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公开(公告)号：US08802990B2
公开(公告)日：2014-08-12
申请号：US13432037
申请日：2012-03-28
申请人： Lawrence A. Clevenger , Zhengwen Li , Kevin S. Petrarca , Roger A. Quon , Carl J. Radens , Brian C. Sapp
发明人： Lawrence A. Clevenger , Zhengwen Li , Kevin S. Petrarca , Roger A. Quon , Carl J. Radens , Brian C. Sapp
IPC分类号： H01B5/14 , H01L21/76 , H01L21/764
CPC分类号： B81C1/00698 , B81B2201/0292
摘要： A contiguous deep trench includes a first trench portion having a constant width between a pair of first parallel sidewalls, second and third trench portions each having a greater width than the first trench portion and laterally connected to the first trench portion. A non-conformal deposition process is employed to form a conductive layer that has a tapered geometry within the contiguous deep trench portion such that the conductive layer is not present on bottom surfaces of the contiguous deep trench. A gap fill layer is formed to plug the space in the first trench portion. The conductive layer is patterned into two conductive plates each having a tapered vertical portion within the first trench portion. After removing remaining portions of the gap fill layer, a device is formed that has a small separation distance between the tapered vertical portions of the conductive plates.
摘要翻译： 连续的深沟槽包括在一对第一平行侧壁之间具有恒定宽度的第一沟槽部分，第二沟槽部分和第三沟槽部分各自具有比第一沟槽部分更大的宽度并横向连接到第一沟槽部分。 使用非共形沉积工艺来形成导电层，该导电层在邻接的深沟槽部分内具有锥形几何形状，使得导电层不存在于邻接的深沟槽的底表面上。 形成间隙填充层以堵塞第一沟槽部分中的空间。 将导电层图案化为在第一沟槽部分内具有锥形垂直部分的两个导电板。 在去除间隙填充层的剩余部分之后，形成在导电板的锥形垂直部分之间具有小间隔距离的装置。
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公开(公告)号：US20120189767A1
公开(公告)日：2012-07-26
申请号：US13432037
申请日：2012-03-28
申请人： Lawrence A. Clevenger , Zhengwen Li , Kevin S. Petrarca , Roger A. Quon , Carl J. Radens , Brian C. Sapp
发明人： Lawrence A. Clevenger , Zhengwen Li , Kevin S. Petrarca , Roger A. Quon , Carl J. Radens , Brian C. Sapp
CPC分类号： B81C1/00698 , B81B2201/0292
摘要： A contiguous deep trench includes a first trench portion having a constant width between a pair of first parallel sidewalls, second and third trench portions each having a greater width than the first trench portion and laterally connected to the first trench portion. A non-conformal deposition process is employed to form a conductive layer that has a tapered geometry within the contiguous deep trench portion such that the conductive layer is not present on bottom surfaces of the contiguous deep trench. A gap fill layer is formed to plug the space in the first trench portion. The conductive layer is patterned into two conductive plates each having a tapered vertical portion within the first trench portion. After removing remaining portions of the gap fill layer, a device is formed that has a small separation distance between the tapered vertical portions of the conductive plates.
摘要翻译： 连续的深沟槽包括在一对第一平行侧壁之间具有恒定宽度的第一沟槽部分，第二沟槽部分和第三沟槽部分各自具有比第一沟槽部分更大的宽度并横向连接到第一沟槽部分。 使用非共形沉积工艺来形成导电层，该导电层在邻接的深沟槽部分内具有锥形几何形状，使得导电层不存在于邻接的深沟槽的底表面上。 形成间隙填充层以堵塞第一沟槽部分中的空间。 将导电层图案化为在第一沟槽部分内具有锥形垂直部分的两个导电板。 在去除间隙填充层的剩余部分之后，形成在导电板的锥形垂直部分之间具有小间隔距离的装置。
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公开(公告)号：US20100319962A1
公开(公告)日：2010-12-23
申请号：US12488948
申请日：2009-06-22
申请人： Lawrence A. Clevenger , Zhengwen Li , Kevin S. Petrarca , Roger A. Quon , Carl J. Radens , Brian C. Sapp
发明人： Lawrence A. Clevenger , Zhengwen Li , Kevin S. Petrarca , Roger A. Quon , Carl J. Radens , Brian C. Sapp
CPC分类号： B81C1/00698 , B81B2201/0292
摘要： A contiguous deep trench includes a first trench portion having a constant width between a pair of first parallel sidewalls, second and third trench portions each having a greater width than the first trench portion and laterally connected to the first trench portion. A non-conformal deposition process is employed to form a conductive layer that has a tapered geometry within the contiguous deep trench portion such that the conductive layer is not present on bottom surfaces of the contiguous deep trench. A gap fill layer is formed to plug the space in the first trench portion. The conductive layer is patterned into two conductive plates each having a tapered vertical portion within the first trench portion. After removing remaining portions of the gap fill layer, a device is formed that has a small separation distance between the tapered vertical portions of the conductive plates.
