公开(公告)号：US6054016A

公开(公告)日：2000-04-25

申请号：US31706

申请日：1998-02-27

申请人： Mutumi Tuda ,  Kouichi Ono ,  Masaaki Tsuchihashi ,  Minoru Hanazaki ,  Toshio Komemura ,  Kouji Oku ,  Shinji Nakaguma

发明人： Mutumi Tuda ,  Kouichi Ono ,  Masaaki Tsuchihashi ,  Minoru Hanazaki ,  Toshio Komemura ,  Kouji Oku ,  Shinji Nakaguma

IPC分类号： H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  H05H1/46 ,  C23F1/02 ,  C23C16/00

CPC分类号： H01J37/3222 ,  H01J37/32192 ,  H01J37/32688 ,  H05H1/46

摘要： There is provided a plasma generating apparatus comprising: a waveguide for guiding a microwave; a vacuum vessel connected to the waveguide, having a means for supplying a gas for discharging electrons and a means for evacuating; and a dielectric member in a tube-like shape or a rod-like shape which is inserted in the vacuum vessel, wherein the dielectric member is provided with a means for emitting the microwave, whereby it is possible to apply the electric power of microwave effectively to plasma of high density exceeding so-called cut-off density and to homogenize the distribution of plasma in the vacuum vessel.

摘要翻译： 提供了一种等离子体产生装置，包括：用于引导微波的波导; 连接到波导的真空容器，具有用于提供用于排出电子的气体的装置和用于排空的装置; 以及插入真空容器中的管状或棒状形状的电介质构件，其中，电介质构件设置有用于发射微波的装置，由此可以有效地施加微波的电力 到高密度的等离子体超过所谓的截止密度并使真空容器中的等离子体的分布均匀化。

公开(公告)号：US6109208A

公开(公告)日：2000-08-29

申请号：US122061

申请日：1998-07-27

申请人： Masaaki Tsuchihashi ,  Minoru Hanazaki ,  Toshio Komemura ,  Mutumi Tuda ,  Kouichi Ono ,  Kouji Oku ,  Shinji Nakaguma

发明人： Masaaki Tsuchihashi ,  Minoru Hanazaki ,  Toshio Komemura ,  Mutumi Tuda ,  Kouichi Ono ,  Kouji Oku ,  Shinji Nakaguma

IPC分类号： H05H1/46 ,  C23C16/50 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  C23C14/00 ,  C23C16/00 ,  C23F1/02

CPC分类号： H01J37/3222 ,  H01J37/32192

摘要： A plasma generating apparatus capable of improving the uniformity of a plasma processing and coping with a larger diameter of a substrate is obtained. Microwaves are distributed and emitted from a waveguide through the branching portions of a T branch to four rod antennas. The microwaves are introduced through four dielectric tubes into a vacuum vessel. In the vacuum vessel, a multi-cusp magnetic field and an electron cyclotron resonance region are caused by permanent magnets located around the vessel and, by an interaction between a vibrational electric field of the microwaves and a magnetic field, highly uniform plasma is generated in a region where a substrate or the like is subjected to a plasma processing.

摘要翻译： 可以获得能够提高等离子体处理的均匀性并应对基板的较大直径的等离子体产生装置。 微波从波导通过T分支的分支部分分布并发射到四个棒状天线。 微波通过四个电介质导入真空容器中。 在真空容器中，多尖点磁场和电子回旋共振区域由位于容器周围的永磁体引起，并且通过微波的振动电场与磁场之间的相互作用，产生高度均匀的等离子体 对基板等进行等离子体处理的区域。

公开(公告)号：US06416618B2

公开(公告)日：2002-07-09

申请号：US09354574

申请日：1999-07-16

申请人： Masaaki Tsuchihashi ,  Minoru Hanazaki ,  Hideki Oura

发明人： Masaaki Tsuchihashi ,  Minoru Hanazaki ,  Hideki Oura

IPC分类号： C23F102

CPC分类号： H01L21/67098 ,  C23C16/4586 ,  C23C16/46 ,  H01L21/6831

摘要： There is described a wafer processing apparatus intended to efficiently secure a wafer on an electrostatic chuck. A heater is disposed in a processing chamber for heating a wafer, and a dielectric plate for supporting the wafer is also disposed in the processing chamber. First and second electrodes are embedded in the dielectric plate, and first and second variable D.C. power supplies are disposed so as to supply voltages to the first and second electrodes, respectively. After the wafer has been placed on an electrostatic chuck, the wafer is pre-heated before being subjected to attraction force. After completion of the pre-heating phase, the first and second D.C. power supplies supply voltages to the first and second electrodes, thus securing the wafer on the dielectric plate.

