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11 条记录 (耗时 0.012 秒)

    Method of making a rim-type phase-shift mask and mask manufactured thereby
    2.
    发明授权
    Method of making a rim-type phase-shift mask and mask manufactured thereby 失效
    制造由此制造的边缘型相移掩模和掩模的方法

    公开(公告)号：US5955222A

    公开(公告)日：1999-09-21

    申请号：US759744

    申请日：1996-12-03

    申请人： Michael Straight Hibbs ,  Steven John Holmes ,  Ahmad D. Katnani ,  Wayne Martin Moreau ,  Niranjan Mohanlal Patel

    发明人： Michael Straight Hibbs ,  Steven John Holmes ,  Ahmad D. Katnani ,  Wayne Martin Moreau ,  Niranjan Mohanlal Patel

    IPC分类号： G03F1/29 ,  G03F9/00

    CPC分类号： G03F1/29

    摘要： A method of making a rim-type phase shift mask comprising the steps of: providing a substrate having opposing first and second surfaces, the first surface being at least partially covered with a first layer of material that substantially blocks the transmission therethrough of electromagnetic radiation of the predetermined range of wavelengths; forming a plurality of openings extending through the first layer so as to expose underlying portions of the first surface of the substrate; depositing a layer of hybrid photoresist on the first layer; exposing the second surface of the substrate to electromagnetic radiation to activate the desired portions of the hybrid photoresist; developing the photoresist, thereby exposing portions underlying the resist; and etching the exposed portions of the substrate is disclosed. The hybrid photoresist material may be exposed at varying doses to alter the placement of the area that is soluble in developer solution so that the phase shifter may be placed in various areas, but is always aligned in a fixed relationship with the edge of the blocking material.

    摘要翻译： 一种制造边缘型相移掩模的方法，包括以下步骤：提供具有相对的第一和第二表面的基底，所述第一表面至少部分地被第一材料层覆盖，所述第一材料层基本上阻挡了通过其中的电磁辐射的透射 波长的预定范围; 形成延伸穿过第一层的多个开口，以便露出衬底的第一表面的下面部分; 在第一层上沉积一层混合光致抗蚀剂; 将基板的第二表面暴露于电磁辐射以激活混合光致抗蚀剂的所需部分; 显影光致抗蚀剂，从而暴露抗蚀剂下面的部分; 并且公开了蚀刻衬底的暴露部分。 混合光致抗蚀剂材料可以以不同的剂量暴露以改变可溶于显影剂溶液的区域的位置，使得移相器可以放置在各种区域中，但是总是与阻挡材料的边缘成固定的关系对准 。

    In-situ pellicle monitor
    3.
    发明授权
    In-situ pellicle monitor 失效
    原位防护薄膜监护仪

    公开(公告)号：US07060403B2

    公开(公告)日：2006-06-13

    申请号：US10904356

    申请日：2004-11-05

    申请人： Michael Straight Hibbs

    发明人： Michael Straight Hibbs

    IPC分类号： G03F9/00

    CPC分类号： G03F1/84 ,  G03F1/62

    摘要： A mask structure and method of quantitatively measuring pellicle degradation in production photomasks by measuring overlay in test structures on the mask. A structure is located in a high transmission region close to a transition region between a low transmission and a high transmission region of the mask such that pellicle degradation impacts the printing of the object. A second structure is located in low transmission region such that the printing of the second structure overlaps the first and provides a measure of pellicle degradation.

    摘要翻译： 掩模结构和方法，通过在掩模上的测试结构中测量覆盖物来定量测量生产光掩模中的薄膜退化。 结构位于靠近掩模的低透射区域和高透射区域之间的过渡区域的高透射区域中，使得防护薄膜衰减影响对象的印刷。 第二结构位于低透射区域中，使得第二结构的印刷与第一结构重叠并提供防护薄膜的降解量。

    Pupil imaging reticle for photo steppers
    5.
    发明授权
    Pupil imaging reticle for photo steppers 失效
    瞳孔成像掩模版用于照相步进机

    公开(公告)号：US5973771A

    公开(公告)日：1999-10-26

    申请号：US824385

    申请日：1997-03-26

    申请人： Michael Straight Hibbs ,  Dean Craig Humphrey ,  Grant Neven Pealer, III ,  Barbara Bates Peck

    发明人： Michael Straight Hibbs ,  Dean Craig Humphrey ,  Grant Neven Pealer, III ,  Barbara Bates Peck

    IPC分类号： G03F7/20 ,  G01J1/00 ,  G01J1/32 ,  G01R11/00

    CPC分类号： G03F7/70591 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/70641

    摘要： The invention relates to the evaluation of the pupil illumination profile in a projection lithography system using an imaging reticle featuring a plurality of holes of few microns in diameter. The imaging reticle is placed at the lens object plane and a photoresist coated substrate is exposed in a defocused position from the lithographic image plane. The image reticle has a plurality of identical holes that are regularly spaced at predetermined distances for a more detailed evaluation of the effective pupil illumination across the entire exposure field.

    摘要翻译： 本发明涉及使用具有多个直径为几微米孔的成像掩模版的投影光刻系统中的光瞳照明轮廓的评估。 将成像掩模版放置在透镜物平面处，并且将光致抗蚀剂涂覆的基板从光刻图像平面以散焦位置曝光。 图像掩模版具有多个相同的孔，其以预定距离规则地间隔开，以便对整个曝光场的有效光瞳照明进行更详细的评估。

    In-situ pellicle monitor
    7.
    发明授权
    In-situ pellicle monitor 失效

    公开(公告)号：US06835502B2

    公开(公告)日：2004-12-28

    申请号：US10064442

    申请日：2002-07-15

    申请人： Michael Straight Hibbs

    发明人： Michael Straight Hibbs

    IPC分类号： G03F900

    CPC分类号： G03F1/84 ,  G03F1/62

    摘要： A mask structure and method of quantitatively measuring pellicle degradation in production photomasks by measuring overlay in test structures on the mask. A structure is located in a high transmission region close to a transition region between a low transmission and a high transmission region of the mask such that pellicle degradation impacts the printing of the object. A second structure is located in low transmission region such that the printing of the second structure overlaps the first and provides a measure of pellicle degradation.