Monitoring low temperature rapid thermal anneal process using implanted wafers
    3.
    发明授权
    Monitoring low temperature rapid thermal anneal process using implanted wafers 有权
    使用植入晶片监测低温快速热退火工艺

    公开(公告)号:US06962884B2

    公开(公告)日:2005-11-08

    申请号:US10743689

    申请日:2003-12-19

    摘要: A method for processing integrated circuit devices. The method includes providing a monitor wafer, which comprising a silicon material. The method introduces a plurality of particles within a depth of the silicon material. The plurality of particles have a reduced activation energy within the silicon material. The method subjects the monitor wafer including the plurality of particles into a rapid thermal anneal process. The method includes applying the rapid thermal anneal process at a first state including a first temperature. The first temperature is within a range defined as a low temperature range, which is less than 650 Degrees Celsius. The method includes removing the monitor wafer and measuring a sheet resistivity of the monitor wafer. The method also determines the first temperature within a tolerance of less than 2 percent across the monitor wafer. The method operates the rapid thermal process using a plurality of production wafers if the first temperature is within a tolerance of a specification temperature.

    摘要翻译: 一种用于处理集成电路器件的方法。 该方法包括提供包括硅材料的监测晶片。 该方法在硅材料的深度内引入多个颗粒。 多个颗粒在硅材料内具有降低的活化能。 该方法将包括多个颗粒的监测晶片进行快速热退火处理。 该方法包括将快速热退火工艺应用于包括第一温度的第一状态。 第一个温度在一个定义为低于650摄氏度的低温范围的范围内。 该方法包括移除监测晶片并测量监测晶片的薄层电阻率。 该方法还确定跨越监视器晶片的容差内的第一温度小于2%。 如果第一温度在规定温度的公差范围内,则该方法使用多个生产晶片进行快速热处理。

    High-throughput screening with multi-through hole testing plate
    4.
    发明申请
    High-throughput screening with multi-through hole testing plate 审中-公开
    高通量筛选多孔测试板

    公开(公告)号:US20060183171A1

    公开(公告)日:2006-08-17

    申请号:US11378735

    申请日:2006-03-17

    IPC分类号: G01N33/53

    摘要: A high throughput screening method. At least one liquid sample is provided that includes an analyte that directly or indirectly produces a detectable characteristic in one or more first assays. A plurality of through holes is filled with portions of the liquid sample in a testing assembly that has a pair of opposing surfaces, each through hole extending from one of the opposing surfaces to the other of the opposing surfaces, with the through holes arranged in group. Surface tension holds the respective portions in the respective plurality of through holes. A detection is made of which of the through holes contains a liquid sample portion that includes said analyte. The detectable characteristic may be produced in various assays such as an absorbance transcription assay, a fluorescent transcription assay, a fluorescent secreted enzyme assay, or a microorganism screening assay.

    摘要翻译: 高通量筛选方法。 提供至少一种液体样品,其包括在一个或多个第一测定中直接或间接产生可检测特征的分析物。 多个通孔在具有一对相对表面的测试组件中填充有液体样品的部分,每个通孔从相对表面中的一个延伸到另一个相对表面,通孔布置成 。 表面张力保持相应的多个通孔中的各个部分。 检测哪个通孔包含包含所述分析物的液体样品部分。 可以在各种测定中产生可检测特征,例如吸光度转录测定,荧光转录测定,荧光分泌酶测定或微生物筛选测定。

    Monitoring low temperature rapid thermal anneal process using implanted wafers

    公开(公告)号:US20050124080A1

    公开(公告)日:2005-06-09

    申请号:US10743689

    申请日:2003-12-19

    摘要: A method for processing integrated circuit devices. The method includes providing a monitor wafer, which comprising a silicon material. The method introduces a plurality of particles within a depth of the silicon material. The plurality of particles have a reduced activation energy within the silicon material. The method subjects the monitor wafer including the plurality of particles into a rapid thermal anneal process. The method includes applying the rapid thermal anneal process at a first state including a first temperature. The first temperature is within a range defined as a low temperature range, which is less than 650 Degrees Celsius. The method includes removing the monitor wafer and measuring a sheet resistivity of the monitor wafer. The method also determines the first temperature within a tolerance of less than 2 percent across the monitor wafer. The method operates the rapid thermal process using a plurality of production wafers if the first temperature is within a tolerance of a specification temperature.

    TWO-HAND ADJUSTABLE ACUPRESSURE METHOD AND APPARATUS
    7.
    发明申请
    TWO-HAND ADJUSTABLE ACUPRESSURE METHOD AND APPARATUS 审中-公开
    两手可调式压缩方法和装置

    公开(公告)号:US20150025568A1

    公开(公告)日:2015-01-22

    申请号:US13947957

    申请日:2013-07-22

    申请人: Amy Liu

    发明人: Amy Liu

    IPC分类号: A61H15/00

    摘要: Acupressure apparatus and method that relieves muscle knots and tightness in a user's back by means of an acupressure ball which is threaded two ends by a cord, the cord being both flexible and stretchable. The ball is adjustable along the cord and can be set at a fixed position along the length of the cord using two anchors around the holes where the ball is threaded through. The user grasps the apparatus at each end of the cord and the apparatus can be positioned at the desired spot on a user's back by any of a combination of adjusting the user's hands, arms, and the position of the ball along the cord while the user is grasping the acupressure apparatus. The user's body weight applied on the ball against a rigid surface will apply acupressure therapy.

    摘要翻译: 指压装置和方法,通过用一根绳索将两端螺纹连接的针压球,缓解使用者背部的肌肉结和紧密度,该绳索既柔韧又可拉伸。 球可以沿绳索调节,并且可以沿着绳索的长度设置在固定位置,使用围绕球穿过的孔的两个锚定件。 使用者在电线的每一端抓住设备,并且可以通过任何组合的方式将设备放置在使用者背部的所需位置,任何一种组合可以在使用者时调整用户的手,手臂和球的位置 正在抓住指压装置。 将使用者的身体重量施加在刚性表面上的球上将采用指压疗法。