摘要翻译： 描述了用于有效地将晶片固定在静电卡盘上的晶片处理设备。 加热器设置在用于加热晶片的处理室中，并且用于支撑晶片的电介质板也设置在处理室中。 第一和第二电极被嵌入在电介质板中，并且第一和第二可变直流电源被设置成分别向第一和第二电极提供电压。 在将晶片放置在静电卡盘上之后，晶片在受到吸引力之前被预热。 在预热阶段完成之后，第一和第二直流电源向第一和第二电极提供电压，从而将晶片固定在电介质板上。

公开(公告)号：US6024105A

公开(公告)日：2000-02-15

申请号：US19702

申请日：1998-02-06

申请人： Minoru Hanazaki ,  Masaaki Tsuchihashi

发明人： Minoru Hanazaki ,  Masaaki Tsuchihashi

IPC分类号： H01L21/302 ,  C23C16/44 ,  H01J37/32 ,  H01L21/205 ,  H01L21/3065 ,  B08B3/02

CPC分类号： H01J37/32862 ,  C23C16/4407 ,  H01J2237/022 ,  Y10S134/902 ,  Y10S438/905 ,  Y10S438/906

摘要： An introduction pipe for gas or the like for introducing water or water vapor is connected to a vacuum process chamber. The vacuum process chamber is evacuated through an evacuation exhaust port, and the introduced water vapor or water is solidified or liquefied by adiabatic expansion using a floating fine particle as a core. The particle on which the water vapor or the like is solidified or liquefied is discharged outside the vacuum process chamber. Thus, a semiconductor manufacturing device capable of reducing the number of fine particles on a wafer without decreasing uptime ratio is achieved.

摘要翻译： 用于引入水或水蒸气的气体等的导入管连接到真空处理室。 真空处理室通过排气口抽真空，引入的水蒸汽或水通过绝热膨胀固化或液化，以漂浮的微粒为核心。 水蒸汽等固化或液化的颗粒排出真空处理室外。 因此，可以实现能够减少晶片上的微粒数量而不减少正常运行时间比的半导体制造装置。

公开(公告)号：US06273023B1

公开(公告)日：2001-08-14

申请号：US09228233

申请日：1999-01-11

申请人： Masaaki Tsuchihashi ,  Minoru Hanazaki

发明人： Masaaki Tsuchihashi ,  Minoru Hanazaki

IPC分类号： C23C1600

CPC分类号： H01J37/32706 ,  C23C16/4586

摘要： A plasma processing apparatus capable of attracting and holding a semiconductor wafer reliably once the processing of the semiconductor wafer is started includes: a vacuum chamber; an electrode arranged inside the vacuum chamber; a dielectric film formed on a surface of the electrode; a gas supply port leading to the vacuum chamber; a high-frequency electric power supply connected to the electrode; a memory operation unit which depends on a processing condition for producing a desired plasma, to calculate and output the voltage value corresponding to the sum of a value of a minimal actual attract and hold voltage required to be applied between one surface of the semiconductor wafer mounted on the dielectric film and a surface of the dielectric film to attract and hold one surface of the semiconductor wafer on the surface of the dielectric film and a value of a self-bias voltage generated at the other surface of the semiconductor wafer when the desired plasma is produced; and an electrostatic chuck power supply for applying the voltage corresponding to the voltage value calculated in the memory operation unit to the electrode. An electrostatic attract and hold vacuum chucking method employed in the plasma processing apparatus is also disclosed.

