公开(公告)号：US09273222B2

公开(公告)日：2016-03-01

申请号：US14350768

申请日：2012-10-12

申请人： Mitsui Chemicals, Inc.

发明人： Koju Okazaki ,  Noboru Kawasaki ,  Kenichi Fujii

IPC分类号： C09D163/00 ,  C09D133/14 ,  C08G59/32 ,  C09D133/26

CPC分类号： C09D133/14 ,  C08G59/32 ,  C09D133/26 ,  C09D163/00

摘要： The present invention provides: a composition including a polymer (i) which has a —SO3M group and an epoxy group, wherein M represents a hydrogen atom, an alkali metal, an alkaline earth metal or an ammonium ion, and a silane compound (ii) which has at least two hydroxy group(s), alkoxy group(s) or halogen atom(s) that are each bound to a silane atom; and a hydrophilic film obtained by curing the composition. The hydrophilic film of the present invention is excellent in its hydrophilicity, durability, abrasion resistance and weather resistance and has high antifogging, antifouling, antistatic and quick-drying (water evaporation) properties. Therefore, a variety of laminates in which the hydrophilic film of the present invention is laminated on a substrate can also be provided.

摘要翻译： 本发明提供：包含具有-SO 3 M基团和环氧基的聚合物（i）的组合物，其中M表示氢原子，碱金属，碱土金属或铵离子，以及硅烷化合物（ii ），其具有与硅烷原子结合的至少两个羟基，烷氧基或卤素原子; 以及通过固化该组合物而获得的亲水性膜。 本发明的亲水性膜的亲水性，耐久性，耐磨性和耐候性优异，防雾，防污，抗静电，快干（水蒸发）性优异。 因此，也可以提供将本发明的亲水性膜层叠在基材上的各种层叠体。

公开(公告)号：US11487205B2

公开(公告)日：2022-11-01

申请号：US16757830

申请日：2018-11-13

申请人： MITSUI CHEMICALS, INC.

发明人： Hiroko Wachi ,  Yasuhisa Kayaba ,  Hirofumi Tanaka ,  Kenichi Fujii

IPC分类号： G03F7/11 ,  H01L21/311 ,  G03F7/075

摘要： Provided are a semiconductor element intermediate including: a substrate and a multilayer resist layer, in which the multilayer resist layer includes a metal-containing film, and in which the metal-containing film has a content of germanium element of 20 atm % or more, or a total content of tin element, indium element, and gallium element of 1 atm % or more, as measured by X-ray photoelectric spectroscopy, and an application of the semiconductor intermediate.

公开(公告)号：US10385157B2

公开(公告)日：2019-08-20

申请号：US14913231

申请日：2014-08-12

申请人： MITSUI CHEMICALS, INC.

发明人： Kazuyuki Fukuda ,  Jun Kamada ,  Takashi Uchida ,  Masakazu Masui ,  Shinji Tachibana ,  Hirokazu Mizuma ,  Kenichi Fujii

IPC分类号： C08G18/28 ,  C08G18/32 ,  C08G18/62 ,  C08G18/79 ,  C08G18/80 ,  C09D175/04 ,  C09J175/04

摘要： The blocked isocyanate is a blocked isocyanate containing a latent isocyanate group, which is an isocyanate group blocked with a blocking agent, wherein the blocked isocyanate includes a first latent isocyanate group that is an isocyanate group blocked with a first blocking agent and a second latent isocyanate group that is an isocyanate group blocked with a second blocking agent; and the first blocking agent is represented by general formula (1) below, and has a higher catalysis activity that activates the isocyanate group than that of the second blocking agent. (where R1 to R3 represent a hydrocarbon group having 1 to 12 carbon atoms or a hydrogen atom, and at least one of R1 to R3 represents a hydrogen atom, and R1 and R3 may be bonded to each other to form a heterocycle. R4 represents a hydrocarbon group having 1 to 12 carbon atoms, a hydrogen atom, or an atomic group represented by —NR5R6 (R5 and R6 represent a hydrocarbon group having 1 to 12 carbon atoms, and R5 and R1 may be bonded to each other to form a heterocycle and R6 and R3 may be bonded to each other to form a heterocycle).

公开(公告)号：US20140256870A1

公开(公告)日：2014-09-11

申请号：US14350768

申请日：2012-10-12

申请人： Mitsui Chemicals, Inc.

