Patterned Substrates With Darkened Conductor Traces
    2.
    发明申请
    Patterned Substrates With Darkened Conductor Traces 有权
    带有变深的导体迹线的图形基板

    公开(公告)号:US20130299214A1

    公开(公告)日:2013-11-14

    申请号:US13979710

    申请日:2012-02-01

    IPC分类号: H05K1/02 H05K3/06

    摘要: The present disclosure provides an article having (a) a substrate having a first nanostructured surface that is antireflective when exposed to air and an opposing second surface; and (b) a conductor micropattern disposed on the first surface of the substrate, the conductor micropattern formed by a plurality of traces defining a plurality of open area cells. The micropattern has an open area fraction greater than 80% and a uniform distribution of trace orientation. The traces of the conductor micropattern have a specular reflectance in a direction orthogonal to and toward the first surface of the substrate of less than 50%. Each of the traces has a width from 0.5 to 10 micrometer. The articles are useful in devices such as displays, in particular, touch screen displays useful for mobile hand held devices, tablets and computers. They also find use in antennas and for EMI shields

    摘要翻译: 本公开内容提供了一种制品,其具有(a)具有第一纳米结构化表面的基底,其在暴露于空气和相对的第二表面时具有抗反射性; 和(b)布置在所述基板的第一表面上的导体微图案,所述导体微图案由限定多个开放区域单元的多个迹线形成。 微图案具有大于80%的开口面积分数和均匀分布的迹线取向。 导体微图案的迹线在与基板的第一表面正交且朝向基板的第一表面的方向上具有小于50%的镜面反射率。 每个迹线的宽度为0.5至10微米。 这些文章在诸如显示器的设备中是有用的,特别是对于移动手持设备,平板电脑和计算机有用的触摸屏显示器。 它们也可用于天线和EMI屏蔽

    MULTILAYER NANOSTRUCTURED ARTICLES
    6.
    发明申请
    MULTILAYER NANOSTRUCTURED ARTICLES 审中-公开
    多层纳米结构文章

    公开(公告)号:US20140004304A1

    公开(公告)日:2014-01-02

    申请号:US14000445

    申请日:2012-02-15

    IPC分类号: G02B5/32

    摘要: Articles comprising a substrate, a first layer comprising polymeric material with nanoparticles protruding from a major surface thereof, and away from the substrate, and a second layer having major surface is a first nanostructured. Embodiments of the articles are useful for display applications (e.g., liquid crystal displays (LCD), light emitting diode (LED) displays, or plasma displays); light extraction; electromagnetic interference (EMI) shielding, ophthalmic lenses; face shielding lenses or films; window films; antireflection for construction applications; and, construction applications or traffic signs.

    摘要翻译: 包含基材的第一层,包含从其主表面突出并远离基材的纳米颗粒的聚合物材料的第一层和具有主表面的第二层是第一纳米结构的。 这些物品的实施例对于显示应用(例如液晶显示器(LCD),发光二极管(LED)显示器或等离子体显示器)是有用的; 光提取; 电磁干扰(EMI)屏蔽,眼科镜片; 面罩屏蔽镜片或胶片; 窗膜; 施工应用抗反射; 以及建筑施工或交通标志。

    METHOD OF MAKING A NANOSTRUCTURE
    7.
    发明申请
    METHOD OF MAKING A NANOSTRUCTURE 有权
    制造纳米结构的方法

    公开(公告)号:US20130038949A1

    公开(公告)日:2013-02-14

    申请号:US13636146

    申请日:2011-04-22

    摘要: A method of making a nanostructure is provided that includes applying a thin, random discontinuous masking layer (105) to a major surface (103) of a substrate (101) by plasma chemical vapor deposition. The substrate (101) can be a polymer, an inorganic material, an alloy, or a solid solution. The masking layer (105) can include the reaction product of plasma chemical vapor deposition using a reactant gas comprising a compound selected from the group consisting of organosilicon compounds, metal alkyls, metal isopropoxides, metal acetylacetonates, and metal halides. Portions (107) of the substrate (101) not protected by the masking layer (105) are then etched away by reactive ion etching to make the nanostructures.

    摘要翻译: 提供一种制备纳米结构的方法,其包括通过等离子体化学气相沉积将薄的随机不连续掩模层(105)施加到衬底(101)的主表面(103)。 基板(101)可以是聚合物,无机材料,合金或固溶体。 掩模层(105)可以包括使用包含选自有机硅化合物,金属烷基,金属异丙氧基化物,金属乙酰丙酮化物和金属卤化物的化合物的反应气体的等离子体化学气相沉积的反应产物。 然后通过反应离子蚀刻将未被掩模层(105)保护的衬底(101)的部分(107)蚀刻掉以制成纳米结构。

    Method for making nanostructured surfaces
    9.
    发明授权
    Method for making nanostructured surfaces 有权
    制造纳米结构表面的方法

    公开(公告)号:US08460568B2

    公开(公告)日:2013-06-11

    申请号:US13142441

    申请日:2009-12-29

    CPC分类号: H01L31/0236 Y02E10/50

    摘要: A continuous method for making a nanostructured surface comprises (a) placing a substrate comprising a nanoscale mask on a cylindrical electrode in a vacuum vessel, (b) introducing etchant gas to the vessel at a predetermined pressure, (c) generating plasma between the cylindrical electrode and a counter-electrode, (d) rotating the cylindrical electrode to translate the substrate, and (e) anisotropically etching a surface of the substrate to provide anisotropic nanoscale features on the surface.

    摘要翻译: 用于制造纳米结构化表面的连续方法包括(a)将包含纳米尺度掩模的衬底放置在真空容器中的圆柱形电极上,(b)以预定压力将蚀刻剂气体引入容器,(c)在圆柱形电极之间产生等离子体 电极和对电极,(d)旋转圆柱形电极以平移衬底,以及(e)各向异性蚀刻衬底的表面以在表面上提供各向异性的纳米尺度特征。