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公开(公告)号：US4933064A
公开(公告)日：1990-06-12
申请号：US126776
申请日：1987-11-30
申请人： Michael Geisler , Jorg Kieser , Reiner Kukla
发明人： Michael Geisler , Jorg Kieser , Reiner Kukla
CPC分类号： H01J37/3423 , H01J37/3408 , H01J37/3426 , H01J37/3452
摘要： A sputtering cathode for the coating of substrates. The cathode has a base, a target of nonmagnetic material, and a magnet system having exposed pole faces for the production of a tunnel of magnetic lines of force overarching the sputtering surface. The target is provided with at least two continuous projections lying one inside the other, which contain at least one sputtering surface between them, and have confronting wall surfaces. The pole faces are located on both sides of the projections and sputtering surface between them such that magnetic lines of force issue perpendicularly from the one wall surface and, after crossing the sputtering surface, re-enter perpendicularly the opposite wall surface. The magnet system has permanent magnets magnetized parallel to the projections, which are yoked together on the sides facing away from the projections by a soft-magnetic base, and are provided on the sides facing the projections with soft-magnetic pole shoes extending over at least a part of the height of the projections.
摘要翻译： 用于涂覆基材的溅射阴极。 阴极具有基极，非磁性材料的靶，以及具有暴露极面的磁体系统，用于产生覆盖溅射表面的磁力线的隧道。 目标设置有至少两个连续的突起，一个在另一个内部，其在它们之间包含至少一个溅射表面，并且具有面对的壁表面。 极面位于突起的两侧并且在它们之间的溅射表面，使得磁力线从一个壁表面垂直地发生，并且在穿过溅射表面之后，垂直地重新进入相对的壁表面。 磁体系统具有平行于凸起磁化的永久磁体，它们通过软磁性底座在背对凸起的侧面上一起被钩住，并且在面向突出部的侧面上设置有至少延伸的软磁极靴 投影高度的一部分。
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公开(公告)号：US4515675A
公开(公告)日：1985-05-07
申请号：US624940
申请日：1984-06-27
申请人： Jorg Kieser , Reiner Kukla , Gerd Deppisch
发明人： Jorg Kieser , Reiner Kukla , Gerd Deppisch
CPC分类号： H01J37/3441 , H01J37/3408 , H01J37/3423
摘要： A magnetron cathode for cathodic evaporation apparatus with a target holder (10) for releasably securing a plate-like target (9). The associated magnet arrangement (7) has pole faces (7c, 7d) for producing at least one circumferentially closed tunnel of magnetic field lines which overlaps the target. The magnet arrangement (7) is accommodated in a housing of non-ferromagnetic material which extends over the pole faces. To increase the utilization factor of the target material without the pole faces or housing parts participating in the atomization process,(a) the projections of the target (9 ) and the pole faces (7c, 7d) in a common plane parallel to the target face (9a) do not intersect each other,(b) in the zone of the pole faces (7c, 7d), the housing (16) is extended in the atomization direction in front of the target face (9a) or in the extreme case lies in the plane of the target face (9a), and(c) the housing (16) together with the magnet system (7) is electrically insulated as regards both the target holder (10) and earth (4).
