公开(公告)号：US07871309B2

公开(公告)日：2011-01-18

申请号：US11720964

申请日：2005-12-08

申请人： Kazuyuki Ogawa ,  Tetsuo Shimomura ,  Atsushi Kazuno ,  Yoshiyuki Nakai ,  Masahiro Watanabe ,  Takatoshi Yamada ,  Masahiko Nakamori

发明人： Kazuyuki Ogawa ,  Tetsuo Shimomura ,  Atsushi Kazuno ,  Yoshiyuki Nakai ,  Masahiro Watanabe ,  Takatoshi Yamada ,  Masahiko Nakamori

IPC分类号： B24B1/00 ,  B24D11/00

CPC分类号： B24B37/205 ,  Y10T428/24339 ,  Y10T428/24992

摘要： It is an object of the invention to provide a polishing pad capable of high precision optical detection of an endpoint during polishing in progress and prevention of slurry leakage from between a polishing region and a light-transmitting region during the use thereof even after the polishing pad has been used for a long period. It is a second object of the invention to provide a polishing pad capable of suppression of deterioration of polishing characteristics (such as in-plane uniformity) and generation of scratches due to a difference in behavior of a polishing region and a light-transmitting region during polishing. It is a third object of the invention to provide a polishing pad having a polishing region and a light-transmitting region with a concentration of a specific metal equal to or lower than a specific value (threshold value).

摘要翻译： 本发明的目的是提供一种抛光垫，其能够在抛光过程中对端点进行高精度光学检测，并且即使在抛光垫之后也可防止在使用期间抛光区域和透光区域之间的浆料泄漏 已被使用了很长时间。 本发明的第二个目的是提供一种能够抑制抛光特性（例如面内均匀性）劣化的抛光垫以及由于抛光区域和透光区域的行为差异而产生的划痕 抛光。 本发明的第三个目的是提供一种具有抛光区域和特定金属浓度等于或低于特定值（阈值）的透光区域的抛光垫。

公开(公告)号：US07731568B2

公开(公告)日：2010-06-08

申请号：US10598717

申请日：2004-10-20

申请人： Tetsuo Shimomura ,  Masahiko Nakamori ,  Takatoshi Yamada ,  Kazuyuki Ogawa ,  Atsushi Kazuno ,  Masahiro Watanabe

发明人： Tetsuo Shimomura ,  Masahiko Nakamori ,  Takatoshi Yamada ,  Kazuyuki Ogawa ,  Atsushi Kazuno ,  Masahiro Watanabe

IPC分类号： B24B7/00 ,  B24B7/19 ,  B24B5/00 ,  B24B29/00 ,  B24D11/00

CPC分类号： B24B37/205 ,  H01L21/30625

摘要： The object of the invention is to provide a polishing pad capable of maintaining high-precision end-point optical detection over a long period from the start of use to the end of use even if polishing is performed with an alkaline or acid slurry, as well as a method of manufacturing a semiconductor device with this polishing pad. The polishing pad of the invention is used in chemical mechanical polishing and has a polishing region and a light-transmitting region, wherein the light-transmitting region satisfies that the difference ΔT (ΔT=T0−T1) (%) between T0 and T1 is within 10(%) over the whole range of measurement wavelengths of from 400 to 700 nm, wherein T1 is the light transmittance (%) of the light-transmitting region measured at the measurement wavelength λ after dipping for 24 hours in a KOH aqueous solution at pH 11 or an H2O2 aqueous solution at pH 4 and T0 is the light-transmittance (%) measured at the measurement wavelength λ before the dipping.

摘要翻译： 本发明的目的是提供一种抛光垫，即使在用碱性或酸性浆料进行研磨的同时，也能够在从使用开始到使用结束的长时间内保持高精度的端点光学检测 作为使用该研磨垫的半导体装置的制造方法。 本发明的抛光垫用于化学机械抛光，并具有抛光区域和透光区域，其中透光区域满足以下区别：Dgr; T（＆Dgr; T = T0-T1）（％） T0和T1在400〜700nm的测量波长的整个范围内在10（％）以内，其中T1是在浸渍24小时后在测量波长λ测量的透光区域的透光率（％） pH为11的KOH水溶液或pH4的H 2 O 2水溶液，T0为在浸渍前测定的波长λ下测定的透光率（％）。

