公开(公告)号：US20120067507A1

公开(公告)日：2012-03-22

申请号：US13307042

申请日：2011-11-30

申请人： Masahiko OGINO ,  Mitsuru Hasegawa ,  Kenya Ohashi ,  Akihiro Miyauchi ,  Hitoshi Suzuki ,  Toshio Haba ,  Haruo Akahoshi

发明人： Masahiko OGINO ,  Mitsuru Hasegawa ,  Kenya Ohashi ,  Akihiro Miyauchi ,  Hitoshi Suzuki ,  Toshio Haba ,  Haruo Akahoshi

IPC分类号： B29C33/42 ,  B29C65/00

CPC分类号： B29C33/3878 ,  B29C33/424 ,  C25D1/02 ,  C25D1/10 ,  Y10S425/81 ,  Y10T29/49549 ,  Y10T29/49552

摘要： The fine pattern mold that includes a roll, a buffer tube with inner peripheral surface is in contact with an outer peripheral surface of the roll, and a stamper tube in which its inner peripheral surface is in contact with an outer peripheral surface of the buffer tube and a fine concave/convex pattern is formed on its outer peripheral surface, wherein the buffer tube has a larger coefficient of linear expansion and a smaller elastic modulus than those of the stamper tube.

摘要翻译： 包括辊，具有内周面的缓冲管的精细图案模具与辊的外周面接触，并且压模管的内周面与缓冲管的外周面接触 并且在其外周面上形成微细的凹凸图案，其中缓冲管具有比压模管更大的线膨胀系数和更小的弹性模量。

公开(公告)号：US08083515B2

公开(公告)日：2011-12-27

申请号：US12129881

申请日：2008-05-30

申请人： Masahiko Ogino ,  Mitsuru Hasegawa ,  Kenya Ohashi ,  Akihiro Miyauchi ,  Hitoshi Suzuki ,  Toshio Haba ,  Haruo Akahoshi

发明人： Masahiko Ogino ,  Mitsuru Hasegawa ,  Kenya Ohashi ,  Akihiro Miyauchi ,  Hitoshi Suzuki ,  Toshio Haba ,  Haruo Akahoshi

IPC分类号： B29C43/46 ,  B29C59/04

CPC分类号： B29C33/3878 ,  B29C33/424 ,  C25D1/02 ,  C25D1/10 ,  Y10S425/81 ,  Y10T29/49549 ,  Y10T29/49552

摘要： The fine pattern mold comprises: that includes a roll, a buffer tube with inner peripheral surface is in contact with an outer peripheral surface of the roll, and a stamper tube in which its inner peripheral surface is in contact with an outer peripheral surface of the buffer tube and a fine concave/convex pattern is formed on its outer peripheral surface, wherein the buffer tube has a larger coefficient of linear expansion and a smaller elastic modulus than those of the stamper tube.

摘要翻译： 精细图案模具包括：包括辊，具有内周表面的缓冲管与辊的外周表面接触;以及压模管，其内周表面与所述辊的外周表面接触 在其外周面形成有缓冲管和细凹凸图案，其中缓冲管具有比压模管更大的线膨胀系数和更小的弹性模量。

公开(公告)号：US08387255B2

公开(公告)日：2013-03-05

申请号：US13307042

申请日：2011-11-30

申请人： Masahiko Ogino ,  Mitsuru Hasegawa ,  Kenya Ohashi ,  Akihiro Miyauchi ,  Hitoshi Suzuki ,  Toshio Haba ,  Haruo Akahoshi

发明人： Masahiko Ogino ,  Mitsuru Hasegawa ,  Kenya Ohashi ,  Akihiro Miyauchi ,  Hitoshi Suzuki ,  Toshio Haba ,  Haruo Akahoshi

IPC分类号： G11B7/26 ,  B29C33/38 ,  B29C59/04

CPC分类号： B29C33/3878 ,  B29C33/424 ,  C25D1/02 ,  C25D1/10 ,  Y10S425/81 ,  Y10T29/49549 ,  Y10T29/49552

摘要： The fine pattern mold that includes a roll, a buffer tube with inner peripheral surface is in contact with an outer peripheral surface of the roll, and a stamper tube in which its inner peripheral surface is in contact with an outer peripheral surface of the buffer tube and a fine concave/convex pattern is formed on its outer peripheral surface, wherein the buffer tube has a larger coefficient of linear expansion and a smaller elastic modulus than those of the stamper tube.