发明人： Koju Okazaki ,  Noboru Kawasaki ,  Kenichi Fujii

IPC分类号： C09D133/14 ,  C09D133/26

CPC分类号： C09D133/14 ,  C08G59/32 ,  C09D133/26 ,  C09D163/00

摘要： The present invention provides: a composition including a polymer (i) which has a —SO3M group and an epoxy group, wherein M represents a hydrogen atom, an alkali metal, an alkaline earth metal or an ammonium ion, and a silane compound (ii) which has at least two hydroxy group(s), alkoxy group(s) or halogen atom(s) that are each bound to a silane atom; and a hydrophilic film obtained by curing the composition. The hydrophilic film of the present invention is excellent in its hydrophilicity, durability, abrasion resistance and weather resistance and has high antifogging, antifouling, antistatic and quick-drying (water evaporation) properties. Therefore, a variety of laminates in which the hydrophilic film of the present invention is laminated on a substrate can also be provided.

摘要翻译： 本发明提供：包含具有-SO 3 M基团和环氧基的聚合物（i）的组合物，其中M表示氢原子，碱金属，碱土金属或铵离子，以及硅烷化合物（ii ），其具有与硅烷原子结合的至少两个羟基，烷氧基或卤素原子; 以及通过固化该组合物而获得的亲水性膜。 本发明的亲水性膜的亲水性，耐久性，耐磨性和耐候性优异，防雾，防污，抗静电，快干（水蒸发）性优异。 因此，也可以提供将本发明的亲水性膜层叠在基材上的各种层叠体。

公开(公告)号：US10988647B2

公开(公告)日：2021-04-27

申请号：US16606789

申请日：2018-04-19

申请人： Mitsui Chemicals, Inc.

发明人： Jun Kamada ,  Kaichiro Haruta ,  Takashi Unezaki ,  Kiyomi Imagawa ,  Kenichi Fujii ,  Yasuhisa Kayaba ,  Kazuo Kohmura

IPC分类号： C09J179/08 ,  C09J5/00 ,  H01L21/304 ,  H01L21/56

摘要： The purpose of the present invention is to provide a semiconductor substrate manufacturing method, which prevents detachment of a semiconductor wafer being ground, and which prevents cracking or chipping in a semiconductor substrate obtained. In order to solve the problem, the semiconductor substrate manufacturing method comprises: a polyimide layer forming step of forming a polyimide layer on a support material; a wafer attaching step of affixing the support material and a semiconductor wafer to each other with the polyimide layer disposed therebetween; a wafer grinding step of grinding the semiconductor wafer; a support material peeling step of peeling the support material from the polyimide layer; and a polyimide layer peeling step of peeling the polyimide layer from the semiconductor wafer. The polyimide layer includes polyimide which includes a benzophenone skeleton and an aliphatic structure, wherein an amine equivalent weight is 4000 to 20000.

公开(公告)号：US11332643B2

公开(公告)日：2022-05-17

申请号：US16629719

申请日：2018-07-10

申请人： MITSUI CHEMICALS, INC.

发明人： Jun Kamada ,  Tomoya Matayoshi ,  Michio Eriguchi ,  Kaichiro Haruta ,  Kenichi Fujii ,  Takashi Unezaki ,  Kazuo Kohmura

IPC分类号： C09J7/25 ,  B32B3/30 ,  B32B7/022 ,  B32B27/08 ,  B32B27/32 ,  C09J7/24 ,  C09J7/38 ,  B32B7/12

摘要： Provided is an adhesive member including: a base material having an uneven shape on at least one surface; and a surface layer covering at least a portion of the surface having the uneven shape on the base material.

公开(公告)号：US11072678B2

公开(公告)日：2021-07-27

申请号：US16456967

申请日：2019-06-28

申请人： MITSUI CHEMICALS, INC.

发明人： Kazuyuki Fukuda ,  Jun Kamada ,  Takashi Uchida ,  Masakazu Masui ,  Shinji Tachibana ,  Hirokazu Mizuma ,  Kenichi Fujii

IPC分类号： C08G18/80 ,  C08G18/28 ,  C08G18/32 ,  C08G18/62 ,  C08G18/79 ,  C09D175/04 ,  C09J175/04

摘要： The blocked isocyanate is a blocked isocyanate containing a latent isocyanate group, which is an isocyanate group blocked with a blocking agent, wherein the blocked isocyanate includes a first latent isocyanate group that is an isocyanate group blocked with a first blocking agent and a second latent isocyanate group that is an isocyanate group blocked with a second blocking agent; and the first blocking agent is represented by general formula (1) below, and has a higher catalysis activity that activates the isocyanate group than that of the second blocking agent. (where R1 to R3 represent a hydrocarbon group having 1 to 12 carbon atoms or a hydrogen atom, and at least one of R1 to R3 represents a hydrogen atom, and R1 and R3 may be bonded to each other to form a heterocycle. R4 represents a hydrocarbon group having 1 to 12 carbon atoms, a hydrogen atom, or an atomic group represented by —NR5R6 (R5 and R6 represent a hydrocarbon group having 1 to 12 carbon atoms, and R5 and R1 may be bonded to each other to form a heterocycle and R6 and R3 may be bonded to each other to form a heterocycle).