摘要翻译： 一旦开始半导体晶片的处理，能够可靠地吸引并保持半导体晶片的等离子体处理装置包括：真空室; 设置在真空室内的电极; 形成在电极表面上的电介质膜; 通向真空室的气体供给口; 连接到电极的高频电源; 存储器操作单元，其依赖于用于产生所需等离子体的处理条件，以计算和输出对应于在安装的半导体晶片的一个表面之间施加的最小实际吸引和保持电压的值之和的电压值 在电介质膜和电介质膜的表面上，以在电介质膜的表面上吸引并保持半导体晶片的一个表面，并且当期望的等离子体在半导体晶片的另一个表面产生的自偏压值 生产; 以及静电卡盘电源，用于将对应于在存储器操作单元中计算出的电压值的电压施加到电极。 还公开了在等离子体处理装置中采用的静电吸引和保持真空吸附方法。

公开(公告)号：US09200141B2

公开(公告)日：2015-12-01

申请号：US13816145

申请日：2011-08-11

申请人： Seichi Tahara ,  Kumi Fujiki ,  Masaaki Tsuchihashi ,  Tetsuo Takano

发明人： Seichi Tahara ,  Kumi Fujiki ,  Masaaki Tsuchihashi ,  Tetsuo Takano

IPC分类号： C08K5/1545 ,  C08K5/1535 ,  B60C1/00 ,  C08L9/06 ,  C08L21/00 ,  C08L71/02 ,  C08K5/17 ,  C08L7/00 ,  C08K5/06

CPC分类号： C08K5/1545 ,  B60C1/0016 ,  B60C1/0025 ,  C08K5/06 ,  C08K5/1535 ,  C08K5/17 ,  C08L7/00 ,  C08L9/06 ,  C08L21/00 ,  C08L71/02

摘要： Provided is a rubber composition capable of preventing discoloration due to an amine-based antiaging agent and wax without deteriorating the ozone resistance not only in cases where the rubber composition is used in side wall portions of tires but also in cases where the rubber composition is used in tread portions of tires. The rubber composition comprises at least one rubber component selected from a dienic synthetic rubber and a natural rubber and, as incorporated therein, at least one nonionic surfactant selected from specific compounds.

摘要翻译： 本发明提供一种橡胶组合物，其不仅在轮胎的侧壁部分使用橡胶组合物的情况下，而且在使用橡胶组合物的情况下，能够防止由于胺类抗老化剂和蜡而引起的变色，而不会使耐臭氧性恶化 在轮胎的胎面部分。 橡胶组合物包含至少一种选自二烯合成橡胶和天然橡胶的橡胶组分，并且其中包含至少一种选自特定化合物的非离子表面活性剂。

公开(公告)号：US07799856B2

公开(公告)日：2010-09-21

申请号：US10491272

申请日：2002-10-04

申请人： Daisuke Nohara ,  Masaaki Tsuchihashi ,  Isao Nishi ,  Tetsuo Takano

发明人： Daisuke Nohara ,  Masaaki Tsuchihashi ,  Isao Nishi ,  Tetsuo Takano

IPC分类号： C08K5/00

CPC分类号： C08K5/12 ,  C08K3/013 ,  C08K5/101 ,  C08K5/11 ,  C08K5/54 ,  C08L21/00

摘要： Provided is a rubber composition comprising an inorganic filler, a compound having at least one group A reacting with a rubber and two or more groups B adsorbing on the inorganic filler described above in the same molecule, a compound having the group A reacting with a rubber and an amino group in the same molecule or acrylate or methacrylate having a specific structure and further comprising, if necessary, a silane coupling agent. This makes it possible to provide a rubber composition which is excellent in the dispersibility of an inorganic filler, so that it does not elevate a viscosity of a non-vulcanized rubber and does not damage the processability and which does not bring about roughening on the surface of a rubber and is improved in a storage modulus.

摘要翻译： 本发明提供一种橡胶组合物，其包含无机填料，具有至少一个与橡胶反应的基团A的化合物和吸附在上述同一分子中的无机填料上的两个或更多个基团B，具有与橡胶反应的基团A的化合物 和具有特定结构的相同分子中的氨基或丙烯酸酯或甲基丙烯酸酯，并且如果需要，还包含硅烷偶联剂。 这使得可以提供一种无机填料的分散性优异的橡胶组合物，使得它不会提高未硫化橡胶的粘度，并且不损害加工性，并且不会在表面上产生粗糙化 的橡胶，并且储能模量得到改善。

公开(公告)号：US4171957A

公开(公告)日：1979-10-23

申请号：US894422

申请日：1978-04-07

申请人： Noboru Moriyama ,  Masaaki Tsuchihashi

发明人： Noboru Moriyama ,  Masaaki Tsuchihashi

IPC分类号： C10L1/24 ,  C10L1/32

CPC分类号： C10L1/322

摘要： A mixed fuel of coal and fuel oil can be effectively stabilized by adding thereinto a compound obtained by the condensation reaction between a sulfonated aromatic compound having a hydrophobic group and formalin.