摘要翻译： 一种用于阴极蒸发装置的磁控管阴极，具有用于可释放地固定板状靶（9）的靶保持器（10）。 相关联的磁体布置（7）具有用于产生与目标重叠的磁场线的至少一个周向闭合的通道的极面（7c，7d）。 磁体布置（7）容纳在非磁性材料的壳体上，该壳体在极面上延伸。 为了增加目标材料的利用率，而没有参与雾化过程的极面或壳体部分，（a）靶（9）和极面（7c，7d）在平行于靶的公共平面中的突起 （9a）彼此不相交，（b）在极面（7c，7d）的区域中，壳体（16）在目标面（9a）的前方沿着雾化方向延伸，或者在极端 壳体位于目标面（9a）的平面内，（c）与磁体系统（7）一起的壳体（16）与目标支架（10）和地球（4）都是电绝缘的。
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3.发明授权Cathode sputtering apparatus on the magnetron principle with a hollow cathode and a cylindrical target 失效具有空心阴极和圆柱形靶的磁控管原理的阴极溅射装置
公开(公告)号：US4966677A
公开(公告)日：1990-10-30
申请号：US344244
申请日：1989-04-27
申请人： Hans Aichert , Rainer Gegenwart , Reiner Kukla , Klaus Wilmes , Jorg Kieser
发明人： Hans Aichert , Rainer Gegenwart , Reiner Kukla , Klaus Wilmes , Jorg Kieser
CPC分类号： C23C14/3407 , H01J37/3405
摘要： Cathode sputtering apparatus having a hollow cathode on the magnetron principle with a cathode base (5) in which a hollow target (9) with a cylindrical sputtering surface (10) and a cylindrical outer surface is disposed. The cathode base (5) has a cooling passage (6). The target is externally surrounded by a magnet system (18) with magnet poles for the production of a rotationally symmetrical tunnel of magnetic lines of force closed on the circumference and over the sputtering surface. Outside of the space surrounded by the sputtering surface (10) there is disposed at least one anode (3, 4). A transport path for a substrate to be coated passes through the target (9) and the at least one anode.The cooling passage (6) is sealed off from the target (9) by a wall (7). Due to a narrow clearance, as soon as the target (9) reaches its operating temperature it comes in thermal contact with the wall (7). The [north] pole faces (N) of the magnet system (18) are on one side and the other [south] pole faces (S) lie on the other side of the end faces of the target (9) and radially on a radius which is equal to or greater than the radius of the sputtering surface (10). The magnet system (18) is held at a freely adjustable ("floating") potential in operation by insulating spaces (11, 19, 10).
摘要翻译： 在具有阴极基体（5）的磁控管原理上具有空心阴极的阴极溅射装置设置有具有圆柱形溅射表面（10）的中空靶（9）和圆柱形外表面。 阴极基座（5）具有冷却通道（6）。 目标被具有磁极的磁体系统（18）外部包围，用于产生在圆周上和溅射表面上的磁力线的旋转对称的隧道。 在由溅射表面（10）围绕的空间的外部设置有至少一个阳极（3,4）。 待涂覆的基底的输送路径穿过靶（9）和至少一个阳极。 冷却通道（6）通过壁（7）与靶（9）密封。 由于狭窄的间隙，只要目标（9）达到其工作温度，它就与墙壁（7）热接触。 磁体系（18）的[北]极面（N）位于一侧，另一[南]极面（S）位于靶（9）端面的另一侧， 半径等于或大于溅射表面（10）的半径。 磁体系统（18）通过绝缘空间（11,19,10）保持在操作中可自由调节（“浮动”）的电位。
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公开(公告)号：US4572776A
公开(公告)日：1986-02-25
申请号：US678597
申请日：1984-12-05
申请人： Hans Aichert , Jorg Kieser , Reiner Kukla
发明人： Hans Aichert , Jorg Kieser , Reiner Kukla
CPC分类号： H01J37/3441 , H01J37/3408 , H01J37/3426 , H01J37/3497
摘要： A magnetron cathode for sputtering ferromagnetic targets. The magnet system consists of magnet poles of opposite polarity lying one within the other disposed on a basic cathode body. Between the target and the pole shoes, which consist of target material, two circumferential air gaps in the direction of the depth of the system are formed. The surfaces of projection of the magnet poles and target do not overlap. For the purpose of making the target ablation uniform while simultaneously achieving high sputtering rates, the pole shoes are separated, in accordance with the invention, each by a distance S from the magnet poles. The magnet poles lie in an area which runs from a plane passing through the sputtering surface in the direction of the depth of the system. Between the pole shoes and the target, on the one hand, and the magnet poles on the other, there is disposed a thermally conductive metal body which is in communication with at least one coolant passage and consists of a nonferromagnetic material.
