摘要:
A particle beam apparatus includes a first aperture unit having an adjustable aperture opening. The particle beam apparatus may include a first condenser lens having a first pole shoe and a second pole shoe. Both the first pole shoe and the second pole shoe may be adjustable relative to a second aperture unit independently of each other. The second aperture unit may be designed as a pressure stage aperture separating a first area having a vacuum at a first pressure, and a second area having a vacuum at a second pressure. Additionally, a method for adjusting a beam current in a particle beam apparatus is provided.
摘要:
A method for processing a digital gray value image includes the steps of: generating a binary edge image from the gray value image so that edges present in the gray value image are determined as line areas around the edges; applying a sharpness algorithm in the gray value image within regions which correspond to the line areas; and, carrying out a smoothing process in the gray value image within regions which lie outside of the line areas so that an additional smoothed, sharpened gray value image is generated.
摘要:
A method for processing a digital gray value image includes the steps of: generating a binary edge image from the gray value image so that edges present in the gray value image are determined as line areas around the edges; applying a sharpness algorithm in the gray value image within regions which correspond to the line areas; and, carrying out a smoothing process in the gray value image within regions which lie outside of the line areas so that an additional smoothed, sharpened gray value image is generated.
摘要:
The invention relates to a focusing and positioning ancillary device for a particle-optical scanning microscope, a particle-optical scanning microscope including a corresponding positioning aid, and a method for focusing and positioning an object in a particle-optical scanning microscope. The focusing and positioning ancillary device includes an illuminating device, a camera, a display and a control unit. The illuminating device produces a collimated or focused light beam at an angle to the particle-optical beam axis which intersects the particle-optical beam axis at a predetermined position. The camera is sensitive to the wavelength of the light beam and records an image of the object, which is positioned on the object table, at a second angle to the particle-optical beam axis. The control unit produces an image captured by the camera on the display together with a marking which indicates the position of the particle-optical beam axis in the image.
摘要:
A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.
摘要:
The invention relates to a focusing and positioning ancillary device for a particle-optical scanning microscope, a particle-optical scanning microscope including a corresponding positioning aid, and a method for focusing and positioning an object in a particle-optical scanning microscope. The focusing and positioning ancillary device includes an illuminating device, a camera, a display and a control unit. The illuminating device produces a collimated or focused light beam at an angle to the particle-optical beam axis which intersects the particle-optical beam axis at a predetermined position. The camera is sensitive to the wavelength of the light beam and records an image of the object, which is positioned on the object table, at a second angle to the particle-optical beam axis. The control unit produces an image captured by the camera on the display together with a marking which indicates the position of the particle-optical beam axis in the image.
摘要:
A particle beam apparatus includes a first aperture unit having an adjustable aperture opening. The particle beam apparatus may include a first condenser lens having a first pole shoe and a second pole shoe. Both the first pole shoe and the second pole shoe may be adjustable relative to a second aperture unit independently of each other. The second aperture unit may be designed as a pressure stage aperture separating a first area having a vacuum at a first pressure, and a second area having a vacuum at a second pressure. Additionally, a method for adjusting a beam current in a particle beam apparatus is provided.
摘要:
A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.
摘要:
A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.
摘要:
An inspection method comprises focusing a particle beam onto a sample; operating at least one detector located close to the sample; assigning detection signals generated by the at least one detector to different intensity intervals; determining, based on the detection signals assigned to the intensity intervals, at least one first signal component related to electrons incident on the detector; and determining, based on the detection signals assigned to the intensity intervals, at least one second signal component related to X-rays incident on the detector.