公开(公告)号：US07039501B2

公开(公告)日：2006-05-02

申请号：US10406644

申请日：2003-04-03

申请人： Marvin L. Freeman ,  Jeffrey C. Hudgens ,  Damon Keith Cox ,  Chris Holt Pencis ,  Michael Rice ,  David A. Van Gogh

发明人： Marvin L. Freeman ,  Jeffrey C. Hudgens ,  Damon Keith Cox ,  Chris Holt Pencis ,  Michael Rice ,  David A. Van Gogh

IPC分类号： G05B15/00 ,  G05B19/00

CPC分类号： H01L21/67259 ,  B25J9/0009 ,  B25J9/107 ,  G05B19/404 ,  G05B2219/37608 ,  G05B2219/39192 ,  G05B2219/49169 ,  G05B2219/49207 ,  H01L21/67742 ,  H01L21/67748 ,  H01L21/68 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

摘要： Generally, a method of determining a position of a robot is provided. In one embodiment, a method of determining a position of a robot comprises acquiring a first set of positional metrics, acquiring a second set of positional metrics and resolving the position of the robot due to thermal expansion using the first set and the second set of positional metrics. Acquiring the first and second set of positional metrics may occur at the same location within a processing system, or may occur at different locations. For example, in another embodiment, the method may comprise acquiring a first set of positional metrics at a first location proximate a processing chamber and acquiring a second set of positional metrics in another location. In another embodiment, substrate center information is corrected using the determined position of the robot.

公开(公告)号：US06556887B2

公开(公告)日：2003-04-29

申请号：US09905091

申请日：2001-07-12

申请人： Marvin L. Freeman ,  Jeffrey C. Hudgens ,  Damon Keith Cox ,  Chris Holt Pencis ,  Michael Rice ,  David A. Van Gogh

发明人： Marvin L. Freeman ,  Jeffrey C. Hudgens ,  Damon Keith Cox ,  Chris Holt Pencis ,  Michael Rice ,  David A. Van Gogh

IPC分类号： G06F700

CPC分类号： H01L21/67259 ,  B25J9/0009 ,  B25J9/107 ,  G05B19/404 ,  G05B2219/37608 ,  G05B2219/39192 ,  G05B2219/49169 ,  G05B2219/49207 ,  H01L21/67742 ,  H01L21/67748 ,  H01L21/68 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

摘要： Generally, a method of determining a position of a robot is provided. In one embodiment, a method of determining a position of a robot comprises acquiring a first set of positional metrics, acquiring a second set of positional metrics and resolving the position of the robot due to thermal expansion using the first set and the second set of positional metrics. Acquiring the first and second set of positional metrics may occur at the same location within a processing system, or may occur at different locations. For example, in another embodiment, the method may comprise acquiring a first set of positional metrics at a first location proximate a processing chamber and acquiring a second set of positional metrics in another location. In another embodiment, substrate center information is corrected using the determined position of the robot.

摘要翻译： 通常，提供了一种确定机器人的位置的方法。 在一个实施例中，一种确定机器人位置的方法包括获取第一组位置度量，获取第二组位置度量并且利用第一组和第二组位置来解决由于热膨胀引起的机器人的位置 指标 获取第一和第二组位置度量可以发生在处理系统内的相同位置处，或者可以在不同位置处发生。 例如，在另一个实施例中，该方法可以包括在靠近处理室的第一位置获取第一组位置度量，并在另一位置获取第二组位置度量。 在另一个实施例中，使用所确定的机器人的位置校正基板中心信息。

公开(公告)号：US07927062B2

公开(公告)日：2011-04-19

申请号：US11554530

申请日：2006-10-30

申请人： Michael Rice ,  Nicholas Cravalho ,  Jeffrey A. Brodine

发明人： Michael Rice ,  Nicholas Cravalho ,  Jeffrey A. Brodine

IPC分类号： G06F15/00

CPC分类号： H01L21/67748 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/68707

摘要： In one aspect, a first apparatus is provided that is adapted to transfer a substrate between a transfer chamber and a processing chamber. The first apparatus includes a robot having a first blade, a second blade spaced from the first blade, and a central hub coupled to the first blade by at least a first arm and coupled to the second blade by at least a second arm. The first blade and the second blade are spaced so as to allow (a) both blades to simultaneously extend through a slit valve that separates a transfer chamber from a processing chamber coupled to the transfer chamber when the robot is positioned within the transfer chamber; and (b) the first and second blades to transfer substrates to and remove substrates from the processing chamber without raising or lowering the first and second blades or the robot. Numerous other aspects are provided.