摘要翻译： 用于溅射铁磁靶的磁控管阴极。 磁体系统由相反极性的磁极组成，位于另一个设置在基本阴极体上的磁极。 在由目标材料组成的目标和极靴之间形成在系统深度方向上的两个圆周气隙。 磁极和靶的投影面不重叠。 为了使目标消融均匀，同时实现高溅射速率，根据本发明，极靴与磁极分开距离S。 磁极位于从系统深度方向穿过溅射表面的平面延伸的区域。 一方面，在极靴和目标之间以及另一方面的磁极之间设置有导热金属体，其与至少一个冷却剂通道连通并由非铁磁材料构成。
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公开(公告)号：US5266117A
公开(公告)日：1993-11-30
申请号：US6900
申请日：1993-01-21
CPC分类号： C23C14/246 , C23C14/243
摘要： A vacuum chamber contains means for transferring a substrate for an information disc such as a CD from a loading station to a coating station, where material such as aluminum in wire form is evaporated in order to coat the substrate from above. An evaporation nozzle is continuously supplied with wire at a rate according to the coating thickness. The nozzle may be heated either resistively in order to evaporate the wire therein, or the wire may be directly heated by an induction coil.
摘要翻译： 真空室包含用于将诸如CD的信息盘的基板从装载站传送到涂布站的装置，其中诸如线形铝的材料被蒸发以从上面涂覆基板。 蒸发喷嘴以与涂层厚度相应的速率连续地供应线。 可以电阻地加热喷嘴以使其中的电线蒸发，或者线可以被感应线圈直接加热。
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6.发明授权
公开(公告)号：US5133850A
公开(公告)日：1992-07-28
申请号：US654118
申请日：1991-02-11
IPC分类号： C23C14/35 , C23C14/34 , H01J37/34 , H01L21/203
CPC分类号： H01J37/3423 , C23C14/3407 , H01J37/3408
摘要： Cathode base (1) has a hollow target (8) disposed thereon with at least one planar sputtering surface (8a), of circular shape for example, which is encompassed by at least two concentric, continuous projections (8b, 8c), and with a magnet system (6) with pole faces (6c, 6d) of opposite polarity lying on both sides of the target (8) for the production of magnetic lines of force (11, 11', . . . ) running substantially parallel to the sputtering surface (16a), the wall surfaces (8d, 8e) of the projections (8b, 8c) of the target (8), adjoining the sputtering surface (8a) being disposed at an angle (.alpha.) to the perpendicular, is preferably in a range between 30 and 70 degrees.
摘要翻译： 阴极基座（1）具有设置在其上的中空靶（8），其上具有圆形的至少一个平面溅射表面（8a），该平面溅射表面由至少两个同心连续的突起（8b，8c）包围，并且与 具有相对极性的极面（6c，6d）的磁体系统（6）位于目标（8）的两侧，用于产生基本上平行于所述目标（8）的磁力线（11,11'，...） 溅射表面（16a），与溅射表面（8a）相邻的靶（8）的突出部（8b，8c）的壁表面（8d，8c）优选地以垂直角度（α）设置 在30和70度之间的范围内。
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公开(公告)号：US5069772A
公开(公告)日：1991-12-03
申请号：US564363
申请日：1990-08-08
CPC分类号： H01J37/347 , C23C14/3407 , H01J37/3408 , H01J37/3455 , H01J37/3458
摘要： In a process for coating substrates by means of cathode sputtering, a magnetron cathode is used which has an annularly closed target 9. The sputter surface 9a of this target has an inner edge 9c and an outer edge 9d. The corresponding permanent magnets 7 has a first pole 7c which is disposed inside the inner edge and a second pole 7d disposed outside the outer edge. The characteristics of the poles geometrically resemble those of the target edges. This results in the generation of a circumferentially closed magnetic tunnel over the sputter surface. The flux lines thereof which are important to the enclosure of the plasma, are only slightly curved. In order to achieve a good material efficiency at high sputter rates and yet a high plasma density at the substrates, the spatial course of the magnetic flux lines is selectively distorted in such a way that the area of maximum target erosion, in absence of additional magnetic fields, is shifted to the vicinity of the outer edge 9d of the target 9. An averaged time value of an excitation current is applied to an additionally disposed magnetic coil 26. It serves to shift the zone of maximum target erosion approximately to the center between the two target edges. A periodic change of the average value of the excitation current shifts the zone of maximum target erosion from the center toward both sides.