摘要翻译： 连续的深沟槽包括在一对第一平行侧壁之间具有恒定宽度的第一沟槽部分，第二沟槽部分和第三沟槽部分各自具有比第一沟槽部分更大的宽度并横向连接到第一沟槽部分。 使用非共形沉积工艺来形成导电层，该导电层在邻接的深沟槽部分内具有锥形几何形状，使得导电层不存在于邻接的深沟槽的底表面上。 形成间隙填充层以堵塞第一沟槽部分中的空间。 将导电层图案化为在第一沟槽部分内具有锥形垂直部分的两个导电板。 在去除间隙填充层的剩余部分之后，形成在导电板的锥形垂直部分之间具有小间隔距离的装置。
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公开(公告)号：US08476530B2
公开(公告)日：2013-07-02
申请号：US12488948
申请日：2009-06-22
申请人： Lawrence A. Clevenger , Zhengwen Li , Kevin S. Petrarca , Roger A. Quon , Carl J. Radens , Brian C. Sapp
发明人： Lawrence A. Clevenger , Zhengwen Li , Kevin S. Petrarca , Roger A. Quon , Carl J. Radens , Brian C. Sapp
IPC分类号： H01B5/14
CPC分类号： B81C1/00698 , B81B2201/0292
摘要： A contiguous deep trench includes a first trench portion having a constant width between a pair of first parallel sidewalls, second and third trench portions each having a greater width than the first trench portion and laterally connected to the first trench portion. A non-conformal deposition process is employed to form a conductive layer that has a tapered geometry within the contiguous deep trench portion such that the conductive layer is not present on bottom surfaces of the contiguous deep trench. A gap fill layer is formed to plug the space in the first trench portion. The conductive layer is patterned into two conductive plates each having a tapered vertical portion within the first trench portion. After removing remaining portions of the gap fill layer, a device is formed that has a small separation distance between the tapered vertical portions of the conductive plates.
摘要翻译： 连续的深沟槽包括在一对第一平行侧壁之间具有恒定宽度的第一沟槽部分，第二沟槽部分和第三沟槽部分各自具有比第一沟槽部分更大的宽度并横向连接到第一沟槽部分。 使用非共形沉积工艺来形成导电层，该导电层在邻接的深沟槽部分内具有锥形几何形状，使得导电层不存在于邻接的深沟槽的底表面上。 形成间隙填充层以堵塞第一沟槽部分中的空间。 将导电层图案化为在第一沟槽部分内具有锥形垂直部分的两个导电板。 在去除间隙填充层的剩余部分之后，形成在导电板的锥形垂直部分之间具有小间隔距离的装置。
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公开(公告)号：US08574950B2
公开(公告)日：2013-11-05
申请号：US12915985
申请日：2010-10-29
申请人： Lawrence A. Clevenger , Rainer K. Krause , Zhengwen O. Li , Kevin S. Petrarca , Roger A. Quon , Carl Radens , Brian C. Sapp
发明人： Lawrence A. Clevenger , Rainer K. Krause , Zhengwen O. Li , Kevin S. Petrarca , Roger A. Quon , Carl Radens , Brian C. Sapp
IPC分类号： H01L21/44
CPC分类号： H01L31/02164 , H01L31/022425 , Y02E10/50
摘要： A method for manufacturing one or more electrically contactable grids on at least one surface of a semiconductor substrate for use in a solar cell product includes the following. A heat-sensitive masking agent layer is deposited on the surface of the substrate of the solar cell product. The masking agent layer is locally heated to form a grid mask. Selected parts of the masking agent layer defined by locally heating are removed to form openings in the grid mask. A contact metallization is applied on the grid mask.