摘要翻译： 包括辊，具有内周面的缓冲管的精细图案模具与辊的外周面接触，并且压模管的内周面与缓冲管的外周面接触 并且在其外周面上形成微细的凹凸图案，其中缓冲管具有比压模管更大的线膨胀系数和更小的弹性模量。

公开(公告)号：US20080299247A1

公开(公告)日：2008-12-04

申请号：US12129881

申请日：2008-05-30

申请人： Masahiko Ogino ,  Mitsuru Hasegawa ,  Kenya Ohashi ,  Akihiro Miyauchi ,  Hitoshi Suzuki ,  Toshio Haba ,  Haruo Akahoshi

发明人： Masahiko Ogino ,  Mitsuru Hasegawa ,  Kenya Ohashi ,  Akihiro Miyauchi ,  Hitoshi Suzuki ,  Toshio Haba ,  Haruo Akahoshi

IPC分类号： B29C33/42 ,  C25D1/10

CPC分类号： B29C33/3878 ,  B29C33/424 ,  C25D1/02 ,  C25D1/10 ,  Y10S425/81 ,  Y10T29/49549 ,  Y10T29/49552

摘要： There is provided a fine pattern mold capable of transferring a fine concave/convex pattern accurately without causing deformation of the fine concave/convex pattern itself.The fine patter mold comprises: a roll; a buffer tube whose inner peripheral surface is in contact with an outer peripheral surface of the roll; and a stamper tube in which its inner peripheral surface is in contact with an outer peripheral surface of the buffer tube and a fine concave/convex pattern is formed on its outer peripheral surface, wherein the buffer tube has a larger coefficient of linear expansion and a smaller elastic modulus than those of the stamper tube.

摘要翻译： 提供了能够精确地转印精细凹凸图案的精细图案模具，而不会导致精细凹凸图案本身的变形。 精细模具包括：卷; 缓冲管，其内周面与所述辊的外周面接触; 以及其内周面与缓冲管的外周面接触的压模管，在其外周面上形成微细的凹凸图案，其中缓冲管具有较大的线膨胀系数和 比压模管的弹性模量小。

公开(公告)号：US20100310773A1

公开(公告)日：2010-12-09

申请号：US12859802

申请日：2010-08-20

申请人： Hiroshi Yoshida ,  Haruo Akahoshi ,  Akihiro Miyauchi ,  Masahiko Ogino

发明人： Hiroshi Yoshida ,  Haruo Akahoshi ,  Akihiro Miyauchi ,  Masahiko Ogino

IPC分类号： B05D3/10

CPC分类号： B29C33/3842 ,  B29C33/424 ,  B81B2203/0361 ,  B81C1/00111 ,  B81C1/00206 ,  B81C99/0085 ,  B81C99/009 ,  B81C2201/034 ,  B82Y10/00 ,  B82Y40/00 ,  C23C18/1608 ,  C23C18/1651 ,  C23C18/1653 ,  C23C18/1657 ,  C23C18/1689 ,  C23C18/208 ,  C23C18/42 ,  G03F7/0002 ,  H01J1/304 ,  H01J9/025 ,  Y10T428/12389 ,  Y10T428/12993

摘要： A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1. There is further provided a process for producing a fine metal structure, characterized by comprising providing a substrate having a fine rugged pattern on its surface, applying a molecular electroless plating catalyst to the surface, thereafter carrying out electroless plating to thereby form a metal layer having the rugged pattern filled, and detaching the metal layer from the substrate to thereby obtain a fine metal structure furnished with a surface having undergone reversal transfer of the above rugged pattern.