摘要翻译： 通过将具有疏水性基团的磺化芳香族化合物与福尔马林之间的缩合反应得到的化合物加入，可以有效地稳定煤和燃料油的混合燃料。

公开(公告)号：US20140134094A1

公开(公告)日：2014-05-15

申请号：US14123915

申请日：2012-06-06

申请人： Hiromi Aso ,  Masaaki Tsuchihashi ,  Tetsuo Takano

发明人： Hiromi Aso ,  Masaaki Tsuchihashi ,  Tetsuo Takano

IPC分类号： D01F9/21

CPC分类号： D01F9/21 ,  D01F9/22 ,  D06M7/00 ,  D06M13/224 ,  D06M13/425 ,  D06M15/568 ,  D06M15/6436 ,  D06M2101/28

摘要： The present invention relates to an oil agent for carbon-fiber precursor acrylic fiber, including at least one type of compound selected from groups of a hydroxybenzoate (Compound A), a cyclohexanedicarboxylic acid (Compound B and C), a cyclohexanedimethanol and/or a cyclohexanediol and a fatty acid (Compound D and E) and an isophoronediisocyanate-aliphatic alcohol adduct (Compound F), an oil composition for carbon-fiber precursor acrylic fiber, a processed-oil solution for carbon-fiber precursor acrylic fiber, and a method for producing a carbon-fiber precursor acrylic fiber bundle, and a carbon-fiber bundle using the carbon-fiber precursor acrylic fiber bundle.

摘要翻译： 本发明涉及一种碳纤维前体丙烯酸系纤维的油剂，其包含至少一种选自羟基苯甲酸酯（化合物A），环己烷二羧酸（化合物B和C），环己烷二甲醇和/或 环己二醇和脂肪酸（化合物D和E）和异佛尔酮二异氰酸酯 - 脂肪醇加合物（化合物F），碳纤维前体丙烯酸系纤维用油组合物，碳纤维前体丙烯酸系纤维的加工油溶液 用于生产碳纤维前体丙烯酸纤维束，以及使用碳纤维前体丙烯酸纤维束的碳纤维束。

公开(公告)号：US09868847B2

公开(公告)日：2018-01-16

申请号：US13989243

申请日：2011-11-24

申请人： Reiko Yagi ,  Kumi Fujiki ,  Tetsuo Takano ,  Masaaki Tsuchihashi

发明人： Reiko Yagi ,  Kumi Fujiki ,  Tetsuo Takano ,  Masaaki Tsuchihashi

IPC分类号： B60C1/00 ,  C08K5/20 ,  C08K3/36 ,  C08K5/548 ,  C08L7/00 ,  C08L9/00 ,  C08L21/00

CPC分类号： C08K5/20 ,  B60C1/00 ,  C08K3/36 ,  C08K5/548 ,  C08L7/00 ,  C08L9/00 ,  C08L21/00

摘要： In order to provide a rubber composition which is improved in dispersibility of silica in rubber compositions and can be improved as well in heat build-up and processability without causing increasing a viscosity of unvulcanized rubber and retarding a vulcanization rate, and a tire prepared by using the same, the rubber composition is endowed with a constitution in which at least one rubber component selected from natural rubber and/or diene base synthetic rubbers is compounded with a white filler and at least one of monoalkanolamides represented by the following Formula (I): [in Formula (I) described above, R1 represents an alkyl group or an alkenyl group having 1 to 13 carbon atoms, and the alkyl group and alkenyl group may be any of a linear type, a branched type and a cyclic type; and R2 represents a hydroxyalkyl group or a hydroxyalkyl group having an oxyalkylene unit].