HIGH-THROUGHPUT WORKPIECE HANDLING
    1.
    发明申请
    HIGH-THROUGHPUT WORKPIECE HANDLING 审中-公开
    高效率工作处理

    公开(公告)号:US20130108406A1

    公开(公告)日:2013-05-02

    申请号:US13470809

    申请日:2012-05-14

    IPC分类号: B66C17/00 B66C1/42 B66C1/02

    摘要: A system and method for receiving unprocessed workpieces, moving them, orienting them and placing them in a load lock, or other end point is disclosed. The system includes a gantry module for moving workpieces from a conveyor system to a swap module. The swap module is used to remove a carrier or matrix of processed workpieces from a load lock and place a carrier of matrix of unprocessed workpieces in its place. The processed workpieces are then moved by the gantry module back to the conveyor. The gantry module may have X, Y, Z and rotational actuators and include an end effector having multiple grippers. A method of aligning a plurality of workpieces on the end effector so that the plurality can be transported at the same time is also disclosed.

    摘要翻译: 公开了一种用于接收未加工的工件,移动它们,将它们定向并将它们放置在装载锁中或其它端点的系统和方法。 该系统包括用于将工件从传送系统移动到交换模块的台架模块。 交换模块用于从加载锁移除已处理工件的载体或矩阵,并将未加工工件的矩阵载体放置在其位置。 然后将经处理的工件通过台架模块移回到输送机。 台架模块可以具有X,Y,Z和旋转致动器,并且包括具有多个夹具的末端执行器。 还公开了一种使末端执行器上的多个工件对齐的方法,以便可以同时传送多个工件。

    IMPLANT MASK WITH MOVEABLE MASK SEGMENTS
    4.
    发明申请
    IMPLANT MASK WITH MOVEABLE MASK SEGMENTS 失效
    植物面膜与可移动的面膜部分

    公开(公告)号:US20100314559A1

    公开(公告)日:2010-12-16

    申请号:US12757616

    申请日:2010-04-09

    IPC分类号: G21K5/00

    摘要: This apparatus has two mask segments. Each mask segment has apertures that an ion beam may pass through. These mask segments can move between a first and second position using hinges. One or more workpieces are disposed behind the mask segments when these mask segments are in a second position. The two mask segments are configured to cover the one or more workpieces in one instance. Ions are implanted into the one or more workpieces through the apertures in the mask segments.

    摘要翻译: 该装置具有两个掩模段。 每个掩模段具有离子束可能通过的孔。 这些掩模段可以使用铰链在第一和第二位置之间移动。 当这些掩模段处于第二位置时,一个或多个工件设置在掩模段后面。 两个掩模段被配置为在一个实例中覆盖一个或多个工件。 离子通过掩模段中的孔注入到一个或多个工件中。

    System and method for handling multiple workpieces for matrix configuration processing
    6.
    发明授权
    System and method for handling multiple workpieces for matrix configuration processing 失效
    用于处理多个工件以进行矩阵配置处理的系统和方法

    公开(公告)号:US08698104B2

    公开(公告)日:2014-04-15

    申请号:US12941656

    申请日:2010-11-08

    IPC分类号: G01J1/00

    摘要: A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.

    摘要翻译: 用于将工件加载到用于以矩阵构造处理的处理室中的系统包括被构造成以线性方式输送多个工件的传送器。 工件酒店被配置为从输送机接收多个工件。 工件酒店包括排列在N列和M层的单元矩阵。 拾取刀片被配置成插入酒店并从酒店退回,以便将多个基板从第一层卸载到单行拾取刀片中,并且重复卸载操作以形成矩阵,其包括多个 设置在拾取刀片上的一排衬底。 在一个例子中,工件酒店具有交错的配置,可以提供每个酒店单元的个人可访问性。

    Implant mask with moveable hinged mask segments
    7.
    发明授权
    Implant mask with moveable hinged mask segments 失效
    植入式面膜与可移动铰链的面膜段

    公开(公告)号:US08330128B2

    公开(公告)日:2012-12-11

    申请号:US12757616

    申请日:2010-04-09

    IPC分类号: G21K5/10 H01J37/08 H01L21/425

    摘要: This apparatus has two mask segments. Each mask segment has apertures that an ion beam may pass through. These mask segments can move between a first and second position using hinges. One or more workpieces are disposed behind the mask segments when these mask segments are in a second position. The two mask segments are configured to cover the one or more workpieces in one instance. Ions are implanted into the one or more workpieces through the apertures in the mask segments.