摘要翻译： 精细的金属结构，其表面具有高强度，高精度和大纵横比的微喷射体; 以及没有缺陷的金属微细结构的制造方法。 提供了具有微喷射体的表面的细金属结构，其特征在于，微喷射体具有10纳米至10微米的最小厚度或最小直径，并且微喷射体的最小厚度或最小直径（D）与高度 的微喷射体（H）H / D大于1.还提供了一种制造精细金属结构的方法，其特征在于，在其表面上提供具有细凹凸图案的基板，将分子无电镀催化剂 然后进行无电解电镀，从而形成具有凹凸图案的金属层，并将金属层与基板分离，从而获得配备有经过上述凹凸图案的反转传送的表面的精细金属结构。

公开(公告)号：US08741380B2

公开(公告)日：2014-06-03

申请号：US12859802

申请日：2010-08-20

申请人： Hiroshi Yoshida ,  Haruo Akahoshi ,  Akihiro Miyauchi ,  Masahiko Ogino

发明人： Hiroshi Yoshida ,  Haruo Akahoshi ,  Akihiro Miyauchi ,  Masahiko Ogino

IPC分类号： A61M5/00 ,  A61M5/32

CPC分类号： B29C33/3842 ,  B29C33/424 ,  B81B2203/0361 ,  B81C1/00111 ,  B81C1/00206 ,  B81C99/0085 ,  B81C99/009 ,  B81C2201/034 ,  B82Y10/00 ,  B82Y40/00 ,  C23C18/1608 ,  C23C18/1651 ,  C23C18/1653 ,  C23C18/1657 ,  C23C18/1689 ,  C23C18/208 ,  C23C18/42 ,  G03F7/0002 ,  H01J1/304 ,  H01J9/025 ,  Y10T428/12389 ,  Y10T428/12993

摘要： A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1. There is further provided a process for producing a fine metal structure, characterized by comprising providing a substrate having a fine rugged pattern on its surface, applying a molecular electroless plating catalyst to the surface, thereafter carrying out electroless plating to thereby form a metal layer having the rugged pattern filled, and detaching the metal layer from the substrate to thereby obtain a fine metal structure furnished with a surface having undergone reversal transfer of the above rugged pattern.

摘要翻译： 精细的金属结构，其表面具有高强度，高精度和大纵横比的微喷射体; 以及没有缺陷的金属微细结构的制造方法。 提供了具有微喷射体的表面的细金属结构，其特征在于，微喷射体具有10纳米至10微米的最小厚度或最小直径，并且微喷射体的最小厚度或最小直径（D）与高度 的微喷射体（H）H / D大于1.还提供了一种制造精细金属结构的方法，其特征在于，在其表面上提供具有细凹凸图案的基板，将分子无电镀催化剂 然后进行无电解电镀，从而形成具有凹凸图案的金属层，并将金属层与基板分离，从而获得配备有经过上述凹凸图案的反转传送的表面的精细金属结构。

公开(公告)号：US20060258163A1

公开(公告)日：2006-11-16

申请号：US11354029

申请日：2006-02-15

申请人： Kenya Ohashi ,  Akihiro Miyauchi ,  Masahiko Ogino

发明人： Kenya Ohashi ,  Akihiro Miyauchi ,  Masahiko Ogino

IPC分类号： H01L21/302

CPC分类号： G03F7/0002 ,  B81C1/0046 ,  B81C99/009 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/855

摘要： To provide a metal mold excellent in the mold-release characteristic and the transfer accuracy in a nano-imprint method. By controlling the thickness of a metal oxide film formed in the face of a release agent and a mold, the adhesive amount of the release agent layer formed in the outer layer thereof is adjusted, thereby forming a mold excellent in the mold-release characteristic. The present invention also relates to methods of fabricating molds for nano-imprint, and mold usage on nano-imprinting equipment.

