Methods and moulds for use in fabricating side-ported microneedles
    2.
    发明申请
    Methods and moulds for use in fabricating side-ported microneedles 失效
    用于制造侧端微针的方法和模具

    公开(公告)号:US20100305516A1

    公开(公告)日:2010-12-02

    申请号:US10592559

    申请日:2004-03-12

    摘要: Side-ported microneedles are produced from a suitably shaped microneedle mould (40). A microneedle mould base (32) is made with a number of microneedle mould recesses (30) in it. One surface of the microneedle mould base (32) is coated with a seed layer (34). The microneedle mould base (32) contains two microneedle mould sheets (24, 26), which are separated to gain access to an internal surface of one of the microneedle mould sheets (24, 26). Side-port forming channels (38) are formed on one of the internal surfaces, intersecting with the recesses (30) within the relevant microneedle mould sheet (24). The two microneedle mould sheets (24, 26) are placed back together and joined together as a unitary microneedle mould (40). The microneedles are formed in the recesses (30) by depositing a microneedle layer (44) therein and on the surface with the seed layer (34). The microneedle layer (44) fails to deposit at side-port forming holes (42) where the side-port forming channels (38) intersect the recesses (30), which result in side-ports (46) in the moulded microneedles (52).

    摘要翻译: 由适当形状的微针模具(40)制造侧端微针。 微针模具基座(32)在其中形成有许多微针模具凹槽(30)。 微针模具基座(32)的一个表面涂覆有种子层(34)。 微针模具基座(32)包含两个微针模具片(24,26),它们分开以进入其中一个微针模板(24,26)的内表面。 侧孔形成通道(38)形成在与相关微针模板(24)内的凹部(30)相交的一个内表面上。 将两个微针模具片(24,26)放置在一起并作为整体式微针模具(40)连接在一起。 通过在其中放置微针层(44)并在种子层(34)的表面上,在凹部(30)中形成微针。 该微针层(44)不能沉积在侧孔形成通道(42)处,其中侧孔形成通道(38)与凹槽(30)相交,这导致模制微针(52)中的侧端口(46) )。

    Method for electroless deposition of a metal layer on selected portions of a substrate
    5.
    发明申请
    Method for electroless deposition of a metal layer on selected portions of a substrate 审中-公开
    金属层在衬底的选定部分上无电沉积的方法

    公开(公告)号:US20050118436A1

    公开(公告)日:2005-06-02

    申请号:US10512113

    申请日:2003-04-23

    摘要: The present invention relates to a method for electroless deposition of a metal layer on selected portions of a substrate. A preferred form of the invention relates to a method of depositing a desired metal layer, by electroless deposition, on one or more selected portions of an indium tin oxide (ITO) surface of a substrate. These selected portions are typically transparent conductive paths of ITO. The method includes a number of steps including applying a masking layer onto the surface, the masking layer having one or more apertures formed therein so as to expose the one or more selected portions of the surface: exposing the one or more selected portions of the surface to a colloidal suspension of catalytic particles adapted to adsorb to the substrate surface and to enhance deposition of the desired metal layer, and exposing the one or more selected portions of the surface to an ionic solution containing ions of the desired metal to enable formation of the metal layer.

    摘要翻译: 本发明涉及一种金属层在衬底的选定部分上无电沉积的方法。 本发明的优选形式涉及通过无电沉积在衬底的氧化铟锡(ITO)表面的一个或多个选定部分上沉积所需金属层的方法。 这些选择的部分通常是ITO的透明导电路径。 该方法包括若干步骤,包括在表面上施加掩模层,掩模层具有形成在其中的一个或多个孔,以暴露表面的一个或多个选定部分:暴露表面的一个或多个选定部分 涉及适于吸附到基底表面并催化所需金属层沉积的催化颗粒的胶态悬浮液,并将表面的一个或多个选定部分暴露于含有所需金属离子的离子溶液,以形成 金属层。