公开(公告)号：US20090253353A1

公开(公告)日：2009-10-08

申请号：US11720964

申请日：2005-12-08

申请人： Kazuyuki Ogawa ,  Tetsuo Shimomura ,  Atsushi Kazuno ,  Yoshiyuki Nakai ,  Masahiro Watanabe ,  Takatoshi Yamada ,  Masahiko Nakamori

发明人： Kazuyuki Ogawa ,  Tetsuo Shimomura ,  Atsushi Kazuno ,  Yoshiyuki Nakai ,  Masahiro Watanabe ,  Takatoshi Yamada ,  Masahiko Nakamori

IPC分类号： B24B37/04 ,  B24B1/00 ,  B29C65/70 ,  B32B37/00 ,  B32B3/10

CPC分类号： B24B37/205 ,  Y10T428/24339 ,  Y10T428/24992

摘要： It is an object of the invention to provide a polishing pad capable of high precision optical detection of an endpoint during polishing in progress and prevention of slurry leakage from between a polishing region and a light-transmitting region during the use thereof even after the polishing pad has been used for a long period. It is a second object of the invention to provide a polishing pad capable of suppression of deterioration of polishing characteristics (such as in-plane uniformity) and generation of scratches due to a difference in behavior of a polishing region and a light-transmitting region during polishing. It is a third object of the invention to provide a polishing pad having a polishing region and a light-transmitting region with a concentration of a specific metal equal to or lower than a specific value (threshold value).

摘要翻译： 本发明的目的是提供一种抛光垫，其能够在抛光过程中对端点进行高精度光学检测，并且即使在抛光垫之后也可防止在使用期间抛光区域和透光区域之间的浆料泄漏 已被使用了很长时间。 本发明的第二个目的是提供一种能够抑制抛光特性（例如面内均匀性）劣化的抛光垫以及由于抛光区域和透光区域的行为差异而产生的划痕 抛光。 本发明的第三个目的是提供一种具有抛光区域和特定金属浓度等于或低于特定值（阈值）的透光区域的抛光垫。

公开(公告)号：US08845852B2

公开(公告)日：2014-09-30

申请号：US10536621

申请日：2003-11-27

申请人： Masahiko Nakamori ,  Tetsuo Shimomura ,  Takatoshi Yamada ,  Kazuyuki Ogawa ,  Atsushi Kazuno ,  Masahiro Watanabe

发明人： Masahiko Nakamori ,  Tetsuo Shimomura ,  Takatoshi Yamada ,  Kazuyuki Ogawa ,  Atsushi Kazuno ,  Masahiro Watanabe

IPC分类号： C23F1/00 ,  B24B37/20 ,  B24B37/013

CPC分类号： B24B37/205 ,  B24B37/013

摘要： A polishing pad enabling a highly precise optical endpoint sensing during the polishing process and thus having excellent polishing characteristics (such as surface uniformity and in-plane uniformity) is disclosed. A polishing pad enabling to obtain the polishing profile of a large area of a wafer is also disclosed. A polishing pad of a first invention comprises a light-transmitting region having a transmittance of not less than 50% over the wavelength range of 400 to 700 nm. A polishing pad of a second invention comprises a light-transmitting region having a thickness of 0.5 to 4 mm and a transmittance of not less than 80% over the wavelength range of 600 to 700 nm. A polishing pad of a third invention comprises a light-transmitting region arranged between the central portion and the peripheral portion of the polishing pad and having a length (D) in the diametrical direction which is three times or more longer than the length (L) in the circumferential direction.

摘要翻译： 公开了一种抛光垫，其能够在抛光过程中进行高精度的光学终点感测，因此具有优异的抛光特性（例如表面均匀性和面内均匀性）。 还公开了能够获得大面积晶片的抛光轮廓的抛光垫。 第一发明的抛光垫包括在400〜700nm的波长范围内具有不小于50％透射率的透光区域。 第二发明的抛光垫包括在600至700nm的波长范围内具有0.5至4mm厚度的透光区域和不小于80％的透光率。 第三发明的抛光垫包括布置在抛光垫的中心部分和周边部分之间的透光区域，其沿直径方向的长度（D）比长度（L）长三倍或更长， 在圆周方向。

公开(公告)号：US20070190905A1

公开(公告)日：2007-08-16

申请号：US10598717

申请日：2004-10-20

申请人： Tetsuo Shimomura ,  Masahiko Nakamori ,  Takatoshi Yamada ,  Kazuyuki Ogawa ,  Atsushi Kazuno ,  Masahiro Watanabe