摘要翻译： 提供在纳米压印方法中脱模特性和转印精度优异的金属模具。 通过控制在脱模剂和模具的表面形成的金属氧化物膜的厚度，调节在其外层中形成的脱模剂层的粘合量，从而形成脱模特性优异的模具。 本发明还涉及在纳米压印设备上制造用于纳米压印的模具和模具使用的方法。

公开(公告)号：US08109752B2

公开(公告)日：2012-02-07

申请号：US12146489

申请日：2008-06-26

申请人： Kenya Ohashi ,  Masahiko Ogino ,  Akihiro Miyauchi

发明人： Kenya Ohashi ,  Masahiko Ogino ,  Akihiro Miyauchi

IPC分类号： B29C59/00

CPC分类号： B29C33/424 ,  B29C33/40 ,  B29C33/565 ,  B29C59/022 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T156/1041

摘要： An imprinting stamper which can transfer a microscopic pattern to a medium bearing a convex area or local projection, with high accuracy. A convexo-concave pattern is formed on a surface of the imprinting stamper. It includes a pattern layer having the convexo-concave pattern; and a stamper backside layer arranged on a backside of the pattern layer. Young's modulus of the pattern layer is 500 MPa to 10 GPa; and Young's modulus of the stamper backside layer is smaller than Young's modulus of the pattern layer.

摘要翻译： 一种能够以高精度将微观图案转印到具有凸区域或局部投影的介质的压印模。 在印模压模的表面上形成凹凸图案。 它包括具有凹凸图案的图案层; 以及设置在图案层的背面上的压模背面层。 图案层的杨氏模量为500MPa至10GPa; 并且压模背面层的杨氏模量小于图案层的杨氏模量。

公开(公告)号：US20080237931A1

公开(公告)日：2008-10-02

申请号：US11847636

申请日：2007-08-30

申请人： Kenya Ohashi ,  Masahiko Ogino ,  Akihiro Miyauchi

发明人： Kenya Ohashi ,  Masahiko Ogino ,  Akihiro Miyauchi

IPC分类号： C08J5/18 ,  B29C33/10

CPC分类号： B29C33/10 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S977/887

摘要： A mold for forming a resin pattern using nanoimprint lithography according to the present invention comprises a main mold including a fine pattern of a protrusion and a depression intended to be transferred, and a spacer for forming a space between the protrusion of the fine pattern of the main mold and a transferred object during a transfer of the fine pattern, in which the spacer has a vent passage capable of flowing gas therethrough and has an elasticity against a pressing force during the transfer.

摘要翻译： 根据本发明的使用纳米压印光刻形成树脂图案的模具包括：主模具，其包括突起的精细图案和待转印的凹陷;以及间隔件，用于在所述微型图案的突起之间形成空间 主模具和被转移物体在精细图案的转印期间，其中间隔件具有能够使气体流过的通气通道，并且具有抵抗转印期间的按压力的弹性。

公开(公告)号：US08158048B2

公开(公告)日：2012-04-17

申请号：US11847636

申请日：2007-08-30

申请人： Kenya Ohashi ,  Masahiko Ogino ,  Akihiro Miyauchi

发明人： Kenya Ohashi ,  Masahiko Ogino ,  Akihiro Miyauchi

IPC分类号： B29C59/00

CPC分类号： B29C33/10 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S977/887

摘要： A mold for forming a resin pattern using nanoimprint lithography according to the present invention comprises a main mold including a fine pattern of a protrusion and a depression intended to be transferred, and a spacer for forming a space between the protrusion of the fine pattern of the main mold and a transferred object during a transfer of the fine pattern, in which the spacer has a vent passage capable of flowing gas therethrough and has an elasticity against a pressing force during the transfer.

摘要翻译： 根据本发明的使用纳米压印光刻形成树脂图案的模具包括：主模具，其包括突起的精细图案和待转印的凹陷;以及间隔件，用于在所述微型图案的突起之间形成空间 主模具和被转移物体在精细图案的转印期间，其中间隔件具有能够使气体流过的通气通道，并且具有抵抗转印期间的按压力的弹性。