摘要翻译： 一种用于在太阳能电池产品中使用的半导体衬底的至少一个表面上制造一个或多个电接触网格的方法包括以下。 在太阳能电池产品的基板的表面上沉积热敏屏蔽剂层。 掩蔽剂层被局部加热以形成栅格掩模。 去除由局部加热限定的掩蔽剂层的选定部分，以在网格掩模中形成开口。 在栅格掩模上施加接触金属化。
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公开(公告)号：US20110100453A1
公开(公告)日：2011-05-05
申请号：US12915985
申请日：2010-10-29
申请人： Lawrence A. Clevenger , Rainer K. Krause , Zhengwen O. Li , Kevin S. Petrarca , Roger A. Quon , Carl Radens , Brian C. Sapp
发明人： Lawrence A. Clevenger , Rainer K. Krause , Zhengwen O. Li , Kevin S. Petrarca , Roger A. Quon , Carl Radens , Brian C. Sapp
IPC分类号： H01L31/0224 , H01L31/18
CPC分类号： H01L31/02164 , H01L31/022425 , Y02E10/50
摘要： A method for manufacturing one or more electrically contactable grids on at least one surface of a semiconductor substrate for use in a solar cell product includes the following. A heat-sensitive masking agent layer is deposited on the surface of the substrate of the solar cell product. The masking agent layer is locally heated to form a grid mask. Selected parts of the masking agent layer defined by locally heating are removed to form openings in the grid mask. A contact metallization is applied on the grid mask.
摘要翻译： 一种用于在太阳能电池产品中使用的半导体衬底的至少一个表面上制造一个或多个电接触网格的方法包括以下。 在太阳能电池产品的基板的表面上沉积热敏屏蔽剂层。 掩蔽剂层被局部加热以形成栅格掩模。 去除由局部加热限定的掩蔽剂层的选定部分，以在网格掩模中形成开口。 在栅格掩模上施加接触金属化。
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公开(公告)号：US07629264B2
公开(公告)日：2009-12-08
申请号：US12099996
申请日：2008-04-09
申请人： Griselda Bonilla , Kaushik A. Kumar , Lawrence A. Clevenger , Stephan Grunow , Kevin S. Petrarca , Roger A. Quon
发明人： Griselda Bonilla , Kaushik A. Kumar , Lawrence A. Clevenger , Stephan Grunow , Kevin S. Petrarca , Roger A. Quon
IPC分类号： H01L21/302
CPC分类号： H01L23/5329 , H01L21/76804 , H01L21/76819 , H01L21/76835 , H01L21/76883 , H01L23/485 , H01L23/5226 , H01L23/53266 , H01L2924/0002 , H01L2924/00
摘要： The present invention in one embodiment provides a method of forming an interconnect comprising, providing a interlevel dielectric layer atop a substrate, the interlevel dielectric layer including at least one tungsten (W) stud extending from an upper surface of the interlevel dielectric to the substrate; recessing an upper surface of the at least one tungsten (W) stud below the upper surface of the interlevel dielectric to provide at least one recessed tungsten (W) stud; forming a first low-k dielectric layer atop the upper surface of the interlevel dielectric layer and the at least one recessed tungsten (W) stud; forming a opening through the first low-k dielectric layer to expose an upper surface of the at least one recessed tungsten stud; and filling the opening with copper (Cu).