发明人： Tetsuo Shimomura ,  Masahiko Nakamori ,  Takatoshi Yamada ,  Kazuyuki Ogawa ,  Atsushi Kazuno ,  Masahiro Watanabe

IPC分类号： B24B1/00 ,  H01L21/461 ,  H01L21/302

CPC分类号： B24B37/205 ,  H01L21/30625

摘要： The object of the invention is to provide a polishing pad capable of maintaining high-precision end-point optical detection over a long period from the start of use to the end of use even if polishing is performed with an alkaline or acid slurry, as well as a method of manufacturing a semiconductor device with this polishing pad. The polishing pad of the invention is used in chemical mechanical polishing and has a polishing region and a light-transmitting region, wherein the light-transmitting region satisfies that the difference ΔT (ΔT=T0−T1) (%) between T0 and T1 is within 10(%) over the whole range of measurement wavelengths of from 400 to 700 nm, wherein T1 is the light transmittance (%) of the light-transmitting region measured at the measurement wavelength λ after dipping for 24 hours in a KOH aqueous solution at pH 11 or an H2O2 aqueous solution at pH 4 and T0 is the light-transmittance (%) measured at the measurement wavelength λ before the dipping.

摘要翻译： 本发明的目的是提供一种抛光垫，即使在用碱性或酸性浆料进行研磨的同时，也能够在从使用开始到使用结束的长时间内保持高精度的端点光学检测 作为使用该研磨垫的半导体装置的制造方法。 本发明的抛光垫用于化学机械抛光，并具有抛光区域和透光区域，其中透光区域满足差值DeltaT（ΔT= T 0 -T < 在0至100nm的测量波长的整个范围内，T 0和T 1之间的平均值（％）在10（％）以内 其中T 1是在pH 11或KOH 2的KOH水溶液中浸渍24小时后在测量波长λ下测量的透光区的透光率（％） 在pH 4和T 0 <0> 2水溶液中的透光率（％）是在浸渍之前在测量波长λ下测量的。

公开(公告)号：US09753401B2

公开(公告)日：2017-09-05

申请号：US15182088

申请日：2016-06-14

申请人： Masayuki Yamane ,  Takeroh Kurenuma ,  Masahiro Watanabe

发明人： Masayuki Yamane ,  Takeroh Kurenuma ,  Masahiro Watanabe

IPC分类号： G03G15/08

CPC分类号： G03G15/0865 ,  G03G15/0872

摘要： A powder container includes a rotatable powder storage to store powder for image formation, a conveyor to transport the powder inside the powder storage, and a scooping portion to scoop the powder inside the powder storage. The conveyor transports the powder in a powder conveyance direction parallel to a rotation axis of the powder storage toward an opening at one end of the powder storage. The scooping portion causes the powder to flow to the opening. The scooping portion includes a scooping face extending from an inner face of the powder storage toward the rotation axis of the powder storage, and a rim disposed along an inner end of the scooping face in a diameter direction of the powder storage, and at least a portion of the rim protruding downstream beyond the scooping face in a rotation direction of the powder storage.

公开(公告)号：US09507291B2

公开(公告)日：2016-11-29

申请号：US14887025

申请日：2015-10-19

申请人： Tetsuro Hirota ,  Hiroshi Hosokawa ,  Shunji Katoh ,  Masayuki Yamane ,  Masahiro Watanabe ,  Shingo Nishizaki

发明人： Tetsuro Hirota ,  Hiroshi Hosokawa ,  Shunji Katoh ,  Masayuki Yamane ,  Masahiro Watanabe ,  Shingo Nishizaki

IPC分类号： G03G15/08 ,  G01N27/72

CPC分类号： G03G15/0829 ,  G01N27/72 ,  G03G15/0848 ,  G03G15/0853

摘要： A magnetic permeability detector includes an LC oscillator circuit including a coil and a capacitor; and a resistor connected in series with the coil.

