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    F2-laser with line selection
    1.
    发明申请
    F2-laser with line selection 失效
    F2激光线选线

    公开(公告)号：US20020015431A1

    公开(公告)日：2002-02-07

    申请号：US09924814

    申请日：2001-08-07

    Applicant: Lambda Physik AG

    Inventor： Jurgen Kleinschmidt ,  Peter Heist ,  Frank Voss ,  Andreas Gortler

    IPC: H01S003/22 ,  H01S003/223

    CPC classification number: H01S3/225 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/1062

    Abstract: An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost. The wavelength selection unit preferably includes a prism having a front surface oriented at Brewster's angle and a back surface oriented to receive and reflect an ordinary refracted ray travelling within the prism at a right angle to the back surface. The back surface also preferably includes a highly reflective coating to serve as the highly reflective surface of the resonator. The wavelength selection unit preferably further comprises an adjustment component for adjusting the orientation of the prism and for enclosing the other end of the housing, opposite the outcoupling end.

    Abstract translation: F2准分子激光器在157nm处具有多个紧密分布的感兴趣的谱线，并且通过波长选择光学器件选择一条线。 第一优选实施例的波长选择光学器件包括包围放电室的激光气体体积的双折射布鲁斯特窗口。 窗口优选地包括MgF 2，并且位于放电室的一端。 当窗口的光学厚度与窗口的可旋转调节的正交折射率配合选择时，选择两条线。 窗的透射率取决于正交折射率和窗口的光学厚度。 第二优选实施例的波长选择光学器件至少部分地在激光有源体积内。 以这种方式，以优化光和放电效率，谐振器尺寸和成本的组合的方式执行线选择。 波长选择单元优选地包括具有以布鲁斯特角取向的前表面的棱镜和定向成接收和反射在棱镜内以与该背面成直角的方式行进的普通折射光线的后表面。 背表面还优选地包括用作谐振器的高反射表面的高反射涂层。 波长选择单元优选地还包括用于调整棱镜的取向并且用于封闭与外耦合端相对的壳体的另一端的调节部件。

    F2-laser with line selection
    2.
    发明申请
    F2-laser with line selection 失效

    公开(公告)号：US20020041616A1

    公开(公告)日：2002-04-11

    申请号：US09925041

    申请日：2001-08-07

    Applicant: Lambda Physik AG.

    Inventor： Jurgen Kleinschmidt ,  Peter Heist ,  Frank Voss ,  Andreas Gortler

    IPC: H01S003/22 ,  H01S003/223

    CPC classification number: H01S3/225 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/1062

    Abstract: An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost. The wavelength selection unit preferably includes a prism having a front surface oriented at Brewster's angle and a back surface oriented to receive and reflect an ordinary refracted ray travelling within the prism at a right angle to the back surface. The back surface also preferably includes a highly reflective coating to serve as the highly reflective surface of the resonator. The wavelength selection unit preferably further comprises an adjustment component for adjusting the orientation of the prism and for enclosing the other end of the housing, opposite the outcoupling end.

    Method and apparatus for wavelength calibration
    3.
    发明申请
    Method and apparatus for wavelength calibration 失效
    用于波长校准的方法和装置

    公开(公告)号：US20020012368A1

    公开(公告)日：2002-01-31

    申请号：US09849600

    申请日：2001-05-04

    Applicant: Lambda Physik AG

    Inventor： Jurgen Kleinschmidt ,  Uwe Stamm ,  Klaus Vogler ,  Peter Lokai

    IPC: H01S003/13

    CPC classification number: H01S3/1392 ,  H01S3/225

    Abstract: A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor. When the system specifically includes F2-laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 157 nm and the element is preferably a gas or vapor selected from the group consisting of selenium, bromine and silicon. The module is alternatively a purge chamber configurable for purging with a photo-absorbing gas.

    Abstract translation: 波长校准系统确定准分子或分子激光系统的窄谱分光发射带的绝对波长。 该系统包括模块，该模块包括与激光系统的可变范围内的变窄带周围的激光输出光束的分量光学相互作用的元件。 通过监测模块内的电压变化来检测层间谐振，或者通过光电检测设备检测光吸收。 当发生光学转变并被检测时，窄带的绝对波长可以精确地确定。 当该系统具体包括ArF-准分子激光室时，该模块优选地是含有吸光约193nm的元素的加合加速器，该元件优选为选自砷，碳，氧，铁 ，气态烃，卤化烃，碳污染的惰性气体，锗和铂蒸气。 当该系统具体包括F2激光室时，该模块优选为含有吸收约157nm的元素的加合加速器，该元件优选为选自硒，溴和硅的气体或蒸汽。 该模块可选地是可配置为用光吸收气体吹扫的净化室。

    F2-laser with line selection
    5.
    发明申请
    F2-laser with line selection 失效

    公开(公告)号：US20020034206A1

    公开(公告)日：2002-03-21

    申请号：US09925040

    申请日：2001-08-07

    Applicant: Lambda Physik AG.

    Inventor： Jurgen Kleinschmidt ,  Peter Heist ,  Frank Voss ,  Andreas Gortler

    IPC: H01S003/10 ,  H01S003/22 ,  H01S003/223

    CPC classification number: H01S3/225 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/1062

    Abstract: An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost. The wavelength selection unit preferably includes a prism having a front surface oriented at Brewster's angle and a back surface oriented to receive and reflect an ordinary refracted ray travelling within the prism at a right angle to the back surface. The back surface also preferably includes a highly reflective coating to serve as the highly reflective surface of the resonator. The wavelength selection unit preferably further comprises an adjustment component for adjusting the orientation of the prism and for enclosing the other end of the housing, opposite the outcoupling end.

    Excimer laser
    6.
    发明申请
    Excimer laser 失效

    公开(公告)号：US20020015432A1

    公开(公告)日：2002-02-07

    申请号：US09924817

    申请日：2001-08-07

    Applicant: Lambda Physik AG

    Inventor： Jurgen Kleinschmidt ,  Peter Heist ,  Frank Voss ,  Andreas Gortler

    IPC: H01S003/223 ,  H01S003/22

    CPC classification number: H01S3/225 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/1062

    Abstract: An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost. The wavelength selection unit preferably includes a prism having a front surface oriented at Brewster's angle and a back surface oriented to receive and reflect an ordinary refracted ray travelling within the prism at a right angle to the back surface. The back surface also preferably includes a highly reflective coating to serve as the highly reflective surface of the resonator. The wavelength selection unit preferably further comprises an adjustment component for adjusting the orientation of the prism and for enclosing the other end of the housing, opposite the outcoupling end.

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