    摘要翻译: 该装置具有两个掩模段。 每个掩模段具有离子束可能通过的孔。 这些掩模段可以使用铰链在第一和第二位置之间移动。 当这些掩模段处于第二位置时,一个或多个工件设置在掩模段后面。 两个掩模段被配置为在一个实例中覆盖一个或多个工件。 离子通过掩模段中的孔注入到一个或多个工件中。

    Masking apparatus for an ion implanter
    8.
    发明授权
    Masking apparatus for an ion implanter 有权
    用于离子注入机的掩蔽装置

    公开(公告)号:US08101927B2

    公开(公告)日:2012-01-24

    申请号:US12775728

    申请日:2010-05-07

    IPC分类号: H01J37/317 H01J1/54 A61N5/00

    摘要: A masking apparatus includes a mask positioned upstream of a target positioned for treatment with ions. The mask is sized relative to the target to cause a first half of the target to be treated with a selective treatment of ions through the mask and a second half of the target to be treated with a blanket treatment of ions unimpeded by the mask during a first time interval. The masking apparatus also includes a positioning mechanism to change a relative position of the mask and the target so that the second half of the target is treated with the selective treatment of ions and the first half of the target is treated with the blanket implant during a second time interval. An ion implanter having the masking apparatus is also provided.

    摘要翻译: 掩模装置包括位于被定位用于用离子处理的靶的上游的掩模。 掩模的尺寸相对于目标,以使靶的第一半被选择性地处理离子通过掩模和待处理的靶的第二半被处理,在一个 第一时间间隔。 掩蔽装置还包括定位机构,以改变掩模和靶的相对位置,以便通过选择性处理离子来处理靶的后半部分,并且在 第二时间间隔。 还提供了具有掩蔽装置的离子注入机。

    MASKING APPARATUS FOR AN ION IMPLANTER
    9.
    发明申请
    MASKING APPARATUS FOR AN ION IMPLANTER 有权
    用于离子植入物的掩蔽装置

    公开(公告)号:US20100308236A1

    公开(公告)日:2010-12-09

    申请号:US12775728

    申请日:2010-05-07

    IPC分类号: H01J37/317 H01J1/54

    摘要: A masking apparatus includes a mask positioned upstream of a target positioned for treatment with ions. The mask is sized relative to the target to cause a first half of the target to be treated with a selective treatment of ions through the mask and a second half of the target to be treated with a blanket treatment of ions unimpeded by the mask during a first time interval. The masking apparatus also includes a positioning mechanism to change a relative position of the mask and the target so that the second half of the target is treated with the selective treatment of ions and the first half of the target is treated with the blanket implant during a second time interval. An ion implanter having the masking apparatus is also provided.

    摘要翻译: 掩模装置包括位于被定位用于用离子处理的靶的上游的掩模。 掩模的尺寸相对于目标,以使靶的第一半被选择性地处理离子通过掩模和待处理的靶的第二半被处理,在一个 第一时间间隔。 掩蔽装置还包括定位机构,以改变掩模和靶的相对位置,以便通过选择性处理离子来处理靶的后半部分,并且在 第二时间间隔。 还提供了具有掩蔽装置的离子注入机。

    SYSTEM AND METHOD FOR HANDLING MULTIPLE WORKPIECES FOR MATRIX CONFIGURATION PROCESSING
    10.
    发明申请
    SYSTEM AND METHOD FOR HANDLING MULTIPLE WORKPIECES FOR MATRIX CONFIGURATION PROCESSING 失效
    用于处理矩阵配置处理的多个工件的系统和方法

    公开(公告)号:US20110108742A1

    公开(公告)日:2011-05-12

    申请号:US12941656

    申请日:2010-11-08

    摘要: A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.

    摘要翻译: 用于将工件加载到用于以矩阵构造处理的处理室中的系统包括被构造成以线性方式输送多个工件的传送器。 工件酒店被配置为从输送机接收多个工件。 工件酒店包括排列在N列和M层的单元矩阵。 拾取刀片被配置成插入酒店并从酒店退回,以便将多个基板从第一层卸载到单行拾取刀片中,并且重复卸载操作以形成矩阵,其包括多个 设置在拾取刀片上的一排衬底。 在一个例子中,工件酒店具有交错的配置,可以提供每个酒店单元的个人可访问性。