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    METHOD OF PRODUCING COATED MEMBER
    7.
    发明申请
    METHOD OF PRODUCING COATED MEMBER 审中-公开
    制造涂层成员的方法

    公开(公告)号：US20130059093A1

    公开(公告)日：2013-03-07

    申请号：US13696921

    申请日：2011-05-12

    申请人： Masahiro Suzuki ,  Kazuyoshi Yamakawa ,  Toshiyuki Saito

    发明人： Masahiro Suzuki ,  Kazuyoshi Yamakawa ,  Toshiyuki Saito

    IPC分类号： C23C16/30

    CPC分类号： C23C16/26 ,  C23C14/022 ,  C23C16/515 ,  C23C18/04 ,  C23C28/042 ,  C23C28/044 ,  C23C28/046 ,  C23C28/322 ,  C23C28/343

    摘要： The coated member production method includes a DLC film forming step of introducing a feedstock gas containing a carbon compound and an oxygen-containing organic silicon compound into a treatment chamber in which a base is accommodated, and applying a voltage to the base at a treatment pressure of not lower than 100 Pa and not higher than 400 Pa to generate plasma to form a DLC film on a surface of the base. Hexamethyldisiloxane, for example, is used as the oxygen-containing organic silicon compound. A DC pulse voltage, for example, is applied to the base in the DLC film forming step.

    摘要翻译： 涂布部件的制造方法包括：将含有碳化合物和含氧有机硅化合物的原料气体导入容纳基体的处理室中的DLC膜形成工序，并在处理压力下向基材施加电压 不低于100Pa并且不高于400Pa，以在基底的表面上产生等离子体以形成DLC膜。 例如使用六甲基二硅氧烷作为含氧有机硅化合物。 例如，在DLC膜形成步骤中将直流脉冲电压施加到基底。

    DLC-coated member
    8.
    发明授权
    DLC-coated member 有权
    DLC涂层部件

    公开(公告)号：US08501673B2

    公开(公告)日：2013-08-06

    申请号：US13267446

    申请日：2011-10-06

    申请人： Masahiro Suzuki ,  Toshiyuki Saito ,  Kazuyoshi Yamakawa

    发明人： Masahiro Suzuki ,  Toshiyuki Saito ,  Kazuyoshi Yamakawa

    IPC分类号： C10M171/00

    CPC分类号： C23C16/26 ,  C23C16/0272 ,  C23C28/04

    摘要： A DLC-coated member (100) has a base (200), an intermediate layer (300) that covers the surface of the base (200), and a DLC film (400) that covers the surface of the intermediate layer (300). The intermediate layer (300) has a five-layer structure, constituted of a first intermediate layer (301), a second intermediate layer (302), a third intermediate layer (303), a fourth intermediate layer (304), and a fifth intermediate layer (305). The five layers (301 to 305) are made of DLC to which Si has been added. Among the layers (301 to 305), the Si concentration in the first intermediate layer (301) is the highest, and that in the fifth intermediate layer (305) is the second highest. The Si concentrations in the second intermediate layer (302), third intermediate layer (303), and fourth intermediate layer (304) are lower than those in the first intermediate layer (301) and fifth intermediate layer (305).

    摘要翻译： DLC涂覆部件（100）具有基部（200），覆盖基部（200）的表面的中间层（300）和覆盖中间层（300）的表面的DLC膜（400） 。 中间层（300）具有五层结构，由第一中间层（301），第二中间层（302），第三中间层（303），第四中间层（304）和第五中间层 中间层（305）。 五层（301〜305）由添加有Si的DLC制成。 在层（301〜305）中，第一中间层（301）中的Si浓度最高，第五中间层（305）中的Si浓度最高。 第二中间层（302），第三中间层（303）和第四中间层（304）中的Si浓度低于第一中间层（301）和第五中间层（305）中的Si浓度。

    Method of producing coated member
    9.
    发明授权
    Method of producing coated member 有权
    生产涂层部件的方法

    公开(公告)号：US08445077B2

    公开(公告)日：2013-05-21

    申请号：US13117576

    申请日：2011-05-27

    申请人： Masahiro Suzuki ,  Toshiyuki Saito ,  Kazuyoshi Yamakawa

    发明人： Masahiro Suzuki ,  Toshiyuki Saito ,  Kazuyoshi Yamakawa

    IPC分类号： H05H1/24

    CPC分类号： C23C16/515 ,  C23C16/26 ,  C23C16/503 ,  C23C16/56

    摘要： A method of producing a coated member in which a base material surface is at least partially coated with a diamond-like carbon film, the method includes: a diamond-like carbon film deposition process in which a diamond-like carbon film is formed on a surface of the base material by generating plasma by applying voltage to the base material in a processing chamber that stores the base material, while evacuating the processing chamber and introducing feedstock gas that contains at least a carbon compound into the processing chamber; and a hydrogenation process in which the deposited diamond-like carbon film is hydrogenated using hydrogen gas by stopping the voltage application and introducing hydrogen gas inducted instead of the feedstock gas, while the evacuation is being continued.

    摘要翻译： 一种生产涂覆部件的方法，其中基材表面至少部分地涂覆有类金刚石碳膜，该方法包括：金刚石状碳膜沉积工艺，其中在金刚石状碳膜上形成类金刚石碳膜 通过在存储基材的处理室中对基材施加电压而产生等离子体，同时抽空处理室并将至少含有碳化合物的原料气体引入到处理室中; 以及在继续排气的同时，通过停止施加电压并引入代替原料气体的氢气，使用氢气使沉积的类金刚石碳膜氢化的氢化工艺。

    DLC film-forming method and DLC film
    10.
    发明授权
    DLC film-forming method and DLC film 有权
    DLC成膜法和DLC膜

    公开(公告)号：US08821990B2

    公开(公告)日：2014-09-02

    申请号：US13378689

    申请日：2010-06-09

    申请人： Masahiro Suzuki ,  Toshiyuki Saito ,  Kazuyoshi Yamakawa

    发明人： Masahiro Suzuki ,  Toshiyuki Saito ,  Kazuyoshi Yamakawa

    IPC分类号： C23C16/26 ,  F16D69/00 ,  C23C16/02 ,  C23C16/515

    CPC分类号： C23C16/0245 ,  C23C16/26 ,  C23C16/515 ,  F16D69/00 ,  Y10T428/24355

    摘要： The present invention provides a DLC film that has good adhesiveness even in a low-temperature environment, and a DLC film-forming method capable of forming this DLC film. The present invention also provides a DLC film that has excellent initial compatibility, and a DLC film-forming method capable of forming this DLC film. In the present invention, a first opposing surface (31) that faces an inner clutch plate, of a substrate (30) of an outer clutch plate (15) is covered by a DLC film (26). Also, a treatment layer (33) is formed on a surface layer portion of the substrate (30). The treatment layer (33) is formed by applying direct-current pulse voltage to the substrate (30), and generating plasma in an atmosphere that contains argon gas and hydrogen gas.

    摘要翻译： 本发明提供即使在低温环境下也具有良好的粘附性的DLC膜，以及能够形成该DLC膜的DLC膜形成方法。 本发明还提供了具有优异的初始相容性的DLC膜和能够形成该DLC膜的DLC膜形成方法。 在本发明中，由离合器板（15）的基板（30）面向内离合器板的第一相对面（31）被DLC膜（26）覆盖。 此外，在基板（30）的表层部分上形成处理层（33）。 通过向基板（30）施加直流脉冲电压，在含有氩气和氢气的气氛中产生等离子体，形成处理层（33）。