摘要翻译： 本发明在一个实施例中提供了一种形成互连的方法，包括：在衬底顶部提供层间电介质层，所述层间电介质层包括从层间电介质的上表面延伸到衬底的至少一个钨（W）柱; 将所述至少一个钨（W）螺柱的上表面凹陷在所述层间电介质的上表面下方，以提供至少一个凹入的钨（W）螺柱; 在所述层间介电层的上表面和所述至少一个凹入的钨（W）螺柱之上形成第一低k电介质层; 通过所述第一低k电介质层形成开口以露出所述至少一个凹入的钨螺柱的上表面; 并用铜（Cu）填充开口。
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公开(公告)号：US20090256263A1
公开(公告)日：2009-10-15
申请号：US12099996
申请日：2008-04-09
申请人： Griselda Bonilla , Kaushik A. Kumar , Lawrence A. Clevenger , Stephan Grunow , Kevin S. Petrarca , Roger A. Quon
发明人： Griselda Bonilla , Kaushik A. Kumar , Lawrence A. Clevenger , Stephan Grunow , Kevin S. Petrarca , Roger A. Quon
IPC分类号： H01L23/532 , H01L21/768
CPC分类号： H01L23/5329 , H01L21/76804 , H01L21/76819 , H01L21/76835 , H01L21/76883 , H01L23/485 , H01L23/5226 , H01L23/53266 , H01L2924/0002 , H01L2924/00
摘要： The present invention in one embodiment provides a method of forming an interconnect comprising, providing a interlevel dielectric layer atop a substrate, the interlevel dielectric layer including at least one tungsten (W) stud extending from an upper surface of the interlevel dielectric to the substrate; recessing an upper surface of the at least one tungsten (W) stud below the upper surface of the interlevel dielectric to provide at least one recessed tungsten (W) stud; forming a first low-k dielectric layer atop the upper surface of the interlevel dielectric layer and the at least one recessed tungsten (W) stud; forming a opening through the first low-k dielectric layer to expose an upper surface of the at least one recessed tungsten stud; and filling the opening with copper (Cu).
摘要翻译： 本发明在一个实施例中提供了一种形成互连的方法，包括：在衬底顶部提供层间电介质层，所述层间电介质层包括从层间电介质的上表面延伸到衬底的至少一个钨（W）柱; 将所述至少一个钨（W）螺柱的上表面凹陷在所述层间电介质的上表面下方，以提供至少一个凹入的钨（W）螺柱; 在所述层间介电层的上表面和所述至少一个凹入的钨（W）螺柱之上形成第一低k电介质层; 通过所述第一低k电介质层形成开口以露出所述至少一个凹入的钨螺柱的上表面; 并用铜（Cu）填充开口。
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公开(公告)号：US06995475B2
公开(公告)日：2006-02-07
申请号：US10666775
申请日：2003-09-18
申请人： Julie C. Biggs , Tien-Jen Cheng , David E. Eichstadt , Lisa A. Fanti , Jonathan H. Griffith , Randolph F. Knarr , Sarah H. Knickerbocker , Kevin S. Petrarca , Roger A. Quon , Wolfgang Sauter , Kamalesh K. Srivastava , Richard P. Volant
发明人： Julie C. Biggs , Tien-Jen Cheng , David E. Eichstadt , Lisa A. Fanti , Jonathan H. Griffith , Randolph F. Knarr , Sarah H. Knickerbocker , Kevin S. Petrarca , Roger A. Quon , Wolfgang Sauter , Kamalesh K. Srivastava , Richard P. Volant
CPC分类号： H01L24/05 , H01L24/03 , H01L24/45 , H01L24/48 , H01L24/85 , H01L2224/04042 , H01L2224/05083 , H01L2224/05147 , H01L2224/05155 , H01L2224/05181 , H01L2224/05624 , H01L2224/05644 , H01L2224/05655 , H01L2224/45144 , H01L2224/48453 , H01L2224/48463 , H01L2224/4847 , H01L2224/48624 , H01L2224/48644 , H01L2224/48655 , H01L2224/85205 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01019 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/01033 , H01L2924/01073 , H01L2924/01076 , H01L2924/01078 , H01L2924/01079 , H01L2924/01327 , H01L2924/04953 , H01L2924/05042 , H01L2924/12042 , H01L2924/14 , H01L2924/00014 , H01L2924/00 , H01L2924/00015
摘要： A method of forming wire bonds in (I/C) chips comprising: providing an I/C chip having a conductive pad for a wire bond with at least one layer of dielectric material overlying the pad; forming an opening through the dielectric material exposing a portion of said pad. Forming at least a first conductive layer on the exposed surface of the pad and on the surface of the opening. Forming a seed layer on the first conductive layer; applying a photoresist over the seed layer; exposing and developing the photoresist revealing the surface of the seed layer surrounding the opening; removing the exposed seed layer; removing the photoresist material in the opening revealing the seed layer. Plating at least one second layer of conductive material on the seed layer in the opening, and removing the first conductive layer on the dielectric layer around the opening. The invention also includes the resulting structure.
