A/D conversion method and apparatus
    2.
    发明授权
    A/D conversion method and apparatus 有权
    A / D转换方法和装置

    公开(公告)号:US06879278B2

    公开(公告)日:2005-04-12

    申请号:US10854297

    申请日:2004-05-26

    摘要: An A/D converter for driving a plurality of delay units forming a pulse delay circuit by an analog input signal Vin and digitalizing the number of delay units through which a pulse signal passes in the pulse delay circuit at predetermined timings, provided with a plurality of pulse position digitalizing units used for A/D conversion and inputting delay pulses from the delay units of the pulse delay circuit to the pulse position digitalizing units through an inverter group comprised of inverters with different inversion levels (switching threshold level) by different input timings. The digital data obtained by the pulse position digitalizing units are added by an adder.

    摘要翻译: 一种A / D转换器,用于通过模拟输入信号Vin驱动形成脉冲延迟电路的多个延迟单元,并且将预定时间脉冲信号通过脉冲信号的延迟单元的数量化,并设置多个延迟单元 用于A / D转换的脉冲位置数字化单元,并且通过由不同输入定时具有不同反相电平(开关阈值电平)的反相器组成的反相器组将延迟脉冲从脉冲延迟电路的延迟单元输入到脉冲位置数字化单元。 由脉冲位置数字化单元获得的数字数据由加法器相加。

    Silicon carbide substrates and a method of producing the same
    3.
    发明授权
    Silicon carbide substrates and a method of producing the same 失效
    碳化硅基板及其制造方法

    公开(公告)号:US4664946A

    公开(公告)日:1987-05-12

    申请号:US858834

    申请日:1986-04-29

    IPC分类号: H01L21/48 H01L23/15 B05D5/12

    摘要: This invention relates to a method of producing a silicon carbide substrate having desirable electrical insulation properties. The silicon carbide substrate is produced by applying to a surface of a silicon carbide plate a film-forming composition which consists essentially of at least one oxide or substance with produces an oxide by decomposition of an element selected from the group consisting of aluminum, phosphorus, boron, germanium, arsenic, antimony, bismuth, vanadium, zinc, lead, cadmium, sodium, potassium, lithium, beryllium, calcium, magnesium, barium and strontium and heating the silicon carbide body in an oxidizing atmosphere to form a eutectic oxide layer thereon.

    摘要翻译: 本发明涉及一种具有所需电绝缘性能的碳化硅基板的制造方法。 通过向碳化硅板的表面施加成膜组合物来制造碳化硅衬底,所述成膜组合物基本上由至少一种氧化物或物质组成,所述氧化物或物质通过分解选自铝,磷, 硼,锗,砷,锑,铋,钒,锌,铅,镉,钠,钾,锂,铍,钙,镁,钡和锶,并在氧化气氛中加热碳化硅体以在其上形成共晶氧化物层 。

    Method of producing high-strength .beta.-type silicon carbide sintered
bodies
    4.
    发明授权
    Method of producing high-strength .beta.-type silicon carbide sintered bodies 失效
    生产高强度β型碳化硅烧结体的方法

    公开(公告)号:US5192719A

    公开(公告)日:1993-03-09

    申请号:US768337

    申请日:1991-09-30

    IPC分类号: C04B35/565

    CPC分类号: C04B35/565

    摘要: A high-density and high-strength .beta.-type silicon carbide sintered body, in which crystal grains are made uniform and fine by adjusting the compounding ratio of the sintering aid and further taking a special means at the sintering step while suppressing the inclusion of .alpha.-SiC into the starting powder as far as possible during the production of the silicon carbide sintered body.

    摘要翻译: 高密度,高强度的β型碳化硅烧结体,其中通过调节烧结助剂的配合比例,并且在烧结步骤中进一步采取特殊方法,使晶粒均匀且细微,同时抑制α -SiC在碳化硅烧结体的生产过程中尽可能地进入起始粉末。

    Silicon carbide substrates and a method of producing the same
    6.
    发明授权
    Silicon carbide substrates and a method of producing the same 失效
    碳化硅基板及其制造方法

    公开(公告)号:US4499147A

    公开(公告)日:1985-02-12

    申请号:US451940

    申请日:1982-12-21

    IPC分类号: H01L21/48 H01L23/15 C03C3/12

    摘要: A silicon carbide substrate having excellent electrical insulation properties is disclosed. The silicon carbide substrate is produced by closely adhering to a surface of a silicon carbide plate body a eutectic oxide layer comprising SiO.sub.2 produced by partial oxidation of the plate body and at least one oxide selected from Al.sub.2 O.sub.3, P.sub.2 O.sub.5, B.sub.2 O.sub.3, GeO.sub.2, As.sub.2 O.sub.3, Sb.sub.2 O.sub.3, Bi.sub.2 O.sub.3, V.sub.2 O.sub.5, ZnO, PbO, Pb.sub.3 O.sub.4, PbO.sub.2, CdO, Na.sub.2 O, K.sub.2 O, BeO, CaO, MgO, BaO and SrO.

    摘要翻译: 公开了具有优异的电绝缘性能的碳化硅衬底。 碳化硅衬底通过紧密地附着到碳化硅板体的表面上,该共晶氧化物层包含通过板体的部分氧化产生的SiO和从Al 2 O 3,P 2 O 5,B 2 O 3,GeO 2,As 2 O 3,Sb 2 O 3中选择的至少一种氧化物 ,Bi2O3,V2O5,ZnO,PbO,Pb3O4,PbO2,CdO,Na2O,K2O,BeO,CaO,MgO,BaO和SrO。