摘要翻译： 在一个方面，提供了适于在传送室和处理室之间传送衬底的第一设备。 第一装置包括具有第一叶片的机器人，与第一叶片间隔开的第二叶片，以及通过至少第一臂联接到第一叶片并通过至少第二臂联接到第二叶片的中心轮毂。 第一叶片和第二叶片间隔开以便（a）当机器人位于传送室内时，两个叶片同时延伸通过狭缝阀，该狭缝阀将传送室与耦合到传送室的处理室分离; 以及（b）第一和第二刀片，用于将基板转移到处理室中并从基板移除基板，而不会升高或降低第一和第二刀片或机器人。 提供了许多其他方面。

公开(公告)号：US20090064929A1

公开(公告)日：2009-03-12

申请号：US12254784

申请日：2008-10-20

申请人： Tetsuya Ishikawa ,  Rick J. Roberts ,  Helen R. Armer ,  Leon Volfovski ,  Jay D. Pinson ,  Michael Rice ,  David H. Quach ,  Mohsen S. Salek ,  Robert Lowrance ,  John A. Backer ,  William Tyler Weaver ,  Charles Carlson ,  Chongyang Wang ,  Jeffrey Hudgens ,  Harald Herchen ,  Brian Lu

发明人： Tetsuya Ishikawa ,  Rick J. Roberts ,  Helen R. Armer ,  Leon Volfovski ,  Jay D. Pinson ,  Michael Rice ,  David H. Quach ,  Mohsen S. Salek ,  Robert Lowrance ,  John A. Backer ,  William Tyler Weaver ,  Charles Carlson ,  Chongyang Wang ,  Jeffrey Hudgens ,  Harald Herchen ,  Brian Lu

IPC分类号： B05C13/02

CPC分类号： H01L21/67225 ,  G03B27/32 ,  G03D13/006 ,  G03F7/40 ,  G05B19/41825 ,  G05B2219/40476 ,  G05B2219/45031 ,  G05B2219/49137 ,  H01L21/67109 ,  H01L21/6715 ,  H01L21/67161 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67754 ,  H01L21/6831 ,  H01L21/6838 ,  H01L21/68707 ,  H01L22/26 ,  Y02P90/087 ,  Y10S414/135 ,  Y10S414/136 ,  Y10T29/53187 ,  Y10T29/5323

摘要： Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, which is then removed in a developing process completed in the cluster tool. In track lithography type cluster tools, since the chamber processing times tend to be rather short, and the number of processing steps required to complete a typical track system process is large, a significant portion of the time it takes to process a substrate is taken up by the processes of transferring the substrates in a cluster tool between the various processing chambers. In one embodiment of the cluster tool, the cost of ownership is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. In one aspect of the invention, the substrate processing sequence and cluster tool are designed so that the substrate transferring steps performed during the processing sequence are only made to chambers that will perform the next processing step in the processing sequence. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

公开(公告)号：US20090064928A1

公开(公告)日：2009-03-12

申请号：US12254750

申请日：2008-10-20

申请人： Tetsuya Ishikawa ,  Rick J. Roberts ,  Helen R. Armer ,  Leon Volfovski ,  Jay D. Pinson ,  Michael Rice ,  David H. Quach ,  Mohsen S. Salek ,  Robert Lowrance ,  John A. Backer ,  William Tyler Weaver ,  Charles Carlson ,  Chongyang Wang ,  Jeffrey Hudgens ,  Harald Herchen ,  Brian Lue