公开(公告)号：US09488500B2

公开(公告)日：2016-11-08

申请号：US14111012

申请日：2011-04-18

申请人： Wataru Tsujita ,  Kenji Inomata ,  Masahiro Watanabe ,  Masahiro Shikai

发明人： Wataru Tsujita ,  Kenji Inomata ,  Masahiro Watanabe ,  Masahiro Shikai

IPC分类号： G01J4/00 ,  G01S13/00 ,  G01D5/34

CPC分类号： G01D5/345

摘要： A reflector apparatus includes reflectors, which respectively radiate reflected waves in predetermined polarization directions. A polarized wave information reading circuit fixed to a moving body radiates a radio wave toward the reflecting apparatus from a transmitting antenna, receives reflected waves from the reflecting apparatus, and generates a received level difference signal that corresponds to a polarization direction of the received reflected waves. A position calculating circuit calculates a position of the polarized wave information reading circuit based on the received level difference signal.

摘要翻译： 反射器装置包括反射器，其分别以预定的偏振方向辐射反射波。 固定到移动体的偏振波信息读取电路从发送天线朝向反射装置发射无线电波，接收来自反射装置的反射波，并生成与所接收的反射波的偏振方向对应的接收电平差信号 。 位置计算电路基于接收到的电平差信号来计算偏振波信息读取电路的位置。

公开(公告)号：US09413173B2

公开(公告)日：2016-08-09

申请号：US13993804

申请日：2011-12-01

申请人： Eisuke Kuroda ,  Yasuo Sato ,  Masahiro Watanabe ,  Taichiro Kawahara

发明人： Eisuke Kuroda ,  Yasuo Sato ,  Masahiro Watanabe ,  Taichiro Kawahara

IPC分类号： H02J3/24 ,  G06Q10/06 ,  G06Q50/06 ,  H02J3/38

CPC分类号： H02J3/24 ,  G06Q10/06 ,  G06Q50/06 ,  H02J3/383 ,  H02J3/386 ,  Y02E10/563 ,  Y02E10/763 ,  Y04S10/54

摘要： A command system of a power conditioning system of the present invention receives return pattern information including a time instance and an upper output limit, and issues a command with respect to the upper output limit of the power conditioning system, the return pattern information being for preventing the frequency of an isolated power system, which is calculated by a planning server, from causing a sharp change.

摘要翻译： 本发明的功率调节系统的命令系统接收包括时间实例和上限输出限制的返回模式信息，并且发出关于功率调节系统的上限输出的命令，返回模式信息用于防止 由计划服务器计算的隔离电力系统的频率引起急剧变化。

公开(公告)号：US09382611B2

公开(公告)日：2016-07-05

申请号：US13488626

申请日：2012-06-05

申请人： Shunpei Yamazaki ,  Tetsunori Maruyama ,  Yuki Imoto ,  Hitomi Sato ,  Masahiro Watanabe ,  Mitsuo Mashiyama ,  Kenichi Okazaki ,  Motoki Nakashima ,  Takashi Shimazu

发明人： Shunpei Yamazaki ,  Tetsunori Maruyama ,  Yuki Imoto ,  Hitomi Sato ,  Masahiro Watanabe ,  Mitsuo Mashiyama ,  Kenichi Okazaki ,  Motoki Nakashima ,  Takashi Shimazu

IPC分类号： B28B1/00 ,  C23C14/08 ,  C23C14/34

CPC分类号： C23C14/08 ,  B28B11/243 ,  C04B35/453 ,  C04B35/64 ,  C04B2235/3284 ,  C04B2235/3286 ,  C04B2235/76 ,  C23C14/086 ,  C23C14/3414 ,  C23C14/345 ,  H01L21/02565 ,  H01L21/02631 ,  H01L29/24 ,  H01L29/66969 ,  H01L29/7869

摘要： There have been cases where transistors formed using oxide semiconductors are inferior in reliability to transistors formed using amorphous silicon. Thus, in the present invention, a semiconductor device including a highly reliable transistor formed using an oxide semiconductor is manufactured. An oxide semiconductor film is deposited by a sputtering method, using a sputtering target including an oxide semiconductor having crystallinity, and in which the direction of the c-axis of a crystal is parallel to a normal vector of the top surface of the oxide semiconductor. The target is formed by mixing raw materials so that its composition ratio can obtain a crystal structure.

摘要翻译： 已经有使用氧化物半导体形成的晶体管的可靠性与使用非晶硅形成的晶体管的可靠性差。 因此，在本发明中，制造了包括使用氧化物半导体形成的高可靠性晶体管的半导体器件。 使用包含具有结晶性的氧化物半导体的溅射靶，通过溅射法沉积氧化物半导体膜，并且其中晶体的c轴方向平行于氧化物半导体的顶表面的法向矢量。 通过混合原料形成靶，使其组成比可以得到晶体结构。