摘要翻译： 一种在（I / C）芯片中形成引线键合的方法，包括：提供具有导电焊盘的I / C芯片，所述导电焊盘与覆盖所述焊盘的至少一层电介质材料进行引线接合; 通过暴露所述垫的一部分的电介质材料形成开口。 在衬垫的暴露表面和开口表面上形成至少第一导电层。 在第一导电层上形成种子层; 在种子层上施加光致抗蚀剂; 曝光和显影光致抗蚀剂，其显露出围绕开口的种子层的表面; 去除暴露的种子层; 去除开口中的光致抗蚀剂材料，露出种子层。 在开口中的种子层上电镀至少一层第二导电材料层，以及去除围绕开口的电介质层上的第一导电层。 本发明还包括所得到的结构。
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10.发明授权公开(公告)号：US07572726B2
公开(公告)日：2009-08-11
申请号：US11271760
申请日：2005-11-10
申请人： Julie C. Biggs , Tien-Jen Cheng , David E. Eichstadt , Lisa A. Fanti , Jonathan H. Griffith , Randolph F. Knarr , Sarah H. Knickerbocker , Kevin S. Petrarca , Roger A. Quon , Wolfgang Sauter , Kamalesh K. Srivastava , Richard P. Volant
发明人： Julie C. Biggs , Tien-Jen Cheng , David E. Eichstadt , Lisa A. Fanti , Jonathan H. Griffith , Randolph F. Knarr , Sarah H. Knickerbocker , Kevin S. Petrarca , Roger A. Quon , Wolfgang Sauter , Kamalesh K. Srivastava , Richard P. Volant
IPC分类号： H01L21/44
CPC分类号： H01L24/05 , H01L24/03 , H01L24/45 , H01L24/48 , H01L24/85 , H01L2224/04042 , H01L2224/05083 , H01L2224/05147 , H01L2224/05155 , H01L2224/05181 , H01L2224/05624 , H01L2224/05644 , H01L2224/05655 , H01L2224/45144 , H01L2224/48453 , H01L2224/48463 , H01L2224/4847 , H01L2224/48624 , H01L2224/48644 , H01L2224/48655 , H01L2224/85205 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01019 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/01033 , H01L2924/01073 , H01L2924/01076 , H01L2924/01078 , H01L2924/01079 , H01L2924/01327 , H01L2924/04953 , H01L2924/05042 , H01L2924/12042 , H01L2924/14 , H01L2924/00014 , H01L2924/00 , H01L2924/00015
摘要： A method of forming wire bonds in (I/C) chips comprising: providing an I/C chip having a conductive pad for a wire bond with at least one layer of dielectric material overlying the pad; forming an opening through the dielectric material exposing a portion of said pad. Forming at least a first conductive layer on the exposed surface of the pad and on the surface of the opening. Forming a seed layer on the first conductive layer; applying a photoresist over the seed layer; exposing and developing the photoresist revealing the surface of the seed layer surrounding the opening; removing the exposed seed layer; removing the photoresist material in the opening revealing the seed layer. Plating at least one second layer of conductive material on the seed layer in the opening, and removing the first conductive layer on the dielectric layer around the opening. The invention also includes the resulting structure.
摘要翻译： 一种在（I / C）芯片中形成引线键合的方法，包括：提供具有导电焊盘的I / C芯片，所述导电焊盘与覆盖所述焊盘的至少一层电介质材料进行引线接合; 通过暴露所述垫的一部分的电介质材料形成开口。 在衬垫的暴露表面和开口表面上形成至少第一导电层。 在第一导电层上形成种子层; 在种子层上施加光致抗蚀剂; 曝光和显影光致抗蚀剂，其显露出围绕开口的种子层的表面; 去除暴露的种子层; 去除开口中的光致抗蚀剂材料，露出种子层。 在开口中的种子层上电镀至少一层第二导电材料层，以及去除围绕开口的电介质层上的第一导电层。 本发明还包括所得到的结构。
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