发明人： Tetsuya Ishikawa ,  Rick J. Roberts ,  Helen R. Armer ,  Leon Volfovski ,  Jay D. Pinson ,  Michael Rice ,  David H. Quach ,  Mohsen S. Salek ,  Robert Lowrance ,  John A. Backer ,  William Tyler Weaver ,  Charles Carlson ,  Chongyang Wang ,  Jeffrey Hudgens ,  Harald Herchen ,  Brian Lue

IPC分类号： B05C13/02

CPC分类号： H01L21/67225 ,  G03B27/32 ,  G03D13/006 ,  G03F7/40 ,  G05B19/41825 ,  G05B2219/40476 ,  G05B2219/45031 ,  G05B2219/49137 ,  H01L21/67109 ,  H01L21/6715 ,  H01L21/67161 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67754 ,  H01L21/6831 ,  H01L21/6838 ,  H01L21/68707 ,  H01L22/26 ,  Y02P90/087 ,  Y10S414/135 ,  Y10S414/136 ,  Y10T29/53187 ,  Y10T29/5323

摘要： Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, which is then removed in a developing process completed in the cluster tool. In track lithography type cluster tools, since the chamber processing times tend to be rather short, and the number of processing steps required to complete a typical track system process is large, a significant portion of the time it takes to process a substrate is taken up by the processes of transferring the substrates in a cluster tool between the various processing chambers. In one embodiment of the cluster tool, the cost of ownership, is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. In one aspect of the invention, the substrate processing sequence and cluster tool are designed so that the substrate transferring steps performed during the processing sequence are only made to chambers that will perform the next processing step in the processing sequence. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

公开(公告)号：US20070274813A1

公开(公告)日：2007-11-29

申请号：US11838155

申请日：2007-08-13

申请人： Michael Rice ,  Martin Elliott ,  Robert Lawrance ,  Jeffrey Hudgens ,  Eric Englhardt

发明人： Michael Rice ,  Martin Elliott ,  Robert Lawrance ,  Jeffrey Hudgens ,  Eric Englhardt

IPC分类号： G06F19/00

CPC分类号： B65G37/02 ,  B65G47/61 ,  B65G2201/0297 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778

摘要： In a first aspect, a substrate loading station is served by a conveyor which continuously transports substrate carriers. A substrate carrier handler that is part of the substrate loading station operates to exchange substrate carriers with the conveyor while the conveyor is in motion. A carrier exchange procedure may include moving an end effector of the substrate carrier handler at a velocity that substantially matches a velocity of the conveyor. Numerous other aspects are provided.

公开(公告)号：US20070108019A1

公开(公告)日：2007-05-17

申请号：US11619181

申请日：2007-01-02

申请人： Michael Rice ,  Eric Englhardt ,  Robert Lowrance ,  Martin Elliot ,  Jeffrey Hudgens

发明人： Michael Rice ,  Eric Englhardt ,  Robert Lowrance ,  Martin Elliot ,  Jeffrey Hudgens

IPC分类号： B65G37/00 ,  B65G29/00

CPC分类号： H01L21/68707 ,  H01L21/6773 ,  H01L21/67733

摘要： A break-away mounting system for a continuous-motion, high-speed position conveyor system is disclosed. A support cradle may be suspended from a conveyor belt such that the support cradle maintains a fixed position and orientation relative to at least one point on the conveyor belt without inducing appreciable stress on the conveyor belt, the support cradle, or the coupling between the conveyor belt and the support cradle. The mount may include a leading rotatable bearing attached to the support cradle which may releasably engage a first key attached to the conveyor belt, the rotatable bearing adapted to accommodate rotational forces applied to the support cradle by the conveyor belt. The mount may also include a slide bearing attached to the support cradle which may releasably engage a second key attached to the conveyor belt, the slide bearing adapted to accommodate longitudinal forces applied to the support cradle by the conveyor belt.