摘要翻译： 在通过阴极溅射涂布基板的方法中，使用具有环形封闭的靶9的磁控管阴极。该靶的溅射表面9a具有内边缘9c和外边缘9d。 相应的永磁体7具有设置在内边缘内的第一极7c和设置在外边缘外侧的第二极7d。 极点的几何特性与目标边缘的特征相似。 这导致在溅射表面上产生周向闭合的磁通道。 对于等离子体的外壳重要的其通量线仅是略微弯曲。 为了在高溅射速率下实现良好的材料效率，并且在基板处获得高等离子体密度，磁通线的空间过程选择性地变形，使得在没有附加磁性的情况下，最大目标侵蚀的面积 场移动到目标9的外边缘9d附近。激励电流的平均时间值被施加到另外设置的磁线圈26.它用于将最大目标侵蚀的区域大致移动到 两个目标边缘。 励磁电流的平均值的周期性变化将最大目标侵蚀的区域从中心向两侧移动。
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公开(公告)号：US5182001A
公开(公告)日：1993-01-26
申请号：US755293
申请日：1991-09-05
CPC分类号： H01J37/347 , C23C14/3407 , H01J37/3408 , H01J37/3455 , H01J37/3458
摘要： In a process for coating substrates by means of cathode sputtering, a magnetron cathode is used which has an annularly closed target 9. The sputter surface 9a of this target has an inner edge 9c and an outer edge 9d. The corresponding system of permanent magnets 7 has a first pole 7c which is disposed inside the inner edge and a second pole 7d disposed outside the outer edge. The characteristics of the poles geometrically resemble those of the target edges. This results in the generation of a circumferentially closed magnetic tunnel over the sputter surface. The flux lines thereof which are important to the enclosure of the plasma, are only slightly curved. In order to achieve a good material efficiency at high sputter rates and yet a high plasma density at the substrates, the spatial course of the magnetic flux lines is selectively distorted in such a way that the area of maximum target erosion, in absence of additional magnetic fields, is shifted to the vicinity of the outer edge 9d of the target 9. An averaged time value of an excitation current is applied to an additionally disposed magnetic coil 26. It serves to shift the zone of maximum target erosion approximately to the center between the two target edges. A periodic change of the average value of the excitation current shifts the zone of maximum target erosion from the center toward both sides.
摘要翻译： 在通过阴极溅射涂布基板的方法中，使用具有环形封闭的靶9的磁控管阴极。该靶的溅射表面9a具有内边缘9c和外边缘9d。 永磁体7的相应系统具有设置在内边缘内的第一极7c和设置在外边缘外侧的第二极7d。 极点的几何特性与目标边缘的特征相似。 这导致在溅射表面上产生周向闭合的磁通道。 对于等离子体的外壳重要的其通量线仅是略微弯曲。 为了在高溅射速率下实现良好的材料效率，并且在基板处获得高等离子体密度，磁通线的空间过程选择性地变形，使得在没有附加磁性的情况下，最大目标侵蚀的面积 场移动到目标9的外边缘9d附近。激励电流的平均时间值被施加到另外设置的磁线圈26.它用于将最大目标侵蚀的区域大致移动到 两个目标边缘。 励磁电流的平均值的周期性变化将最大目标侵蚀的区域从中心向两侧移动。
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9.发明授权Guide arrangement with at least on guide roller for the guidance of webs in webs treatment installations 有权引导装置至少在导向辊上用于引导幅材处理装置中的幅材公开(公告)号：US07882946B2
公开(公告)日：2011-02-08
申请号：US11081879
申请日：2005-03-17
申请人： Stefan Hein , Peter Skuk , Karl-Heinz Wenk , Reiner Kukla , Rainer Ludwig
发明人： Stefan Hein , Peter Skuk , Karl-Heinz Wenk , Reiner Kukla , Rainer Ludwig
IPC分类号： B65H23/00
CPC分类号： C23C14/568 , B65H23/038 , B65H2404/5521
摘要： A guide arrangement (1) for guiding webs in evacuatable web treatment installations comprises at least one guide roller (2) with an axis (5), whose spatial position is settable. To solve the problem of compensating in modular installations with several chambers either misalignments of the chambers relative to one another and/or to avoid completely adjustable roller frames, whose adjustment would require the repositioning of treatment and coating sources and of separating gaps on the circumference of coating rollers, the invention proposes that the guide roller (2) is supported between two pivot bearings (11, 12), of which at least one is adjustable relative to the other transversely to the axis (5). This is preferably carried out thereby that the adjustable pivot bearing (12) comprises a slide guide (15), fastened to a chamber wall (14), on which a slide (16) with the pivot bearing (12) is guided, and that the adjustable pivot bearing (12) comprises a remotely operated adjustment drive (21).
