Method for manufacturing pressure sensitive semiconductor device
    2.
    发明授权
    Method for manufacturing pressure sensitive semiconductor device 失效
    制造压力敏感半导体器件的方法

    公开(公告)号:US3634931A

    公开(公告)日:1972-01-18

    申请号:US3634931D

    申请日:1969-12-09

    CPC classification number: H01L29/84 G01L1/18 H01L21/00 H01L29/00

    Abstract: In a semiconductor device with a four-layer structure having the so-called thyristor characteristic, when the control electrode for controlling its breakover voltage is constructed by the Schottky barrier and a means to apply a stress to the barrier, the breakover voltage of the said semiconductor device can be controlled by the stress. If this device is assembled in a circuit system, the circuit system can be set to either the ''''off'''' or ''''on'''' state, corresponding to the applied stress.

    Abstract translation: 在具有所谓的晶闸管特性的具有四层结构的半导体器件中,当用于控制其跳变电压的控制电极由肖特基势垒构成并且对屏障施加应力的装置时,所述 半导体器件可以通过应力控制。 如果该设备组装在电路系统中,则电路系统可以设置为对应于施加的应力的“关闭”或“开启”状态。

Patent Agency Ranking