公开(公告)号：US20070061042A1

公开(公告)日：2007-03-15

申请号：US11555240

申请日：2006-10-31

申请人： Michael Rice ,  Martin Elliott ,  Robert Lowrance ,  Jeffrey Hudgens ,  Eric Englhardt

发明人： Michael Rice ,  Martin Elliott ,  Robert Lowrance ,  Jeffrey Hudgens ,  Eric Englhardt

IPC分类号： G06F19/00

CPC分类号： B65G37/02 ,  B65G47/61 ,  B65G2201/0297 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778

摘要： In a first aspect, a substrate loading station is served by a conveyor which continuously transports substrate carriers. A substrate carrier handler that is part of the substrate loading station operates to exchange substrate carriers with the conveyor while the conveyor is in motion. A carrier exchange procedure may include moving an end effector of the substrate carrier handler at a velocity that substantially matches a velocity of the conveyor. Numerous other aspects are provided.

摘要翻译： 在第一方面中，基板装载站由连续输送基板载体的输送机供给。 作为基板装载站的一部分的基板载体处理器在输送机运动的同时与输送机交换基板载体。 载体交换过程可以包括以基本匹配输送机速度的速度移动基底载体处理器的端部执行器。 提供了许多其他方面。

公开(公告)号：US20070060754A1

公开(公告)日：2007-03-15

申请号：US10595230

申请日：2004-10-01

申请人： Kyle Lindstrom ,  Bryon Merrill ,  Chad Haraldson ,  Michael Rice ,  Tushar Kshirsagar ,  Philip Heppner ,  Joshua Wurst ,  Shri Niwas ,  Sarah Johannessen

发明人： Kyle Lindstrom ,  Bryon Merrill ,  Chad Haraldson ,  Michael Rice ,  Tushar Kshirsagar ,  Philip Heppner ,  Joshua Wurst ,  Shri Niwas ,  Sarah Johannessen

IPC分类号： C07D471/00

CPC分类号： C07D471/04 ,  A61K31/4745 ,  C07D413/14 ,  C07D519/00 ,  Y02A50/409 ,  Y02A50/411 ,  Y02A50/463

摘要： Imidazoquinoline compounds with an alkoxy substituent at the 6, 7, 8, or 9-position, pharmaceutical compositions containing the compounds, intermediates, methods of making, and methods of use of these compounds as immunomodulators, for inducing or inhibiting cytokine biosynthesis in animals and in the treatment of diseases including viral, and neoplastic, are disclosed.

摘要翻译： 含有6,7,8或9位烷氧基取代基的咪唑并喹啉化合物含有化合物，中间体，制备方法，以及这些化合物作为免疫调节剂的用途，用于诱导或抑制动物中的细胞因子生物合成， 在包括病毒和肿瘤的疾病的治疗中。

公开(公告)号：US20070059145A1

公开(公告)日：2007-03-15

申请号：US11554876

申请日：2006-10-31

申请人： Michael Rice ,  Robert Lowrance ,  Martin Elliott ,  Jeffrey Hudgens ,  Eric Englhardt

发明人： Michael Rice ,  Robert Lowrance ,  Martin Elliott ,  Jeffrey Hudgens ,  Eric Englhardt

IPC分类号： B65G47/90

CPC分类号： H01L21/67276 ,  H01L21/67769 ,  H01L21/67778

摘要： In a semiconductor fabrication facility, a conveyor transports substrate carriers. The substrate carriers are unloaded from the conveyor and loaded onto the conveyor without stopping the conveyor. A load and/or unload mechanism lifts the substrate carriers from the conveyor during unloading operations, while matching the horizontal speed of the conveyor. Similarly, during loading operations, the load/unload mechanism lowers a substrate carrier into engagement with the conveyor while matching the horizontal speed of the conveyor. Individual substrates, without carriers, may be similarly loaded and/or unloaded from a conveyor.

摘要翻译： 在半导体制造设备中，输送机输送基板载体。 基板载体从输送机卸载并装载到输送机上而不停止输送机。 在卸载操作期间，负载和/或卸载机构将基板载体从输送机提升，同时匹配输送机的水平速度。 类似地，在装载操作期间，装载/卸载机构降低了基板载体与输送机的接合，同时匹配输送机的水平速度。 没有载体的单个基底可以类似地从输送机装载和/或卸载。