66 , C07D307/52 , C07D307/68 , C07D317/58 , C07D333/20
Abstract: Urea and thiourea derivatives inhibit cell function of the chemokine receptor CCR-3. These compounds offer an effective means for treating a range of diseases thought to be mediated by the CCR-3 receptor. A variety of useful urea and thiourea derivatives can be synthesized using liquid and solid phase synthesis protocols.
Abstract translation: 尿素和硫脲衍生物抑制趋化因子受体CCR-3的细胞功能。 这些化合物提供了治疗被认为是由CCR-3受体介导的一系列疾病的有效手段。 可以使用液相和固相合成方案合成各种有用的脲和硫脲衍生物。
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公开(公告)号：US09841385B2
公开(公告)日：2017-12-12
申请号：US12857906
申请日：2010-08-17
Applicant: Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
Inventor： Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
IPC: G03F1/84 , G01N21/956 , G03F7/20
CPC classification number: G01N21/956 , G03F1/84 , G03F7/70525 , G03F7/70625 , G03F7/7065
Abstract: According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.
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9.发明申请CONDUCTIVE COATING, METHOD FOR PREPARING A COATING, ROLLER, AND METHOD FOR MANUFACTURING A ROLLER AND USING A COATING 有权导电涂料，制备涂料的方法，滚筒以及制造滚筒和使用涂料的方法公开(公告)号：US20090257790A1
公开(公告)日：2009-10-15
申请号：US12424413
申请日：2009-04-15
Applicant: John Jansen , Tsuyoshi Tokiwa , Eiji Sawa
Inventor： John Jansen , Tsuyoshi Tokiwa , Eiji Sawa
CPC classification number: G03G15/0818 , B65H27/00 , B65H2401/11 , C08L33/06 , C09D5/24 , C09D175/06 , G03G15/0233 , G03G15/1685 , G03G2215/0861 , C08L2666/04
Abstract: A conductive coating is described, suitable for coating a developer, charge or transfer roller in a developing apparatus to give a charge providing layer. The coating comprises a conductive polymer in a matrix. A roller is also described, suitable for a developing apparatus comprising, from the centre to the periphery, a conductive mandrel, a conductive elastic base layer and a charge providing layer.
Abstract translation: 描述了一种导电涂层，适用于在显影装置中涂覆显影剂，充电或转印辊以产生电荷提供层。 涂层包含基质中的导电聚合物。 还描述了一种适用于从中心到外围包括导电心轴，导电弹性基底层和电荷提供层的显影装置的辊。
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10.发明授权Inspection system and method for inspecting line width and/or positional errors of a pattern 有权用于检查图案的线宽和/或位置误差的检查系统和方法公开(公告)号：US09036896B2
公开(公告)日：2015-05-19
申请号：US13083157
申请日：2011-04-08
Applicant: Takanao Touya , Shuichi Tamamushi , Hidenori Sato , Hiroyuki Tanizaki , Takeshi Fujiwara , Eiji Sawa , Kentaro Okuda , Hiroyuki Ikeda , Hiromu Inoue , Hiroshi Tsukada
Inventor： Takanao Touya , Shuichi Tamamushi , Hidenori Sato , Hiroyuki Tanizaki , Takeshi Fujiwara , Eiji Sawa , Kentaro Okuda , Hiroyuki Ikeda , Hiromu Inoue , Hiroshi Tsukada
CPC classification number: G06T7/001 , G01N21/9501 , G01N21/9503 , G01N21/956 , G06T7/0004 , G06T7/0006 , G06T7/70 , G06T7/74 , G06T2207/10004 , G06T2207/30141 , G06T2207/30148
Abstract: A method and system for imaging an object to be inspected and obtaining an optical image; creating a reference image from design pattern data; preparing an inspection recipe including one or more templates and parameter settings necessary for the inspection; checking the pattern and the template against each other, and selecting the reference image which corresponds to the template; detecting first and second edges in the selected reference image in accordance with the parameter setting using determined coordinates as a reference; detecting first and second edges in the optical image, this optical image corresponds to the selected reference image; and determining an inspection value by acquiring the difference between the line width of the optical image and the reference image using the first edge and second edge of the reference image and the first edge and second edges of the optical image.
Abstract translation: 一种用于对待检查对象进行成像并获得光学图像的方法和系统; 从设计模式数据创建参考图像; 准备包括一个或多个模板和检查所需的参数设置的检查配方; 检查图案和模板，并选择与模板对应的参考图像; 根据使用确定的坐标作为参考的参数设置来检测所选参考图像中的第一和第二边缘; 检测光学图像中的第一和第二边缘，该光学图像对应于所选择的参考图像; 以及通过使用参考图像的第一边缘和第二边缘以及光学图像的第一边缘和第二边缘获取光学图像的线宽和参考图像之间的差来确定检查值。
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