摘要翻译： 用于在可抽空的纸幅处理装置中引导幅材的引导装置（1）包括至少一个具有轴（5）的引导辊（2），其空间位置是可设定的。 为了解决在具有多个室的模块化安装中补偿的问题，腔室相对于彼此的不对准和/或避免完全可调节的辊框架，其调整将需要重新定位处理和涂覆源以及在圆周上分离间隙 本发明提出，引导辊（2）支撑在两个枢转轴承（11,12）之间，其中至少一个可相对于另一个横向于轴线（5）可调节。 这优选地由此可调节的枢转轴承（12）包括紧固到室壁（14）的滑动引导件（15），其上带有枢转轴承（12）的滑动件（16）被引导到其上，并且 所述可调枢转轴承（12）包括远程操作的调节驱动器（21）。
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公开(公告)号：US5108571A
公开(公告)日：1992-04-28
申请号：US770772
申请日：1991-10-04
申请人： Rainer Ludwig , Rolf Adam , Anton Dietrich , Reiner Kukla
发明人： Rainer Ludwig , Rolf Adam , Anton Dietrich , Reiner Kukla
CPC分类号： H05K3/16 , C23C14/024 , C23C14/087 , C23C14/18 , C23C14/35 , H05K3/38
摘要： In a process for coating substrates 1, 35, for example aluminum ceramic plates 1 or polyimide films 35 with copper by means of a device including a direct current source 10 which is connected to a sputtering cathode 5, 30, 31 disposed in a process chamber 15, 15a, 32 which can be evacuated and this cathode electrically interacts with a copper target 3, 33, 34 which can be sputtered and the sputtered particles are deposited on the substrate 1, 35 whereby the argon gas can be introduced into the process chamber 15, 15a, 32 which can be evacuated, an oxygen inlet 20, 39 is provided in addition to the argon inlet 21, 40, whereby the supply of oxygen can be controlled via a valve 19, 43 inserted in the feed line 23, 39 and the amount of oxygen can be metered such that during a first process phase a copper oxide layer which functions as a bonding agent forms on the substrate 1, 35 and after adjusting the argon atmosphere in the process chamber 15, 15a, 32 pure copper is deposited as an electrically conductive layer.
摘要翻译： 在通过包括连接到设置在处理室中的溅射阴极5,30,31的直流电源10的装置来涂覆基板1，35，例如铝陶瓷板1或具有铜的聚酰亚胺膜35的工艺中 15，15a，32，其可以被抽真空，并且该阴极与可以溅射的铜靶3,33,34电相互作用，并且溅射的颗粒沉积在衬底1,35上，由此氩气可以被引入到处理室 除了氩入口21,40之外，还可以提供可以抽真空的氧气入口20,39，从而可以通过插入进料管线23,39中的阀19,43来控制供氧。 并且可以计量氧气的量，使得在第一处理阶段期间，在基板1,35上形成用作粘合剂的氧化铜层，并且在调节处理室15,15a，32纯铜中的氩气氛之后， 作为选民保存 导电层。
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